公开(公告)号：US20220278038A1

公开(公告)日：2022-09-01

申请号：US17742816

申请日：2022-05-12

Applicant: Intel Corporation

Inventor： Ji Yong Park ,  Kyu Oh Lee ,  Yikang Deng ,  Zhichao Zhang ,  Liwei Cheng ,  Andrew James Brown ,  Cheng Xu ,  Jiwei Sun

IPC: H01L23/498 ,  H01L23/00 ,  H01L21/48

Abstract: Microelectronic assemblies, and related devices and methods, are disclosed herein. For example, in some embodiments, a microelectronic assembly may include a package substrate having a core substrate with a first conductive structure having a first thickness on the core substrate, and a second conductive structure having a second thickness on the core substrate, where the first thickness is different than the second thickness.

公开(公告)号：US11328968B2

公开(公告)日：2022-05-10

申请号：US16463638

申请日：2016-12-27

Applicant: Intel Corporation

Inventor： Mitul Modi ,  Robert L. Sankman ,  Debendra Mallik ,  Ravindranath V. Mahajan ,  Amruthavalli P. Alur ,  Yikang Deng ,  Eric J. Li

IPC: H01L23/13 ,  H01L23/498 ,  H01L23/31 ,  H01L25/065 ,  H01L25/18 ,  H01L25/00 ,  H01L21/56 ,  H01L21/48 ,  H01L23/00

Abstract: An apparatus is provided which comprises: a plurality of dielectric layers forming a substrate, a plurality of first conductive contacts on a first surface of the substrate, a cavity in the first surface of the substrate defining a second surface parallel to the first surface, a plurality of second conductive contacts on the second surface of the substrate, one or more integrated circuit die(s) coupled with the second conductive contacts, and mold material at least partially covering the one or more integrated circuit die(s) and the first conductive contacts. Other embodiments are also disclosed and claimed.

公开(公告)号：US20210305154A1

公开(公告)日：2021-09-30

申请号：US16829336

申请日：2020-03-25

Applicant: Intel Corporation

Inventor： Ying Wang ,  Yikang Deng ,  Junnan Zhao ,  Andrew James Brown ,  Cheng Xu ,  Kaladhar Radhakrishnan

IPC: H01L23/522 ,  H01L23/528 ,  H01L23/532 ,  H01L49/02

Abstract: Disclosed herein are magnetic structures in integrated circuit (IC) package supports, as well as related methods and devices. For example, in some embodiments, an IC package support may include a conductive line, a magnetic structure around the conductive line, and material stubs at side faces of the magnetic structure.

公开(公告)号：US20210304952A1

公开(公告)日：2021-09-30

申请号：US17213622

申请日：2021-03-26

Applicant: Intel Corporation

Inventor： William J. Lambert ,  Mihir K. Roy ,  Mathew J. Manusharow ,  Yikang Deng

IPC: H01F27/28 ,  H01F17/00 ,  H01F41/04 ,  C25D5/16 ,  C25D5/48 ,  C25D7/00 ,  H01F27/255 ,  H01F41/02

Abstract: Devices and methods including a though-hole inductor for an electronic package are shown herein. Examples of the through-hole inductor include a substrate including at least one substrate layer. Each substrate layer including a dielectric layer having a first surface and a second surface. An aperture included in the dielectric layer is located from the first surface to the second surface. The aperture includes an aperture wall from the first surface to the second surface. A conductive layer is deposited on the first surface, second surface, and the aperture wall. At least one coil is cut from the conductive layer and located on the aperture wall.

公开(公告)号：US10998120B2

公开(公告)日：2021-05-04

申请号：US16162465

申请日：2018-10-17

Applicant: Intel Corporation

Inventor： William J. Lambert ,  Mihir K Roy ,  Mathew J Manusharow ,  Yikang Deng

IPC: H01F7/06 ,  H01F27/28 ,  H01F17/00 ,  H01F41/04 ,  C25D5/16 ,  C25D5/48 ,  C25D7/00 ,  H01F27/255 ,  H01F41/02

Abstract: Devices and methods including a though-hole inductor for an electronic package are shown herein. Examples of the through-hole inductor include a substrate including at least one substrate layer. Each substrate layer including a dielectric layer having a first surface and a second surface. An aperture included in the dielectric layer is located from the first surface to the second surface. The aperture includes an aperture wall from the first surface to the second surface. A conductive layer is deposited on the first surface, second surface, and the aperture wall. At least one coil is cut from the conductive layer and located on the aperture wall.

公开(公告)号：US20210020558A1

公开(公告)日：2021-01-21

申请号：US17064085

申请日：2020-10-06

Applicant: Intel Corporation

Inventor： Yikang Deng ,  Ying Wang ,  Cheng Xu ,  Chong Zhang ,  Junnan Zhao

IPC: H01L23/498 ,  H01L23/538

Abstract: An electronic device may include a substrate, and the substrate may include one or more layers. The one or more layers may include a first dielectric material and one or more electrical traces. A cavity may be defined in the substrate, and the cavity may be adapted to receive one or more electrical components. One or more lateral traces may extend through a wall of the cavity. The lateral traces may provide electrical communication pathways between the substrate and the electrical components.

公开(公告)号：US20190385780A1

公开(公告)日：2019-12-19

申请号：US16012259

申请日：2018-06-19

Applicant: Intel Corporation

Inventor： Cheng Xu ,  Yikang Deng ,  Kyu Oh Lee ,  Ji Yong Park ,  Srinivas Pietambaram ,  Ying Wang ,  Chong Zhang ,  Rui Zhang ,  Junnan Zhao

IPC: H01F27/28 ,  H01F27/24 ,  H04B5/00 ,  H01L21/822 ,  H01L23/522 ,  H01L49/02 ,  H01F41/04

Abstract: Techniques are provided for an inductor at a first level interface between a first die and a second die. In an example, the inductor can include a winding and a core disposed inside the winding. The winding can include first conductive traces of a first die, second conductive traces of a second die, and a plurality of connectors configured to connect the first die with the second die. Each connector of the plurality of connecters can be located between a trace of the first conductive traces and a corresponding trace of the second conductive traces.

公开(公告)号：US09721880B2

公开(公告)日：2017-08-01

申请号：US14969940

申请日：2015-12-15

Applicant: Intel Corporation

Inventor： Jimin Yao ,  Sanka Ganesan ,  Shawna M. Liff ,  Yikang Deng ,  Debendra Mallik

IPC: H01L23/12 ,  H01L21/00 ,  H05K7/10 ,  H01L23/498 ,  H01L23/31 ,  H01L21/48 ,  H05K1/18 ,  H05K1/03 ,  H05K3/34 ,  H01L23/00 ,  H01L25/065

CPC classification number: H01L23/49816 ,  H01L21/4853 ,  H01L23/3114 ,  H01L23/49838 ,  H01L24/13 ,  H01L24/14 ,  H01L24/16 ,  H01L24/32 ,  H01L24/73 ,  H01L24/81 ,  H01L24/83 ,  H01L24/92 ,  H01L24/97 ,  H01L25/0657 ,  H01L2224/0401 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/14135 ,  H01L2224/16237 ,  H01L2224/16503 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/8101 ,  H01L2224/81191 ,  H01L2224/81192 ,  H01L2224/81447 ,  H01L2224/81815 ,  H01L2224/83102 ,  H01L2224/92125 ,  H01L2224/97 ,  H01L2924/15321 ,  H01L2924/3511 ,  H05K1/03 ,  H05K1/18 ,  H05K1/181 ,  H05K3/34 ,  H05K3/3436 ,  H05K2201/10515 ,  H05K2201/1053 ,  H01L2924/014 ,  H01L2924/00014 ,  H01L2224/81 ,  H01L2924/01047 ,  H01L2924/01029 ,  H01L2924/01028

Abstract: Integrated circuit (IC) package structures, and related devices and methods, are disclosed herein. In some embodiments, an IC package substrate may include: a dielectric layer having a first face and a second face; a metal layer disposed at the first face of the dielectric layer and having a first face and a second face, wherein the second face of the metal layer is disposed between the first face of the metal layer and the second face of the dielectric layer; a package contact at the first face of the metal layer to couple the IC package substrate to a component; and a die contact at the first face of the metal layer to couple a die to the IC package substrate.

公开(公告)号：US11955426B2

公开(公告)日：2024-04-09

申请号：US17839337

申请日：2022-06-13

Applicant: INTEL CORPORATION

Inventor： Huong Do ,  Kaladhar Radhakrishnan ,  Krishna Bharath ,  Yikang Deng ,  Amruthavalli P. Alur

IPC: H01L23/522 ,  H01L21/768 ,  H01L23/66 ,  H01L49/02

CPC classification number: H01L23/5227 ,  H01L21/76816 ,  H01L23/5226 ,  H01L23/66 ,  H01L28/10 ,  H01L2223/6672

Abstract: A microelectronics package comprising a substrate, the substrate comprising a dielectric and at least first and second conductor level within the dielectric, where the first and second conductor levels are separated by at least one dielectric layer. The microelectronics package comprises an inductor structure that comprises a magnetic core. The magnetic core is at least partially embedded within the dielectric. The inductor structure comprises a first trace in the first conductor level, a second trace in the second conductor level, and a via interconnect connecting the first and second traces. The first trace and the second trace extend at least partially within the magnetic core.

公开(公告)号：US11651885B2

公开(公告)日：2023-05-16

申请号：US16637006

申请日：2017-09-28

Applicant: Intel Corporation

Inventor： Junnan Zhao ,  Ying Wang ,  Cheng Xu ,  Kyu Oh Lee ,  Sheng Li ,  Yikang Deng

IPC: H01F17/00 ,  H01F27/255

CPC classification number: H01F17/0013 ,  H01F27/255 ,  H01F2017/002 ,  H01F2017/0066

Abstract: Described herein are magnetic core inductors (MCI) and methods for manufacturing magnetic core inductors. A first embodiment of the MCI can be a snake-configuration MCI. The snake-configuration MCI can be formed by creating an opening in a base material, such as copper, and providing a nonconductive magnetic material in the opening. The inductor can be further formed by forming plated through holes into the core material. The conductive elements for the inductor can be formed in the plated through holes. The nonconductive magnetic material surrounds each conductive element and plated through hole. In embodiments, a layered coil inductor can be formed by drilling a laminate to form a cavity through the laminate within the metal rings of the layered coil inductor. The nonconductive magnetic material can be provided in the cavity.