公开(公告)号：US07686019B2

公开(公告)日：2010-03-30

申请号：US11287163

申请日：2005-11-23

Applicant: Markus Weiss ,  William T. Denman

Inventor： Markus Weiss ,  William T. Denman

IPC: A61M11/00

CPC classification number: A61M16/044 ,  A61M16/0434 ,  A61M16/0443 ,  A61M16/0452 ,  A61M16/0841 ,  A61M16/0858 ,  A61M2016/0413

Abstract: A medical ventilation device comprising a cannula having proximal and distal ends; an inflatable cuff adapted to be inflated to an inspiratory pressure, the cuff attached to and surrounding a portion of the cannula toward the distal end thereof; an inspiratory pressure inflation tube having first and second ends, the first end in communication with an interior of the inflatable cuff, the second end adapted to communicate with an inspiratory pressure source; and a pressure valve in communication with the inspiratory pressure inflation tube.

Abstract translation: 一种医用通气装置，包括具有近端和远端的插管; 适于充气到吸气压力的可充气套筒，所述袖带附着到所述套管的一部分并围绕其远端延伸; 吸气压力充气管具有第一和第二端，所述第一端与所述可充气袖带的内部连通，所述第二端适于与吸气压力源连通; 以及与吸气压力充气管连通的压力阀。

公开(公告)号：US20080258070A1

公开(公告)日：2008-10-23

申请号：US12098739

申请日：2008-04-07

Applicant: Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

Inventor： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

IPC: G01J1/42

CPC classification number: G01J1/42 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70558 ,  H05G2/00

Abstract: The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

Abstract translation: 本公开涉及EUV（极紫外）照明系统。 该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。 孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。 孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

公开(公告)号：US20060291062A1

公开(公告)日：2006-12-28

申请号：US11416447

申请日：2006-05-02

Applicant: Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Joachim Wietzorrek ,  Johannes Wangler ,  Frank Melzer ,  Bernhard Gellrich ,  Bernhard Geuppert ,  Erich Schubert ,  Martin Antoni

Inventor： Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Joachim Wietzorrek ,  Johannes Wangler ,  Frank Melzer ,  Bernhard Gellrich ,  Bernhard Geuppert ,  Erich Schubert ,  Martin Antoni

IPC: G02B27/10

CPC classification number: B82Y10/00 ,  G02B5/09 ,  G02B7/182 ,  G02B17/006 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70825 ,  G21K1/06 ,  G21K5/04

Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength 193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

Abstract translation: 提供了沿着扫描方向以扫描模式操作的投影曝光系统。 投影曝光系统包括：收集器，其接收波长为193nm的光并照射平面中的区域。 平面由具有与扫描方向平行的y方向和垂直于扫描方向的x方向的局部坐标系限定。 收集器包括（a）第一镜壳，（b）第一镜壳内的第二镜壳，以及（c）用于紧固第一镜壳和第二镜壳的紧固装置。 镜壳基本上围绕公共旋转轴线旋转对称。 紧固装置具有在镜壳的径向方向上延伸的支撑辐条，并且当​​投影到平面中时支撑辐条产生不平行于y方向的突起。

公开(公告)号：US07084412B2

公开(公告)日：2006-08-01

申请号：US10952412

申请日：2004-09-28

Applicant: Markus Weiss

Inventor： Markus Weiss

IPC: H01J21/425

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G21K1/06 ,  G21K2201/064

Abstract: There is provided a collector unit for illumination systems with a wavelength of ≦193 nm, preferably ≦126 nm, and especially preferably in the region of EUV wavelengths. Rays of a beam bundle impinge on the collector unit, and the beam bundle emerges from an object in an object plane. The collector unit includes at least one mirror shell that receives the rays of the beam bundle emerging from the object and shows an optical effect, and a periodic structure with at least one grating period applied to at least a part of the mirror shell. An illumination system and an EUV projection exposure system are also provided.

Abstract translation: 为波长<= 193nm，优选<= 126nm，特别优选在EUV波长区域的照明系统提供收集器单元。 束束的射线照射在收集器单元上，并且束束从物平面中的物体出射。 收集器单元包括至少一个镜壳，其接收从物体出射的束束的光线并且显示光学效应，以及具有施加到镜壳的至少一部分的至少一个光栅周期的周期性结构。 还提供照明系统和EUV投影曝光系统。

公开(公告)号：US20130284129A1

公开(公告)日：2013-10-31

申请号：US13883942

申请日：2011-08-23

Applicant: Phillipp Bittel ,  Stefan Foerst ,  Markus Weiss ,  Josef Groeschel

Inventor： Phillipp Bittel ,  Stefan Foerst ,  Markus Weiss ,  Josef Groeschel

IPC: F01L1/34

CPC classification number: F01L1/34 ,  F01L1/3442 ,  F01L2001/34426 ,  F15B13/044 ,  F16K27/041 ,  Y10T29/49293

Abstract: A valve housing for a control valve of a camshaft adjuster, including a housing flange for fastening to a control unit as well as an essentially cylindrical housing component for accommodating a control piston. It is provided that the housing component is rotatably fixedly attached to the housing flange by a form-locked connection. A valve housing of this type is cost effective to manufacture and has a low weight, while ensuring operational reliability. The invention furthermore relates to a method for manufacturing an aforementioned valve housing.

Abstract translation: 一种用于凸轮轴调节器的控制阀的阀壳体，包括用于紧固到控制单元的壳体凸缘以及用于容纳控制活塞的基本上圆柱形的壳体部件。 提供了壳体部件通过形成锁定的连接可旋转地固定地附接到壳体凸缘。 这种阀壳体制造成本低，重量轻，同时确保操作可靠性。 本发明还涉及一种用于制造上述阀壳体的方法。

公开(公告)号：US08513628B2

公开(公告)日：2013-08-20

申请号：US12969115

申请日：2010-12-15

Applicant: Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

Inventor： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

IPC: G01J1/42

CPC classification number: G01J1/42 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70558 ,  H05G2/00

Abstract: The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

Abstract translation: 本公开涉及EUV（极紫外）照明系统。 该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。 孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。 孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

公开(公告)号：US08164077B2

公开(公告)日：2012-04-24

申请号：US12625336

申请日：2009-11-24

Applicant: Marco Wedowski ,  Nadyeh Shariloo, legal representative ,  Markus Weiss ,  Stephan Muellender ,  Johann Trenkler ,  Hartmut Enkisch ,  Gisela Sipos ,  Hubert Adriaan van Mierlo ,  Michiel David Nijkerk ,  Fokko Pieter Wieringa

Inventor： Marco Wedowski ,  Markus Weiss ,  Stephan Muellender ,  Johann Trenkler ,  Hartmut Enkisch ,  Gisela Sipos ,  Hubert Adriaan van Mierlo ,  Michiel David Nijkerk ,  Fokko Pieter Wieringa

IPC: G01J3/10

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70316 ,  G03F7/70916 ,  G21K1/00 ,  G21K1/062 ,  G21K2201/067

Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.

Abstract translation: 描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。 元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。 多层涂层的至少一层用作第一电容器电极。 在两个电容器电极之间提供至少一个电介质层。 还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。

公开(公告)号：US07802891B2

公开(公告)日：2010-09-28

申请号：US12338049

申请日：2008-12-18

Applicant: Andreas Seifert ,  Markus Weiss ,  Andreas Heisler ,  Stefan Dornheim

Inventor： Andreas Seifert ,  Markus Weiss ,  Andreas Heisler ,  Stefan Dornheim

IPC: G02B5/08

CPC classification number: B82Y10/00 ,  G02B7/1824 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70825

Abstract: A faceted mirror apparatus includes a support plate having a plurality of stepped reception bores into which are fitted the base portions of respective ones of a plurality of mirror facets having mirrored surfaces. An outer surface of each of the facets bears on an inner wall to provide a stable alignment of the optical axes of the mirrored surfaces such that the apparatus generates a beam of rays from impinging rays.

Abstract translation: 分面镜装置包括具有多个阶梯式接收孔的支撑板，其中装配有具有镜面的多个镜面中相应的一个的基部。 每个小面的外表面承载在内壁上以提供镜面的光轴的稳定对准，使得该装置从入射光线产生射线。

公开(公告)号：US20100067653A1

公开(公告)日：2010-03-18

申请号：US12625336

申请日：2009-11-24

Applicant: Marco Wedowski ,  Markus Weiss ,  Stephan Mûllender ,  Johann Trenkler ,  Hartmut Enkisch ,  Gisela Sipos ,  H.A. van Mierlo ,  Michiel David Nijkerk ,  Fokko Pieter Wieringa ,  Nadyeh Shariloo

Inventor： Marco Wedowski ,  Markus Weiss ,  Stephan Mûllender ,  Johann Trenkler ,  Hartmut Enkisch ,  Gisela Sipos ,  H.A. van Mierlo ,  Michiel David Nijkerk ,  Fokko Pieter Wieringa ,  Nadyeh Shariloo

IPC: G21K1/06 ,  A61N5/06 ,  G01J1/42

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70316 ,  G03F7/70916 ,  G21K1/00 ,  G21K1/062 ,  G21K2201/067

Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.

Abstract translation: 描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。 元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。 多层涂层的至少一层用作第一电容器电极。 在两个电容器电极之间提供至少一个电介质层。 还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。

公开(公告)号：US07646004B2

公开(公告)日：2010-01-12

申请号：US11439854

申请日：2006-05-24

Applicant: Marco Wedowski ,  Nadyeh Shariloo, legal representative ,  Markus Weiss ,  Stephan Müllender ,  Johann Trenkler ,  Hartmut Enkisch ,  Gisela Sipos ,  H. A. van Mierlo ,  Michiel David Nijkerk ,  Fokko Pieter Wieringa

Inventor： Marco Wedowski ,  Markus Weiss ,  Stephan Müllender ,  Johann Trenkler ,  Hartmut Enkisch ,  Gisela Sipos ,  H. A. van Mierlo ,  Michiel David Nijkerk ,  Fokko Pieter Wieringa

IPC: G01J3/10

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70316 ,  G03F7/70916 ,  G21K1/00 ,  G21K1/062 ,  G21K2201/067

Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.

Abstract translation: 描述了用于EUV和/或波长的软X射线区域中的辐射的光学元件，特别是法向入射收集镜。 元件具有基板，具有光学活性区域的多层涂层和具有第一和第二电容器电极的电容器。 多层涂层的至少一层用作第一电容器电极。 在两个电容器电极之间提供至少一个电介质层。 还描述了具有至少一个光学元件的光学系统，其具有布置在光学元件附近的第一电极。