公开(公告)号：US11515155B2

公开(公告)日：2022-11-29

申请号：US17197866

申请日：2021-03-10

Applicant: Applied Materials, Inc.

Inventor： Chang Ke ,  Michael S. Jackson ,  Liqi Wu ,  Lei Zhou ,  Shuyi Zhang ,  David Thompson ,  Paul F. Ma ,  Biao Liu ,  Cheng Pan

IPC: H01L21/02 ,  C23C16/02 ,  C23C16/56 ,  H01L21/3105 ,  H01L21/32

Abstract: Methods of improved selectively for SAM-based selective depositions are described. Some of the methods include forming a SAM on a second surface and a carbonized layer on the first surface. The substrate is exposed to an oxygenating agent to remove the carbonized layer from the first surface, and a film is deposited on the first surface over the protected second surface. Some of the methods include overdosing a SAM molecule to form a SAM layer and SAM agglomerates, depositing a film, removing the agglomerates, reforming the SAM layer and redepositing the film.

公开(公告)号：US10892161B2

公开(公告)日：2021-01-12

申请号：US16169610

申请日：2018-10-24

Applicant: Applied Materials, Inc.

Inventor： Biao Liu ,  Cheng Pan ,  Erica Chen ,  Srinivas D. Nemani ,  Chang Ke ,  Lei Zhou

IPC: H01L21/02 ,  H01L23/31 ,  H01L21/768 ,  H01L23/29 ,  H01L21/3105 ,  H01L21/321 ,  C23C16/00 ,  B05D1/18 ,  H01L21/32

Abstract: Methods for depositing desired materials formed on certain locations of a substrate with desired materials using a selective deposition process for semiconductor applications are provided. In one embodiment, a method of forming a structure with desired materials on a substrate includes supplying a first gas comprising a hydroxy terminated hydrocarbon containing material to a surface of a substrate, selectively forming a passivation layer on a first material of the substrate, selectively forming self assembled monolayers on a second material of the substrate, and selectively forming a material layer on the passivation layer.

公开(公告)号：US20250093238A1

公开(公告)日：2025-03-20

申请号：US18968156

申请日：2024-12-04

Applicant: Applied Materials, Inc.

Inventor： Changgong Wang ,  Zhili Zuo ,  Chang Ke ,  Song-Moon Suh

IPC: G01N1/02 ,  G01N15/00 ,  G01N15/02 ,  G01N15/06 ,  G01N15/14

Abstract: A processing device of a particle detection system causes a distribution unit of the particle detection system to initiate a particle collection process to dislodge surface particles from a surface of an article based on a stream including solid carbon dioxide (CO2) particles and/or CO2 droplets directed toward the article. A portion of the dislodged surface particles are collected by a particle sampling component that determines, for collected particles and in real-time, a particle number concentration, a particle size, and/or a particle size distribution. A determination is made based on a signal received by the particle sampling component that the at least one of the particle number concentration, the particle size, or the particle size distribution of the portion of the dislodged surface particles satisfies one or more collection criteria. The processing device causes the distribution unit of the particle detection system to terminate the particle collection process.

公开(公告)号：US20250060048A1

公开(公告)日：2025-02-20

申请号：US18235459

申请日：2023-08-18

Applicant: Applied Materials, Inc.

Inventor： Chang Ke

IPC: F16K31/06 ,  B04C3/06 ,  F16K37/00

Abstract: Certain embodiments of the present disclosure relate to a gas flow valve. The gas flow valve includes a housing configured to receive a flow of gas. The gas flow valve further includes a plunger configured to move between a closed position and one or more open positions within the housing. The gas flow valve further includes a position sensor configured to measure a distance associated with a difference in position of the plunger between the closed position and the one or more open position. The gas flow valve further includes a force sensor coupled to the plunger and configured to measure a force exerted by the plunger in the closed position on a sealing surface.

公开(公告)号：US20210033499A1

公开(公告)日：2021-02-04

申请号：US16529630

申请日：2019-08-01

Applicant: APPLIED MATERIALS, INC.

Inventor： ChangGong Wang ,  Zhili Zuo ,  Chang Ke ,  Song-Moon Suh

IPC: G01N1/02 ,  G01N15/02 ,  G01N15/06 ,  G01N15/14

Abstract: Disclosed herein is a method comprising directing, from a distribution unit, a stream comprising at least one of solid CO2 particles or CO2 droplets toward an article, wherein the article comprises a plurality of surface particles, and wherein the stream comprising at least one of solid CO2 particles or CO2 droplets causes at least a portion of the plurality of surface particles on the article to dislodge from the surface of the article; collecting, on a surface of a substrate having a pre-determined initial state comprising initial surface particles on the surface of the substrate or a real-time aerosol sampling unit, at least some of the portion of the plurality of surface particles dislodged from the surface of the article; analyzing the surface of the substrate after performing the collecting; and determining at least one of a size, a morphology, a chemical composition, a particle number concentration, or a particle size distribution of the portion of the plurality of surface particles that were dislodged from the surface of the article and collected on the surface of the substrate.

公开(公告)号：US10770292B2

公开(公告)日：2020-09-08

申请号：US16008495

申请日：2018-06-14

Applicant: Applied Materials, Inc.

Inventor： Chang Ke ,  Lei Zhou ,  Biao Liu ,  Cheng Pan ,  Yuanhong Guo ,  Liqi Wu ,  Michael S. Jackson ,  Ludovic Godet ,  Tobin Kaufman-Osborn ,  Erica Chen ,  Paul F. Ma

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/67 ,  H01L21/3105 ,  H01L21/683 ,  H01L21/32

Abstract: Methods of depositing a film selectively onto a first material relative to a second material are described. The substrate is pre-cleaned by heating the substrate to a first temperature, cleaning contaminants from the substrate and activating the first surface to promote formation of a self-assembled monolayer (SAM) on the first material. A SAM is formed on the first material by repeated cycles of SAM molecule exposure, heating and reactivation of the first material. A final exposure to the SAM molecules is performed prior to selectively depositing a film on the second material. Apparatus to perform the selective deposition are also described.

公开(公告)号：US20190080904A1

公开(公告)日：2019-03-14

申请号：US16129223

申请日：2018-09-12

Applicant: Applied Materials, Inc.

Inventor： Jeffrey W. Anthis ,  Chang Ke ,  Pratham Jain ,  Benjamin Schmiege ,  Guoqiang Jian ,  Michael S. Jackson ,  Lei Zhou ,  Paul F. Ma ,  Liqi Wu

IPC: H01L21/02 ,  H01L21/311 ,  H01L21/033

Abstract: Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include exposing a substrate to a blocking molecule to selectively deposit a blocking layer on the first surface. A layer is selectively formed on the second surface and defects of the layer are formed on the blocking layer. The defects are removed from the blocking layer on the first surface.

公开(公告)号：US12169163B2

公开(公告)日：2024-12-17

申请号：US18493742

申请日：2023-10-24

Applicant: APPLIED MATERIALS, INC.

Inventor： Changgong Wang ,  Zhili Zuo ,  Chang Ke ,  Song-Moon Suh

IPC: G01N1/02 ,  G01N15/00 ,  G01N15/02 ,  G01N15/06 ,  G01N15/14

Abstract: A distribution unit of a particle detection system initiates a particle collection process to dislodge one or more surface particles from a surface of an article based on a stream including at least one of solid CO2 particles or CO2 droplets. The dislodged surface particles are collected on a surface of a substrate having a pre-determined initial state including initial surface particles of the substrate. A measurement indicating a particle number concentration of detectable surface particles on the substrate after the particle collection process is completed is obtained. An initial particle number concentration of the initial surface particles of the pre-determined initial state is identified. A number of particles transported away from the surface of the article is determined based on the obtained measurement and the identified initial particle concentration.

公开(公告)号：US12024770B2

公开(公告)日：2024-07-02

申请号：US16535499

申请日：2019-08-08

Applicant: APPLIED MATERIALS, INC.

Inventor： Chang Ke ,  Wenyu Zhang ,  Liqi Wu

IPC: C23C16/04 ,  C23C16/02 ,  C23C16/08 ,  C23C16/18 ,  C23C16/455

CPC classification number: C23C16/18 ,  C23C16/0281 ,  C23C16/04 ,  C23C16/08 ,  C23C16/45525

Abstract: Methods and apparatus for selectively depositing a layer atop a substrate having a metal surface and a dielectric surface is disclosed, including: (a) contacting the metal surface with one or more metal halides such as metal chlorides or metal fluorides to form an exposed metal surface; (b) growing an organosilane based self-assembled monolayer atop the dielectric surface; and (c) selectively depositing a layer atop the exposed metal surface of the substrate, wherein the organosilane based self-assembled monolayer inhibits deposition of the layer atop the dielectric surface.

公开(公告)号：US11735420B2

公开(公告)日：2023-08-22

申请号：US17014975

申请日：2020-09-08

Applicant: Applied Materials, Inc.

Inventor： Chang Ke ,  Lei Zhou ,  Biao Liu ,  Cheng Pan ,  Yuanhong Guo ,  Liqi Wu ,  Michael S. Jackson ,  Ludovic Godet ,  Tobin Kaufman-Osborn ,  Erica Chen ,  Paul F. Ma

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/67 ,  H01L21/3105 ,  H01L21/683 ,  H01L21/32

CPC classification number: H01L21/0271 ,  H01L21/0206 ,  H01L21/0228 ,  H01L21/02057 ,  H01L21/02181 ,  H01L21/02266 ,  H01L21/02274 ,  H01L21/02334 ,  H01L21/3105 ,  H01L21/67207 ,  H01L21/32 ,  H01L21/6831

Abstract: Methods of depositing a film selectively onto a first material relative to a second material are described. The substrate is pre-cleaned by heating the substrate to a first temperature, cleaning contaminants from the substrate and activating the first surface to promote formation of a self-assembled monolayer (SAM) on the first material. A SAM is formed on the first material by repeated cycles of SAM molecule exposure, heating and reactivation of the first material. A final exposure to the SAM molecules is performed prior to selectively depositing a film on the second material. Apparatus to perform the selective deposition are also described.