公开(公告)号：US10830706B2

公开(公告)日：2020-11-10

申请号：US16616069

申请日：2018-02-16

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toshifumi Honda ,  Shunichi Matsumoto ,  Masami Makuuchi ,  Yuta Urano ,  Keiko Oka

IPC: G01N21/88 ,  G01N21/956 ,  G01N21/47

Abstract: A defect inspection apparatus includes: an illumination unit configured to illuminate an inspection object region of a sample with light emitted from a light source; a detection unit configured to detect scattered light in a plurality of directions, which is generated from the inspection object region; a photoelectric conversion unit configured to convert the scattered light detected by the detection unit into an electrical signal; and a signal processing unit configured to process the electrical signal converted by the photoelectric conversion unit to detect a defect in the sample. The detection unit includes an imaging unit configured to divide an aperture and form a plurality of images on the photoelectric conversion unit. The signal processing unit is configured to synthesize electrical signals corresponding to the plurality of formed images to detect a defect in the sample.

公开(公告)号：US10401300B2

公开(公告)日：2019-09-03

申请号：US15317065

申请日：2015-05-27

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko Otani ,  Yuta Urano ,  Toshifumi Honda

IPC: G01B21/00 ,  G01N21/88 ,  G01B11/30 ,  G01N21/956 ,  G01B11/06 ,  G01N21/95 ,  G01N23/2251 ,  G02B21/00 ,  G02B21/10 ,  G02B21/26 ,  G02B27/09 ,  G02B27/58 ,  G01B15/08 ,  G01B11/25 ,  G03F7/20

Abstract: A defect observation method for observing a defect on a sample detected by another inspection device with a scanning electron microscope including the steps of: optically detecting the defect using the position information for the defect: illuminating the sample including the defect with an illumination intensity pattern having periodic intensity variation in two dimensions by irradiating a plurality of illumination light beams onto the surface of the sample while phase modulating the light beams in a single direction and successively moving the light beams in small movements in a direction different from the single direction, imaging the surface of the sample that is illuminated by the illumination intensity pattern having periodic intensity variation in two dimensions and includes the defect detected by the other inspection device, and detecting the defect detected by the other inspection device from the image obtained through the imaging of the surface of the sample.

公开(公告)号：US09678021B2

公开(公告)日：2017-06-13

申请号：US14821075

申请日：2015-08-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuta Urano ,  Toshifumi Honda

IPC: G01N21/00 ,  G01N21/956 ,  G01N21/95

CPC classification number: G01N21/95623 ,  G01N21/9501 ,  G01N2021/9513 ,  G01N2201/0638

Abstract: In optical dark field defect inspection, the present invention provides including: condensing laser emitted from a light source in a line shape; reflecting the laser, with a mirror; irradiating the reflected laser via an objective lens to a sample placed on a table from a vertical direction; condensing reflected scattered light from the sample with the objective lens; shielding diffraction light occurred from a periodical pattern formed on the sample, in the reflected scattered light from the sample and scattered light occurred from the mirror, with a spatial filter; receiving the reflected scattered light from the sample, not shielded with the spatial filter, with an imaging lens, and forming an image of the reflected scattered light; detecting the image of the reflected scattered light; and processing a detection signal obtained by detecting the image of the reflected scattered light and detecting a defect on the sample.

公开(公告)号：US09523648B2

公开(公告)日：2016-12-20

申请号：US14422583

申请日：2013-07-29

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta Urano ,  Toshifumi Honda ,  Yukihiro Shibata

IPC: G01N21/00 ,  G01N21/956 ,  G01N21/95

CPC classification number: G01N21/956 ,  G01N21/9501

Abstract: A defect-inspection device includes an irradiation unit having an objective-pupil-optical unit that allows illumination light linearly condensed by a first light-condensing unit to pass through, and an objective lens that allows the illumination light having passed through the objective-pupil-optical unit to pass through; an irradiation-position-control unit that controls a passing position of the illumination light in the objective-pupil-optical unit disposed at a pupil surface of the objective lens; a detection unit having a second light-condensing unit that condenses light irradiated by the irradiation unit and generated from a sample, a specular-reflection light-blocking unit that blocks specular-reflection light from the sample and light components generated near the pupil surface among the light beams condensed by the second light-condensing unit, and an image-forming unit that images the light that is condensed by the second light-condensing unit and is not blocked by the specular-reflection light-blocking unit into a detector; and a defect-determination unit that detects a defect on a surface of the sample on the basis of a signal of the image imaged by the image-forming unit.

Abstract translation: 缺陷检查装置包括具有允许由第一聚光单元直线聚光的照明光通过的物镜光瞳单元的照射单元和允许照明光通过物镜的物镜 光通单位通过; 照射位置控制单元，其控制设置在物镜的光瞳表面处的物镜光学单元中的照明光的通过位置; 检测单元，具有：第二聚光单元，其冷凝由所述照射单元照射并由样品产生的光;镜面反射阻光单元，其阻挡来自所述样品的镜面反射光;以及在所述瞳孔表面附近产生的光分量 由第二聚光单元聚光的光束和图像形成单元，其将由第二聚光单元聚光并且不被镜面反射光阻挡单元遮挡的光成像到检测器中; 以及缺陷确定单元，其基于由图像形成单元成像的图像的信号来检测样本的表面上的缺陷。

公开(公告)号：US09506876B2

公开(公告)日：2016-11-29

申请号：US14371427

申请日：2012-12-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta Urano ,  Toshifumi Honda ,  Yasuko Aoki

IPC: G01N23/04 ,  G01T1/20 ,  G01N23/16 ,  G01N23/18

CPC classification number: G01N23/04 ,  G01N23/043 ,  G01N23/16 ,  G01N23/18 ,  G01N2223/642 ,  G01N2223/643 ,  G01N2223/646 ,  G01N2223/652 ,  G01T1/20

Abstract: The X-ray inspection device includes: an X-ray source with a focal spot size greater than the diameter of a defect for irradiating a sample with X-rays; an X-ray TDI detector arranged near the sample and having long pixels in a direction parallel to the scanning direction of the sample for detecting the X-rays emitted by the X-ray source and passing through the sample as an X-ray transmission image; and a defect-detecting unit for detecting defects based on the X-ray transmission image detected by the X-ray TDI detector.

Abstract translation: X射线检查装置包括：焦点尺寸大于用X射线照射样品的缺陷的直径的X射线源; X射线TDI检测器，其布置在样本附近，并且在与样品的扫描方向平行的方向上具有长像素，用于检测由X射线源发射的X射线并作为X射线透射图像通过样品 ; 以及缺陷检测单元，用于基于由X射线TDI检测器检测到的X射线透射图像来检测缺陷。

公开(公告)号：US09470640B2

公开(公告)日：2016-10-18

申请号：US15042598

申请日：2016-02-12

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Shunichi Matsumoto ,  Atsushi Taniguchi ,  Toshifumi Honda ,  Yukihiro Shibata ,  Yuta Urano

IPC: G01N21/00 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2201/126 ,  G01N2201/127 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A defect inspection method and device for irradiating a linear region on a surface-patterned sample mounted on a table, with illumination light from an inclined direction to the sample, next detecting in each of a plurality of directions an image of the light scattered from the sample irradiated with the illumination light, then processing signals obtained by the detection of the images of the scattered light, and thereby detecting a defect present on the sample; wherein the step of detecting the scattered light image in the plural directions is performed through oval shaped lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light.

公开(公告)号：US20160216217A1

公开(公告)日：2016-07-28

申请号：US15088673

申请日：2016-04-01

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshifumi Honda ,  Yuta Urano ,  Takahiro Jingu ,  Akira Hamamatsu

IPC: G01N21/95 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01J1/0474 ,  G01J1/44 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0683 ,  G01N2201/0697 ,  G01N2201/10 ,  G01N2201/12

Abstract: To detect an infinitesimal defect, highly precisely measure the dimensions of the detect, a detect inspection device is configured to comprise: a irradiation unit which irradiate light in a linear region on a surface of a sample; a detection unit which detect light from the linear region; and a signal processing unit which processes a signal obtained by detecting light and detecting a defect. The detection unit includes: an optical assembly which diffuses the light from the sample in one direction and forms an image in a direction orthogonal to the one direction; and a detection assembly having an array sensor in which detection pixels are positioned two-dimensionally, which detects the light diffused in the one direction and imaged in the direction orthogonal to the one direction, adds output signals of each of the detection pixels aligned in the direction in which the light is diffused, and outputs same.

公开(公告)号：US20160018340A1

公开(公告)日：2016-01-21

申请号：US14799741

申请日：2015-07-15

Applicant: Hitachi High-Technologies Corporation ,  The University of Tokyo

Inventor： Yuko Otani ,  Shunji Maeda ,  Yuta Urano ,  Toshifumi Honda ,  Takehiro Hirai ,  Satoru Takahashi ,  Kiyoshi Takamasu

IPC: G01N21/88 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2021/8867

Abstract: detect a fine defect in reviewing To review a fine defect detected by another inspection apparatus, there is disclosed a method for reviewing a defect including a light capturing step that illuminates a sample with light under plural optical conditions, while varying only at least one of illumination conditions, sample conditions, or detection conditions, and detects plural lights scattering from the sample; a signal obtaining step that obtains plural signals based on the lights detected; and a processing step that discriminates a defect from noise according to a waveform characteristic quantity, an image characteristic quantity, or a value characteristic quantity created using the signals and derives the coordinates of defect.

Abstract translation: 检查检查中的细小缺陷为了检查由另一检查装置检测到的细小缺陷，公开了一种检查缺陷的方法，所述缺陷包括在多个光学条件下用光照亮样品的光捕获步骤，同时只改变照明中的至少一种 条件，样品条件或检测条件，并且检测从样品散射的多个光; 信号获取步骤，基于检测到的光获取多个信号; 以及根据使用该信号产生的波形特征量，图像特征量或值特征量来识别缺陷与噪声的处理步骤，并且导出缺陷坐标。

公开(公告)号：US20150116702A1

公开(公告)日：2015-04-30

申请号：US14399972

申请日：2013-04-23

Applicant: Hitachi High-Technologies Corporation

Inventor： Shunichi Matsumoto ,  Toshifumi Honda ,  Yuta Urano ,  Takahiro Jingu

IPC: G01N21/95 ,  G01T1/18 ,  G01T1/20 ,  G01N21/47

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N2021/4735 ,  G01N2201/06113 ,  G01T1/18 ,  G01T1/2018

Abstract: To enable the detection of a more minute defect with a defect detection device, the defect inspection device is provided with: an illumination light irradiating section that irradiates illumination light on a linear area of a specimen from an inclined direction; a detection optical system section provided with multiple detection optical systems that comprise objective lenses and two-dimensional detectors, said objective lenses being placed in a direction substantially orthogonal to the length direction of the linear area, being placed in a surface that contains a normal line to the specimen front surface, and condensing scattered light generated from the linear area on the specimen, and said two-dimensional detectors detecting the scattered light condensed by the objective lenses; and a signal processing section that processes a signal detected by the detection optical system section and detects the defect on the specimen.

Abstract translation: 为了能够利用缺陷检测装置检测更多的缺陷，缺陷检查装置设置有：照射光照射部，其从倾斜方向对样本的线性区域照射照明光; 检测光学系统部分，其设置有包括物镜和二维检测器的多个检测光学系统，所述物镜放置在与线性区域的长度方向基本正交的方向上，放置在包含法线的表面中 并且将从所述样本的直线区域产生的散射光聚集在一起，并且所述二维检测器检测由所述物镜聚光的散射光; 以及信号处理部，处理由所述检测光学系统部检测出的信号，检测出所述检体的缺陷。

公开(公告)号：US20150062581A1

公开(公告)日：2015-03-05

申请号：US14331681

申请日：2014-07-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta Urano ,  Taketo Ueno ,  Akira Hamamatsu ,  Toshifumi Honda

IPC: G01N21/88 ,  G01N21/27 ,  G01N21/21

CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8845 ,  G01N2021/8848

Abstract: A defect inspection apparatus includes: a seed light generator including a pulse signal generator that generates a pulse signal and a polarization modulator that outputs pulse light of any one of two polarization states orthogonal to each other in synchronization with the pulse signal output from the pulse signal generator; a wavelength converting unit including a branching mechanism that branches the pulse light output by the polarization modulator of the seed light generator using polarization and a converting unit that wavelength-converts the pulse light branched by the branching mechanism into beams of two different wavelengths, respectively; an illumination optical system that illuminates a surface of an inspected target material with the beams of the two different wavelengths converted by the wavelength converting unit; a detection optical system including a detecting unit that detects light generated by the beams of the two different wavelengths illuminated by the illumination optical system; and a signal processing system including a distributor that distributes a signal based on the light detected by the detecting unit of the detection optical system for each wavelength, on the basis of the pulse signal output from the pulse signal generator, and a defect determining unit that processes a signal based on the light distributed by the distributor and determines a defect.

Abstract translation: 缺陷检查装置包括：种子光发生器，包括产生脉冲信号的脉冲信号发生器和输出与从脉冲信号输出的脉冲信号同步的彼此正交的两个极化状态中的任一个的脉冲光的偏振调制器 发电机; 波长转换单元，其包括分支机构，其使用偏振的种子发光器的偏振调制器输出的脉冲光分支;以及转换单元，其将分支机构分支的脉冲光分别波长转换为两个不同波长的波束; 照明光学系统，其利用由波长转换单元转换的两个不同波长的光束照射被检查目标材料的表面; 检测光学系统，包括检测单元，其检测由照明光学系统照射的两个不同波长的光束产生的光; 以及信号处理系统，其包括分配器，其基于从所述脉冲信号发生器输出的脉冲信号，基于由所述检测光学系统的检测单元为每个波长检测到的光分布信号;以及缺陷确定单元， 基于分配器分布的光处理信号并确定缺陷。