公开(公告)号：US20230335374A1

公开(公告)日：2023-10-19

申请号：US18019088

申请日：2021-07-27

Applicant: ASML Netherlands B.V.

Inventor： Benoit Herve GAURY ,  Jun JIANG ,  Bruno LA FONTAINE ,  Shakeeb Bin HASAN ,  Kenichi KANAI ,  Jasper Frans Mathijs VAN RENS ,  Cyrus Emil TABERY ,  Long MA ,  Oliver Desmond PATTERSON ,  Jian ZHANG ,  Chih-Yu JEN ,  Yixiang WANG

IPC: H01J37/26 ,  G01N23/2251 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/265 ,  G01N23/2251 ,  H01J37/244 ,  H01J37/228 ,  H01J2237/2482

Abstract: Systems and methods of observing a sample using a charged-particle beam apparatus in voltage contrast mode are disclosed. The charged-particle beam apparatus comprises a charged-particle source, an optical source, a charged-particle detector configured to detect charged particles, and a controller having circuitry configured to apply a first signal to cause the optical source to generate the optical pulse, apply a second signal to the charged-particle detector to detect the second plurality of charged particles, and adjust a time delay between the first and the second signals. In some embodiments, the controller having circuitry may be further configured to acquire a plurality of images of a structure, to determine an electrical characteristic of the structure based on the rate of gray level variation of the plurality of images of the structure, and to simulate, using a model, a physical characteristic of the structure based on the determined electrical characteristic.

公开(公告)号：US20230324318A1

公开(公告)日：2023-10-12

申请号：US18327847

申请日：2023-06-01

Applicant: ASML Netherlands B.V.

Inventor： Yan REN ,  Erwin SLOT ,  Albertus Victor, Gerardus MANGNUS ,  Marijke SCOTUZZI ,  Erwin Paul SMAKMAN

IPC: G01N23/2251 ,  H01J37/244 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147

CPC classification number: G01N23/2251 ,  H01J37/244 ,  H01J37/09 ,  H01J37/12 ,  H01J37/1472 ,  G01N2223/303 ,  H01J2237/2448 ,  H01J2237/0453 ,  H01J37/20

Abstract: A charged-particle tool configured to generate a plurality of sub-beams from a beam of charged particles and direct the sub-beams downbeam toward a sample position, the tool charged-particle tool comprising at least three charged-particle-optical components; a detector module; and a controller. Thea detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode. The charged-particle-optical components include: a charged-particle source configured to emit a beam of charged particles and a beam generator configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.

公开(公告)号：US20230315027A1

公开(公告)日：2023-10-05

申请号：US18013154

申请日：2021-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Koos VAN BERKEL ,  Joost Johan BOLDER ,  Stijn BOSMA

IPC: G05B13/02 ,  G06N3/084 ,  G03F7/00

CPC classification number: G05B13/027 ,  G03F7/706841 ,  G06N3/084

Abstract: Variable setpoints and/or other factors may limit iterative learning control for moving components of an apparatus. The present disclosure describes a processor configured to control movement of a component of an apparatus with at least one prescribed movement. The processor is configured to receive a control input such as and/or including a variable setpoint. The control input indicates the at least one prescribed movement for the component. The processor is configured to determine, with a trained artificial neural network, based on the control input, a feedforward output for the component. The artificial neural network is pretrained with a training data set such that the artificial neural network determines the output regardless of whether or not the control input falls outside the training data set. The processor controls the component based on at least the output.

公开(公告)号：US11774671B2

公开(公告)日：2023-10-03

申请号：US17077756

申请日：2020-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Patrick Sebastian Uebel ,  Peter Maximilian Götz ,  Sebastian Thomas Bauerschmidt ,  Coen Hubertus Matheus Baltis ,  Janneke Ravensbergen

IPC: G02B6/02 ,  C03B37/15 ,  F21V8/00 ,  G03F7/00 ,  G03F9/00

CPC classification number: G02B6/02328 ,  C03B37/15 ,  G02B6/0096 ,  G02B6/02347 ,  G03F7/7085 ,  G03F9/7034 ,  G03F9/7065 ,  C03B2203/16 ,  C03B2203/42

Abstract: Optical components and methods of manufacture thereof. A first optical component has a hollow-core photonic crystal fiber includes internal capillaries for guiding radiation and an outer capillary sheathing the internal capillaries; and at least an output end section having a larger inner cross-sectional dimension over at least a portion of the output end section than an inner cross-sectional dimension of the outer capillary along a central portion of the hollow-core photonic crystal fiber prior to the output end section. A second optical component includes a hollow-core photonic crystal fiber and a sleeve arrangement.

公开(公告)号：US11768442B2

公开(公告)日：2023-09-26

申请号：US17973221

申请日：2022-10-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo Tel ,  Mark John Maslow ,  Koenraad Van Ingen Schenau ,  Patrick Warnaar ,  Abraham Slachter ,  Roy Anunciado ,  Simon Hendrik Celine Van Gorp ,  Frank Staals ,  Marinus Jochemsen

IPC: G06F30/20 ,  G06F30/33 ,  G06F30/398 ,  G03F7/00 ,  G03F1/00 ,  G06T7/00 ,  G21K5/00 ,  H01L21/00 ,  H01L21/66 ,  G06F119/18

CPC classification number: G03F7/70625 ,  G06F30/20 ,  G06T7/0004 ,  H01L22/20 ,  G03F1/00 ,  G06F30/33 ,  G06F30/398 ,  G06F2119/18 ,  G21K5/00 ,  H01L21/00

Abstract: A method including: obtaining an image of at least part of a substrate, wherein the image includes at least one feature of a device being manufactured in a layer on the substrate; obtaining a layout of features associated with a previous layer adjacent to the layer on the substrate; calculating one or more image-related metrics in dependence on: 1) a contour determined from the image including the at least one feature and 2) the layout; and determining one or more control parameters of a lithographic apparatus and/or one or more further processes in a manufacturing process of the device in dependence on the one or more image-related metrics, wherein at least one of the control parameters is determined to modify the geometry of the contour in order to improve the one or more image-related metrics.

公开(公告)号：US11768440B2

公开(公告)日：2023-09-26

申请号：US18089007

申请日：2022-12-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Jing Su ,  Yen-Wen Lu ,  Ya Luo

IPC: G03F7/20 ,  G03F7/00 ,  G06N20/00 ,  G06N5/047

CPC classification number: G03F7/70441 ,  G03F7/705 ,  G06N5/047 ,  G06N20/00

Abstract: A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.

公开(公告)号：US20230300965A1

公开(公告)日：2023-09-21

申请号：US18016553

申请日：2021-07-23

Applicant: ASML Netherlands B.V.

Inventor： Robert Jay Rafac

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003

Abstract: Disclosed is an apparatus for and method of aligning a target composed of a target material and a conditioning beam provided to condition the target by changing the target’s shape, mass distribution, etc., in which the conditioning beam includes structured light in the form of an inhomogeneous distribution of a propagation mode such as a polarization mode across a spatial mode of the target.

公开(公告)号：US20230298852A1

公开(公告)日：2023-09-21

申请号：US18120278

申请日：2023-03-10

Applicant: ASML Netherlands B.V.

Inventor： Benoit Herve GAURY ,  Jasper Frans Mathijs VAN RENS

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J37/244 ,  H01J37/28

Abstract: A method of measuring a delay time of a propagation of a signal in a line in a circuit structure, the method comprises irradiating the line by pulses of a charged particle beam, wherein a pulse repetition frequency of the pulses of the charged particle beam is varied. The method further comprises measuring, for each of the pulse repetition frequencies, a secondary charged particle emission responsive to the irradiating the line by the pulses of the charged particle beam at the respective pulse repetition frequency, and deriving the delay time of the line based on the secondary charged particle emission responsive to the varying of the pulse repetition frequency.

公开(公告)号：US11764030B2

公开(公告)日：2023-09-19

申请号：US16714549

申请日：2019-12-13

Applicant: ASML Netherlands B.V.

Inventor： Johannes Hubertus Antonius Van De Rijdt ,  Peter Paul Hempenius ,  Allard Eelco Kooiker ,  Jef Goossens ,  Petrus Wilhelmus Vleeshouwers

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/2007

Abstract: Disclosed is a stage apparatus comprising: an object support configured to support an object; a positioning device configured to position the object support; a first connection arrangement configured to connect the object support to the positioning device, the first connection arrangement comprising at least one damped connection; and a second connection arrangement configured to connect the object support to the positioning device, the second connection arrangement comprising at least one substantially rigid connection.

公开(公告)号：US11754918B2

公开(公告)日：2023-09-12

申请号：US17548944

申请日：2021-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand Vles ,  Chaitanya Krishna Ande ,  Antonius Franciscus Johannes De Groot ,  Adrianus Johannes Maria Giesbers ,  Johannes Joseph Janssen ,  Paul Janssen ,  Johan Hendrik Klootwijk ,  Peter Simon Antonius Knapen ,  Evgenia Kurganova ,  Marcel Peter Meijer ,  Wouter Rogier Meijerink ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Raymond Olsman ,  Hrishikesh Patel ,  Mária Péter ,  Gerrit Van Den Bosch ,  Wilhelmus Theodorus Anthonius Johannes Van Den Einden ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  Hendrikus Jan Wondergem ,  Aleksandar Nikolov Zdravkov

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.