Method for integrating micro- and nanoparticles into MEMS and apparatus including the same
    163.
    发明申请
    Method for integrating micro- and nanoparticles into MEMS and apparatus including the same 失效
    将微米和纳米颗粒整合到MEMS中的方法和包括其的设备

    公开(公告)号:US20030228411A1

    公开(公告)日:2003-12-11

    申请号:US10391122

    申请日:2003-03-18

    Abstract: MEMs devices are integrally fabricated with included micro or nanoparticles by providing a mixture of a sacrificial material and a multiplicity of particles, disposing the mixture onto a substrate, fabricating a MEMs structure on the substrate including at least part of the mixture, so that at least some of the mixture is enclosed in the MEMs structure, removing the sacrificial material, and leaving at least some of the multiplicity of particles substantially free and enclosed in the MEMs structure. The step of fabricating a MEMs structure is quite general and is contemplated as including one or a multiplicity of additional steps for creating some type of structure in which the particles, which may be microbeads or nanobeads, are included. A wide variety of useful applications for MEMs integrated with micro or nanoparticles are available.

    Abstract translation: 通过提供牺牲材料和多个颗粒的混合物将MEM装置与包含的微型或纳米颗粒整体制造,将混合物设置在衬底上,在包括至少部分混合物的衬底上制造MEM结构,使得至少 一些混合物被包封在MEMs结构中,去除牺牲材料,并且使至少一些多个颗粒基本上自由并且封闭在MEM结构中。 制造MEMs结构的步骤是相当普遍的,并且被设想为包括用于产生某些类型的结构的一个或多个附加步骤,其中可以包括可以是微珠或纳米珠的颗粒。 可以使用与微型或纳米颗粒集成的MEM的各种有用的应用。

    Method of manufacturing a microstructure

    公开(公告)号:US06583920B2

    公开(公告)日:2003-06-24

    申请号:US09995956

    申请日:2001-11-29

    CPC classification number: B81C1/00142 B81B2201/042 B81C2201/0108

    Abstract: A method of manufacturing a micromirror actuator includes forming a trench on a substrate by etching, laminating a film-type organic layer on the substrate to cover but not fill the trench so that the trench is maintained hollow, and depositing and patterning a metal layer on the film-type organic layer and removing the film-type organic layer. According to the method of manufacturing a micromirror actuator, a micromirror can be easily planarized by laminating the film-type organic layer on the substrate including the trench, which reduces the cost of manufacturing the micromirror actuator and increases a reflectivity of the micromirror actuator by increasing the flatness level of the micromirror so as to enhance an optical transmission efficiency.

    Use of an organic dielectric as a sacrificial layer
    165.
    发明申请
    Use of an organic dielectric as a sacrificial layer 失效
    使用有机电介质作为牺牲层

    公开(公告)号:US20030010746A1

    公开(公告)日:2003-01-16

    申请号:US09902116

    申请日:2001-07-10

    CPC classification number: B81C1/00476 B81C2201/0108

    Abstract: A method for using an organic dielectric as a sacrificial layer for forming suspended or otherwise spaced structures. The use of an organic dielectric has a number of advantages, including allowing use of an organic solvent or etch to remove the sacrificial layer. Organic solvents only remove organic materials, and thus do not affect or otherwise damage non-organic layers such as metal layers. This may reduce or eliminate the need for the rinsing and drying steps often associated with the use of acidic etchants such as Hydrofluoric Acid.

    Abstract translation: 一种使用有机电介质作为牺牲层的方法,用于形成悬浮或其他间隔结构。 有机电介质的使用具有许多优点,包括允许使用有机溶剂或蚀刻去除牺牲层。 有机溶剂仅除去有机物质,因此不会影响或以其他方式损坏金属层等非有机层。 这可以减少或消除通常与使用酸性蚀刻剂如氢氟酸相关的漂洗和干燥步骤的需要。

    Process for making micromechanical structures
    166.
    发明授权
    Process for making micromechanical structures 失效
    制造微机械结构的方法

    公开(公告)号:US6008138A

    公开(公告)日:1999-12-28

    申请号:US814760

    申请日:1997-03-07

    CPC classification number: B81B3/0051 B81B2203/053 B81C2201/0108

    Abstract: A process for structuring a movable element out of a membrane region. A sacrificial layer and a sealing layer are applied to the underside of the membrane region. Following removal of the sacrificial layer, sealing layer forms a limit stop and a seal for the movement of the movable element.

    Abstract translation: 一种用于从膜区域构造可移动元件的工艺。 将牺牲层和密封层施加到膜区域的下侧。 在去除牺牲层之后,密封层形成限位挡块和用于可移动元件运动的密封件。

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