公开(公告)号：US11029265B2

公开(公告)日：2021-06-08

申请号：US16301980

申请日：2017-05-17

Applicant: XENOCS SAS

Inventor： Peter Hoghoj

IPC: G01N23/201 ,  G01N23/20 ,  G01N23/20008

Abstract: An X-ray scattering apparatus has a sample holder for aligning and orienting a sample to be analyzed by X-ray scattering, an X-ray beam delivery system arranged upstream of the sample holder for generating and directing a direct X-ray beam along a propagation direction towards the sample holder, a proximal X-ray detector arranged downstream of the sample holder as to let the direct X-ray beam pass and detect X rays scattered from the sample, and a distal X-ray detector arranged downstream of the sample holder and movable along the propagation direction (X) of the direct X-ray beam in which the proximal X-ray detector is also movable essentially along the propagation direction of the direct X-ray beam.

公开(公告)号：US10976272B2

公开(公告)日：2021-04-13

申请号：US16498593

申请日：2018-01-25

Applicant: RIGAKU CORPORATION

Inventor： Yayoi Taniguchi ,  Keiichi Morikawa

IPC: G01N23/201 ,  G01N23/207 ,  G01N23/205

Abstract: An X-ray analysis assistance device with an input and operation device 24 for arbitrarily inputting and setting the value of one from among the distance L between a sample S and a two-dimensional detector 2 and the maximum detection range Xmax for X-rays scattered or diffracted by the sample S, and a central processing unit 20 for automatically setting the other setting item on the basis of the value of the one setting item set by the input and operation device 24. Further, the maximum measurement frame Hmax for the X-rays is displayed on a display screen 22 of a display device 21 on the basis of the distance L and maximum detection range Xmax. Additionally, an X-ray detection area A indicating the range within which it is possible for the detection surface of the two-dimensional detector 2 to detect X-rays is displayed on the display screen 22 of the display device 21.

公开(公告)号：US20210072169A1

公开(公告)日：2021-03-11

申请号：US16958851

申请日：2019-03-25

Applicant: Council of Scientific and Industrial Research

Inventor： ASHISH ,  Amin SAGAR ,  Maulik Dinesh BADMALIA ,  Kanika DHIMAN ,  Shiv Pratap Singh YADAV

IPC: G01N23/201 ,  G01N33/483

Abstract: The present application provides an in vitro method for detecting presence of cancer by analyzing small angle X-ray scattering (SAXS) of a single hair by automated data analysis using end user or in-house X-ray source. Specifically, the present methodology provides a method which also provides steps to allow correction for hair thickness and provide a quantitative view on the cancer status of the subject.

公开(公告)号：US10859519B2

公开(公告)日：2020-12-08

申请号：US16686953

申请日：2019-11-18

Applicant: NOVA MEASURING INSTRUMENTS, INC.

Inventor： Heath A. Pois ,  David A. Reed ,  Bruno W. Schueler ,  Rodney Smedt ,  Jeffrey T. Fanton

IPC: G01N23/201 ,  G01N23/207 ,  H01L21/66

Abstract: Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) are disclosed. For example, a method of measuring a sample by X-ray reflectance scatterometry involves impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles. The method also involves collecting at least a portion of the scattered X-ray beam.

公开(公告)号：US10859518B2

公开(公告)日：2020-12-08

申请号：US15847375

申请日：2017-12-19

Applicant: KLA-Tencor Corporation

Inventor： Nikolay Artemiev ,  Michael Friedmann

IPC: G01N23/201

Abstract: Methods and systems for controlling illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements of different sized metrology targets are described herein. An X-ray illumination optics subsystem includes one or more focusing optical elements with object and image planes at fixed locations and one or more illumination apertures or slits that independently control magnification and beam divergence. In a further aspect, the illumination source size and shape is controlled, along with magnification and beam divergence. In this manner, beam divergence and illumination spot size on a specimen are independently controlled, while maintaining constant illumination flux.

公开(公告)号：US10767978B2

公开(公告)日：2020-09-08

申请号：US15950823

申请日：2018-04-11

Applicant: KLA-Tencor Corporation

Inventor： Andrei V. Shchegrov ,  Antonio Arion Gellineau ,  Sergey Zalubovsky

IPC: G01N23/201 ,  G01N23/20 ,  G01B11/14 ,  H01L21/66 ,  G01B11/26 ,  G03F7/20 ,  G01N21/47 ,  H01J37/28 ,  G01N21/21 ,  G01B11/06 ,  H05G2/00 ,  G01N21/95 ,  G01B15/00

Abstract: Methods and systems for characterizing dimensions and material properties of semiconductor devices by transmission small angle x-ray scatterometry (TSAXS) systems having relatively small tool footprint are described herein. The methods and systems described herein enable Q space resolution adequate for metrology of semiconductor structures with reduced optical path length. In general, the x-ray beam is focused closer to the wafer surface for relatively small targets and closer to the detector for relatively large targets. In some embodiments, a high resolution detector with small point spread function (PSF) is employed to mitigate detector PSF limits on achievable Q resolution. In some embodiments, the detector locates an incident photon with sub-pixel accuracy by determining the centroid of a cloud of electrons stimulated by the photon conversion event. In some embodiments, the detector resolves one or more x-ray photon energies in addition to location of incidence.

公开(公告)号：US10481111B2

公开(公告)日：2019-11-19

申请号：US15789992

申请日：2017-10-21

Applicant: KLA-Tencor Corporation

Inventor： John Hench ,  Antonio Gellineau ,  Nikolay Artemiev ,  Joseph A. Di Regolo

IPC: G01N23/20 ,  G01N23/201 ,  G01N23/083 ,  G21K1/06

Abstract: Methods and systems for calibrating the location of x-ray beam incidence onto a specimen in an x-ray scatterometry metrology system are described herein. The precise location of incidence of the illumination beam on the surface of the wafer is determined based on occlusion of the illumination beam by two or more occlusion elements. The center of the illumination beam is determined based on measured values of transmitted flux and a model of the interaction of the beam with each occlusion element. The position of the axis of rotation orienting a wafer over a range of angles of incidence is adjusted to align with the surface of wafer and intersect the illumination beam at the measurement location. A precise offset value between the normal angle of incidence of the illumination beam relative to the wafer surface and the zero angle of incidence as measured by the specimen positioning system is determined.

公开(公告)号：US20190339215A1

公开(公告)日：2019-11-07

申请号：US16515052

申请日：2019-07-18

Applicant: BRUKER JV ISRAEL LTD.

Inventor： Alex Krokhmal ,  Alex Dikopoltsev ,  Juri Vinshtein

IPC: G01N23/201

Abstract: A method for X-ray scatterometry includes receiving a first distribution of an X-ray beam scattered from a sample. The first distribution exhibits asymmetry with respect to a reference axis. A correction is applied to the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution. One or more parameters of the sample are estimated based on the second distribution.

公开(公告)号：US20190331616A1

公开(公告)日：2019-10-31

申请号：US16464574

申请日：2017-11-28

Applicant: Technische Universität Munchen

Inventor： Florian Schaff ,  Franz Pfeiffer

IPC: G01N23/046 ,  G01N23/201 ,  G01N23/20025

Abstract: The invention relates to an X-ray CT method and in particular a registration-based dark-field tensor tomography method for testing a sample (60) by means of X-rays, with which method a sample (60) is consecutively scanned by means of X-rays in at least two fixed orientations differing from one another while rotating about a fixed rotation axis, in every orientation of the sample (60) on the basis of dark-field signals a plurality of scatter data sets is recorded, and the scatter data sets for different orientations are matched to one another by registration and combined into a common scatter data set reflecting a possible angular dependence of the scatter present due to the sample (60).

公开(公告)号：US20190317031A1

公开(公告)日：2019-10-17

申请号：US16382606

申请日：2019-04-12

Applicant: Malvern Panalytical B.V.

Inventor： Milen GATESHKI ,  Detlef BECKERS

IPC: G01N23/223 ,  G01N23/207 ,  G01N23/201

Abstract: An X-ray analysis apparatus and method. The apparatus comprises an adjustable slit (210) between an X-ray source (4) and a sample (6); and optionally a further slit (220, 220a). A controller (17) is configured to control a width of the adjustable slit, between a first width, a larger second width, and an even larger third width. At the first and second widths: the adjustable slit (210) limits the divergence of the incident beam and thereby limits an area of the sample that is irradiated; and the further slit (220) does not limit the divergence of the incident beam. At the third width: the adjustable slit (210) does not limit the divergence of the incident beam, and the further slit (220) limits the divergence of the incident beam and thereby limits the area of the sample that is irradiated. Alternatively, at the third width, the adjustable slit (210) continues to limit the area irradiated.