Self-Calibration Procedure For Optical Polarimeters
    181.
    发明申请
    Self-Calibration Procedure For Optical Polarimeters 审中-公开
    光学偏光仪的自校准程序

    公开(公告)号:US20120010842A1

    公开(公告)日:2012-01-12

    申请号:US13177116

    申请日:2011-07-06

    CPC classification number: G01J4/00 G01J4/04

    Abstract: A procedure for self-calibration of an optical polarimeter has been developed that eliminates the need for “known” input signals to be used. The self-calibration data is then taken by moving a polarization controller between several random and unknown states of polarization (SOPs) and recording the detector output values (D0, . . . , D3) for each state of polarization. These values are then used to create an “approximate” calibration matrix. In one exemplary embodiment, the SOP of the incoming signal is adjusted three times (by adjusting a separate polarization controller element, for example), creating a set of four detector output values for each of the four polarizations states of the incoming signal—an initial calibration matrix. The first row of this initial calibration matrix is then adjusted to fit the power measurements using a least squares fit. In the third and final step, the remaining elements of the calibration matrix are adjusted to a given constraint (for example, DOP=100% for all SOPs).

    Abstract translation: 已经开发了用于光学偏振计的自校准的过程,其消除了对使用的“已知”输入信号的需要。 然后通过在多个随机和未知极化状态(SOP)之间移动偏振控制器并且为每个极化状态记录检测器输出值(D0,...,D3)来获取自校准数据。 然后将这些值用于创建“近似”校准矩阵。 在一个示例性实施例中,输入信号的SOP被调整三次(例如通过调整单独的偏振控制器元件),为输入信号的四个极化状态中的每一个产生一组四个检测器输出值 - 初始 校准矩阵。 然后调整该初始校准矩阵的第一行以使用最小二乘拟合拟合功率测量。 在第三和最后一步中,将校准矩阵的剩余元素调整到给定的约束(例如,对于所有SOP,DOP = 100%)。

    APPARATUS AND METHOD OF INFORMATION EXTRACTION FROM ELECTROMAGNETIC ENERGY BASED UPON MULTI-CHARACTERISTIC SPATIAL GEOMETRY PROCESSING
    182.
    发明申请
    APPARATUS AND METHOD OF INFORMATION EXTRACTION FROM ELECTROMAGNETIC ENERGY BASED UPON MULTI-CHARACTERISTIC SPATIAL GEOMETRY PROCESSING 有权
    基于多特征空间几何处理的电磁能量提取信息的方法和方法

    公开(公告)号:US20110299763A1

    公开(公告)日:2011-12-08

    申请号:US13210658

    申请日:2011-08-16

    Abstract: An apparatus for information extraction from electromagnetic energy via multi-characteristic spatial geometry processing to determine three-dimensional aspects. Structure receives the electromagnetic energy, which has a plurality of spatial phase characteristics. Structure separates the plurality of spatial phase characteristics of the received electromagnetic energy. Structure identifies spatially segregated portions of each of the plurality of spatial phase characteristics, with each spatially segregated portion corresponding in a point to point relationship to a spatially segregated portion for each of the other of the plurality of spatial phase characteristics in a group. Structure quantifies each segregated portion to provide a spatial phase metric of each segregated portion for providing a data map of the spatial phase metric of each separated spatial phase characteristic of the plurality of spatial phase characteristics. Structure processes the spatial phase metrics to determine surface contour information for each segregated portion of the data map.

    Abstract translation: 一种用于通过多特征空间几何处理从电磁能量提取信息以确定三维方面的装置。 结构接收具有多个空间相位特性的电磁能。 结构分离接收的电磁能的多个空间相位特性。 结构识别多个空间相位特性中的每一个的空间分离部分,其中每个空间隔离部分对应于一组中的多个空间相位特性中的另一个中的每一个的空间分离部分的点对点关系。 结构量化每个隔离部分以提供每个分离部分的空间相位度量,以提供多个空间相位特性的每个分离空间相位特性的空间相位度量的数据图。 结构处理空间相位度量以确定数据图的每个分离部分的表面轮廓信息。

    Apparatus and method of information extraction from electromagnetic energy based upon multi-characteristic spatial geometry processing
    183.
    发明授权
    Apparatus and method of information extraction from electromagnetic energy based upon multi-characteristic spatial geometry processing 有权
    基于多特征空间几何处理的电磁能量信息提取装置和方法

    公开(公告)号:US08023724B2

    公开(公告)日:2011-09-20

    申请号:US11045703

    申请日:2005-01-28

    Inventor: Blair A. Barbour

    Abstract: An apparatus for information extraction from electromagnetic energy via multi-characteristic spatial geometry processing to determine three-dimensional aspects of an object from which the electromagnetic energy is proceeding. The apparatus receives the electromagnetic energy. The received electromagnetic energy has a plurality of spatial phase characteristics. The apparatus separates the plurality of spatial phase characteristics of the received electromagnetic energy. The apparatus r identifies spatially segregated portions of each spatial phase characteristic, with each spatially segregated portion of each spatial phase characteristic corresponding to a spatially segregated portion of each of the other spatial phase characteristics in a group. The apparatus quantifies each segregated portion to provide a spatial phase metric of each segregated portion for providing a data map of the spatial phase metric of each separated spatial phase characteristic. The apparatus processes the spatial phase metrics to determine surface contour information for each segregated portion of the data map.

    Abstract translation: 一种用于通过多特征空间几何处理从电磁能量提取信息以确定电磁能量正在进行的物体的三维方面的装置。 该装置接收电磁能。 所接收的电磁能具有多个空间相位特性。 该装置分离接收的电磁能的多个空间相位特性。 装置r识别每个空间相位特征的空间分离的部分,每个空间相位特征的每个空间分离的部分对应于一组中的每个其他空间相位特征的空间上分离的部分。 该装置对每个隔离部分进行量化以提供每个分离部分的空间相位度量,以提供每个分离的空间相位特性的空间相位度量的数据图。 该装置处理空间相位度量以确定数据图的每个分离部分的表面轮廓信息。

    POLARIZATION EVALUATION MASK, EXPOSURE DEVICE, AND POLARIZATION EVALUATION METHOD
    185.
    发明申请
    POLARIZATION EVALUATION MASK, EXPOSURE DEVICE, AND POLARIZATION EVALUATION METHOD 审中-公开
    极化评估掩模,曝光装置和极化评估方法

    公开(公告)号:US20110032502A1

    公开(公告)日:2011-02-10

    申请号:US12852201

    申请日:2010-08-06

    Applicant: Hiroshi NOMURA

    Inventor: Hiroshi NOMURA

    Abstract: Polarization evaluation mask according to one mode includes a transparent substrate, a light shielding portion, plural quarter-wavelength plates, and plural polarizers. The light shielding portion is formed on the transparent substrate and has plural openings therein. Plural quarter-wavelength plates are formed to cover at least one opening. Fast axes of the quarter-wavelength plates are different in azimuth by a certain angle. Plural polarizers are disposed upstream of the quarter-wavelength plates with respect to the illumination light and formed to overlay the quarter-wavelength plates and cover at least one of the openings. Transmission axes of the polarizers are different in azimuth by a certain angle. The plural openings are provided with different combinations of an azimuth, of the polarizer and an azimuth of the quarter-wavelength plate from one another.

    Abstract translation: 根据一种模式的极化评估掩模包括透明基板,遮光部分,多个四分之一波长板和多个偏振器。 遮光部形成在透明基板上,其中具有多个开口。 形成多个四分之一波长的板以覆盖至少一个开口。 四分之一波长板的快轴在方位角上有一定的角度。 多个偏振器相对于照明光设置在四分之一波长板的上游,并形成为覆盖四分之一波长板并覆盖至少一个开口。 偏振器的透射轴在方位角上有一定的角度。 多个开口具有方位角,偏振器的方位角和四分之一波长板的方位角彼此不同的组合。

    Photo-aligned liquid-crystal micropolarimeter array and its manufacturing method
    186.
    发明申请
    Photo-aligned liquid-crystal micropolarimeter array and its manufacturing method 有权
    光取向液晶微量计阵列及其制造方法

    公开(公告)号:US20100296039A1

    公开(公告)日:2010-11-25

    申请号:US12784355

    申请日:2010-05-20

    CPC classification number: G01J4/04 G02F1/133753

    Abstract: A micropolarimeter is described for simultaneously extracting all Stokes parameters from incident light. The micropolarimeter includes at least one superpixel, which further includes three or more subpixels, each exact a different polarization components from the incident light. The micropolarimeter includes a first and second alignment layers and a liquid crystal layer disposed between the first and second alignment layers. The liquid crystal molecules of the liquid crystal layer are aligned in accordance with the first and second alignment layers to form the superpixel. A method is provided for manufacturing the photo-aligned liquid-crystal micropolarimeter array.

    Abstract translation: 描述了一种用于从入射光中提取所有斯托克斯参数的微量计。 所述微偏振计包括至少一个超像素,其还包括三个或更多个子像素,每个子像素精确地与入射光不同的偏振分量。 该微波偏振器包括第一和第二对准层和设置在第一和第二对准层之间的液晶层。 液晶层的液晶分子根据第一和第二取向层排列,形成超像素。 提供了一种用于制造光取向液晶微偏振计阵列的方法。

    Method and device for optical determination of physical properties of features, not much larger than the optical wavelength used, on a test sample
    188.
    发明授权
    Method and device for optical determination of physical properties of features, not much larger than the optical wavelength used, on a test sample 有权
    用于在测试样品上光学确定特征物理性质的方法和装置,其比所使用的光波长不大

    公开(公告)号:US07808648B2

    公开(公告)日:2010-10-05

    申请号:US11742414

    申请日:2007-04-30

    Abstract: A method and device for optical determination of physical properties of features, not much larger than the optical wavelength used, on a test sample are described. A beam is split into reference and illuminating beams having known polarization. The test sample is exposed to the illuminating beam and recombined to form an image. The image is detected using at least one sensor, which may be cameras. A point-to-point map of polarization, phase and power is extracted from data representing the image. Optionally, the sensor may be a camera. The sensor may detect at least three optical parameters, such as a Stokes vector, a Jones vector, a Jones matrix, a Mueller matrix or a coherency matrix.

    Abstract translation: 描述了用于在测试样品上光学确定不同于所使用的光波长的特征的物理性质的方法和装置。 光束被分割成具有已知偏振的参考和照明光束。 将测试样品暴露于照明光束并重新组合以形成图像。 使用至少一个可以是相机的传感器来检测图像。 从表示图像的数据中提取极化,相位和功率的点对点图。 可选地,传感器可以是相机。 传感器可以检测至少三个光学参数,例如斯托克斯矢量,琼斯矢量,琼斯矩阵,米勒矩阵或相干矩阵。

    Terahertz-infrared ellipsometer system, and method of use
    189.
    发明申请
    Terahertz-infrared ellipsometer system, and method of use 有权
    太赫兹红外椭偏仪系统及其使用方法

    公开(公告)号:US20100220313A1

    公开(公告)日:2010-09-02

    申请号:US12456791

    申请日:2009-06-23

    Abstract: The present invention relates to ellipsometer and polarimeter systems, and more particularly is an ellipsometer or polarimeter or the like system which operates in a frequency range between 300 GHz or lower and extending to higher than at least 1 Tera-hertz (THz), and preferably through the Infra-red (IR) range up to, and higher than 100 THz, including: a source such as a backward wave oscillator; a Smith-Purcell cell; a free electron laser, or an FTIR source and a solid state device; and a detector such as a Golay cell; a bolometer or a solid state detector; and preferably including at least one odd-bounce polarization state image rotating system, and optionally including a polarizer, at least one compensator and/or modulator, in addition to an analyzer.

    Abstract translation: 本发明涉及椭偏仪和偏振计系统,更具体地说,涉及在300GHz以下的频率范围内并延伸至高于至少1Tera-Hz(THz)的椭偏仪或偏振计等。 通过红外(IR)范围,高达100THz,包括:诸如反向波振荡器的源; 史密斯 - 珀塞尔细胞; 自由电子激光器或FTIR源和固态器件; 和诸如Golay细胞的检测器; 测辐射热计或固态检测器; 并且除了分析器之外,还优选地包括至少一个奇数反弹偏振态图像旋转系统,并且可选地包括偏振器,至少一个补偿器和/或调制器。

    POLARIZATION MONITORING RETICLE DESIGN FOR HIGH NUMERICAL APERTURE LITHOGRAPHY SYSTEMS
    190.
    发明申请
    POLARIZATION MONITORING RETICLE DESIGN FOR HIGH NUMERICAL APERTURE LITHOGRAPHY SYSTEMS 有权
    高精度光刻系统的极化监测设计

    公开(公告)号:US20100208264A1

    公开(公告)日:2010-08-19

    申请号:US12707962

    申请日:2010-02-18

    CPC classification number: G06F17/50 G01J4/04 G03F1/44 G03F7/70466 G03F7/70566

    Abstract: This invention relates to the manufacture of semiconductor substrates such as wafers and to a method for monitoring the state of polarization incident on a photomask in projection printing using a specially designed polarization monitoring reticle for high numerical aperture lithographic scanners. The reticle measures 25 locations across the slit and is designed for numerical apertures above 0.85. The monitors provide a large polarization dependent signal which is more sensitive to polarization. A double exposure method is also provided using two reticles where the first reticle contains the polarization monitors, clear field reference regions and low dose alignment marks. The second reticle contains the standard alignment marks and labels. For a single exposure method, a tri-PSF low dose alignment mark is used. The reticles also provide for electromagnetic bias wherein each edge is biased depending on that edge's etch depth.

    Abstract translation: 本发明涉及诸如晶片的半导体衬底的制造以及用于在使用专门设计的用于高数值孔径光刻扫描仪的偏振监视掩模版的投影印刷中监视入射到光掩模上的偏振状态的方法。 标线测量穿过狭缝的25个位置,并设计为高于0.85的数值孔径。 监视器提供对极化更敏感的大偏振相关信号。 使用两个掩模版也提供双曝光方法,其中第一掩模版包含偏振监视器,清晰的场参考区域和低剂量对准标记。 第二个掩模版包含标准对准标记和标签。 对于单次曝光方法,使用三PSF低剂量对准标记。 标线还提供电磁偏压,其中每个边缘根据该边缘的蚀刻深度而偏置。

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