公开(公告)号：US11189459B2

公开(公告)日：2021-11-30

申请号：US16886872

申请日：2020-05-29

Applicant: NuFlare Technology, Inc.

Inventor： Hideaki Hashimoto ,  Riki Ogawa

IPC: H01J37/28 ,  H01J37/065 ,  H01J37/063

Abstract: A pattern inspection apparatus according to an aspect described herein includes: a stage on which an object to be inspected is capable to be mounted, a multibeam column that irradiates the object to be inspected with multi-primary electron beams, and a multi-detector including a first detection pixel that receives irradiation of a first secondary electron beam emitted after a first beam scanning region of the object to be inspected is irradiated with a first primary electron beam of the multi-primary electron beams and a second detection pixel that receives irradiation of a second secondary electron beam emitted after a second beam scanning region adjacent to the first beam scanning region of the object to be inspected and overlapping with the first beam scanning region is irradiated with a second primary electron beam adjacent to the first primary electron beam of the multi-primary electron beams; a comparison unit that obtains a difference in beam intensity between the first primary electron beam and the second primary electron beam by comparing overlapping portions of a first frame image acquired through entering of the first secondary electron beam into the first detection pixel and a second frame image acquired through entering of the second secondary electron beam into the second detection pixel; and a sensitivity adjustor that adjusts detection sensitivity of the first detection pixel and/or the second detection pixel so as to correct the difference in beam intensity.

公开(公告)号：US11004193B2

公开(公告)日：2021-05-11

申请号：US16237770

申请日：2019-01-02

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi Hirano ,  Hideo Tsuchiya ,  Masataka Shiratsuchi ,  Hideaki Hashimoto ,  Riki Ogawa

IPC: G06T7/00 ,  G01N21/956 ,  G03F7/20 ,  G01N21/88

Abstract: There is provided an inspection method including acquiring an inspection image by irradiating a sample with a plurality of electron beams and by simultaneously scanning the sample by the electron beams, performing first correction of a reference image corresponding to the inspection image or second correction of the inspection image based on a plurality of distortions of each of the electron beams and on a position scanned by each of the electron beams in the inspection image, and performing first comparison of the reference image subjected to the first correction with the inspection image or second comparison of the reference image with the inspection image subjected to the second correction.

公开(公告)号：US20190277782A1

公开(公告)日：2019-09-12

申请号：US16292466

申请日：2019-03-05

Applicant: NuFlare Technology, Inc.

Inventor： Hideo TSUCHIYA ,  Masataka Shiratsuchi ,  Ryoichi Hirano ,  Hideaki Hashimoto ,  Riki Ogawa

IPC: G01N23/2251 ,  G01N23/2206

Abstract: An electron beam inspection apparatus includes an acquisition processing circuitry to acquire surface material information presenting a surface material of the substrate and a value of an acceleration voltage of an electron beam; a sequence determination processing circuitry to determine a scan sequence of a plurality of stripe regions on the basis of the surface material of the substrate and the value of the acceleration voltage, the plurality of stripe regions obtained by virtually dividing an inspection region of the substrate in a stripe shape; a secondary electron image acquisition mechanism including a detector for detecting a secondary electron and configured to scan the plurality of stripe regions of the substrate according to a determined scan sequence and to acquire a secondary electron image of the substrate; and a comparison processing circuitry to compare the secondary electron image with a corresponding reference image.

公开(公告)号：US09575010B2

公开(公告)日：2017-02-21

申请号：US15180222

申请日：2016-06-13

Applicant: NuFlare Technology, Inc.

Inventor： Riki Ogawa ,  Nobutaka Kikuiri ,  Hideaki Hashimoto

IPC: G01N21/88 ,  G01N21/956

CPC classification number: G01N21/8851 ,  G01N21/8806 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8848 ,  G01N2021/8887 ,  G01N2021/95676 ,  G03F1/84

Abstract: An inspection object is supported by a table. Light is emitted from a light source to illuminate the inspection object. An optical unit illuminates the inspection object with light, wherein the light is transmitted through the inspection object. Another optical unit illuminates the inspection object with light, wherein the light is reflected by the inspection object. Light transmitted through the inspection object is incident to a first sensor. Light reflected by the inspection object is incident to a second sensor. A defect of a pattern of the inspection object is detected using optical image data output from at least one of the sensors. A line width error is obtained by comparing line widths obtained from design data and optical image data of the pattern. A polarized beam splitter is disposed, movable between the inspection object and the first sensor, and between the inspection object and the second sensor.

Abstract translation: 检查对象由表支持。 光从光源发射以照射检查对象。 光学单元用光照射检查对象，其中光被透过检查对象。 另一个光学单元用光照射检查对象，其中光被检查对象反射。 透过检查对象的光入射到第一传感器。 由检查对象反射的光入射到第二传感器。 使用从至少一个传感器输出的光学图像数据检测检查对象的图案的缺陷。 通过比较从设计数据获得的线宽和图案的光学图像数据获得线宽误差。 偏振分束器设置在检查对象和第一传感器之间以及检查对象和第二传感器之间。

公开(公告)号：US10984525B2

公开(公告)日：2021-04-20

申请号：US16271909

申请日：2019-02-11

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi Hirano ,  Hideo Tsuchiya ,  Masataka Shiratsuchi ,  Hideaki Hashimoto ,  Riki Ogawa

IPC: G06T7/00 ,  G01N21/956 ,  G06T5/50

Abstract: Provided is a pattern inspection method including: irradiating a substrate with an electron beam, a pattern being formed on the substrate; acquiring an inspection image as a secondary electron image of the pattern; setting a pixel value equal to or less than a first threshold value minus a half of a predetermined detection width of the inspection image and a pixel value equal to or more than the first threshold value plus a half of the predetermined detection width of the inspection image to unprocessed; acquiring a difference image between the inspection image having the pixel value having less than the first threshold value minus the half of the predetermined detection width and the pixel value having more of the first threshold value plus the half of the predetermined detection width being set to unprocessed and a reference image of the inspection image; and performing inspection on the basis of the difference image.

公开(公告)号：US09646374B2

公开(公告)日：2017-05-09

申请号：US15051744

申请日：2016-02-24

Applicant: NuFlare Technology, Inc.

Inventor： Hideaki Hashimoto ,  Hideki Nukada ,  Kazuhiko Inoue

IPC: G06K9/00 ,  G06T7/00

CPC classification number: G06T7/001 ,  G06T2207/30148

Abstract: Optical image data is acquired by irradiating a pattern with light emitted from a light source. A threshold value is specified by internally dividing a minimum value and a maximum value of a signal amount of reference image data by a division ratio. A position corresponding to a signal amount of a threshold value is determined as an edge of a pattern of the reference image data. A position of a signal amount equal to the threshold value is determined as an edge of the pattern of the optical image data. A line width error is obtained as a difference between a first line width of the optical image data and a second line width of the reference image data. A new threshold value is specified in the case of fluctuation of a light quantity of the light source or decrease of a contrast value of the optical image data.

公开(公告)号：US20160370300A1

公开(公告)日：2016-12-22

申请号：US15180222

申请日：2016-06-13

Applicant: NuFlare Technology, Inc.

Inventor： Riki OGAWA ,  Nobutaka Kikuiri ,  Hideaki Hashimoto

IPC: G01N21/88 ,  G01N21/956

CPC classification number: G01N21/8851 ,  G01N21/8806 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8848 ,  G01N2021/8887 ,  G01N2021/95676 ,  G03F1/84

Abstract: An inspection object is supported by a table. Light is emitted from a light source to illuminate the inspection object. An optical unit illuminates the inspection object with light, wherein the light is transmitted through the inspection object. Another optical unit illuminates the inspection object with light, wherein the light is reflected by the inspection object. Light transmitted through the inspection object is incident to a first sensor. Light reflected by the inspection object is incident to a second sensor. A defect of a pattern of the inspection object is detected using optical image data output from at least one of the sensors. A line width error is obtained by comparing line widths obtained from design data and optical image data of the pattern. A polarized beam splitter is disposed, movable between the inspection object and the first sensor, and between the inspection object and the second sensor.

Abstract translation: 检查对象由表支持。 光从光源发射以照射检查对象。 光学单元用光照射检查对象，其中光被透过检查对象。 另一个光学单元用光照射检查对象，其中光被检查对象反射。 透过检查对象的光入射到第一传感器。 由检查对象反射的光入射到第二传感器。 使用从至少一个传感器输出的光学图像数据检测检查对象的图案的缺陷。 通过比较从设计数据获得的线宽和图案的光学图像数据获得线宽误差。 偏振分束器设置在检查对象和第一传感器之间以及检查对象和第二传感器之间。

公开(公告)号：US09196033B2

公开(公告)日：2015-11-24

申请号：US14278212

申请日：2014-05-15

Applicant: NuFlare Technology, Inc.

Inventor： Hideaki Hashimoto ,  Nobutaka Kikuiri

IPC: G06K9/00 ,  G06T7/00

CPC classification number: G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: An inspection sensitivity evaluation method includes generating a reference design image where plural figure patterns are arranged, based on reference design data, generating plural position shift design images whose positional deviation amounts are mutually different such that positions of the plural figure patterns in the reference design image are uniformly shifted, acquiring an optical image of a photo mask fabricated based on the reference design data where there is no positional deviation from the plural figure patterns, calculating a first positional deviation amount between the reference design image and the optical image, calculating plural second positional deviation amounts each of which is a respective positional deviation amount between a corresponding position shift design image of the plural position shift design images and the optical image, and acquiring a detectable positional deviation amount by using the first and the plural second positional deviation amounts.

Abstract translation: 检查灵敏度评价方法包括基于参考设计数据生成多个图案的参考设计图像，生成多个位置偏移量相互不同的位置偏移设计图像，使得参考设计图像中的多个图形的位置 获取基于与多个图形图案没有位置偏差的参考设计数据制造的光掩模的光学图像，计算参考设计图像和光学图像之间的第一位置偏差量，计算多个秒 每个位置偏差量是多个位置偏移设计图像的对应位置偏移设计图像和光学图像之间的相应位置偏差量，并且通过使用第一和第二位置偏差量来获取可检测位置偏差量。

公开(公告)号：US09021406B2

公开(公告)日：2015-04-28

申请号：US14249843

申请日：2014-04-10

Applicant: NuFlare Technology, Inc.

Inventor： Hideaki Hashimoto

IPC: G06F17/50 ,  H01L21/027

CPC classification number: G06F17/5081 ,  G01N21/956 ,  G03F7/70625 ,  H01L21/027 ,  H01L22/12

Abstract: In accordance with one aspect of this invention, a pattern inspection method includes acquiring optical images regarding figure patterns arranged in each of frame regions, for each of the plurality of frame regions; measuring linewidth dimensions of the figure patterns, for each of the frame regions; operating an average value of each linewidth dimension shift between linewidth dimensions of figure patterns in a reference image corresponding to the frame region concerned and the linewidth dimensions of the figure patterns in the optical image, for each of the frame regions; extracting a specific frame from the frame regions by comparing the average value of the frame region concerned, with average values of frame regions around the frame region concerned, for each of the frame regions; and inspecting the specific frame for dimensional defects of linewidth dimensions.

Abstract translation: 根据本发明的一个方面，一种图案检查方法包括：针对多个帧区域中的每一个，获取关于布置在每个帧区域中的图形图案的光学图像; 测量每个框架区域的图形图形的线宽尺寸; 对于每个帧区域，操作与对应于相关帧区域的参考图像中的图形的线宽尺寸和光学图像中的图形图形的线宽尺寸之间的每个线宽尺寸偏移的平均值; 对于每个帧区域，通过将相关帧区域的平均值与相关帧区域周围的帧区域的平均值进行比较，从帧区域中提取特定帧; 并检查线宽尺寸的尺寸缺陷的具体框架。

公开(公告)号：US20190369035A1

公开(公告)日：2019-12-05

申请号：US16415077

申请日：2019-05-17

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Hideo Tsuchiya ,  Masataka Shiratsuchi ,  Ryoichi Hirano ,  Hideaki Hashimoto ,  Riki Ogawa

IPC: G01N23/2251 ,  H01J37/22 ,  H01J37/20 ,  H01J37/147

Abstract: An electron beam inspection apparatus according to an embodiment includes a stage holding a substrate with a pattern; an electron beam column irradiating the substrate with multiple beams including a plurality of electron beams such that adjacent regions irradiated with the electron beams have an overlap portion therebetween; a first image storage unit storing a first inspection image acquired by irradiating a first inspection region of the substrate with the multiple beams; a second image storage unit storing a second inspection image acquired by irradiating a second inspection region of the substrate with the multiple beams; a correction coefficient storage unit storing a correction coefficient for correcting an image of the overlap portion; an image correction unit correcting an image of the overlap portion using the correction coefficient; and a comparison unit comparing the first inspection image with the second inspection image.