公开(公告)号：US20210283650A1

公开(公告)日：2021-09-16

申请号：US17335829

申请日：2021-06-01

Applicant: Applied Materials, Inc.

Inventor： Chang Ke ,  Song-Moon Suh ,  Liqi Wu ,  Michael S. Jackson ,  Lei Zhou ,  Biao Liu ,  Cheng Pan ,  Paul F. Ma ,  Mei Chang

IPC: B05D3/04 ,  B05D1/00 ,  C23C16/04 ,  C23C16/455 ,  H01L21/02 ,  H01L21/3105 ,  H01L21/321

Abstract: Methods and apparatus for removing deposits in self-assembled monolayer (SAM) based selective deposition process schemes using cryogenic gas streams are described. Some methods include removing deposits in self-assembled monolayer (SAM) based selective depositions by exposing the substrate to cryogenic aerosols to remove undesired deposition on SAM protected surfaces. Processing chambers for cryogenic gas assisted selective deposition are also described.

公开(公告)号：US11033930B2

公开(公告)日：2021-06-15

申请号：US16242184

申请日：2019-01-08

Applicant: Applied Materials, Inc.

Inventor： Chang Ke ,  Song-Moon Suh ,  Liqi Wu ,  Michael S. Jackson ,  Lei Zhou ,  Biao Liu ,  Cheng Pan ,  Paul F. Ma ,  Mei Chang

IPC: B05D3/04 ,  B05D1/00 ,  C23C16/455 ,  C23C16/04 ,  H01L21/02 ,  H01L21/3105 ,  H01L21/321 ,  B05D1/18

Abstract: Methods and apparatus for removing deposits in self-assembled monolayer (SAM) based selective deposition process schemes using cryogenic gas streams are described. Some methods include removing deposits in self-assembled monolayer (SAM) based selective depositions by exposing the substrate to cryogenic aerosols to remove undesired deposition on SAM protected surfaces. Processing chambers for cryogenic gas assisted selective deposition are also described.

公开(公告)号：US20180366317A1

公开(公告)日：2018-12-20

申请号：US16008495

申请日：2018-06-14

Applicant: Applied Materials, Inc.

Inventor： Chang Ke ,  Lei Zhou ,  Biao Liu ,  Cheng Pan ,  Yuanhong Guo ,  Liqi Wu ,  Michael S. Jackson ,  Ludovic Godet ,  Tobin Kaufman-Osborn ,  Erica Chen ,  Paul F. Ma

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/67

Abstract: Methods of depositing a film selectively onto a first material relative to a second material are described. The substrate is pre-cleaned by heating the substrate to a first temperature, cleaning contaminants from the substrate and activating the first surface to promote formation of a self-assembled monolayer (SAM) on the first material. A SAM is formed on the first material by repeated cycles of SAM molecule exposure, heating and reactivation of the first material. A final exposure to the SAM molecules is performed prior to selectively depositing a film on the second material. Apparatus to perform the selective deposition are also described.

公开(公告)号：US11815436B2

公开(公告)日：2023-11-14

申请号：US17819255

申请日：2022-08-11

Applicant: APPLIED MATERIALS, INC.

Inventor： Changgong Wang ,  Zhili Zuo ,  Chang Ke ,  Song-Moon Suh

IPC: G01N1/02 ,  G01N15/02 ,  G01N15/06 ,  G01N15/14 ,  G01N15/00

CPC classification number: G01N1/02 ,  G01N15/02 ,  G01N15/065 ,  G01N15/14 ,  G01N2001/028 ,  G01N2015/0019 ,  G01N2015/0294 ,  G01N2015/1493 ,  G01N2015/1497

Abstract: A stream including at least one of solid CO2 particles or CO2 droplets is directed toward an article including surface particles. The stream causes at least a portion of the surface particles on the article to dislodge from a surface of the article. A purge cycle to transport at least a portion of the dislodged surface particles away from the surface of the article is initiated. The purge cycle includes generating a laminar flow at a first velocity for a first time period and subsequently generating a laminar flow at a second velocity for a second time period. A determination is made of whether a number of particles transported away from the surface of the article satisfies a particle criterion. In response to a determination that the number of particles transported away from the article does not satisfy the criterion, the purge cycle is re-initiated.

公开(公告)号：US11194244B2

公开(公告)日：2021-12-07

申请号：US16720520

申请日：2019-12-19

Applicant: Applied Materials, Inc.

Inventor： Shuwei Liu ,  Chang Ke ,  Wen Xiao ,  Vibhu Jindal

IPC: G03F1/22 ,  G03F1/54

Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a substrate; a multilayer stack of reflective layers on the substrate; a capping layer on the multilayer stack of reflecting layers; and an absorber layer on the capping layer, the absorber layer made from amorphous tantalum nitride formed by non-reactive sputtering.

公开(公告)号：US20190210061A1

公开(公告)日：2019-07-11

申请号：US16242184

申请日：2019-01-08

Applicant: Applied Materials, Inc.

Inventor： Chang Ke ,  Song-Moon Suh ,  Liqi Wu ,  Michael S. Jackson ,  Lei Zhou ,  Biao Liu ,  Cheng Pan ,  Paul F. Ma ,  Mei Chang

IPC: B05D3/04 ,  B05D1/00 ,  C23C16/455 ,  C23C16/04

CPC classification number: B05D3/044 ,  B05D1/60 ,  B05D3/0453 ,  C23C16/042 ,  C23C16/45544 ,  C23C16/45563

Abstract: Methods and apparatus for removing deposits in self-assembled monolayer (SAM) based selective deposition process schemes using cryogenic gas streams are described. Some methods include removing deposits in self-assembled monolayer (SAM) based selective depositions by exposing the substrate to cryogenic aerosols to remove undesired deposition on SAM protected surfaces. Processing chambers for cryogenic gas assisted selective deposition are also described.

公开(公告)号：US20190157079A1

公开(公告)日：2019-05-23

申请号：US16193594

申请日：2018-11-16

Applicant: Applied Materials, Inc.

Inventor： Chang Ke ,  Michael S. Jackson ,  Liqi Wu ,  Lei Zhou ,  Shuyi Zhang ,  David Thompson ,  Paul F. Ma ,  Biao Liu ,  Cheng Pan

IPC: H01L21/02 ,  C23C16/02 ,  C23C16/56

Abstract: Methods of improved selectively for SAM-based selective depositions are described. Some of the methods include forming a SAM on a second surface and a carbonized layer on the first surface. The substrate is exposed to an oxygenating agent to remove the carbonized layer from the first surface, and a film is deposited on the first surface over the protected second surface. Some of the methods include overdosing a SAM molecule to form a SAM layer and SAM agglomerates, depositing a film, removing the agglomerates, reforming the SAM layer and redepositing the film.

公开(公告)号：US20250060298A1

公开(公告)日：2025-02-20

申请号：US18801057

申请日：2024-08-12

Applicant: Applied Materials, Inc.

Inventor： Wei Weng ,  Chang Ke ,  Changgong Wang

IPC: G01N15/06 ,  H01J37/32

Abstract: A processing system includes a processing chamber defining a processing region. A foreline is coupled with the processing chamber and defines a fluid conduit. A plasma trap is provided within an interior of the foreline to charge and trap at least some particles in the fluid conduit. The system further includes a particle detector to collect at least some of the charged particles and measure an electric charge produced by the particles.

公开(公告)号：US20240060860A1

公开(公告)日：2024-02-22

申请号：US18493742

申请日：2023-10-24

Applicant: APPLIED MATERIALS, INC.

Inventor： Changgong Wang ,  Zhili Zuo ,  Chang Ke ,  Song-Moon Suh

IPC: G01N1/02 ,  G01N15/02 ,  G01N15/06 ,  G01N15/14

CPC classification number: G01N1/02 ,  G01N15/02 ,  G01N15/065 ,  G01N15/14 ,  G01N2015/1497 ,  G01N2015/0019

Abstract: A distribution unit of a particle detection system initiates a particle collection process to dislodge one or more surface particles from a surface of an article based on a stream including at least one of solid CO2 particles or CO2 droplets. The dislodged surface particles are collected on a surface of a substrate having a pre-determined initial state including initial surface particles of the substrate. A measurement indicating a particle number concentration of detectable surface particles on the substrate after the particle collection process is completed is obtained. An initial particle number concentration of the initial surface particles of the pre-determined initial state is identified. A number of particles transported away from the surface of the article is determined based on the obtained measurement and the identified initial particle concentration.

公开(公告)号：US20220381653A1

公开(公告)日：2022-12-01

申请号：US17819255

申请日：2022-08-11

Applicant: APPLIED MATERIALS, INC.

Inventor： Changgong Wang ,  Zhili Zuo ,  Chang Ke ,  Song-Moon Suh

IPC: G01N1/02 ,  G01N15/02 ,  G01N15/06 ,  G01N15/14

Abstract: A stream including at least one of solid CO2 particles or CO2 droplets is directed toward an article including surface particles. The stream causes at least a portion of the surface particles on the article to dislodge from a surface of the article. A purge cycle to transport at least a portion of the dislodged surface particles away from the surface of the article is initiated. The purge cycle includes generating a laminar flow at a first velocity for a first time period and subsequently generating a laminar flow at a second velocity for a second time period. A determination is made of whether a number of particles transported away from the surface of the article satisfies a particle criterion. In response to a determination that the number of particles transported away from the article does not satisfy the criterion, the purge cycle is re-initiated.