Abstract:
Embodiments generally describe systems, devices, and methods for focusing and calibrating beam profilers. A test object is provided that may include an internal housing rotatable within an external housing. The internal housing may house a light source, a collimator, a filter, and/or a diffuser. A plate may be mounted to the internal housing and may include a plurality of markings. In some embodiments, to focus a beam profiler, the test object may be positioned adjacent the converter plate of a beam profiler. Marker images may be captured and a focus quality may be assessed therefrom. A position of the converter, objective, and/or camera of the beam profiler may be adjusted based on the focus quality. To calibrate, images of the markings in several rotational positions may be captured and used for calibration. The markings may be rotated to several positions by rotating the internal housing relative to the external housing.
Abstract:
A multi-spectral photon converting imaging apparatus and method are disclosed. A plurality of photons in a first received band and a plurality of photons in a second received band are received by a first nanoparticle photon conversion material. The first nanoparticle photon conversion material converts the plurality of photons in the first received band to a plurality of photons in a first converted band, and the plurality of photons in the second received band to a plurality of photons in a second converted band. An image sensor receives the plurality of photons in the first converted band and the plurality of photons in the second converted band, and generates a digitized image of the scene based on the plurality of photons in the first converted band and the plurality of photons in the second converted band.
Abstract:
There is described a method of determining the UV fluence received by a fluid. The method comprises the steps of: (a) irradiating the fluid at an unknown UV fluence; (b) measuring the fluorescence of a test sample of the fluid after irradiation in Step (a) to produce a test signal proportional to the concentration of a prescribed fluorescent composition of matter comprised in the test sample; and (c) determining the value of the unknown UV fluence by comparing the test signal to a calibration curve of a control signal proportional to concentration of the prescribed fluorescent composition of matter in the fluid as a function of applied UV fluence. There is also described a system for determining the UV fluence received by a fluid being treated in UV fluid treatment system comprising at least one UV source. The system comprises: (a) a radiation-transparent vessel for receiving a test sample of the fluid after irradiation of the fluid at an unknown UV fluence; (b) a fluorometer for measuring the fluorescence of the test sample received in the radiation-transparent vessel to produce a test signal proportional to the concentration of a prescribed fluorescent composition of matter comprised in the test sample; and (c) a controller configured to determine the value of the unknown UV fluence by comparing the test signal to a calibration curve of a control signal proportional to concentration of the prescribed fluorescent composition of matter in the fluid as a function of applied UV fluence.
Abstract:
An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).
Abstract:
A scintillator plate includes a substrate, a buffer layer, a scintillator layer arranged on the buffer layer, and a protective layer. The buffer layer and/or the protective layer is colored. The buffer layer and/or the protective layer include a proportion of carbonyl groups of greater than 5000 ppm.
Abstract:
A system for measuring intensity distribution of light includes a carbon nanotube array and an imaging element. The carbon nanotube array is placed in an environment of inert gas or a vacuum environment. The carbon nanotube array absorbs photons of a light source and radiates radiation light. The imaging element is used to image the radiation light. The carbon nanotube array is between the light source and the imaging element.
Abstract:
Embodiments of the present invention generally describe systems, devices, and methods for directly measuring pulse profiles during pulse delivery. In some embodiment, the pulse profiles may be measured while the pulse is delivered to ablate a material. Embodiments, may calculate ablation spot parameters based on the pulse profiles and may refine one or more subsequent laser pulses based on deviations from the calculated ablation spot parameters from desired ablation spot parameters. In some embodiments, a fluence profiler is provided. The fluence profiler may measure a pulse profile of a laser pulse from a portion of the laser pulse. The fluence profiler may utilize a UV radiation energy sensor device and a camera-based imager. The measurements from the UV radiation energy sensor device and the camera-based imager may be combined and scaled to provide a measured pulse profile that corresponds to the delivered pulse.
Abstract:
A luminescent infrared transparent sticker is disclosed herein. An example apparatus includes a substrate that is transparent with respect to light at a first wavelength and light at a second wavelength and an adhesive on a first side of the substrate, wherein the adhesive contains taggant that has luminescent properties such that when the taggant is illuminated with light at the first wavelength, it emits light at the second wavelength
Abstract:
A welding accessory and a system for detecting thermal and/or UV radiation exposure during welding operations are disclosed. The welding accessory may have a surface exposed to thermal and/or UV radiation generated by electric arc welding, a first image visible without exposure to the thermal and/or UV radiation, and a second image formed from either a UV activated dye that is visible only after exposure to UV radiation generated by the electric welding arc or a thermochromic dye that is visible only after exposure to a predetermined level of thermal radiation generated by the welding arc. A system may include either a thermal or UV exposure indicator with a first state and at least a second state, and include either a thermochromic or UV activated dye adapted to provide a reversible or persistent visual indication upon exposure to radiation. The visual indication may include any combination of symbols, logos, images, text, or other decorative or informational designs as desired.
Abstract:
A scintillator plate includes a substrate, a buffer layer, a scintillator layer arranged on the buffer layer, and a protective layer. The buffer layer and/or the protective layer is colored. A method for the production of the scintillator plate is also described.