公开(公告)号：US07713684B2

公开(公告)日：2010-05-11

申请号：US12338202

申请日：2008-12-18

Applicant: Rajesh Menon ,  Henry I. Smith

Inventor： Rajesh Menon ,  Henry I. Smith

IPC: G03F1/00

CPC classification number: G03F7/70291 ,  G03F7/001 ,  G03F7/203 ,  G03F7/7005 ,  G03F7/70275 ,  G03F7/70316 ,  G03F7/70408 ,  G03F7/70466

Abstract: A lithography system is disclosed that provides an array of areas of imaging electromagnetic energy that are directed toward a recording medium. The reversible contrast-enhancement material is disposed between the recording medium and the array of areas of imaging electromagnetic energy.

Abstract translation: 公开了一种光刻系统，其提供朝向记录介质的成像电磁能的区域阵列。 可逆对比度增强材料设置在记录介质和成像电磁能的区域阵列之间。

公开(公告)号：US20100097703A1

公开(公告)日：2010-04-22

申请号：US12253512

申请日：2008-10-17

Applicant: Rajesh Menon ,  Paul Rogge ,  Hsin-Yu Tsai

Inventor： Rajesh Menon ,  Paul Rogge ,  Hsin-Yu Tsai

IPC: G02B27/44

CPC classification number: G02B27/4288 ,  G02B3/10 ,  G02B27/4211

Abstract: A dichromatic lens includes a plurality of zones being arranged on a lens structure, each of the zones having a specified radius and varying height. The lens structure focuses propagating light applicable to any intensity distribution for a plurality of wavelengths.

Abstract translation: 双色透镜包括布置在透镜结构上的多个区域，每个区域具有指定的半径和变化的高度。 透镜结构聚焦适用于多个波长的任何强度分布的传播光。

公开(公告)号：US20090087797A1

公开(公告)日：2009-04-02

申请号：US12337000

申请日：2008-12-17

Applicant: Rajesh Menon ,  Henry I. Smith

Inventor： Rajesh Menon ,  Henry I. Smith

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/091

Abstract: A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.

Abstract translation: 公开了一种光刻系统，其包括用于将聚焦照明引向记录介质的聚焦元件的阵列，以及设置在记录介质和聚焦元件阵列之间的可逆对比度增强材料。

公开(公告)号：US07148496B2

公开(公告)日：2006-12-12

申请号：US10823458

申请日：2004-04-13

Applicant: Rajesh Menon ,  Dario Gil ,  George Barbastathis ,  Henry I. Smith

Inventor： Rajesh Menon ,  Dario Gil ,  George Barbastathis ,  Henry I. Smith

IPC: H01J37/304

CPC classification number: H01J37/304 ,  G03F1/78 ,  G03F7/70383 ,  G03F7/70441 ,  G03F7/70558 ,  H01J2237/31769

Abstract: A system and method are disclosed for providing error correction in an imaging system. The system includes an error determination unit for determining an amount of error associated with a spot at (x,y) in a binary pattern to be imaged, a determination unit for determining the location of a nearest exposed spot at (xi, yi) for each spot at (x,y), and a dose modification unit for modifying an exposure dose at the nearest exposed spot at (xi, yi) for each spot at (x,y).

Abstract translation: 公开了一种用于在成像系统中提供纠错的系统和方法。 该系统包括：误差确定单元，用于确定与待成像的二进制图案中的（x，y）处的斑点相关联的误差量;确定单元，用于确定最近的曝光光斑在（x i）处的位置， （x，y）处的每个斑点的剂量修改单元，以及用于修改在（x，y）处最近的曝光点的曝光剂量的剂量修改单元 （x，y）的每个点的平均值。

公开(公告)号：US06894292B2

公开(公告)日：2005-05-17

申请号：US10628809

申请日：2003-07-28

Applicant: Dario Gil ,  Rajesh Menon ,  David Carter ,  Henry I. Smith ,  George Barbastathis

Inventor： Dario Gil ,  Rajesh Menon ,  David Carter ,  Henry I. Smith ,  George Barbastathis

IPC: G03F20060101 ,  G03F7/20 ,  G21G5/00 ,  G21K5/04 ,  H01J37/317 ,  H01L27/00

CPC classification number: G03F7/70391 ,  G03F7/70275

Abstract: A maskless lithography system is disclosed that includes an array of focusing elements, each of which focuses an energy beam from an array of sources into an array of focal spots in order to create a permanent pattern on an adjacent substrate.

Abstract translation: 公开了一种无掩模光刻系统，其包括聚焦元件阵列，每个聚焦元件将来自源阵列的能量束聚焦到焦点阵列中，以便在相邻基底上产生永久图案。

公开(公告)号：US08669461B2

公开(公告)日：2014-03-11

申请号：US12253626

申请日：2008-10-17

Applicant: Rajesh Menon

Inventor： Rajesh Menon

IPC: H01L31/0232

CPC classification number: G02B5/1814 ,  F24S23/30 ,  H01L31/0543 ,  H01L31/0547 ,  H01L31/0549 ,  Y02E10/52

Abstract: A photovoltaic cell is provided. The photovoltaic cell includes a concentrator optic structure separating the solar spectrum of light into a plurality of spectral bands. The concentrator optic structure focuses these spectral bands into a plurality of concentric tightly focused ring-shaped spots and a central round spot. A multitude of circular sub-cells are each approximately positioned at a ring-shaped spot associated with a respective spectral band produced by the concentrator optic structure. Each of the sub-cells stores the energy produced at the respective spectral band

Abstract translation: 提供光电池。 光伏电池包括将太阳光谱分离成多个光谱带的聚光器光学结构。 集中器光学结构将这些光谱带聚焦成多个同心紧密聚焦的环形斑点和中心圆形斑点。 多个圆形子单元各自大致位于与由聚光器光学结构产生的相应光谱带相关联的环形光点处。 每个子单元存储在相应光谱带处产生的能量

公开(公告)号：US20120266937A1

公开(公告)日：2012-10-25

申请号：US13274903

申请日：2011-10-17

Applicant: Rajesh Menon ,  Ganghun Kim

Inventor： Rajesh Menon ,  Ganghun Kim

IPC: G02B5/18 ,  H01L31/052 ,  G01B9/02

CPC classification number: G02B27/0012 ,  G02B27/4266

Abstract: A method for designing a diffractive optic includes identifying an initial performance metric for the diffractive optic, the diffractive optic including a substrate. A test cell is selected from an array of cells on the substrate. A height of the test cell is changed by a predetermined height unit. Images are computed at a plurality of discrete wavelengths or using a continuous spectrum using diffraction-based propagation through at least a portion of the array of cells. A wavelength metric is determined for each of the images. The wavelength metrics for each of the images is consolidated into a perturbed performance metric. The perturbed performance metric is compared to the initial performance metric and the method identifies whether the perturbed performance metric is an improvement over the initial performance metric.

Abstract translation: 用于设计衍射光学器件的方法包括识别衍射光学元件的初始性能度量，所述衍射光学元件包括衬底。 测试电池从衬底上的一组电池中选出。 测试单元的高度改变预定的高度单位。 以多个离散波长计算图像，或者使用基于衍射的传播通过细胞阵列的至少一部分的连续光谱来计算图像。 为每个图像确定波长度量。 每个图像的波长度量被合并成一个扰动的性能指标。 将扰动的性能度量与初始性能度量进行比较，并且该方法识别扰动的性能度量是否是比初始性能度量的改进。

公开(公告)号：US20090046299A1

公开(公告)日：2009-02-19

申请号：US12186968

申请日：2008-08-06

Applicant: Rajesh Menon ,  Henry I. Smith

Inventor： Rajesh Menon ,  Henry I. Smith

IPC: G01N21/17

CPC classification number: G01Q60/22 ,  G03F1/50 ,  G03F1/84 ,  G03F7/2014

Abstract: An imaging system is provided. The imaging system includes a sample to be scanned by the imaging system. An absorbance modulation layer (AML) is positioned in close proximity to the sample and is physically separate from the sample. One or more sub-wavelength apertures are generated within the AML, whose size is determined by the material properties of the AML and the intensities of the illuminating wavelengths. A light source transmits an optical signal through the one or more sub-wavelength apertures generating optical near-fields that are collected for imaging.

Abstract translation: 提供成像系统。 成像系统包括要由成像系统扫描的样品。 吸收调制层（AML）位于样品附近，物理上与样品分开。 在AML内产生一个或多个亚波长孔径，其尺寸由AML的材料特性和照明波长的强度决定。 光源通过一个或多个子波长孔径传输光信号，产生用于成像的光学近场。

公开(公告)号：US07304318B2

公开(公告)日：2007-12-04

申请号：US11082629

申请日：2005-03-16

Applicant: Dario Gil ,  Rajesh Menon ,  David Carter ,  Henry I. Smith ,  George Barbastathis

Inventor： Dario Gil ,  Rajesh Menon ,  David Carter ,  Henry I. Smith ,  George Barbastathis

IPC: G21K5/04

CPC classification number: G03F7/70391 ,  G03F7/70275

Abstract: A method is disclosed for creating a permanent pattern on a substrate. The method includes the steps of providing an array of photon sources, each of which provides a photon beam, providing an array of focusing elements, each of which focuses an associated photon beam from the array of photon sources onto a substrate, and creating a permanent pattern on a substrate using the array of focusing elements to respectively focus associated photon beams on the substrate.

Abstract translation: 公开了一种用于在基板上形成永久图案的方法。 该方法包括以下步骤：提供光子源阵列，每个光子源提供光子束，提供聚焦元件阵列，每个聚焦元件将相关联的光子束从光子源阵列聚焦到衬底上，并创建永久 使用聚焦元件阵列在衬底上分别将相关联的光子束聚焦在衬底上。

公开(公告)号：US20070154850A1

公开(公告)日：2007-07-05

申请号：US11565051

申请日：2006-11-30

Applicant: Rajesh Menon

Inventor： Rajesh Menon

IPC: G03F7/20

CPC classification number: G03F7/70466 ,  G03F1/70 ,  Y10S430/153

Abstract: A method to enhance resolution in optical lithography via absorbance-modulation involves exposing an opaque absorbance modulation layer (AML) to a first waveform having wavelength, 81, with the first exposure forming a first set of transparent regions in the opaque AML and forming a first pattern made of a set of exposed regions in a photoresist layer. Next, the AML is restored to its original opaque state. Next, the restored AML is re-exposed to the first waveform having wavelength, 81, with the exposure forming a second set of transparent regions in the opaque AML and forming a second pattern having a set of exposed regions in a photoresist layer. The first and second patterns in the photoresist layer form a final pattern with enhanced resolution and decreased spatial period than the first pattern. In another scenario, instead of exposing the AML to a first waveform, two waveforms are used (the second being complimentary to the first) to ensure that the transmitted image has sharper edges compared to the original image.

Abstract translation: 通过吸光度调制增强光刻中分辨率的方法包括将不透明吸光度调制层（AML）暴露于具有波长8λ1的第一波形，第一曝光形成第一组透明区域 在不透明的AML中，并形成由光致抗蚀剂层中的一组曝光区域制成的第一图案。 接下来，AML恢复到原始的不透明状态。 接下来，恢复的AML再次暴露于具有波长8λ1的第一波形，曝光在不透明AML中形成第二组透明区域，并形成具有一组曝光的第二图案 光致抗蚀剂层中的区域。 光致抗蚀剂层中的第一和第二图案形成具有比第一图案更高分辨率和减小的空间周期的最终图案。 在另一种情况下，不是将AML暴露于第一波形，而是使用两个波形（第二个与第一波形互补），以确保传输的图像与原始图像相比具有更清晰的边缘。