公开(公告)号：US20140072202A1

公开(公告)日：2014-03-13

申请号：US14020217

申请日：2013-09-06

Applicant: NuFlare Technology, Inc.

Inventor： Riki OGAWA ,  Nobutaka KIKUIRI

IPC: G01N21/95

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2021/95676

Abstract: A pattern evaluation method comprising the steps of, illuminating light from a light source constituting an optical system and acquiring an optical image of a sample having a repeated pattern with a period not more than a resolution of the optical system, allocating a gradation value to each pixel of the optical image and obtaining at least one of an average gradation value for each predetermined unit region and deviation of the gradation value in the unit region, and performing at least one of a process of converting the average gradation value into average line width information in the region of the repeated pattern and a process of converting the deviation of the gradation value into roughness of the repeated pattern and creating a map representing distribution of at least one of the average line width information and the roughness with the use of an obtained converted value.

Abstract translation: 一种图案评估方法，包括以下步骤：从构成光学系统的光源照明光，并获取具有不大于光学系统的分辨率的周期的具有重复图案的样本的光学图像;将渐变值分配给每个 并且获得每个预定单位区域的平均灰度值和单位区域中的灰度值的偏差中的至少一个，并且执行将平均灰度值转换为平均线宽信息的处理中的至少一个 在重复图案的区域中，并且将灰度值的偏差转换成重复图案的粗糙度的过程，并且通过使用获得的转换的图像来创建表示平均线宽度信息和粗糙度中的至少一个的分布的映射 值。

公开(公告)号：US20140055780A1

公开(公告)日：2014-02-27

申请号：US13956708

申请日：2013-08-01

Applicant: KABUSHIKI KAISHA TOSHIBA ,  NuFlare Technology, Inc.

Inventor： Riki OGAWA ,  Masatoshi HIRONO

IPC: G01N21/956

CPC classification number: G01N21/95607 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/06113 ,  G01N2201/0636

Abstract: According to one embodiment, a pattern test apparatus includes a light source configured to apply test light to a test sample, a polarizing beam splitter which reflects or transmits the test light, an imaging device which receives light which has been reflected by the test sample and transmitted through or reflected by the polarizing beam splitter, an optical system which forms a Fourier transform plane of the test sample between the test sample and the polarizing beam splitter, and a polarizing controller disposed in the Fourier transform plane. The polarizing controller includes a first region which lets the test light through, and a second region which is greater than the first region and lets the light reflected by the test sample through, and the each regions have different retardation quantities.

Abstract translation: 根据一个实施例，图案测试装置包括被配置为将测试光施加到测试样本的光源，反射或透射测试光的偏振分束器，接收被测试样品反射的光的成像装置和 通过偏振分束器透射或反射的光学系统，在测试样本和偏振分束器之间形成测试样本的傅立叶变换平面的光学系统，以及设置在傅里叶变换平面中的偏振控制器。 偏振控制器包括使测试光通过的第一区域和大于第一区域的第二区域，并且使由测试样品反射的光通过，并且每个区域具有不同的延迟量。

公开(公告)号：US20200161082A1

公开(公告)日：2020-05-21

申请号：US16601901

申请日：2019-10-15

Applicant: NuFlare Technology, Inc.

Inventor： Hiromu INOUE ,  Ryoichi HIRANO ,  Masataka SHIRATSUCHI ,  Riki OGAWA

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: According to one aspect of the present invention, a multiple electron beam inspection apparatus includes a reference image generation circuit generating reference images corresponding to the secondary electron images, in accordance with an image generation characteristic of a secondary electron image by irradiation of one beam; and a correction circuit generating corrected reference images in which, on the basis of deviation information between a figure pattern of the secondary electron image by irradiation of the one beam of the multiple primary electron beams and a figure pattern of a secondary electron image by irradiation of another beam different from the one beam of the multiple primary electron beams, a shape of a figure pattern of a reference image corresponding to the figure pattern of the secondary electron image by the irradiation of the another beam in the reference images is corrected.

公开(公告)号：US20190066286A1

公开(公告)日：2019-02-28

申请号：US16104191

申请日：2018-08-17

Applicant: NuFlare Technology, Inc.

Inventor： Masataka SHIRATSUCHI ,  Riki OGAWA ,  Hideaki HASHIMOTO ,  Kazuhiro NAKASHIMA ,  Ryoichi HIRANO ,  Hideo TSUCHIYA ,  Chosaku NODA

IPC: G06T7/00 ,  G06T5/00

Abstract: According to one aspect of the present invention, a pattern inspection apparatus includes: a first sub-pixel interpolation processing circuitry configured to calculate a pixel value of a reference image corresponding to a position of each pixel of the inspection target image by performing an interpolation process using at least one pixel value of the reference image for each shift amount while variably and relatively shifting the inspection target image and the reference image by the unit of a sub-pixel using the reference image corresponding to the inspection target image; and an SSD calculation processing circuitry configured to calculate a sum of squared difference between each pixel value of the inspection target image and a corresponding pixel value of the reference image subjected to a filter process for the each shift amount.

公开(公告)号：US20180114306A1

公开(公告)日：2018-04-26

申请号：US15714468

申请日：2017-09-25

Applicant: NuFlare Technology, Inc.

Inventor： Riki OGAWA

IPC: G06T7/00 ,  G02B5/30 ,  G02B27/10 ,  G02B15/15 ,  G02B27/09 ,  H04N5/225 ,  G06T5/50 ,  G01N21/956

CPC classification number: G06T7/001 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8848 ,  G01N2021/8896 ,  G01N2021/95676 ,  G01N2201/0683 ,  G02B5/3025 ,  G02B5/3083 ,  G02B15/15 ,  G02B21/0092 ,  G02B27/0938 ,  G02B27/10 ,  G02B27/283 ,  G03F1/84 ,  G03F7/70491 ,  G06T5/50 ,  G06T2207/10148 ,  G06T2207/30148 ,  H04N5/2254 ,  H04N5/2258

Abstract: A polarized image acquisition apparatus includes a division type half-wave plate, located opposite to the mask substrate with respect to an objective lens and near an objective lens pupil position, to arrange P and S polarized waves of the transmitted light having passed through the objective lens to be mutually orthogonal, a Rochon prism to separate trajectories of P and S polarized waves, an imaging lens to form images of P and S polarized waves having passed through the Rochon prism at image formation positions different from each other, a mirror, in a case where one of P and S polarized waves is focused/formed at one of the different image formation positions, to reflect the other wave at the other position, a first sensor to capture an image of one of P and S polarized waves, and a second sensor to capture an image of the other wave.

公开(公告)号：US20180024075A1

公开(公告)日：2018-01-25

申请号：US15642905

申请日：2017-07-06

Applicant: Nuflare Technology, Inc.

Inventor： Toshiaki OTAKI ,  Riki OGAWA

IPC: G01N21/88 ,  G06T7/00 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/956 ,  G01N2021/8848 ,  G06T7/0004

Abstract: A pattern inspection apparatus includes a first half-wave plate to receive an ultraviolet light linearly polarized in a first electric field oscillation direction, and output a linearly polarized light polarized in a second electric field oscillation direction obtained by rotating by an integer multiple of 90°, a mirror to reflect the linearly polarized light polarized in the second electric field oscillation direction, and output a linearly polarized light polarized in a third electric field oscillation direction parallel or orthogonal to the second electric field oscillation direction, a second half-wave plate to convert the linearly polarized light polarized in the third electric field oscillation direction, which has been reflected, to a linearly polarized light polarized in a fourth electric field oscillation direction by rotating by an angle different from an integer multiple of 90°.

公开(公告)号：US20170206433A1

公开(公告)日：2017-07-20

申请号：US15407397

申请日：2017-01-17

Applicant: NuFlare Technology, Inc.

Inventor： Riki OGAWA

IPC: G06K9/62 ,  G06T7/73 ,  G03F7/20 ,  H04N5/235 ,  G06T7/00 ,  G01N21/956 ,  H04N5/225 ,  H04N5/372

CPC classification number: G06K9/6203 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F1/84 ,  G03F7/702 ,  G06K9/209 ,  G06T7/001 ,  G06T7/74 ,  G06T2207/30148 ,  H04N5/2256 ,  H04N5/2258 ,  H04N5/2351 ,  H04N5/372 ,  H04N5/3743

Abstract: According to one aspect of the present invention, a pattern inspection apparatus includes a first diaphragm that is positioned on an optical path of a reflection illumination optical system and has a first reference pattern of a line-and-space pattern formed thereon; a semi-transmission reflection plate configured to reflect a portion of a reference pattern image that has passed through the first reference pattern; a second diaphragm which is positioned on an optical path of the imaging optical system, on which the portion of the reference pattern image reflected by the semi-transmission reflection plate is projected, and which has a second reference pattern of a line-and-space pattern formed thereon; and a first time delay integration sensor (TDI sensor) configured to receive the portion of the reference pattern image that has passed through the second reference pattern.

公开(公告)号：US20160370300A1

公开(公告)日：2016-12-22

申请号：US15180222

申请日：2016-06-13

Applicant: NuFlare Technology, Inc.

Inventor： Riki OGAWA ,  Nobutaka Kikuiri ,  Hideaki Hashimoto

IPC: G01N21/88 ,  G01N21/956

CPC classification number: G01N21/8851 ,  G01N21/8806 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8848 ,  G01N2021/8887 ,  G01N2021/95676 ,  G03F1/84

Abstract: An inspection object is supported by a table. Light is emitted from a light source to illuminate the inspection object. An optical unit illuminates the inspection object with light, wherein the light is transmitted through the inspection object. Another optical unit illuminates the inspection object with light, wherein the light is reflected by the inspection object. Light transmitted through the inspection object is incident to a first sensor. Light reflected by the inspection object is incident to a second sensor. A defect of a pattern of the inspection object is detected using optical image data output from at least one of the sensors. A line width error is obtained by comparing line widths obtained from design data and optical image data of the pattern. A polarized beam splitter is disposed, movable between the inspection object and the first sensor, and between the inspection object and the second sensor.

Abstract translation: 检查对象由表支持。 光从光源发射以照射检查对象。 光学单元用光照射检查对象，其中光被透过检查对象。 另一个光学单元用光照射检查对象，其中光被检查对象反射。 透过检查对象的光入射到第一传感器。 由检查对象反射的光入射到第二传感器。 使用从至少一个传感器输出的光学图像数据检测检查对象的图案的缺陷。 通过比较从设计数据获得的线宽和图案的光学图像数据获得线宽误差。 偏振分束器设置在检查对象和第一传感器之间以及检查对象和第二传感器之间。

公开(公告)号：US20150332452A1

公开(公告)日：2015-11-19

申请号：US14710779

申请日：2015-05-13

Applicant: NuFlare Technology, Inc.

Inventor： Hideo TSUCHIYA ,  Riki OGAWA

IPC: G06T7/00 ,  G01N21/95 ,  G06T3/60

CPC classification number: G01N21/956 ,  G01N21/9501 ,  G06T3/60 ,  G06T7/0004 ,  G06T7/0008 ,  G06T2200/24 ,  G06T2207/10004 ,  G06T2207/10056 ,  G06T2207/10148 ,  G06T2207/30144 ,  G06T2207/30148 ,  G06T2207/30204

Abstract: A substrate to be inspected includes a first pattern constructed with a repetitive pattern that is not resolved by a wavelength of a light source, and at least one alignment mark that is arranged on the same plane as the first pattern. The alignment mark includes a second pattern constructed with a repetitive pattern that is not resolved by the wavelength of the light source, and a programmed defect that is provided in the second pattern and not resolved by the wavelength of the light source. A focus offset is adjusted such that the strongest signal of the programmed defect is obtained with respect to a base value of a gradation value in an optical image of the programmed defect by capturing the optical image while changing a focal distance between the surface in which the first pattern is provided and an optical system.

Abstract translation: 待检查的基板包括由不由光源的波长分辨的重复图案构成的第一图案和布置在与第一图案相同的平面上的至少一个对准标记。 对准标记包括由不由光源的波长分辨的重复图案构成的第二图案，以及设置在第二图案中并且不被光源的波长分辨的编程缺陷。 调整对焦偏移，使得通过拍摄光学图像而相对于编程缺陷的光学图像中的灰度值的基值获得编程缺陷的最强信号，同时改变表面之间的焦距， 提供第一图案和光学系统。

公开(公告)号：US20150219568A1

公开(公告)日：2015-08-06

申请号：US14607737

申请日：2015-01-28

Applicant: NuFlare Technology, Inc.

Inventor： Toshiaki OTAKI ,  Riki OGAWA

IPC: G01N21/88 ,  G02B26/06 ,  G01N21/956 ,  G02B3/06 ,  F21V14/08 ,  F21V13/02 ,  G02B3/00

CPC classification number: G01N21/8806 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/95676 ,  G01N2201/06113 ,  G01N2201/0638 ,  G02B5/1871 ,  G02B26/06 ,  G02B26/0808 ,  G02B27/48

Abstract: An illumination apparatus according to embodiments includes: a light source generating laser light; a rotational phase plate having a plurality of randomly arranged stepped regions, the rotational phase plate transmitting the laser light to give a phase change to the laser light; and an integrator including a plurality of lenses arranged in an array, the laser light transmitted through the rotational phase plate being incident on the integrator, an allowable angle of incidence for the laser light of the lenses being set at a maximum value of or larger than an angle of diffraction of a first order of the laser light at the rotational phase plate.

Abstract translation: 根据实施例的照明装置包括：产生激光的光源; 旋转相位板，具有多个随机布置的台阶区域，旋转相位板传输激光以对激光进行相位变化; 以及包括以阵列布置的多个透镜的积分器，透过旋转相位板的激光入射到积分器上，将透镜的激光的允许入射角设定为最大值或大于 在旋转相位板处的激光的一阶的衍射角。