公开(公告)号：US20160116850A1

公开(公告)日：2016-04-28

申请号：US14975412

申请日：2015-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Nicolaas Rudolf KEMPER ,  Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10−3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.

Abstract translation: 公开了一种浸没式光刻设备，其包括流体处理系统，该流体处理系统被配置为将浸没液体限制在投影系统的最终元件与基板和/或台之间的局部空间中，以及气体供应装置，其构造成供应具有浸入溶解度的气体 在20℃下大于5×10 -3 mol / kg的液体和与空间相邻的区域的1atm总压力。

公开(公告)号：US20210173294A1

公开(公告)日：2021-06-10

申请号：US17119331

申请日：2020-12-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Joost Jeroen OTTENS ,  Edwin Cornelis KADIJK ,  Sergei SHULEPOV

IPC: G03B27/42 ,  G03F7/20

Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

公开(公告)号：US20170090296A1

公开(公告)日：2017-03-30

申请号：US15311544

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Mark Constant Johannes BAGGEN ,  Gerard Johannes BOOGAARD ,  Nicolaas Rudolf KEMPER ,  Sander KERSSEMAKERS ,  Robertus Mathijs Gerardus RIJS ,  Frank Johannes Jacobus VAN BOXTEL ,  Erwin Antonius Henricus Franciscus VAN DEN BOOGAERT ,  Marc Wilhelmus Maria VAN DER WIJST ,  Martinus VAN DUIJNHOVEN ,  Jessica Henrica Anna VERDONSCHOT ,  Hendrikus Herman Marie COX

IPC: G03F7/20 ,  G10K11/168

CPC classification number: G03F7/709 ,  G10K11/16 ,  G10K11/168 ,  G10K11/172

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of Cthrough-holes (102), between the chamber and the compartment.

公开(公告)号：US20170003605A1

公开(公告)日：2017-01-05

申请号：US15266453

申请日：2016-09-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Sergei SHULEPOV

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  H01L21/67034

Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.

Abstract translation: 通过确保在待干燥的表面上的液膜中形成压力梯度，配置成干燥浸没式光刻设备中的表面的气刀被优化以去除液体。

公开(公告)号：US20160377996A1

公开(公告)日：2016-12-29

申请号：US15039795

申请日：2014-11-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Peter Paul HEMPENIUS ,  Martijn HOUBEN ,  Nicolaas Rudolf KEMPER ,  Robertus Mathijs Gerardus RIJS ,  Paul Corné Henri DE WIT ,  Stijn Willem BOERE ,  Youssef Karel Maria DE VOS ,  Frits VAN DER MEULEN

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70775 ,  G03F7/709

Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.

Abstract translation: 光刻设备包括：可在至少一个方向上移动的物体; 控制系统，用于在所述至少一个方向上移动所述物体，其中所述控制系统被布置成控制所述物体在感兴趣的频率范围内的所述至少一个方向上的移动; 以及设置有流体的导管，其中所述导管以图案布置在所述物体上或所述物体中，并且其中所述图案使得所述物体在所述至少一个方向上的加速度沿着所述流体沿着所述流体的加速度压力分布 导管，加速度压力分布不符合共振压力分布，其对应于在感兴趣的频率范围内的共振频率的流体中的驻波模式。

公开(公告)号：US20150015857A1

公开(公告)日：2015-01-15

申请号：US14498883

申请日：2014-09-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Marcel BECKERS ,  Marco POLIZZI ,  Michel RlEPEN ,  Anthonie KUIJPER ,  Koen STEFFENS ,  Adrianes Johannes BAETEN ,  Anca Mihaela ANTONEVICI

IPC: G03F7/20 ,  B01D19/00

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

Abstract translation: 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。

公开(公告)号：US20140300879A1

公开(公告)日：2014-10-09

申请号：US14179276

申请日：2014-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  F01N1/023 ,  G03F7/709

Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

Abstract translation: 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。

公开(公告)号：US20230127070A1

公开(公告)日：2023-04-27

申请号：US18087320

申请日：2022-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Joost Jeroen OTTENS ,  Edwin Cornelis KADIJK ,  Sergei SHULEPOV

IPC: G03B27/42 ,  G03F7/20

Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

公开(公告)号：US20170212432A1

公开(公告)日：2017-07-27

申请号：US15483410

申请日：2017-04-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Martinus Hendrikus Antonius LEENDERS ,  Nicolaas Rudolf KEMPER ,  Joost Jeroen OTTENS

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

公开(公告)号：US20170192365A1

公开(公告)日：2017-07-06

申请号：US15452445

申请日：2017-03-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

IPC: G03F7/20 ,  B01D19/00

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.