公开(公告)号：US20110228234A1

公开(公告)日：2011-09-22

申请号：US13051782

申请日：2011-03-18

Applicant: Gisela VON BLANCKENHAGEN

Inventor： Gisela VON BLANCKENHAGEN

IPC: G03B21/28 ,  F21V9/06 ,  F21V7/22 ,  G03B27/54 ,  B32B37/02 ,  B32B37/14

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0875 ,  G02B5/0891 ,  G03F1/24 ,  G03F7/70316 ,  G03F7/70783 ,  G03F7/70941 ,  G21K1/062 ,  G21K2201/067

Abstract: In order to produce stress-reduced reflective optical elements (1) for an operating wave length in the soft X-ray and extreme ultraviolet wavelength range, in particular for use in EUV lithography, it is proposed to apply, between substrate (2) and a multilayer system (4) optimized for high reflectivity at the operating wavelength, a stress-reducing multilayer system (6) with the aid of particle-forming particles having an energy of 40 eV or more, preferably 90 eV or more. Resulting reflective optical elements are distinguished by low surface roughness, a low number of periods in the stress-reducing multilayer system and also high Γ values of the stress-reducing multilayer system.

Abstract translation: 为了在软X射线和极紫外波长范围内产生用于工作波长的应力减小的反射光学元件（1），特别是用于EUV光刻中，提出了在基板（2）和 借助于能量为40eV以上，优选为90eV以上的粒子形成粒子，应力降低多层体系（6），优化了在工作波长下的高反射率的多层体系（4）。 所得到的反射光学元件的特征在于低表面粗糙度，应力降低多层系统中的低周期数以及高＆Ggr; 应力降低多层体系的值。

公开(公告)号：US20110226745A1

公开(公告)日：2011-09-22

申请号：US13048454

申请日：2011-03-15

Applicant: Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

Inventor： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC: B23K26/04

CPC classification number: G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 极紫外光发生系统是与激光装置一起使用并与外部装置连接以向其提供极紫外光的极紫外光发生系统，并且极紫外线发生系统可以包括：室 入射至少一个激光束的入口; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，其被设置到蚀刻气体通过的室，所述蚀刻气体被引入以蚀刻所述目标材料的碎屑，所述目标材料在所述靶材料被所述室内的所述激光束照射时发射，并且粘附至所述至少一个 光学元件 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US20110206187A1

公开(公告)日：2011-08-25

申请号：US12710064

申请日：2010-02-22

Applicant: Susanne Madeline Lee ,  Peter Michael Edic ,  Vanita Mani ,  Forrest Frank Hopkins ,  Eberhard Neuser

Inventor： Susanne Madeline Lee ,  Peter Michael Edic ,  Vanita Mani ,  Forrest Frank Hopkins ,  Eberhard Neuser

IPC: H01J35/06 ,  G21K5/04 ,  H01J35/14

CPC classification number: G21K1/067 ,  A61N5/1084 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A system for producing at least one high flux photon beam is provided. The system includes two or more photon sources configured to produce photon beams, and at least one first stage optic device coupled to at least one of the photon sources and providing at least one focused photon beam through total internal reflection, wherein at least one of the photon beams and the focused photon beams are combined at a virtual focal spot.

Abstract translation: 提供了一种用于产生至少一个高通量光子束的系统。 该系统包括被配置为产生光子束的两个或更多个光子源，以及耦合到至少一个光子源的至少一个第一级光学器件，并且通过全内反射提供至少一个聚焦光子束，其中至少一个 光子束和聚焦光子束在虚拟焦斑处组合。

公开(公告)号：US20110158493A1

公开(公告)日：2011-06-30

申请号：US13060112

申请日：2009-10-28

Applicant: Kentaro Nagai ,  Toru Den

Inventor： Kentaro Nagai ,  Toru Den

IPC: G06K9/00

CPC classification number: G06T7/0002 ,  A61B6/4291 ,  A61B6/484 ,  G01J9/02 ,  G01N23/04 ,  G01N23/20075 ,  G01N2223/401 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/067

Abstract: An analysis method for use in a radiation imaging apparatus employing intensity information of interference fringes of radiation rays that have passed through a detected object includes the steps of generating first phase information of the detected object wrapped into a range of 2π from the intensity information of the interference fringes; generating information on an absorption intensity gradient of the detected object from the intensity information of the interference fringes; generating a weighting function on the basis of an absolute value of a gradient in the information on the absorption intensity gradient; and generating second phase information by unwrapping the first phase information by using the weighting function.

Abstract translation: 一种在使用已经通过检测对象的辐射线的干涉条纹的强度信息的放射线成像装置中的分析方法包括以下步骤：产生被检测物体的第一相位信息，包含在2＆amp; 从干涉条纹的强度信息; 根据干涉条纹的强度信息生成关于被检测物体的吸收强度梯度的信息; 基于关于吸收强度梯度的信息中的梯度的绝对值生成加权函数; 以及通过使用所述加权函数展开所述第一相位信息来产生第二相位信息。

公开(公告)号：US20110128513A1

公开(公告)日：2011-06-02

申请号：US12592736

申请日：2009-12-02

Applicant: Marco Pedrali ,  Ricardo Ghislanzoni

Inventor： Marco Pedrali ,  Ricardo Ghislanzoni

IPC: G03B27/52 ,  F28D15/00 ,  F28F9/02 ,  B21D53/02

CPC classification number: G21K1/06 ,  C25D1/02 ,  C25D1/22 ,  C25D5/02 ,  C25D5/14 ,  G02B7/1815 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70175 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  Y10T29/4935

Abstract: A cooling system (10) for an extreme ultraviolet (EUV) grazing incidence collector (GIC) mirror assembly (240) having at least one shell (20) with a back surface (22) is disclosed. The cooling system has a plurality of spaced apart circularly configured cooling lines (30) arranged in parallel planes (PL) that are perpendicular to the shell central axis (AC) and that are in thermal contact with and that run around the back surface.Input and output secondary cooling-fluid manifolds (44, 46) are respectively fluidly connected to the plurality of cooling lines to flow a cooling fluid from the input secondary cooling-fluid manifold to the output cooling secondary fluid manifold over two semicircular paths for each cooling line. Separating the cooling fluid input and output locations reduces thermal gradients that can cause local surface deformations in the shell that can lead to degraded focusing performance.

Abstract translation: 公开了一种用于具有至少一个具有后表面（22）的外壳（20）的极紫外（EUV）掠入射收集器（GIC）反射镜组件（240）的冷却系统（10）。 冷却系统具有多个间隔开的圆形配置的冷却管线（30），它们布置在垂直于壳体中心轴线（AC）并且与背面表面热交换并且在其周围流动的平行平面（PL）中。 输入和输出二次冷却流体歧管（44,46）分别流体地连接到多个冷却管线，以将冷却流体从输入的二次冷却流体歧管流到输出冷却次要流体歧管两个半圆的路径，以进行每个冷却 线。 分离冷却液输入和输出位置可减少热梯度，从而导致壳体局部表面变形，从而导致聚焦性能降低。

公开(公告)号：US20110080573A1

公开(公告)日：2011-04-07

申请号：US12996036

申请日：2009-05-20

Applicant: Denis Alexandrovich Glushkov ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok ,  Nikolai Nikolaevich Salaschenko

Inventor： Denis Alexandrovich Glushkov ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok ,  Nikolai Nikolaevich Salaschenko

IPC: G03B27/72 ,  G02B5/28

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G03F1/24 ,  G21K1/062 ,  G21K2201/067

Abstract: A multilayer mirror is constructed and arranged to reflect radiation haying a wavelength in the range of 2-8 nm. The multilayer mirror has alternating layers selected from the group consisting of: Cr and Sc layers, Cr and C layers, C and B4C layers, U and B4C layers, Th and B4C layers, C and B9C layers, La and B9C layers, U and B9C layers, Th and B9C layers, La and B layers, C and B layers. U and B layers, and Th and B layers.

Abstract translation: 构造和布置多层反射镜以反射辐射范围为2-8nm的辐射。 多层反射镜具有选自Cr和Sc层，Cr和C层，C和B4C层，U和B4C层，Th和B4C层，C和B9C层，La和B9C层，U和 B9C层，Th和B9C层，La和B层，C和B层。 U和B层，以及Th和B层。

公开(公告)号：US07920323B2

公开(公告)日：2011-04-05

申请号：US11793322

申请日：2005-12-23

Applicant: Nicolas Benoit ,  Torsten Feigl ,  Norbert Kaiser ,  Sergiy Yulin

Inventor： Nicolas Benoit ,  Torsten Feigl ,  Norbert Kaiser ,  Sergiy Yulin

IPC: F21V9/04 ,  G02B1/10

CPC classification number: G02B5/0833 ,  B82Y10/00 ,  G02B5/0891 ,  G21K1/062 ,  G21K2201/067

Abstract: In a multilayer mirror (1) for the reflection of EUV radiation containing a large number of alternating molybdenum layers (4) and silicon layers (3), a barrier layer (5) containing a silicon nitride or a silicon boride is included at a number of interfaces between the molybdenum layers (4) and the silicon layers (3). As a result of the barrier layers (5) of a silicon nitride or of a silicon boride, high thermal stability is achieved, in particular high long-term stability at temperatures of more than 300° C., whilst at the same time achieving high reflectivity in the multilayer mirror. A multilayer mirror (1) of this type can, in particular, be used as a heatable collector mirror for an EUV radiation source.

Abstract translation: 在用于反射含有大量交替钼层（4）和硅层（3））的EUV辐射的多层反射镜（1）中，包含氮化硅或硼化硅的阻挡层（5）包括在数字 的钼层（4）和硅层（3）之间的界面。 作为氮化硅或硼硅化物的阻挡层（5）的结果，实现了高的热稳定性，特别是在高于300℃的温度下的高长期稳定性，同时达到高 多层反射镜的反射率。 这种类型的多层反射镜（1）特别可以用作EUV辐射源的可加热集光镜。

公开(公告)号：US20110063596A1

公开(公告)日：2011-03-17

申请号：US12949985

申请日：2010-11-19

Applicant: Hans-Juergen Mann ,  Wolfgang Singer

Inventor： Hans-Juergen Mann ,  Wolfgang Singer

IPC: G03B27/54

CPC classification number: G02B17/0615 ,  B82Y10/00 ,  G02B13/22 ,  G02B17/0657 ,  G03F7/70233 ,  G03F7/7025 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

Abstract: The disclosure concerns a projection objective, which can include an object plane in which an object field is formed, an entry pupil, a mirrored entry pupil (RE) in a mirrored entry pupil plane obtained by mirroring the entry pupil (VE) at the object plane, an image plane, an optical axis, at least a first mirror and a second mirror. The projection objective can have a negative back focus of the entry pupil, and a principal ray originating from a central point of the object field and traversing the objective from the object plane to the image plane can intersect the optical axis in at least one point of intersection, wherein the geometric locations of all points of intersection lie between the image plane and the mirrored entry pupil plane.

Abstract translation: 本公开涉及一种投影物镜，其可以包括其中形成物场的物平面，入射光瞳，通过在物体上镜像入射光瞳（VE）获得的镜像入射光瞳平面中的镜像入射光瞳（RE） 平面，图像平面，光轴，至少第一反射镜和第二反射镜。 投影物镜可以具有入射光瞳的负的后焦点，并且源自物场的中心点并且从物体平面向图像平面穿过物镜的主射线可以在光轴的至少一点 交叉点，其中所有交点交点的几何位置位于图像平面和镜像入射光瞳平面之间。

公开(公告)号：US20110042587A1

公开(公告)日：2011-02-24

申请号：US12805003

申请日：2010-07-07

Applicant: Dong-Gun LEE ,  Seong-Sue KIM ,  Hwan-Seok SEO

Inventor： Dong-Gun LEE ,  Seong-Sue KIM ,  Hwan-Seok SEO

IPC: G21K5/10 ,  G02B13/14 ,  G02B5/18

CPC classification number: G21K1/06 ,  G02B5/1838 ,  G02B5/1842 ,  G02B5/1871 ,  G02B27/4222 ,  G21K2201/067

Abstract: An EUV projection lens includes a substrate and concentric diffraction patterns on the substrate. The concentric diffraction patterns have an out-of phase height with respect to EUV light and include a material through which the EUV light has a transmittance higher than about 50% at the out-of phase height. The EUV projection lens has a high first order diffraction light efficiency and an optic system having the EUV projection lens has a high resolution.

Abstract translation: EUV投影透镜包括基板和基板上的同心衍射图案。 同心衍射图案相对于EUV光具有异相高度，并且包括在异相高度下EUV光透过率高于约50％的材料。 EUV投影透镜具有高的一阶衍射光效率，并且具有EUV投影透镜的光学系统具有高分辨率。

公开(公告)号：US07841212B2

公开(公告)日：2010-11-30

申请号：US11799936

申请日：2007-05-02

Applicant: Hexin Wang ,  Kurt Becker ,  Lutz Autschbach

Inventor： Hexin Wang ,  Kurt Becker ,  Lutz Autschbach

IPC: C03B23/00 ,  C03B23/025 ,  G01N23/20

CPC classification number: C03B23/0252 ,  C03B23/203 ,  C03B23/22 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  Y10S359/90

Abstract: A method for producing a shaped body (10) made of glass or glass ceramics comprises the steps of: (a) placing at least two glass blanks (12a, 12b) side by side on a shaped surface (14) of a temperature-resistant sagging mold (13); (b) sagging the glass blanks (12a, 12b) onto the shaped surface (14) by heating the sagging mold (13) and the glass blanks (12a, 12b); (c) attaching the sagged glass blanks (10a, 10b) to each other in order to form the shaped body (10); and (d) lifting the shaped body (10) from the sagging mold (13). A shaped body (10) comprises at least two glass blanks (10a, 10b) attached side by side and formed by sagging.

Abstract translation: 一种由玻璃或玻璃陶瓷制成的成形体（10）的制造方法，包括以下步骤：（a）将至少两块玻璃坯料（12a，12b）并排设置在耐温的成形表面（14）上 下垂模具（13）; （b）通过加热下垂模具（13）和玻璃坯料（12a，12b）将玻璃坯料（12a，12b）下垂到成形表面（14）上; （c）将下垂的玻璃坯料（10a，10b）彼此连接以形成成形体（10）; 和（d）将成形体（10）从下垂模具（13）提起。 成形体（10）包括至少两个玻璃坯料（10a，10b）并排并且通过下垂形成。