公开(公告)号：US20070034600A1

公开(公告)日：2007-02-15

申请号：US11535889

申请日：2006-09-27

Applicant: C. Willson ,  Britain Smith ,  Nicholas Stacey

Inventor： C. Willson ,  Britain Smith ,  Nicholas Stacey

IPC: B44C1/22

CPC classification number: B29C43/003 ,  B29C2043/025 ,  B81C99/0085 ,  B81C2201/0152 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0955

Abstract: The present invention includes a method for forming a pattern on a substrate with a composition by forming a cross-linked polymer from the composition upon exposing the same to radiation. The method includes depositing the composition to function as a planarization layer. Thereafter, a layer of polymerizable material into which a pattern is to be recorded is deposited.

Abstract translation: 本发明包括通过在将组合物暴露于辐射时从组合物形成交联聚合物而在组合物上形成图案的方法。 该方法包括沉积作为平坦化层的组合物。 此后，沉积要记录图案的可聚合材料层。

公开(公告)号：US07176047B2

公开(公告)日：2007-02-13

申请号：US10769346

申请日：2004-01-30

Applicant: Ming-Chih Chang ,  H Shu Wu ,  Tsang-Mu Lai

Inventor： Ming-Chih Chang ,  H Shu Wu ,  Tsang-Mu Lai

IPC: H01L21/00

CPC classification number: B81C99/0085 ,  B81C2201/0108 ,  B81C2201/0133 ,  B81C2201/0152

Abstract: A method for forming a free standing micro-structural member including providing a substrate; blanket depositing a first sacrificial resist layer over the substrate; exposing and developing the first sacrificial resist layer to form a first resist portion; subjecting the first resist portion to at least a hard bake process to form the first resist portion having a predetermined first smaller volume compared to a desired final resist portion volume; blanket depositing at least a second sacrificial resist layer followed by exposure, development and the at least a hard bake process to form the final resist portion volume; and, depositing at least one structural material layer over the final resist portion.

Abstract translation: 一种形成独立式微结构构件的方法，包括提供基底; 在衬底上铺设第一牺牲抗蚀剂层; 曝光和显影第一牺牲抗蚀剂层以形成第一抗蚀剂部分; 使所述第一抗蚀剂部分至少进行硬烘烤处理，以形成具有预定的第一较小体积的第一抗蚀剂部分，与期望的最终抗蚀剂部分体积相比; 毯毯沉积至少第二牺牲抗蚀剂层，随后曝光，显影和至少硬烘烤工艺以形成最终的抗蚀剂部分体积; 并且在最终抗蚀剂部分上沉积至少一个结构材料层。

公开(公告)号：US20040112862A1

公开(公告)日：2004-06-17

申请号：US10318319

申请日：2002-12-12

Applicant: MOLECULAR IMPRINTS, INC.

Inventor： C. Grant Willson ,  Britain J. Smith ,  Nicholas A. Stacey

IPC: C23F001/00

CPC classification number: B29C43/003 ,  B29C2043/025 ,  B81C99/0085 ,  B81C2201/0152 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0955

Abstract: The present invention includes a composition and a method for forming a pattern on a substrate with the composition by forming a cross-linked polymer from the composition upon exposing the same to radiation. To that end, in one embodiment of the present invention the composition includes a non-silicon-containing acrylate component, and an initiator component combined with said non-silicon-containing acrylate to provide a viscosity no greater than 5 cps. The initiator component is responsive to radiation to initiate a free radical reaction and cause the non-silicon containing acrylate component to polymerize and cross-link. One embodiment of the non-silicon-containing acrylate component includes ethylene glycol diacrylate. The method includes depositing the composition to function as a planarization layer. Thereafter, a layer of polymerizable material into which a pattern is to be recorded is deposited.

Abstract translation: 本发明包括通过在将组合物暴露于辐射时从组合物形成交联聚合物而在组合物上形成图案的组合物和方法。 为此，在本发明的一个实施方案中，组合物包含非含硅丙烯酸酯组分和与所述非含硅丙烯酸酯组合的引发剂组分，以提供不大于5cps的粘度。 引发剂组分响应辐射以引发自由基反应，并使非含硅丙烯酸酯组分聚合和交联。 非含硅丙烯酸酯组分的一个实施方案包括乙二醇二丙烯酸酯。 该方法包括沉积作为平坦化层的组合物。 此后，沉积要记录图案的可聚合材料层。

公开(公告)号：US20170144152A1

公开(公告)日：2017-05-25

申请号：US15380954

申请日：2016-12-15

Applicant: The Regents of the University of California

Inventor： Michelle Khine ,  Chi-Shuo Chen ,  Anthony Grimes ,  David Nate Breslauer ,  Luke Lee ,  Michael Dunlap ,  Ajay Gopinathan ,  Sayantani Ghosh

IPC: B01L3/00 ,  G03F7/00 ,  B01F13/00 ,  B01F5/06 ,  B81B1/00 ,  B81C1/00

CPC classification number: B01L3/502707 ,  B01F5/0057 ,  B01F5/0646 ,  B01F5/0647 ,  B01F13/0059 ,  B01F2215/0037 ,  B01L2200/12 ,  B01L2300/0816 ,  B01L2300/0867 ,  B01L2300/0887 ,  B81B1/002 ,  B81B2201/051 ,  B81B2201/058 ,  B81B2203/0338 ,  B81C1/00071 ,  B81C2201/0152 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/02269 ,  H01L21/02271

Abstract: A method is provided to prepare one or more microfluidic channels on a receptive material by applying an image-forming material to a heat sensitive thermoplastic receptive material in a designed pattern and heating the material under conditions that reduce the size of the thermoplastic receptive material by at least about 60%. In an alternative aspect, the microfluidic channels on receptive material are prepared by etching a designed pattern into a heat sensitive thermoplastic material support and then heating the material under conditions that reduce the size of the thermoplastic receptive material by at least about 60%.

公开(公告)号：US09362126B2

公开(公告)日：2016-06-07

申请号：US13625400

申请日：2012-09-24

Applicant: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH

Inventor： Ramakrishnan Ganesan ,  Jarrett Dumond ,  M. S. M. Saifullah ,  Su Hui Lim ,  Hazrat Hussain ,  Hong Yee Low

IPC: G03F7/00 ,  H01L21/283 ,  C23C18/04 ,  C23C18/06 ,  C23C18/12 ,  B81C1/00 ,  B82Y40/00 ,  G03F7/004 ,  G03F7/027 ,  B82Y10/00 ,  H01L29/06

CPC classification number: H01L21/283 ,  B81C1/0046 ,  B81C2201/0152 ,  B82Y10/00 ,  B82Y40/00 ,  C23C18/04 ,  C23C18/06 ,  C23C18/1216 ,  G03F7/0002 ,  G03F7/0043 ,  G03F7/027 ,  H01L29/0676

Abstract: There is provided a process for making a patterned metal oxide structure comprising the step of heating an imprint structure comprising a polymerized organometallic compound to remove organic material and thereby form the patterned metal oxide structure, wherein the imprint structure is formed by polymerizing a resist mixture comprising at least one olefinic polymerizable compound and a polymerizable organometallic compound having, e.g., at least one carboxylate of Formula 1: wherein n is 1-12; and each R is independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, cycloakyl, cycloakenyl, aryl, and aralkyl.

Abstract translation: 提供了一种用于制造图案化金属氧化物结构的方法，其包括加热包含聚合的有机金属化合物的压印结构以除去有机材料并由此形成图案化的金属氧化物结构的步骤，其中通过聚合抗蚀剂混合物形成压印结构，所述抗蚀剂混合物包含 至少一种烯属聚合性化合物和具有例如至少一种式1羧酸酯的可聚合的有机金属化合物：其中n为1-12; 并且每个R独立地选自氢，烷基，烯基，炔基，环烷基，环辛基，芳基和芳烷基。

公开(公告)号：US07690912B2

公开(公告)日：2010-04-06

申请号：US11364631

申请日：2006-02-27

Applicant: Toshinobu Tokita ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi ,  Takashi Nakamura

Inventor： Toshinobu Tokita ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi ,  Takashi Nakamura

IPC: B29C33/44 ,  B29C35/08

CPC classification number: B82Y10/00 ,  B81C99/009 ,  B81C2201/0152 ,  B81C2201/036 ,  B82Y40/00 ,  G03F7/0002

Abstract: One object of the present invention is to provide a pattern transferring mold which can provide a starting area of mold release easily and certainly and a pattern transferring apparatus with the same. A pattern transferring mold is disclosed which is used in a pattern transferring apparatus that brings the mold into contact with a photo-curing resin on a substrate and cures the photo-curing resin by light irradiation to transfer a pattern formed on the mold onto the photo-curing resin. The mold comprises a bottom face which contacts the photo-curing resin, the bottom face portion including a first area in which the pattern is formed and a second area formed outside the first area. The mold has a mold-releasing shape in the second area, the mold-releasing shape providing a starting area of mold release from the cured photo-curing resin.

Abstract translation: 本发明的一个目的是提供一种图案转印模具，其可以容易且确定地提供脱模的起始区域和具有该图案转印模具的图案转印装置。 公开了一种图案转印模具，其用于使模具与基板上的光固化树脂接触的图案转印装置，并通过光照射固化光固化树脂，以将形成在模具上的图案转印到照片上 固化树脂。 模具包括与光固化树脂接触的底面，底面部分包括形成图案的第一区域和形成在第一区域外部的第二区域。 模具在第二区域具有脱模形状，脱模形状提供了从固化的光固化树脂脱模的起始区域。

公开(公告)号：US20060192320A1

公开(公告)日：2006-08-31

申请号：US11364631

申请日：2006-02-27

Applicant: Toshinobu Tokita ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi ,  Takashi Nakamura

Inventor： Toshinobu Tokita ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi ,  Takashi Nakamura

IPC: B29C59/02

CPC classification number: B82Y10/00 ,  B81C99/009 ,  B81C2201/0152 ,  B81C2201/036 ,  B82Y40/00 ,  G03F7/0002

Abstract: One object of the present invention is to provide a pattern transferring mold which can provide a starting area of mold release easily and certainly and a pattern transferring apparatus with the same. A pattern transferring mold is disclosed which is used in a pattern transferring apparatus that brings the mold into contact with a photo-curing resin on a substrate and cures the photo-curing resin by light irradiation to transfer a pattern formed on the mold onto the photo-curing resin. The mold comprises a bottom face which contacts the photo-curing resin, the bottom face portion including a first area in which the pattern is formed and a second area formed outside the first area. The mold has a mold-releasing shape in the second area, the mold-releasing shape providing a starting area of mold release from the cured photo-curing resin.

Abstract translation: 本发明的一个目的是提供一种图案转印模具，其可以容易且确定地提供脱模的起始区域和具有该图案转印模具的图案转印装置。 公开了一种图案转印模具，其用于使模具与基板上的光固化树脂接触的图案转印装置，并通过光照射固化光固化树脂，以将形成在模具上的图案转印到照片上 固化树脂。 模具包括与光固化树脂接触的底面，底面部分包括形成图案的第一区域和形成在第一区域外部的第二区域。 模具在第二区域具有脱模形状，脱模形状提供了从固化的光固化树脂脱模的起始区域。

公开(公告)号：US20040055151A1

公开(公告)日：2004-03-25

申请号：US10461825

申请日：2003-06-13

Inventor： Samuel Obi ,  Michael Gale

IPC: G02B006/00 ,  H01R043/00 ,  G02B001/00 ,  G02F001/00

CPC classification number: B81C1/0019 ,  B81B2201/047 ,  B81B2203/0118 ,  B81C2201/0152 ,  Y10T29/49117

Abstract: A method for fabricating optical MEMS (optical Micro-Electro-Mechanical Systems or Micro-Opto-Electro-Mechanical Systems (MOEMS)) is described. The basic process involves deposition and patterning of a sacrificial spacer layer and a combined moulding and photolithography step. The method described allows the fabrication of micromechanical elements incorporating micro-optical structures such as lenses (diffractive or refractive), gratings (for polarisers or resonant filters), waveguides or other micro-optical relief structures fabricated by UV-curing replication processes.

Abstract translation: 描述了制造光学MEMS（光学微机电系统或微机电系统（MOEMS））的方法。 基本过程涉及牺牲间隔层的沉积和图案化以及组合的模制和光刻步骤。 所描述的方法允许制造结合微光学结构的微机械元件，例如透镜（衍射或折射），光栅（用于偏振器或谐振滤光器），波导或通过UV固化复制工艺制造的其它微光学浮雕结构。

公开(公告)号：US06455227B1

公开(公告)日：2002-09-24

申请号：US09473655

申请日：1999-12-29

Applicant: Masaki Hara

Inventor： Masaki Hara

IPC: G03F726

CPC classification number: G03F7/2022 ,  B81C1/00126 ,  B81C2201/0108 ,  B81C2201/0152 ,  B81C2201/0197 ,  G03F7/095 ,  G03F7/11

Abstract: A multilayer resist structure is irradiated more than one time with ultraviolet rays through a photomask. Each time the structure is irradiated, ultraviolet rays of a little greater quantity of light than those used in the last irradiation are used. Also, with each exposure, a photomask which has a larger lightproof section than that used in the last irradiation is used. Next, the multilayer resist structure is developed, and the exposed area of each photoresist is removed with a developing solution. Also, in amorphous silicon layers, the areas under the removed photoresist are easily removed with the developing solution. A resist structure having desired steps is thus completed. Using the resist structure, a three-dimensional microstructure can be formed.

Abstract translation: 通过光掩模用紫外线照射多层抗蚀剂结构多次。 每次照射结构时，使用比上次照射中使用的光量稍大的紫外线。 此外，对于每次曝光，使用具有比在最后照射中使用的遮光部分更大的遮光部分的光掩模。 接下来，显影多层抗蚀剂结构体，用显影液去除各光致抗蚀剂的露出面积。 此外，在非晶硅层中，去除的光致抗蚀剂下的区域容易用显影液除去。 因此完成了具有所需步骤的抗蚀剂结构。 使用抗蚀剂结构，可以形成三维微结构。