公开(公告)号：US12276815B2

公开(公告)日：2025-04-15

申请号：US17722028

申请日：2022-04-15

Applicant: CARL ZEISS SMT GMBH ,  ASML NETHERLANDS B.V.

Inventor： Marcus Van De Kerkhof

IPC: H05G2/00 ,  G02B5/08 ,  G02B5/09 ,  G02B19/00 ,  G03F7/00

Abstract: An EUV collector mirror has a reflection surface (16) to reflect usable EUV light which impinges on the reflection surface (16) from a source region (17) to a subsequent EUV optics. The reflection surface (16) carries a pump light grating structure (19) configured to retroreflect pump light (22) which impinges upon the pump light grating structure (19) from the source region (17) back to the source region (17). The pump light (22) has a wavelength deviating from the wavelength of the usable EUV light. Such EUV collector mirror enables a high conversion efficiency between the energy of pump light of a laser discharged produced plasma (LDPP) EUV light source on the one hand and the resulting usable EUV energy on the other.

公开(公告)号：US20250110381A1

公开(公告)日：2025-04-03

申请号：US18729397

申请日：2023-01-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Yongfeng NI

IPC: G02F1/35 ,  G03F7/00 ,  H01S3/00 ,  H01S3/067 ,  H01S3/094 ,  H01S3/0941

Abstract: A supercontinuum radiation source including a pump laser arrangement for generating pump radiation and including a plurality of pump laser heads; a radiation combiner for combining the respective pump radiation from each pump laser head, and a non-linear fiber for receiving the pump radiation so as to excite a working medium within the non-linear fiber to generate supercontinuum radiation. Each pump laser head has dimensions no greater than 5 cm in any direction. Alternatively, or in addition the supercontinuum radiation source further includes a control arrangement for controlling the pump laser arrangement, the control arrangement configured for non-simultaneous emission of pulses from each pump laser head.

公开(公告)号：US12265337B2

公开(公告)日：2025-04-01

申请号：US17386726

申请日：2021-07-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Junichi Kanehara

IPC: G03F9/00 ,  G03F7/00

Abstract: An exposure apparatus arranged to project a radiation beam onto a target portion of a substrate, the exposure apparatus having: a first substrate holder configured to hold the substrate; a second substrate holder configured to hold the substrate; a sensor holder configured to hold a sensor and/or detector; a first measurement device having a first alignment system having an alignment sensor configured to measure positions of a substrate alignment mark on the substrate; a second measurement device having a second alignment system having a further alignment sensor configured to measure positions of the substrate alignment mark on the substrate; a first scale arranged on a lower surface of the first substrate holder; and a first encoder head arranged to cooperate with the first scale, the first encoder head located beneath the first alignment system and held by a stationary support.

公开(公告)号：US20250095133A1

公开(公告)日：2025-03-20

申请号：US18962091

申请日：2024-11-27

Applicant: ASML Netherlands B.V.

Inventor： Vincent Sylvester KUIPER ,  Marco Jan-Jaco WIELAND

IPC: G06T7/00 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: The embodiments of the present disclosure provide a method of processing data derived from a sample, comprising processing an initial data set of elements derived from a detection by a detector for calibration, the data set comprising elements representing nuisance signals and detection signals. The processing of the initial data set comprising: fitting a distribution model to the initial data set to create a nuisance distribution model; setting a signal strength value, and selecting elements in the initial data set having a magnitude greater than the signal strength value as a set of defect candidates; fitting a distribution model to the set of defect candidates to create a defect distribution model of detection signals; and determining a signal strength threshold dependent on at least the defect distribution model. The determining comprising correcting the defect distribution model.

公开(公告)号：US12249480B2

公开(公告)日：2025-03-11

申请号：US18643379

申请日：2024-04-23

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus Van De Kerkhof ,  Jing Zhang ,  Martijn Petrus Christianus Van Heumen ,  Patriek Adrianus Alphonsus Maria Bruurs ,  Erheng Wang ,  Vineet Sharma ,  Makfir Sefa ,  Shao-Wei Fu ,  Simone Maria Scolari ,  Johannes Andreas Henricus Maria Jacobs

IPC: H01J37/20 ,  F16L11/04 ,  F16L11/12 ,  B01D19/00 ,  H01L21/67

Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.

公开(公告)号：US12242206B2

公开(公告)日：2025-03-04

申请号：US17911498

申请日：2021-03-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Dennis Dominic Van Der Voort ,  Nicolaas Ten Kate

IPC: G03F7/00

Abstract: A method for preparing a substrate for an exposure process of a lithographic manufacturing method, the method including imposing different local temperatures across the substrate so as to induce different thermal expansion across the substrate before the exposure process. This method is for compensating for deformation of the substrate induced when the substrate is positioned on a substrate table of a lithographic apparatus. There is also provided a local temperature applicator to implement this technique and to a lithographic apparatus including such a local temperature applicator.

公开(公告)号：US20250068085A1

公开(公告)日：2025-02-27

申请号：US18727740

申请日：2023-01-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER ,  Christianus Wilhelmus Johannes BERENDSEN ,  Stijn VAN PELT ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Erik Willem BOGAART

IPC: G03F7/00

Abstract: A substrate table, for use in an immersion lithographic apparatus, having a support area defining a support plane to support a substrate to be patterned and an upper surface surrounding the support area, wherein: the upper surface has an outer region that is substantially planar and a transition region proximate the support area; and the transition region is not co-planar with the outer region so as to ameliorate a level transition between the outer region and a non-standard substrate, which has a thickness different than a distance between the support plane and a nominal plane defined by the outer region.

公开(公告)号：US12237144B2

公开(公告)日：2025-02-25

申请号：US18477213

申请日：2023-09-28

Applicant: ASML Netherlands B.V.

Inventor： Xuerang Hu ,  Weiming Ren ,  Xuedong Liu ,  Zhong-wei Chen

IPC: H01J37/147 ,  H01J37/12 ,  H01J37/26

Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer, a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the eclectically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.

公开(公告)号：US12237143B2

公开(公告)日：2025-02-25

申请号：US18392494

申请日：2023-12-21

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US20250060681A1

公开(公告)日：2025-02-20

申请号：US18721251

申请日：2022-12-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry LABETSKI ,  Emericus Antoon Theodorus VAN DEN AKKER ,  Joost DE HOOGH ,  Zhuangxiong HUANG ,  Sjoerd Frans DE VRIES ,  Syed Aaquib HAZARI

IPC: G03F7/00

Abstract: A system for use in a lithographic, the system includes: a substrate table; another device; and at least one deformable partition. The substrate table (for example a wafer stage) is arranged to support a substrate. The system is configurable in a first configuration such that a surface of the device faces and is adjacent to the substrate and the substrate table. The at least one deformable partition either: (a) extends partially from the substrate table towards the surface of the device when the system is in the first configuration; or (b) extends partially from the surface of the device that faces and is adjacent to the substrate and the substrate table when the system is in the first configuration towards the substrate table.