公开(公告)号：US2543630A

公开(公告)日：1951-02-27

申请号：US15543850

申请日：1950-04-12

Applicant: GEN ELECTRIC

Inventor： SIEGFRIED HANSEN

IPC: G21K1/06

CPC classification number: G21K1/06 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067 ,  Y10T74/22

公开(公告)号：US20180299784A1

公开(公告)日：2018-10-18

申请号：US16013687

申请日：2018-06-20

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08 ,  G02B7/18 ,  G02B27/00 ,  G02B3/00 ,  G02B17/06 ,  G03B27/54 ,  B82Y10/00

CPC classification number: G03F7/7015 ,  B82Y10/00 ,  G02B3/00 ,  G02B5/00 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0891 ,  G02B7/1815 ,  G02B17/0647 ,  G02B27/0043 ,  G03B27/542 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

公开(公告)号：US09810890B2

公开(公告)日：2017-11-07

申请号：US15061597

申请日：2016-03-04

Applicant: Carl Zeiss SMT GmbH

Inventor： Markus Deguenther

IPC: G02B27/54 ,  G02B19/00 ,  G03F7/20 ,  G02B5/09 ,  G21K1/06

CPC classification number: G02B19/0023 ,  G02B5/09 ,  G02B19/0095 ,  G03F7/70075 ,  G03F7/70175 ,  G03F7/702 ,  G21K1/06 ,  G21K2201/064

Abstract: A collector transfers EUV illumination light from a radiation source region to illumination optics. Imaging optics of the collector image the radiation source region in a downstream focal region. The imaging optics are embodied so that the radiation source is imaged with at least one first imaging scale by the EUV illumination light, which is emitted with beam angles 70°. The two imaging scales for the beam angles 70° on the other hand differ by no more than a factor of 2.5. In addition to a corresponding collector, an illumination system contains field facets transfer optics.

公开(公告)号：US20170194065A1

公开(公告)日：2017-07-06

申请号：US15117075

申请日：2014-02-05

Applicant: HITACHI, LTD.

Inventor： Ken HARADA ,  Teruo KOHASHI ,  Tomohiro IWANE

IPC: G21K1/06 ,  G02B5/18

CPC classification number: G21K1/06 ,  G02B5/1842 ,  G02B5/1866 ,  G02B2005/1804 ,  G21K2201/064 ,  G21K2201/067 ,  H01J37/04 ,  H01J37/09 ,  H01J37/26

Abstract: The outer shape and size of a diffraction grating including an edge dislocation is made smaller than the irradiation areas of light waves and electromagnetic waves, by using an opener different from in the diffraction grating, the shape and size of the opening is superposed on the shape of a spiral wave that is generated by an edge dislocation diffraction grating, and the shape and size of the opening are reflected in the shape and size of the spiral wave on the diffractive surface. In addition, not only a diffraction grating system including a pair of a single opener and a single diffraction grating, but also a diffraction grating system in which plural openers and plural edge dislocation diffraction gratings are combined are used, and plural spiral waves can be generated on the diffractive surface with a higher degree of freedom.

公开(公告)号：US09601308B2

公开(公告)日：2017-03-21

申请号：US14439993

申请日：2012-10-31

Applicant: Hitachi, Ltd.

Inventor： Yoshihiro Anan ,  Masanari Koguchi

IPC: G01T1/20 ,  H01J37/244 ,  G01N23/225 ,  H01J37/28 ,  G21K1/06 ,  H01J37/252

CPC classification number: H01J37/244 ,  G01N23/2252 ,  G21K1/067 ,  G21K2201/064 ,  H01J37/252 ,  H01J37/28 ,  H01J2237/2442 ,  H01J2237/2445

Abstract: To analyze an element to be evaluated with high sensitivity and high accuracy in a short period of time, in an electron beam analyzer including a wavelength dispersive X-ray analyzer in an electron microscope. The electron beam analyzer has one diffraction grating in which a plurality of patterns having maximum X-ray reflectance with respect to the respective X-rays are formed. It simultaneously detects an X-ray as an energy reference and an X-ray spectrum to be evaluated. The positional displacement of X-ray energy due to the installation/replacement of the diffraction grating is corrected using the X-ray spectrum as the energy reference, thereby enabling to perform an analysis with high sensitivity and high accuracy in a short period of time.

公开(公告)号：US09510433B2

公开(公告)日：2016-11-29

申请号：US14481620

申请日：2014-09-09

Applicant: GIGAPHOTON INC.

Inventor： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC: G03B27/32 ,  B23K26/10 ,  B23K26/12 ,  B23K26/36 ,  H05G2/00 ,  G21K5/02 ,  G21K5/00 ,  B23K10/00 ,  G03F7/20 ,  G21K1/06

CPC classification number: H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US20160254068A1

公开(公告)日：2016-09-01

申请号：US15149395

申请日：2016-05-09

Applicant: X-RAY OPTICAL SYSTEMS, INC.

Inventor： Steven M. POMERANTZ ,  John H. BURDETT ,  Rory D. DELANEY

IPC: G21F5/015 ,  G01N23/223

CPC classification number: G21F5/015 ,  G01N23/10 ,  G01N23/223 ,  G01N2223/074 ,  G01N2223/076 ,  G01N2223/301 ,  G01N2223/308 ,  G01N2223/309 ,  G21K2201/062 ,  G21K2201/064

Abstract: A mobile transport and shielding apparatus, which holds an x-ray analyzer for transport between operating sites, and also serves as a shielded, operational station for holding the x-ray analyzer during operation thereof. The x-ray analyzer is removably insertable into the apparatus and is operable either within the mobile transport and shielding apparatus, or outside of the apparatus. The apparatus may provide means to control, power, cool, and/or charge the x-ray analyzer during operation of the analyzer; and also means to transport the analyzer (e.g., a handle).

Abstract translation: 一种移动式运输和屏蔽装置，其保持用于在操作现场之间运输的x射线分析仪，并且还用作在其操作期间保持x射线分析仪的屏蔽操作台。 X射线分析仪可移除地插入设备中，并且可在移动传输和屏蔽设备内或设备外部操作。 该装置可以提供在分析仪操作期间对x射线分析仪进行控制，供电，冷却和/或充电的装置; 并且还用于运送分析器（例如，手柄）。

公开(公告)号：US20160143122A1

公开(公告)日：2016-05-19

申请号：US14803920

申请日：2015-07-20

Applicant: Jin-Seok Heo ,  Jin-Hong Park

Inventor： Jin-Seok Heo ,  Jin-Hong Park

IPC: H05G2/00 ,  G03F7/20 ,  B05B12/12 ,  G21K1/06

CPC classification number: H05G2/008 ,  B05B12/12 ,  G03F7/70033 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  H05G2/005

Abstract: Provided is an apparatus for generating extreme ultraviolet light. The apparatus includes a collector mirror unit, a gas supply unit configured to supply a processing gas to the collector mirror unit, a gas supply nozzle arranged in at least one area of the collector mirror unit and configured to supply the processing gas to a surface of the collector mirror unit, and a controller configured to adjust a shape of a spray hole of the gas supply nozzle. The shape of the spray hole may be changed according to a control operation of the controller.

Abstract translation: 提供一种用于产生极紫外光的装置。 该装置包括收集反射镜单元，被配置为向收集反射镜单元供应处理气体的气体供给单元，设置在收集反射镜单元的至少一个区域中并被配置为将处理气体供应到 收集器反射镜单元和被配置为调节气体供应喷嘴的喷射孔的形状的控制器。 可以根据控制器的控制操作来改变喷孔的形状。

公开(公告)号：US20150357069A1

公开(公告)日：2015-12-10

申请号：US14636994

申请日：2015-03-03

Applicant: Sigray, Inc.

Inventor： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz

IPC: G21K1/06 ,  G21K1/02 ,  G01N23/207

CPC classification number: G01N23/2076 ,  G01N23/085 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  H01J35/08 ,  H01J35/14 ,  H01J2235/081 ,  H01J2235/086

Abstract: This disclosure presents systems for x-ray absorption fine structure (XAFS) measurements that have x-ray flux and flux density several orders of magnitude greater than existing compact systems. These are useful for laboratory or field applications of x-ray absorption near-edge spectroscopy (XANES) or extended x-ray fine absorption structure (EXFAS) spectroscopy.The higher brightness is achieved by using designs for x-ray targets that comprise a number of aligned microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment with higher electron density and/or higher energy electrons, leading to greater x-ray brightness and high flux.The high brightness x-ray source is then coupled to an x-ray reflecting optical system to collimate the x-rays, and a monochromator, which selects the exposure energy. Absorption spectra of samples using the high flux monochromatic x-rays can be made using standard detection techniques.

Abstract translation: 本公开提供了x射线吸收精细结构（XAFS）测量的系统，其具有比现有紧凑系统大几个数量级的x射线通量和通量密度。 这些对于x射线吸收近边缘光谱（XANES）或扩展X射线精细吸收结构（EXFAS）光谱的实验室或现场应用是有用的。 通过使用X射线靶的设计来实现更高的亮度，所述X射线靶包括与具有高导热性的基底紧密热接触制造的x射线产生材料的多个对准微结构。 这允许用更高电子密度和/或更高能量的电子进行轰击，导致更大的x射线亮度和高通量。 然后将高亮度x射线源耦合到X射线反射光学系统以准直x射线，以及选择曝光能量的单色仪。 使用高通量单色x射线的样品的吸收光谱可以使用标准检测技术进行。

公开(公告)号：US20150318144A1

公开(公告)日：2015-11-05

申请号：US14439993

申请日：2012-10-31

Applicant: Hitachi, Ltd.

Inventor： Yoshihiro Anan ,  Masanari Koguchi

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  G01N23/2252 ,  G21K1/067 ,  G21K2201/064 ,  H01J37/252 ,  H01J37/28 ,  H01J2237/2442 ,  H01J2237/2445

Abstract: To analyze an element to be evaluated with high sensitivity and high accuracy in a short period of time, in an electron beam analyzer including a wavelength dispersive X-ray analyzer in an electron microscope. The electron beam analyzer has one diffraction grating in which a plurality of patterns having maximum X-ray reflectance with respect to the respective X-rays are formed. It simultaneously detects an X-ray as an energy reference and an X-ray spectrum to be evaluated. The positional displacement of X-ray energy due to the installation/replacement of the diffraction grating is corrected using the X-ray spectrum as the energy reference, thereby enabling to perform an analysis with high sensitivity and high accuracy in a short period of time.

Abstract translation: 在电子显微镜中的包括波长色散X射线分析仪的电子束分析仪中，在短时间内以高灵敏度和高精度分析要评估的元件。 电子束分析仪具有一个衍射光栅，其中形成相对于各X射线具有最大X射线反射率的多个图案。 它同时检测X射线作为能量参考和待评估的X射线光谱。 使用X射线光谱作为能量基准来校正由于衍射光栅的安装/替换引起的X射线能量的位置偏移，从而能够在短时间内以高灵敏度和高精度进行分析。