公开(公告)号：US07524604B2

公开(公告)日：2009-04-28

申请号：US10553083

申请日：2004-04-15

Applicant: Takuma Hojo ,  Kiyoshi Ishikawa

Inventor： Takuma Hojo ,  Kiyoshi Ishikawa

IPC: G03F7/039 ,  G03F7/38

CPC classification number: G03F7/0397

Abstract: The invention provides a positive resist composition which has high etching resistance and attains high resolution, and a method of forming patterns by using the positive resist composition. The positive resist composition contains a resin component (A), which has acid dissociable, dissolution inhibiting groups, and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) which generates acid on exposure, wherein the resin component (A) is a polymer comprising structural units (a1) represented by the general formula (I) shown below, and a portion of the hydroxyl groups of the units (a1) are protected by replacing the hydrogen atoms of the hydroxyl groups with acid dissociable, dissolution inhibiting groups represented by the general formula (II) shown below: (wherein, R is a hydrogen atom or methyl group, R1 is an alkyl group having 1 to 5 carbon atoms, R2 is an alkyl group having 1 to 5 carbon atoms or a hydrogen atom, and X is an aliphatic polycyclic group having 10 to 16 carbon atoms or an aromatic polycyclic hydrocarbon group having 10 to 16 carbon atoms.)

Abstract translation: 本发明提供了具有高耐蚀刻性和高分辨率的正型抗蚀剂组合物，以及通过使用正性抗蚀剂组合物形成图案的方法。 正型抗蚀剂组合物含有具有酸解离性，溶解抑制基团，在酸作用下表现出增加的碱溶解性的树脂成分（A）和暴露时产生酸的酸产生剂成分（B），其中树脂成分 （A）是包含由下述通式（I）表示的结构单元（a1）的聚合物，单元（a1）的一部分羟基通过用酸解离而置换羟基的氢原子来保护 ，由下述通式（II）表示的溶解抑制基团：（其中，R为氢原子或甲基，R 1为碳原子数1〜5的烷基，R 2为碳原子数为1〜5的烷基） 或氢原子，X为碳原子数为10〜16的脂肪族多环基或碳原子数为10〜16的芳香族多环烃基。）

公开(公告)号：US07449276B2

公开(公告)日：2008-11-11

申请号：US10554380

申请日：2004-04-22

Applicant: Takuma Hojo ,  Kiyoshi Ishikawa ,  Tsuyoshi Nakamura ,  Tasuku Matsumiya

Inventor： Takuma Hojo ,  Kiyoshi Ishikawa ,  Tsuyoshi Nakamura ,  Tasuku Matsumiya

IPC: G03F7/004 ,  G03F7/039

CPC classification number: G03F7/40 ,  G03F7/0397 ,  G03F7/2059 ,  Y10S430/106 ,  Y10S430/111

Abstract: The invention provides a positive photoresist composition which exhibits a high level of etching resistance and attains high resolution, and enables the formation of a fine pattern using an electron beam exposure step, as well as a method for forming a resist pattern that uses the positive photoresist composition. This positive photoresist composition for use with EB contains a resin component (A) that exhibits increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C), wherein the component (A) comprises a copolymer containing a first structural unit (a1) derived from hydroxystyrene and a second structural unit (a2) derived from a (meth)acrylate ester having an alcoholic hydroxyl group, and a portion of the hydroxyl groups of the structural units (a1) and the alcoholic hydroxyl groups of the structural units (a2) are protected with acid dissociable, dissolution inhibiting groups.

Abstract translation: 本发明提供一种正光致抗蚀剂组合物，其具有高水平的耐蚀刻性并获得高分辨率，并且能够使用电子束曝光步骤形成精细图案，以及形成使用正性光致抗蚀剂的抗蚀剂图案的方法 组成。 用于EB的正性光致抗蚀剂组合物含有在酸作用下表现出增加的碱溶性的树脂组分（A），暴露时产生酸的酸产生剂组分（B）和有机溶剂（C），其中组分 （A）包含含有由羟基苯乙烯衍生的第一结构单元（a 1）和由具有醇羟基的（甲基）丙烯酸酯衍生的第二结构单元（a 2）和一部分羟基的羟基的共聚物 结构单元（a 1）和结构单元（a 2）的醇羟基被酸解离，溶解抑制基团保护。

公开(公告)号：US20060127799A1

公开(公告)日：2006-06-15

申请号：US10537162

申请日：2003-12-02

Applicant: Naotaka Kubota ,  Kiyoshi Ishikawa ,  Mitsuru Sato ,  Tasuku Matsumiya ,  Kazuhiro Fujii ,  Kenichi Sato

Inventor： Naotaka Kubota ,  Kiyoshi Ishikawa ,  Mitsuru Sato ,  Tasuku Matsumiya ,  Kazuhiro Fujii ,  Kenichi Sato

IPC: G03C1/76

CPC classification number: G03F7/32 ,  G03F7/0397 ,  G03F7/40

Abstract: A resist pattern forming method which can prevent a fine resist pattern from collapsing in a drying step after a development treatment in case of forming a resist pattern is provided. This method comprises applying a positive resist composition comprising a resin component (A), which has an alkali-soluble unit content of less than 20 mol % and also has an acid dissociable dissolution inhibiting group, alkali solubility thereof being enhanced by action of acid, an acid generator component (B) which generates an acid under exposure, and an organic solvent (C) which dissolves the components (A) and (B) on a substrate; subjecting the resulting film to prebaking, selective exposure, post exposure baking and alkali development; performing a displacing step of displacing a liquid existing on the substrate with a displacing liquid at least one time; displacing the displacing liquid with a liquid for critical drying; and performing a drying step of drying the liquid for critical drying via a critical state.

Abstract translation: 提供了抗蚀剂图案形成方法，其可以在形成抗蚀剂图案的情况下，在显影处理之后，在干燥步骤中防止细小的抗蚀剂图案塌陷。 该方法包括涂布含有碱溶性单元含量小于20摩尔％的树脂成分（A）的正型抗蚀剂组合物，并且还具有酸解离溶解抑制基团，其碱溶性通过酸的作用而增强， 产生暴露酸的酸产生剂组分（B）和在基材上溶解组分（A）和（B）的有机溶剂（C）; 对所得膜进行预烘烤，选择性曝光，曝光后烘烤和碱显影; 执行置换步骤，用置换液体至少一次移动存在于基板上的液体; 用液体移动置换液体进行临界干燥; 并执行干燥步骤，用于通过临界状态干燥用于临界干燥的液体。

公开(公告)号：US6083665A

公开(公告)日：2000-07-04

申请号：US273262

申请日：1999-03-22

Applicant: Mitsuru Sato ,  Katsumi Oomori ,  Etsuko Iguchi ,  Kiyoshi Ishikawa ,  Fumitake Kaneko ,  Toshimasa Nakayama

Inventor： Mitsuru Sato ,  Katsumi Oomori ,  Etsuko Iguchi ,  Kiyoshi Ishikawa ,  Fumitake Kaneko ,  Toshimasa Nakayama

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  G03F7/40

CPC classification number: G03F7/091 ,  G03F7/0045 ,  Y10S430/12 ,  Y10S430/122

Abstract: A proposal is made for the photolithographic formation of a patterned resist layer on a substrate without the troubles due to reflection of the exposure light on the substrate surface. Thus, patterning is conducted on a photo-resist laminate comprising (a) a substrate; (b) a specific anti-reflection coating layer formed on one surface of the substrate; and (c) a photoresist layer formed on the anti-reflection coating layer from a specific negative-working chemical-sensitization photoresist composition. The patterning procedure comprises the steps of: (A) exposing, pattern-wise to actinic rays, the photoresist layer of the photoresist laminate; (B) subjecting the photoresist layer to a heat treatment; (C) subjecting the photoresist layer to a development treatment to dissolve away the photoresist layer in the areas unexposed to actinic rays in step (A) so as to expose bare the anti-reflection coating layer in the areas unexposed to the actinic rays leaving a patterned resist layer in the areas exposed to the actinic rays; and (D) removing the pattern-wise exposed anti-reflection coating layer by dry etching with the patterned photoresist layer as a mask.

Abstract translation: 提出了在基板上的图案化抗蚀剂层的光刻形成，而不会由于基板表面上的曝光光的反射而引起的问题。 因此，在包含（a）基材的光致抗蚀剂层压体上进行图案化; （b）形成在所述基板的一个表面上的特定抗反射涂层; 和（c）由特定的负性化学增感光致抗蚀剂组合物形成在抗反射涂层上的光致抗蚀剂层。 图案化步骤包括以下步骤：（A）以光致抗蚀剂层压板的光致抗蚀剂层将光致抗蚀剂层以图形方式曝光于光化射线; （B）对光致抗蚀剂层进行热处理; （C）在步骤（A）中对光致抗蚀剂层进行显影处理以将光致抗蚀剂层溶解在未暴露于光化射线的区域中，以便露出未暴露于光化离子的区域中的防反射涂层 在暴露于光化射线的区域中的图案化抗蚀剂层; 和（D）通过用图案化的光致抗蚀剂层作为掩模的干蚀刻去除图案化的曝光的抗反射涂层。

公开(公告)号：US5941839A

公开(公告)日：1999-08-24

申请号：US941329

申请日：1997-09-30

Applicant: Kiyoshi Ishikawa

Inventor： Kiyoshi Ishikawa

IPC: A61H1/00 ,  A61M16/00 ,  A61M1/00

CPC classification number: A61H1/001 ,  A61H2201/107

Abstract: A rotary apparatus gives a patient a rotational motion at a discretionary controlled speed suitable to medical treatment and at the same time can continuously supply the patient in rotation with oxygen for inhalation by means of oxygen supply equipment. The apparatus is characterized in that a chair 1 on which a patient is sitting is driven, via a rotary shaft 6, by a driving system 3 installed in a control base 2 to rotate, and oxygen for inhalation to be supplied to the patient in rotation is guided to pass through the interior of the rotary shaft 6 and supplied by a mouthpiece 23 provided at the top end of an oxygen supply tube 21 to a position suitable for the patient to breathe.

Abstract translation: 旋转装置以适合于医疗处理的任意控制速度向患者提供旋转运动，并且同时可以通过氧气供应设备连续向患者提供用于吸入的氧气。 该装置的特征在于，通过旋转轴6通过安装在控制基座2中的驱动系统3驱动患者坐在其上的椅子1以旋转，并且吸入氧气被提供给患者旋转 被引导通过旋转轴6的内部并由设置在供氧管21的顶端的接口管23供给到适合于患者呼吸的位置。

公开(公告)号：US5928837A

公开(公告)日：1999-07-27

申请号：US987023

申请日：1997-12-09

Applicant: Mitsuru Sato ,  Kiyoshi Ishikawa ,  Yoshiki Sugeta ,  Hiroyuki Yamazaki ,  Toshikazu Tachikawa ,  Hiroshi Komano

Inventor： Mitsuru Sato ,  Kiyoshi Ishikawa ,  Yoshiki Sugeta ,  Hiroyuki Yamazaki ,  Toshikazu Tachikawa ,  Hiroshi Komano

IPC: G03F7/004 ,  G03F7/038 ,  H01L21/027 ,  G03C1/492

CPC classification number: G03F7/038 ,  G03F7/0045 ,  Y10S430/12 ,  Y10S430/122

Abstract: Proposed is a novel negative-working chemical-sensitization photoresist composition used in the photolithographic patterning work for the manufacture of semiconductor devices and the like and capable of giving a patterned resist layer with high sensitivity and pattern resolution as well as excellent heat resistance and excellently orthogonal cross sectional profile of the patterned resist layer. The composition comprises, as a uniform solution:(A) 100 parts by weight of an alkali-soluble resin which is a polyhydroxystyrene-based resin having a weight-average molecular weight of at least 2000;(B) from 3 to 70 parts by weight of an acid-crosslinkable compound which is an amino resin having hydroxyalkyl and/or alkoxyalkyl groups;(C) from 0.5 to 30 parts by weight of a radiation-sensitive acid-generating compound selected from several types of specific oximesulfonate compounds; and(D) from 0.5 to 10 parts by weight of a phenolic compound, such as benzophenone compounds, having at least four hydroxyl groups in a molecule and a molecular weight smaller than 2000.

Abstract translation: 提出了用于制造半导体器件等的光刻图案化工作中的新颖的负极化学增感光致抗蚀剂组合物，并且能够提供具有高灵敏度和图案分辨率的图案化抗蚀剂层以及优异的耐热性和良好的正交 图案化抗蚀剂层的横截面轮廓。 该组合物包含作为均匀溶液：（A）100重量份作为重均分子量为至少2000的聚羟基苯乙烯类树脂的碱溶性树脂; （B）3〜70重量份作为具有羟烷基和/或烷氧基烷基的氨基树脂的酸交联性化合物; （C）0.5〜30重量份选自几种特定肟磺酸酯化合物的辐射敏感产酸化合物; 和（D）0.5〜10重量份在分子中具有至少四个羟基并且分子量小于2000的酚类化合物，例如二苯甲酮化合物。

公开(公告)号：US5789136A

公开(公告)日：1998-08-04

申请号：US626147

申请日：1996-04-05

Applicant: Mitsuru Sato ,  Katsumi Oomori ,  Kiyoshi Ishikawa ,  Etsuko Iguchi ,  Fumitake Kaneko

Inventor： Mitsuru Sato ,  Katsumi Oomori ,  Kiyoshi Ishikawa ,  Etsuko Iguchi ,  Fumitake Kaneko

IPC: G03F7/004 ,  G03F7/038 ,  G03C1/73

CPC classification number: G03F7/0045 ,  G03F7/038 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/126 ,  Y10S430/128

Abstract: Proposed is an alkali-developable negative-working photoresist composition in the form of a solution capable of exhibiting high sensitivity and greatly improved stability of the resist layer of the composition on a substrate surface after pattern-wise exposure to actinic rays and kept for a substantial length of time before further processing. The photoresist composition comprises, as the essential ingredients, (a) an alkali-soluble resin such as a copolymer of hydroxystyrene and styrene; (b) a compound capable of releasing an acid when irradiated with actinic rays such as tris(2,3-dibromopropyl) isocyanurate; (c) a crosslinking agent selected from the group consisting of melamine resins and urea resins substituted at the N-positions by methylol groups, alkoxy methyl groups or a combination thereof; and (d) a sensitivity improver which is hexa(methoxymethyl) melamine or di(methoxymethyl) urea, each in a specified proportion.

Abstract translation: 提出了一种可显影的负性光致抗蚀剂组合物，其形式为能够显示出高灵敏度并且大大提高组合物的抗蚀剂层在图案形式暴露于光化射线之后在基材表面上的稳定性，并保持基本上 进一步处理之前的时间长短。 光致抗蚀剂组合物包含作为必要成分的（a）碱溶性树脂，例如羟基苯乙烯和苯乙烯的共聚物; （b）当用诸如三（2,3-二溴丙基）异氰脲酸酯的光化射线照射时能够释放酸的化合物; （c）选自三聚氰胺树脂和在N-位被羟甲基取代的尿素树脂的交联剂，烷氧基甲基或其组合; 和（d）灵敏度改进剂，其为六（甲氧基甲基）三聚氰胺或二（甲氧基甲基）脲，各自为特定比例。

公开(公告)号：US5547460A

公开(公告)日：1996-08-20

申请号：US333723

申请日：1994-11-03

Applicant: Kiyoshi Ishikawa

Inventor： Kiyoshi Ishikawa

IPC: A61F5/00 ,  A61F5/01 ,  A61H1/00 ,  A61M1/00

CPC classification number: A61H1/00 ,  A61H2203/0406 ,  A61H2205/10 ,  A63B22/14

Abstract: An apparatus for treating bowlegs, which is simple in structure and easy in operation, gives no pains to the patients, while keeping the patient in a very stable and safe condition. The apparatus comprises a stationary platform 1, a tilted rotary plate 3 being located inside the platform 1 and having, on its top, a tilted surface 4 in the form of an inverted cone, a motor 2 for turning the tilted rotary plate 3 together with a patient standing upright on the tilted surface 4, and a control panel 7 for controlling the speed of rotation of the motor 2. The tilted rotary plate 3 is connected to the motor 2 in such a way that the plate 3 can be replaced with one of other tilted rotary plates having different angles of inclination.

Abstract translation: 一种治疗弓形体的装置，结构简单，操作方便，不会给患者带来痛苦，同时保持患者处于非常稳定和安全的状态。 该装置包括固定平台1，位于平台1内的倾斜旋转板3，其顶部具有倒锥形式的倾斜表面4，用于将倾斜旋转板3与 直立在倾斜面4上的病人，以及用于控制马达2的旋转速度的控制面板7.倾斜旋转板3以马达2的方式连接到电动机2上， 的其他具有不同倾斜角度的倾斜旋转板。

公开(公告)号：US08124312B2

公开(公告)日：2012-02-28

申请号：US12443118

申请日：2007-09-13

Applicant: Kiyoshi Ishikawa ,  Jun Koshiyama ,  Kazumasa Wakiya

Inventor： Kiyoshi Ishikawa ,  Jun Koshiyama ,  Kazumasa Wakiya

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/20 ,  G03F7/26

CPC classification number: H01L21/0273 ,  G03F7/0035 ,  G03F7/40 ,  H01L21/0337 ,  H01L21/0338 ,  Y10S430/128

Abstract: A novel method for forming a pattern capable of decreasing the number of steps in a double patterning process, and a material for forming a coating film suitably used in the method for forming a pattern are provided. First resist film (2) is formed by applying a first chemically amplified resist composition on support (1), and thus formed film is selectively exposed, and developed to form multiple first resist patterns (3). Next, on the surface of the first resist patterns (3) are formed multiple coating patterns (5) by forming coating films (4) constituted with a water soluble resin film, respectively. Furthermore, a second chemically amplified resist composition is applied on the support (1) having the coating pattern (5) formed thereon to form second resist film (6), which is selectively exposed and developed to form multiple second resist patterns (7). Accordingly, a pattern including the coating patterns (5) and the second resist patterns (7) is formed on the support (1).

Abstract translation: 提供一种用于形成能够减少双重图案化工艺中的台阶数的图案的新颖方法和用于形成图案的方法中适当使用的涂膜形成材料。 通过在支撑体（1）上涂覆第一化学放大抗蚀剂组合物形成第一抗蚀剂膜（2），从而形成膜被选择性地曝光并显影以形成多个第一抗蚀剂图案（3）。 接下来，通过分别形成由水溶性树脂膜构成的涂膜（4），在第一抗蚀剂图案（3）的表面上形成多个涂布图案（5）。 此外，在其上形成有涂层图案（5）的支撑体（1）上施加第二化学放大抗蚀剂组合物以形成第二抗蚀剂膜（6），其被选择性地暴露和显影以形成多个第二抗蚀剂图案（7）。 因此，在支撑体（1）上形成包括涂布图案（5）和第二抗蚀图案（7）的图案。

公开(公告)号：US07932013B2

公开(公告)日：2011-04-26

申请号：US11993444

申请日：2006-06-16

Applicant: Shogo Matsumaru ,  Toshiyuki Ogata ,  Kiyoshi Ishikawa ,  Hideo Hada ,  Shigenori Fujikawa ,  Toyoki Kunitake

Inventor： Shogo Matsumaru ,  Toshiyuki Ogata ,  Kiyoshi Ishikawa ,  Hideo Hada ,  Shigenori Fujikawa ,  Toyoki Kunitake

IPC: G03F7/004 ,  G03F7/30

CPC classification number: H01L21/0273 ,  G03F7/405

Abstract: There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask.The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.

Abstract translation: 提供一种涂覆材料，其使用在基板上形成的图案作为掩模，在蚀刻工艺中提高图案的耐蚀刻性。 该材料是使用在基板上形成的图案作为掩模的蚀刻工艺的图案涂覆材料，其包括在水解时可产生羟基的金属化合物（W）。