公开(公告)号：US20130022171A1

公开(公告)日：2013-01-24

申请号：US13637391

申请日：2010-07-30

Applicant: Kyong Woo Kim ,  Jae Hee Kim ,  Young Man Kwon ,  Cheol Woo Ryu

Inventor： Kyong Woo Kim ,  Jae Hee Kim ,  Young Man Kwon ,  Cheol Woo Ryu

IPC: G01N23/04

CPC classification number: A61B6/06 ,  A61B6/4035 ,  A61B6/4064 ,  A61B6/542 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/067

Abstract: The present disclosure relates to an apparatus for alignment of multilayer film mirrors for a monochromatic X-ray generator and an X-ray image detecting method using the same. The apparatus for alignment of multilayer film mirrors for a monochromatic X-ray generator includes a collimator disposed between an X-ray generating unit and a detector and aligning them and limiting the radiation direction of X-ray to provide an optimum incident angle to multilayer film mirrors generating the monochromatic X-ray from the X-ray.

Abstract translation: 本公开涉及用于单色X射线发生器的多层膜反射镜的对准装置和使用其的X射线图像检测方法。 用于单色X射线发生器的多层膜反射镜对准装置包括设置在X射线产生单元和检测器之间的准直器并对准它们并限制X射线的辐射方向以向多层膜提供最佳入射角 从X射线产生单色X射线的镜子。

公开(公告)号：US20130010929A1

公开(公告)日：2013-01-10

申请号：US13519175

申请日：2010-12-28

Applicant: Kazuto Yamauchi ,  Takashi Kimura ,  Takashi Tsumura

Inventor： Kazuto Yamauchi ,  Takashi Kimura ,  Takashi Tsumura

IPC: G21K1/06 ,  G21K1/087 ,  H01L41/22

CPC classification number: G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  Y10T29/42

Abstract: The device is configured from: a reflective surface shape controllable mirror in which a band-shaped X-ray reflective surface 2 is formed on a central portion of a front surface of a substrate 1, reference planes 3 are formed along both sides of the X-ray reflective surface, and a plurality of piezoelectric elements 4 are attached to at least one of front and back surfaces of the substrate so as to be arranged in the longitudinal direction of the X-ray reflective surface on both side portions of the substrate, and a multichannel control system for applying a voltage to each of the piezoelectric elements.

Abstract translation: 该装置由以下部件构成：反射面形状可控反射镜，其中在基板1的前表面的中心部分上形成带状X射线反射表面2，基准平面3沿X的两侧形成 射线反射表面，并且多个压电元件4被附着到基板的前表面和后表面中的至少一个上，以便被布置在基板的两侧部分上的X射线反射表面的纵向方向上， 以及用于向每个压电元件施加电压的多通道控制系统。

公开(公告)号：US08278636B2

公开(公告)日：2012-10-02

申请号：US12540596

申请日：2009-08-13

Applicant: Erik Roelof Loopstra ,  Hendrikus Gijsbertus Schimmel

Inventor： Erik Roelof Loopstra ,  Hendrikus Gijsbertus Schimmel

IPC: G21K1/00

CPC classification number: G03F7/70175 ,  G03F7/70033 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator constructed and arranged to generate a stream of droplets of fuel that are directed to a plasma generation site; a laser constructed and arranged to generate a laser beam that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.

Abstract translation: 辐射源被配置成产生辐射。 辐射源包括燃料液滴发生器，其被构造和布置成产生引导到等离子体产生位置的燃料液滴流; 激光器被构造和布置成产生被引导到等离子体产生位置的激光束，液滴流的移动方向与激光束的方向之间的角度小于约90°; 以及收集器，其被构造和布置成当辐射束和液滴碰撞时收集由等离子体形成部位形成的等离子体产生的辐射。 收集器被配置为基本上沿辐射源的光轴反射辐射。 激光束通过设置在收集器中的孔引导到等离子体产生位置。

公开(公告)号：US20120162627A1

公开(公告)日：2012-06-28

申请号：US13370829

申请日：2012-02-10

Applicant: Damian Fiolka ,  Ralf Stuetzle

Inventor： Damian Fiolka ,  Ralf Stuetzle

IPC: G03B27/72 ,  G02B5/30 ,  G02B5/09

CPC classification number: G03F7/70233 ,  G02B27/0905 ,  G02B27/0977 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70566 ,  G21K1/06 ,  G21K1/16 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067

Abstract: An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.

Abstract translation: 照明光学单元包括集光镜，其在照明光学单元的操作期间产生施加到第一刻面光学元件的偏振分布。 存在施加具有不同极化的辐射的至少两个第一小面元件。 第一刻面光学元件具有至少一个第一状态，其中第一面元件的反射表面的法向矢量被选择为使得在照明光学单元的操作期间在物场的位置处产生第一预定偏振分布 。

公开(公告)号：US08153994B2

公开(公告)日：2012-04-10

申请号：US12592736

申请日：2009-12-02

Applicant: Marco Pedrali ,  Riccardo Ghislanzoni

Inventor： Marco Pedrali ,  Riccardo Ghislanzoni

IPC: G21K5/00

CPC classification number: G21K1/06 ,  C25D1/02 ,  C25D1/22 ,  C25D5/02 ,  C25D5/14 ,  G02B7/1815 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70175 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  Y10T29/4935

Abstract: A cooling system (10) for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly (240) having at least one shell (20) with a back surface (22) is disclosed. The cooling system has a plurality of spaced apart circularly configured cooling lines (30) arranged in parallel planes (PL) that are perpendicular to the shell central axis (AC) and that are in thermal contact with and that run around the back surface. Input and output secondary cooling-fluid manifolds (44, 46) are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and output locations reduces thermal gradients that can cause local surface deformations in the shell that can lead to degraded focusing performance.

Abstract translation: 公开了一种用于具有至少一个具有后表面（22）的外壳（20）的极紫外（EUV）掠入射收集器（GIC）反射镜组件（240）的冷却系统（10）。 冷却系统具有多个间隔开的圆形配置的冷却管线（30），它们布置在垂直于壳体中心轴线（AC）并且与背面表面热交换并且在其周围流动的平行平面（PL）中。 输入和输出二次冷却流体歧管（44,46）分别流体地连接到多个冷却管线，以将冷却流体从输入的二次冷却流体歧管流到输出冷却次要流体歧管两个半圆的路径，以进行每个冷却 线。 分离冷却液输入和输出位置可减少热梯度，从而导致壳体局部表面变形，从而导致聚焦性能降低。

公开(公告)号：US20120050706A1

公开(公告)日：2012-03-01

申请号：US12807167

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: G03B27/52 ,  H05G2/00

CPC classification number: G21K1/067 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70033 ,  G03F7/70166 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/006 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon ice provided by the target portion to an irradiation location. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract translation: 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束将由目标部分提供的氙冰照射到照射位置。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。

公开(公告)号：US20120050704A1

公开(公告)日：2012-03-01

申请号：US12807165

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: G03B27/42 ,  H05G2/00

CPC classification number: G21K1/067 ,  G03F7/70033 ,  G03F7/70166 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

公开(公告)号：US08126117B2

公开(公告)日：2012-02-28

申请号：US12699493

申请日：2010-02-03

Applicant: Boris Verman ,  Michael Young ,  Licai Jiang

Inventor： Boris Verman ,  Michael Young ,  Licai Jiang

IPC: H01J35/04 ,  H01J35/30 ,  G21K1/00 ,  G21K1/02

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A multi-beam x-ray system includes an x-ray source which emits x-rays and a housing with a first part and a second part. The second part is moveable relative to the first part and includes a plurality of optics of different performance characteristics. Each optic, through the movement of the second part relative to the first part, is positioned to a working position so that the optic receives the x-rays from the x-ray source and directs the x-rays with the desired performance attributes to a desired location.

Abstract translation: 多光束X射线系统包括发射x射线的X射线源和具有第一部分和第二部分的壳体。 第二部分可相对于第一部分移动，并且包括具有不同性能特征的多个光学元件。 每个光学元件通过第二部分相对于第一部分的移动被定位到工作位置，使得光学器件接收来自x射线源的x射线，并将具有所需性能属性的x射线引导到 理想位置。

公开(公告)号：US08124302B2

公开(公告)日：2012-02-28

申请号：US12582847

申请日：2009-10-21

Applicant: Motoshi Ono ,  Mitsuru Watanabe ,  Mika Yokoyama

Inventor： Motoshi Ono ,  Mitsuru Watanabe ,  Mika Yokoyama

IPC: G03F1/00 ,  C03C17/02

CPC classification number: B82Y40/00 ,  B82Y10/00 ,  C03C23/0025 ,  C03C2204/08 ,  G03F1/24 ,  G03F1/60 ,  G21K2201/067

Abstract: The present invention provides a method for smoothing an optical surface of an optical component for EUVL. Specifically, the present invention provides a method for smoothing an optical surface of an optical component for EUVL made of a silica glass material containing TiO2 and comprising SiO2 as a main component with a laser having an oscillation wavelength, to which the optical component for EUVL has an absorption coefficient of 0.01 μm−1 or more, at a fluence of 0.3 to 1.5 J/cm2 in an atmosphere having a water vapor partial pressure of 3.6 mmHg or less.

Abstract translation: 本发明提供了一种用于平滑EUVL的光学部件的光学表面的方法。 具体地说，本发明提供了一种用于EUVL的光学部件的光学部件的光学部件的光学部件的平滑化的方法，所述光学部件由含有TiO 2的二氧化硅玻璃材料制成，并且包含SiO 2作为主要成分，具有用于EUVL的光学部件具有振荡波长的激光 在水蒸汽分压为3.6mmHg以下的气氛中，以0.3〜1.5J / cm 2的流量计，吸收系数为0.01μm-1以上。

公开(公告)号：US20110299658A1

公开(公告)日：2011-12-08

申请号：US13154746

申请日：2011-06-07

Applicant: Philipp Bernhardt

Inventor： Philipp Bernhardt

IPC: G21K1/06

CPC classification number: G21K1/06 ,  A61B6/4035 ,  A61B6/4441 ,  A61B6/544 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/067

Abstract: For a quasi-monochromatic x-ray radiation with high radiation intensity, an x-ray radiator generates quasi-monochromatic x-ray radiation to expose a subject from a point-shaped radiation source that emits a polychromatic x-ray radiation, and having a diffraction device to diffract the polychromatic x-ray radiation. The diffraction device has a super-mirror made of crystalline material with a flat surface. In the super-mirror, the crystalline material has at least one (in particular continuous) variation of the lattice plane spacing of the crystal lattice. The radiation source and the diffraction device are arranged such that quasi-monochromatic x-ray radiation is generated from the polychromatic x-ray radiation by partial reflection at the super-mirror.

Abstract translation: 对于具有高辐射强度的准单色X射线辐射，x射线辐射器产生准单色X射线辐射，以从发射多色X射线辐射的点状辐射源暴露受试者，并具有 衍射装置衍射多色X射线辐射。 衍射装置具有由具有平坦表面的结晶材料制成的超级反射镜。 在超镜中，晶体材料具有晶格的晶格面间距的至少一个（特别是连续的）变化。 辐射源和衍射装置被布置成使得通过在超镜下的部分反射从多色X射线辐射产生准单色x射线辐射。