Sample Milling System and Apparatus and Method for Image Generation

    公开(公告)号:US20250006458A1

    公开(公告)日:2025-01-02

    申请号:US18757874

    申请日:2024-06-28

    Applicant: JEOL Ltd.

    Inventor: Munehiro Kozuka

    Abstract: There is provided a sample milling system permitting one to determine suitable milling process conditions easily. The sample milling system includes: a sample milling apparatus for milling a sample by making an ion beam impinge on the sample; and an image generator apparatus for generating forecasted imagery for a case where the sample is milled using the milling apparatus under preset milling process conditions. The forecasted imagery contains information about a distribution of directions of impingement of the ion beam.

    Apparatus and Method for Fabrication of Shield Plate

    公开(公告)号:US20240208762A1

    公开(公告)日:2024-06-27

    申请号:US18536792

    申请日:2023-12-12

    Applicant: JEOL Ltd.

    CPC classification number: B65H35/002 B65H59/06 H01J37/09 H01J37/3053

    Abstract: There is provided a shield plate fabrication apparatus capable of fabricating a shield plate easily. The shield plate is included in a sample milling apparatus which mills a sample by shielding a part of the sample with the shield plate and irradiating the sample with a charged particle beam. The fabrication apparatus includes: a base plate holding shaft for rotatably holding a base plate and winding tape around the base plate; and a tension mechanism for applying tension to the tape while it is being wound around the base plate.

    Sample Milling Apparatus and Method of Adjustment Therefor

    公开(公告)号:US20220285125A1

    公开(公告)日:2022-09-08

    申请号:US17683538

    申请日:2022-03-01

    Applicant: JEOL Ltd.

    Inventor: Munehiro Kozuka

    Abstract: A sample milling apparatus includes an ion source, a swinging mechanism for swinging a sample, a positioning camera for bringing a target milling position on the sample into coincidence with the impact point of an ion beam, and a display section for displaying an image captured by the positioning camera. The adjustment method starts with observing the trace of the impinging ion beam left on the sample with the positioning camera while the position of the positioning camera is held relative to the swing axis of the swinging mechanism and capturing an observation image. Then, a display image to be displayed on the display section is extracted from the observation image based on the position of the trace, thus bringing the beam impact point and the position of the field of view of the display image into coincidence.

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