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公开(公告)号：US20210190679A1
公开(公告)日：2021-06-24
申请号：US16755720
申请日：2018-09-26
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Masashi FUKUHARA , Kazuhiko FUJIWARA , Yoshihiro MARUYAMA
Abstract: A spectrum analysis apparatus is an apparatus for analyzing an analysis object on the basis of a spectrum of light generated in the analysis object containing any one or two or more of a plurality of reference objects, and includes an array conversion unit, a processing unit, a learning unit, and an analysis unit. The array conversion unit generates two-dimensional array data on the basis of a spectrum of light generated in the reference object or the analysis object. The processing unit includes a deep neural network. The analysis unit causes the array conversion unit to generate the two-dimensional array data on the basis of the spectrum of light generated in the analysis object, inputs the two-dimensional array data to the deep neural network, and analyzes the analysis object on the basis of data output from the deep neural network.
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Patent Agency Ranking
公开(公告)号：US20180328852A1
公开(公告)日：2018-11-15
申请号：US15776517
申请日：2016-11-15
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Kazuhiko FUJIWARA , Yoshihiro MARUYAMA
IPC: G01N21/78
Abstract: A concentration measurement method is a method for measuring a concentration of an analyte in a measurement solution containing the analyte having reducing action, and includes a mixing step of preparing a mixture solution by mixing a metal ion solution, a complexing agent, and a pH adjusting agent to prepare an intermediate mixture solution, and mixing the intermediate mixture solution and the measurement solution, a metal microstructure generation step of generating a metal microstructure on a support by reducing metal ions in the mixture solution by the reducing action of the analyte in the mixture solution, a measurement step of measuring an optical response of the metal microstructure on the support, and an analysis step of determining a concentration of the analyte in the measurement solution on the basis of a measurement result of the optical response.
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公开(公告)号：US20180224377A1
公开(公告)日：2018-08-09
申请号：US15928886
申请日：2018-03-22
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Masashi ITO , Katsumi SHIBAYAMA , Kazuto OFUJI , Hiroki OYAMA , Yoshihiro MARUYAMA
IPC: G01N21/65
CPC classification number: G01N21/658
Abstract: A SERS unit 1A comprises a SERS element 2 having a substrate and an optical function part 20 formed on the substrate, the optical function part 20 for generating surface-enhanced Raman scattering; a measurement board 3 supporting the SERS element 2 upon measurement; and a holding part 4 mechanically holding the SERS element 2 in the measurement board 3.
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公开(公告)号：US20170261435A1
公开(公告)日：2017-09-14
申请号：US15509549
申请日：2015-09-08
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Hiroki OYAMA , Katsumi SHIBAYAMA , Masashi ITO , Kazuto OFUJI , Yoshihiro MARUYAMA
IPC: G01N21/65
CPC classification number: G01N21/658 , G01N2021/651
Abstract: A surface-enhanced Raman scattering unit includes a surface-enhanced Raman scattering element including an optical functional portion that causes surface-enhanced Raman scattering, and a support member that supports the surface-enhanced Raman scattering element. The surface-enhanced Raman scattering element is fixed to the support member due to a magnetic force.
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公开(公告)号：US20160109291A1
公开(公告)日：2016-04-21
申请号：US14971049
申请日：2015-12-16
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Masashi ITO , Katsumi SHIBAYAMA , Takashi KASAHARA , Yoshihiro MARUYAMA
CPC classification number: G01J3/0205 , G01J3/4412 , G01N21/658 , Y10T29/49155
Abstract: A method for making a surface enhanced Raman scattering device in accordance with one aspect of the present invention comprises a first step of forming a nanoimprint layer on a main surface of a wafer including a plurality of portions each corresponding to a substrate; a second step of transferring, by using a mold having a pattern corresponding to a fine structural part, the pattern to the nanoimprint layer after the first step, and thereby forming the formed layer including the fine structural part for each portion corresponding to the substrate; a third step of forming a conductor layer on the fine structural part after the second step; and a fourth step of cutting the wafer into each portion corresponding to the substrate after the second step.
Abstract translation: 根据本发明的一个方面的用于制造表面增强拉曼散射装置的方法包括在晶片的主表面上形成纳米压印层的第一步骤，该晶片的主表面包括各自对应于基板的多个部分; 在第一步骤之后，通过使用具有与精细结构部分相对应的图案的模具转移到纳米压印层的第二步骤，从而形成对应于基板的每个部分的包含精细结构部分的成形层; 在第二步骤之后，在精细结构部件上形成导体层的第三步骤; 以及在第二步骤之后将晶片切割成与基板相对应的每个部分的第四步骤。
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公开(公告)号：US20140041217A1
公开(公告)日：2014-02-13
申请号：US13962583
申请日：2013-08-08
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Masashi ITO , Katsumi SHIBAYAMA , Takashi KASAHARA , Yoshihiro MARUYAMA
IPC: G01N21/65
CPC classification number: G01J3/0205 , G01J3/4412 , G01N21/658 , Y10T29/49155
Abstract: A method for making a surface enhanced Raman scattering device in accordance with one aspect of the present invention comprises a first step of forming a nanoimprint layer on a main surface of a wafer including a plurality of portions each corresponding to a substrate; a second step of transferring, by using a mold having a pattern corresponding to a fine structural part, the pattern to the nanoimprint layer after the first step, and thereby forming the formed layer including the fine structural part for each portion corresponding to the substrate; a third step of forming a conductor layer on the fine structural part after the second step; and a fourth step of cutting the wafer into each portion corresponding to the substrate after the second step.
Abstract translation: 根据本发明的一个方面的用于制造表面增强拉曼散射装置的方法包括在晶片的主表面上形成纳米压印层的第一步骤，该晶片的主表面包括各自对应于基板的多个部分; 在第一步骤之后，通过使用具有与精细结构部分相对应的图案的模具转移到纳米压印层的第二步骤，从而形成对应于基板的每个部分的包含精细结构部分的成形层; 在第二步骤之后，在精细结构部件上形成导体层的第三步骤; 以及在第二步骤之后将晶片切割成与基板相对应的每个部分的第四步骤。
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