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公开(公告)号：US10849996B2
公开(公告)日：2020-12-01
申请号：US15982531
申请日：2018-05-17
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim S. Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska , Igor Agafonov
Abstract: Ultraviolet radiation is directed within an area. Items located within the area and/or one or more conditions of the area are monitored over a period of time. Based on the monitoring, ultraviolet radiation sources are controlled by adjusting a direction, an intensity, a pattern, and/or a spectral power of the ultraviolet radiation generated by the ultraviolet radiation source. Adjustments to the ultraviolet radiation source(s) can correspond to one of a plurality of selectable operating configurations including a storage life preservation operating configuration, a disinfection operating configuration, and an ethylene decomposition operating configuration.
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公开(公告)号：US10090210B2
公开(公告)日：2018-10-02
申请号：US15283459
申请日：2016-10-03
Applicant: Sensor Electronic Technology, Inc.
Inventor： Maxim S. Shatalov , Mikhail Gaevski , Igor Agafonov , Robert M. Kennedy , Alexander Dobrinsky , Michael Shur , Emmanuel Lakios
IPC: H01L21/687 , H01L21/66 , H01L21/67 , H01L21/302 , H01L21/02 , H01L29/06 , C23C16/458 , C23C16/46
Abstract: A metal-organic chemical vapor deposition (MOCVD) growth with temperature controlled layer is described. A substrate or susceptor can have a temperature controlled layer formed thereon to adjust the temperature uniformity of a MOCVD growth process used to epitaxially grow semiconductor layers. In one embodiment, the substrate and/or the susceptor can be profiled with a shape that improves temperature uniformity during the MOCVD growth process. The profiled shape can be formed with material that provides a desired temperature distribution to the substrate that is in accordance with a predetermined temperature profile for the substrate for a particular MOCVD process.
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公开(公告)号：US20180093002A1
公开(公告)日：2018-04-05
申请号：US15830274
申请日：2017-12-04
Applicant: Sensor Electronic Technology, Inc.
Inventor： Igor Agafonov , Alexander Dobrinsky , Michael Shur , Remigijus Gaska , Saulius Smetona
Abstract: A solution for disinfecting an area using ultraviolet radiation is provided. The solution can include an enclosure including at least one ultraviolet transparent window and a set of ultraviolet radiation sources located adjacent to the at least one ultraviolet transparent window. The set of ultraviolet radiation sources can be configured to generate ultraviolet radiation directed through the at least one ultraviolet transparent window. An input unit can be located on the enclosure and configured to generate an electrical signal in response to pressure applied to the enclosure. A control unit can be configured to manage the ultraviolet radiation by monitoring the electrical signal generated by the input unit and controlling, based on the monitoring, the ultraviolet radiation generated by the set of ultraviolet radiation sources.
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公开(公告)号：US20170100495A1
公开(公告)日：2017-04-13
申请号：US15388394
申请日：2016-12-22
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim S. Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska , Igor Agafonov
CPC classification number: A61L2/10 , A61L2202/14 , A61L2202/21 , F25D17/042 , F25D2317/0417 , G01G19/52 , G01N27/121 , H04N5/332 , H04N7/183
Abstract: Ultraviolet radiation is directed within an area. Items located within the area and/or one or more conditions of the area are monitored over a period of time. Based on the monitoring, ultraviolet radiation sources are controlled by adjusting a direction, an intensity, a pattern, and/or a spectral power of the ultraviolet radiation generated by the ultraviolet radiation source. Adjustments to the ultraviolet radiation source(s) can correspond to one of a plurality of selectable operating configurations including a storage life preservation operating configuration, a disinfection operating configuration, and an ethylene decomposition operating configuration.
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公开(公告)号：US09404182B2
公开(公告)日：2016-08-02
申请号：US14804401
申请日：2015-07-21
Applicant: Sensor Electronic Technology, Inc.
Inventor： Igor Agafonov , Michael Shur , Alexander Dobrinsky
IPC: H01L21/00 , C23C16/455 , C23C16/458 , C23C16/52 , H01L21/02 , H01L21/66
CPC classification number: C23C16/45565 , C23C16/45563 , C23C16/4584 , C23C16/52 , H01L21/0254 , H01L21/0262 , H01L22/12 , H01L22/26
Abstract: A solution for manufacturing semiconductors is provided. An embodiment provides a chemical vapor deposition reactor, which includes a chemical vapor deposition chamber. A substrate holder located in the chemical vapor deposition chamber can be rotated about its own axis at a first angular speed, and a gas injection component located in the chemical vapor deposition chamber can be rotated about an axis of the gas injection component at a second angular speed. The angular speeds are independently selectable and can be configured to cause each point on a surface of a substrate wafer to travel in an epicyclical trajectory within a gas flow injected by the gas injection component. An angle between the substrate holder axis and the gas injection component axis and/or a distance between the substrate holder axis and the gas injection component axis can be controlled variables.
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Patent Agency Ranking
公开(公告)号：US20150337442A1
公开(公告)日：2015-11-26
申请号：US14804401
申请日：2015-07-21
Applicant: SENSOR ELECTRONIC TECHNOLOGY, INC.
Inventor： Igor Agafonov , Jinwei Yang , Michael Shur , Remigijus Gaska , Alexander Dobrinsky
IPC: C23C16/455 , C23C16/458 , H01L21/02 , C23C16/52
CPC classification number: C23C16/45565 , C23C16/45563 , C23C16/4584 , C23C16/52 , H01L21/0254 , H01L21/0262 , H01L22/12 , H01L22/26
Abstract: A solution for manufacturing semiconductors is provided. An embodiment provides a chemical vapor deposition reactor, which includes a chemical vapor deposition chamber. A substrate holder located in the chemical vapor deposition chamber can be rotated about its own axis at a first angular speed, and a gas injection component located in the chemical vapor deposition chamber can be rotated about an axis of the gas injection component at a second angular speed. The angular speeds are independently selectable and can be configured to cause each point on a surface of a substrate wafer to travel in an epicyclical trajectory within a gas flow injected by the gas injection component. An angle between the substrate holder axis and the gas injection component axis and/or a distance between the substrate holder axis and the gas injection component axis can be controlled variables.
Abstract translation: 提供制造半导体的解决方案。 实施例提供了一种化学气相沉积反应器，其包括化学气相沉积室。 位于化学气相沉积室中的衬底保持器可以以其第一角速度围绕其自身的轴线旋转，并且位于化学气相沉积室中的气体注入组件可以围绕气体注入部件的轴线以第二角度 速度。 角速度是可独立选择的，并且可以被配置成使得衬底晶片的表面上的每个点在由气体注入部件注入的气流中的行星轨迹中行进。 衬底保持器轴线和气体注入部件轴线之间的角度和/或衬底保持器轴线和气体注入部件轴线之间的距离可以是受控变量。
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公开(公告)号：US20150238645A1
公开(公告)日：2015-08-27
申请号：US14630692
申请日：2015-02-25
Applicant: Sensor Electronic Technology, Inc.
Inventor： Igor Agafonov , Alexander Dobrinsky , Michael Shur , Remigijus Gaska , Saulius Smetona
Abstract: A solution for disinfecting an area using ultraviolet radiation is provided. The solution can include an enclosure including at least one ultraviolet transparent window and a set of ultraviolet radiation sources located adjacent to the at least one ultraviolet transparent window. The set of ultraviolet radiation sources can be configured to generate ultraviolet radiation directed through the at least one ultraviolet transparent window. An input unit can be located on the enclosure and configured to generate an electrical signal in response to pressure applied to the enclosure. A control unit can be configured to manage the ultraviolet radiation by monitoring the electrical signal generated by the input unit and controlling, based on the monitoring, the ultraviolet radiation generated by the set of ultraviolet radiation sources.
Abstract translation: 提供了一种使用紫外线辐射消毒区域的方案。 该解决方案可以包括包括至少一个紫外线透明窗口和位于该至少一个紫外线透明窗口附近的一组紫外线辐射源的外壳。 紫外线辐射源组可被配置成产生穿过至少一个紫外线透明窗口的紫外线辐射。 输入单元可以位于机箱上并被配置为响应于施加到外壳的压力而产生电信号。 控制单元可以被配置为通过监视由输入单元产生的电信号来控制紫外线辐射，并且基于该监视来控制由该组紫外线辐射源产生的紫外线辐射。
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公开(公告)号：US10787375B2
公开(公告)日：2020-09-29
申请号：US16176362
申请日：2018-10-31
Applicant: Sensor Electronic Technology, Inc.
Inventor： Saulius Smetona , Timothy James Bettles , Igor Agafonov , Ignas Gaska , Alexander Dobrinsky , Maxim S Shatalov , Arthur Peter Barber, III
Abstract: A solution for treating a fluid, such as water, is provided. An ultraviolet transparency of a fluid can be determined before or as the fluid enters a disinfection chamber. In the disinfection chamber, the fluid can be irradiated by ultraviolet radiation to harm microorganisms that may be present in the fluid. One or more attributes of the disinfection chamber, fluid flow, and/or ultraviolet radiation can be adjusted based on the transparency to provide more efficient irradiation and/or higher disinfection rates. In addition, various attributes of the disinfection chamber, such as the position of the inlet(s) and outlet(s), the shape of the disinfection chamber, and other attributes of the disinfection chamber can be utilized to create a turbulent flow of the fluid within the disinfection chamber to promote mixing and improve uniform ultraviolet exposure.
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公开(公告)号：US10745295B2
公开(公告)日：2020-08-18
申请号：US16052980
申请日：2018-08-02
Applicant: Sensor Electronic Technology, Inc.
Inventor： Saulius Smetona , Timothy James Bettles , Igor Agafonov , Ignas Gaska , Alexander Dobrinsky , Michael Shur , Remigijus Gaska
Abstract: A solution for treating a fluid, such as water, is provided. An ultraviolet transparency of a fluid can be determined before or as the fluid enters a disinfection chamber. In the disinfection chamber, the fluid can be irradiated by ultraviolet radiation to harm microorganisms that may be present in the fluid. One or more attributes of the disinfection chamber, fluid flow, and/or ultraviolet radiation can be adjusted based on the transparency to provide more efficient irradiation and/or higher disinfection rates. In addition, various attributes of the disinfection chamber, such as the position of the inlet(s) and outlet(s), the shape of the disinfection chamber, and other attributes of the disinfection chamber can be utilized to create a turbulent flow of the fluid within the disinfection chamber to promote mixing and improve uniform ultraviolet exposure.
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公开(公告)号：US20180346349A1
公开(公告)日：2018-12-06
申请号：US16052980
申请日：2018-08-02
Applicant: Sensor Electronic Technology, Inc.
Inventor： Saulius Smetona , Timothy James Bettles , Igor Agafonov , Ignas Gaska , Alexander Dobrinsky , Michael Shur , Remigijus Gaska
CPC classification number: C02F1/325 , C02F1/001 , C02F1/008 , C02F2201/3222 , C02F2201/3226 , C02F2201/3227 , C02F2201/3228 , C02F2201/326 , C02F2201/328 , C02F2209/001 , C02F2209/005 , C02F2209/05 , C02F2209/11 , C02F2209/40 , C02F2301/026 , C02F2303/04
Abstract: A solution for treating a fluid, such as water, is provided. An ultraviolet transparency of a fluid can be determined before or as the fluid enters a disinfection chamber. In the disinfection chamber, the fluid can be irradiated by ultraviolet radiation to harm microorganisms that may be present in the fluid. One or more attributes of the disinfection chamber, fluid flow, and/or ultraviolet radiation can be adjusted based on the transparency to provide more efficient irradiation and/or higher disinfection rates. In addition, various attributes of the disinfection chamber, such as the position of the inlet(s) and outlet(s), the shape of the disinfection chamber, and other attributes of the disinfection chamber can be utilized to create a turbulent flow of the fluid within the disinfection chamber to promote mixing and improve uniform ultraviolet exposure.
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