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公开(公告)号：US20170017150A1
公开(公告)日：2017-01-19
申请号：US15281056
申请日：2016-09-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrei Mikhailovich YAKUNIN , Vadim Yevgenyevich BANINE , Erik Roelof LOOPSTRA , Harmen Klaas VAN DER SCHOOT , Lucas Henricus Johannes STEVENS , Maarten VAN KAMPEN
CPC classification number: G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
Abstract translation: 包括石墨烯的防护薄膜组件被构造并布置成用于EUV掩模版。 多层反射镜包括石墨烯作为最外层。
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公开(公告)号：US20150331334A1
公开(公告)日：2015-11-19
申请号：US14807458
申请日：2015-07-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Joannes Theodoor DE SMIT , Vadim Yevgenyevich BANINE , Theodorus Hubertus Josephus BISSCHOPS , Marcel Mathijs Theodore Marie DIERICHS , Theodorus Marinus MODDERMAN
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/708 , G03F7/70858
Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
Abstract translation: 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。
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公开(公告)号：US20230314930A1
公开(公告)日：2023-10-05
申请号：US18022476
申请日：2021-07-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich BANINE , Paul Alexander VERMEULEN , Cornelis Adrianus DE MEIJERE , Johnnes Hubertus Josephina MOORS , Andrey NIKIPELOV , Guido SALMASO , Marcus Adrianus VAN DE KERKHOF , Parham YAGHOOBI
CPC classification number: G03F1/64 , G03F7/70983
Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly, the apparatus including: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.
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14.发明申请公开(公告)号：US20210132517A1
公开(公告)日：2021-05-06
申请号：US16472712
申请日：2017-11-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey NIKIPELOV , Vadim Yevgenyevich BANINE , Joost André KLUGKIST , Maxim Aleksandrovich NASALEVICH , Roland Johannes Wilhelmus STAS , WRICKE Sandro
IPC: G03F9/00
Abstract: A lithographic apparatus has an object, the object includes: a substrate and optionally a lower layer on the substrate; an upper layer; and an intermediate layer between the upper layer and the substrate, wherein a bond strength between the intermediate layer and the substrate or lower layer is greater than a bond strength between the intermediate layer and the upper layer and the intermediate layer has a Young's Modulus and/or a Poisson ratio within 20% of that of the upper layer.
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公开(公告)号：US20200064183A1
公开(公告)日：2020-02-27
申请号：US16488259
申请日：2018-02-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Joost André KLUGKIST , Vadim Yevgenyevich BANINE , Johan Franciscus Maria BECKERS , Madhusudhanan JAMBUNATHAN , Maxim Aleksandrovich NASALEVICH , Andrey NIKIPELOV , Roland Johannes Wilhelmus STAS , David Ferdinand VLES , Wilhelmus Jacobus Johannes WELTERS , Sandro WRICKE
IPC: G01J1/42
Abstract: A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.
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Patent Agency Ranking
16.发明申请公开(公告)号：US20190246480A1
公开(公告)日：2019-08-08
申请号：US16388519
申请日：2019-04-18
Applicant: ASML Netherlands B.V.
Inventor： Alexey Olegovich POLYAKOV , Richard QUINTANILHA , Vadim Yevgenyevich BANINE , Coen Adrianus VERSCHUREN
CPC classification number: H05G2/00 , G03F1/84 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/7085 , G21K1/06 , H01L22/12
Abstract: A target structure (T) made by lithography or used in lithography is inspected by irradiating the structure at least a first time with EUV radiation (304) generated by inverse Compton scattering. Radiation (308) scattered by the target structure in reflection or transmission is detected (312) and properties of the target structure are calculated by a processor (340) based on the detected scattered radiation. The radiation may have a first wavelength in the EUV range of 0.1 nm to 125 nm. Using the same source and controlling an electron energy, the structure may be irradiated multiple times with different wavelengths within the EUV range, and/or with shorter (x-ray) wavelengths and/or with longer (UV, visible) wavelengths. By rapid switching of electron energy in the inverse Compton scattering source, irradiation at different wavelengths can be performed several times per second.
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公开(公告)号：US20180259846A1
公开(公告)日：2018-09-13
申请号：US15974661
申请日：2018-05-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrei Mikhailovich YAKUNIN , Vadim Yevgenyevich BANINE , Erik Roelof LOOPSTRA , Harmen Klaas VAN DER SCHOOT , Lucas Henricus Johannes STEVENS , Maarten VAN KAMPEN
IPC: G03F1/64 , G03B27/54 , G02B5/20 , G02B27/00 , C01B32/20 , G03F7/20 , H01B1/24 , H01B1/04 , G21K1/06 , G03F1/24 , G02B5/08 , B82Y40/00 , B82Y10/00 , G03F1/62
CPC classification number: G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
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18.发明申请公开(公告)号：US20190146332A1
公开(公告)日：2019-05-16
申请号：US16247179
申请日：2019-01-14
Applicant: ASML Netherlands B.V.
Inventor： Pieter-Jan VAN ZWOL , Vadim Yevgenyevich BANINE , Jozef Petrus Henricus BENSCHOP , Florian Didier Albin DHALLUIN , Mária PÉTER , Luigi SCACCABAROZZI , Willem Joan VAN DER ZANDE
Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane has one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are within some or all of the additional layers.
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公开(公告)号：US20180246414A1
公开(公告)日：2018-08-30
申请号：US15753811
申请日：2016-08-02
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich BANINE , Han-Kwang NIENHUYS , Luigi SCACCABAROZZI
Abstract: Disclosed is a suppression filter having a profile defining at least two reflective surface levels, each reflected surface level being separated by a separation distance. The separation distance is such that the reflective suppression filter is operable to substantially prevent specular reflection of radiation at a first wavelength and at a second wavelength incident on said reflective suppression filter. Also disclosed is a radiation collector, radiation source and lithographic apparatus comprising such a suppression filter, and to a method of determining a separation distance between at least two reflective surface levels of a suppression filter.
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公开(公告)号：US20180058928A1
公开(公告)日：2018-03-01
申请号：US15549133
申请日：2016-02-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich BANINE , Gerrit Jacobus Hendrik BRUSSAARD , Willem Jakobus Cornelis KOPPERT , Otger Jan LUITEN , Han-Kwang NIENHUYS , Job BECKERS , Ruud Martinus VAN DER HORST
Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.
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