公开(公告)号：US20200310244A1

公开(公告)日：2020-10-01

申请号：US16829906

申请日：2020-03-25

Applicant: HOYA CORPORATION

Inventor： Masanori NAKAGAWA ,  Hirofumi KOZAKAI

IPC: G03F1/60 ,  G03F1/24

Abstract: The substrate with a multilayer reflective film includes a substrate and the multilayer reflective film configured to reflect exposure light, the multilayer reflective film comprising a stack of alternating layers on a substrate, the alternating layers including a low refractive index layer and a high refractive index layer, in which the multilayer reflective film contains molybdenum (Mo) and at least one additive element selected from nitrogen (N), boron (B), carbon (C), zirconium (Zr), oxygen (O), hydrogen (H) and deuterium (D), and the crystallite size of the multilayer reflective film calculated from a diffraction peak of Mo (110) by X-ray diffraction is 2.5 nm or less.

公开(公告)号：US20170023853A1

公开(公告)日：2017-01-26

申请号：US15134776

申请日：2016-04-21

Applicant: HOYA CORPORATION

Inventor： Kazuhiro HAMAMOTO ,  Toshihiko ORIHARA ,  Hirofumi KOZAKAI ,  Youichi USUI ,  Tsutomu SHOKI ,  Junichi HORIKAWA

IPC: G03F1/22 ,  G03F1/60 ,  H01L21/033 ,  G03F7/20

CPC classification number: G03F1/22 ,  G03F1/50 ,  G03F1/60 ,  G03F7/2004 ,  H01L21/0332 ,  H01L21/0334

Abstract: Disclosed is a mask blank substrate for use in lithography, wherein a main surface of the substrate satisfies a relational equation of (BA70−BA30)/(BD70−BD30)≧350 (%/nm), and has a maximum height (Rmax)≦1.2 nm in a relation between a bearing area (%) and a bearing depth (nm) obtained by measuring, with an atomic force microscope, an area of 1 μm×1 μm in the main surface on the side of the substrate where a transfer pattern is formed, wherein BA30 is defined as a bearing area of 30%, BA70 is defined as a bearing area of 70%, and BD70 and BD30 are defined to respectively represent bearing depths for the bearing area of 30% and the bearing area of 70%.

Abstract translation: 公开了一种用于光刻的掩模空白基板，其中基板的主表面满足关系式（BA70-BA30）/（BD70-BD30）≥350（％/ nm），并具有最大高度（Rmax） 通过用原子力显微镜测量在基板一侧的主表面中的面积为1μm×1μm的轴承面积（％）和轴承深度（nm）之间的关系，≤1.2nm，其中， 形成转印图案，其中BA30被定义为30％的轴承面积，BA70被定义为70％的轴承面积，并且BD70和BD30分别表示承载面积为30％的轴承深度和轴承面积 70％。

公开(公告)号：US20160147139A1

公开(公告)日：2016-05-26

申请号：US14906288

申请日：2014-07-15

Applicant: HOYA CORPORATION

Inventor： Takahiro ONOUE ,  Hirofumi KOZAKAI

IPC: G03F1/24 ,  G03F1/48 ,  G03F7/20 ,  G03F1/76

CPC classification number: G03F1/24 ,  G03F1/48 ,  G03F1/76 ,  G03F7/2004

Abstract: An object of the present invention is to provide a substrate with a multilayer reflective film, which gives a reflective mask achieving high reflectance and exhibiting excellent cleaning resistance. The present invention is directed to a substrate with a multilayer reflective film, which has: a substrate; a multilayer reflective film, formed on the substrate, comprising a layer that includes Si as a high refractive-index material and a layer that include a low refractive-index material, the layers being periodically laminated; a Ru protective film, formed on the multilayer reflective film, for protecting the multilayer reflective film; and a block layer, formed between the multilayer reflective film and the Ru protective film, for preventing the migration of Si to the Ru protective film, wherein the surface layer of the multilayer reflective film opposite from the substrate is the layer comprising Si, and at least part of the Si is diffused into the block layer.

Abstract translation: 本发明的目的是提供一种具有多层反射膜的基板，其提供反射掩模以获得高反射率并且表现出优异的清洁阻力。 本发明涉及具有多层反射膜的基板，其具有：基板; 形成在所述基板上的多层反射膜，包括包含作为高折射率材料的Si的层和包含低折射率材料的层，所述层周期性地层压; 形成在多层反射膜上的用于保护多层反射膜的Ru保护膜; 以及形成在多层反射膜和Ru保护膜之间的阻挡层，用于防止Si向Ru保护膜迁移，其中与基板相反的多层反射膜的表面层是包含Si的层，并且在 Si的最少部分被扩散到阻挡层中。