公开(公告)号：US20200381208A1

公开(公告)日：2020-12-03

申请号：US16425094

申请日：2019-05-29

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Matthias Firnkes ,  John Breuer ,  Florian Lampersberger ,  Hanno Kaupp ,  Stefan Lanio

IPC: H01J37/285 ,  H01J37/145 ,  H01J37/317

Abstract: A charged particle beam device for inspecting a specimen is described. The charged particle beam device includes a beam source for emitting a charged particle beam, an electrode for influencing the charged particle beam, and a damping unit provided on the electrode for damping vibrations of the electrode. Further, an objective lens module with an electrode is described, wherein a damping unit is provided on the electrode. Further, an electrode device is described, wherein a mass damper is mounted on a disk-shaped electrode body of the electrode device.

公开(公告)号：US10746759B2

公开(公告)日：2020-08-18

申请号：US16296068

申请日：2019-03-07

Applicant: IMEC vzw

Inventor： Kristof Paredis ,  Claudia Fleischmann ,  Wilfried Vandervorst

IPC: G01Q10/04 ,  G01Q10/06 ,  G01Q30/20 ,  G01Q60/24 ,  H01J37/285

Abstract: The disclosed technology relates to a method and apparatus for correctly positioning a probe suitable for scanning probe microscopy (SPM). The probe is positioned relative to the apex region of a needle-shaped sample, such as a sample for atom probe tomography, in order to perform a SPM acquisition of the apex region to obtain an image of the region. In one aspect, the positioning takes place by an iterative process, starting from a position wherein one side plane of the pyramid-shaped SPM probe interacts with the sample tip. By controlled consecutive scans in two orthogonal directions, the SPM probe tip approaches and finally reaches a position wherein a tip area of the probe interacts with the sample tip's apex region.

公开(公告)号：US10522323B2

公开(公告)日：2019-12-31

申请号：US15946177

申请日：2018-04-05

Applicant: FEI Company

Inventor： Peter Christiaan Tiemeijer

IPC: H01J37/26 ,  G01N23/04 ,  H01J37/24 ,  H01J37/285

Abstract: Adjustable resolution electron energy loss spectroscopy methods and apparatus are disclosed herein. An example method includes operating an electron microscope in a first state, the first state including operating a source of the electron microscope at a first temperature, obtaining, by the electron microscope, a first EELS spectrum of a sample at a first resolution, the first resolution based on the first temperature, operating the electron microscope in a second state, the second state including operating the source of the electron microscope at a second temperature, the second temperature different than the first temperature, and obtaining, by the electron microscope, a second EELS spectrum of the sample at a second resolution, the second resolution based on the second temperature, wherein the second resolution is different than the first resolution.

公开(公告)号：US20190287757A1

公开(公告)日：2019-09-19

申请号：US16276195

申请日：2019-02-14

Applicant: HITACHI, LTD.

Inventor： Yasunari SOHDA ,  Momoyo ENYAMA ,  Megumi KIMURA ,  Koichi HAMADA

IPC: H01J37/22 ,  H01J37/285 ,  H01J37/147 ,  H01J37/28

Abstract: An electron beam device suitable for observing the bottom of a deep groove or hole with a high degree of accuracy under a large current condition includes: an electron optical system having an irradiation optical system to irradiate a first aperture with an electron beam emitted from an electron source and a reduction projection optical system to project and form an aperture image of the first aperture on a sample, detectors to detect secondary electrons emitted by irradiating the sample with the electron beam through the electron optical system. An image processing unit generates a two-dimensional image from detection signals obtained by irradiating the sample while the electron beam scans the sample two-dimensionally by scanning deflectors of the electron optical system. Further, generates a reconstructed image by deconvoluting electron beam intensity distribution information of an ideal aperture image of the first aperture from the generated two-dimensional image information.

公开(公告)号：US20190279838A1

公开(公告)日：2019-09-12

申请号：US16345520

申请日：2016-11-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Kunji SHIGETO ,  Mitsugu YAMASHITA

IPC: H01J37/22 ,  H01J37/285 ,  G06T7/73

Abstract: In the case of an in situ observation with a charged particle beam apparatus, an observer who is not an expert in the charged particle beam apparatus needs to maintain the field of view of the observation that changes from moment to moment while watching a monitor, and thus, adjustment of the field of view needs to be controllable in real time with a good operability. In order to eliminate the need for an observer to move the line of sight, a live image and a comparison image are overlapped and displayed. At this time, an interface is devised, such that overlapping of two images can be executed without giving stress to the observer. The observer presses a button on an operation screen, thereby displaying a superimposed image, which is obtained by making the comparison image matching the size of a first display area configured to display the live image translucent and superimposing the translucent comparison image on the live image, at the position of the first display area of the image display device.

公开(公告)号：US10354832B2

公开(公告)日：2019-07-16

申请号：US15616749

申请日：2017-06-07

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  John Gerling ,  Aron Welk ,  Christopher Sears ,  Felipe Fuks ,  Mehran Nasser-Ghodsi ,  Tomas Plettner

IPC: H01J37/147 ,  H01J37/14 ,  H01J37/285 ,  H01J37/18

Abstract: A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.

公开(公告)号：US20190187174A1

公开(公告)日：2019-06-20

申请号：US16221998

申请日：2018-12-17

Applicant: The Regents of the University of California

Inventor： Xiaoqing Pan ,  Thomas F. Blum ,  Mingjie Xu ,  Jake Jokisaari ,  Wilbur Bigelow

IPC: G01Q60/16 ,  H01J37/285 ,  H01J37/244 ,  H01J37/20

Abstract: The present disclosure relates to in situ transmission electron microscope (TEM) holders with improved stability and electrical sensitivity. The holders feature a front bearing seal and a rear bearing seal which allow the holders to achieve high sensitivity, high stability, large range of motion and high vacuum isolation. The bearings use a PEEK insulating disk as a pivot point for translation and tilting motion, and use O-rings to dampen vibrations, provide electrical and vacuum insulation, and to set a grabbing force between the bearing and the probe.

公开(公告)号：US20180301317A1

公开(公告)日：2018-10-18

申请号：US15769170

申请日：2016-10-20

Applicant: Technische Universiteit Eindhoven

Inventor： Otger Jan Luiten

IPC: H01J37/285 ,  H01J37/073

Abstract: In one aspect, the present invention provides a method of generating an electron beam in a transmission electron microscopy device. The method includes: generating an electron pulse [306] by a pulsed electron source [300], accelerating the electron pulse in a first resonant microwave cavity [302], passing the accelerated electron pulse through a drift space [314], and correcting the energy spread of the accelerated electron pulse in a second resonant microwave cavity [304] by operating it out of phase by 90 degrees from the first resonant cavity [302].

公开(公告)号：US10088450B2

公开(公告)日：2018-10-02

申请号：US15526231

申请日：2014-12-08

Applicant: HITACHI, LTD.

Inventor： Takeshi Nakayama ,  Masanari Koguchi

IPC: G01N27/62 ,  G01N33/20 ,  G01N1/44 ,  G01Q10/00 ,  H01J37/285

Abstract: Areas having different isotopic ratios are artificially introduced into a metal material before sintering, a heat treatment, or grain boundary diffusion, and atom probe analysis results before and after sintering, a heat treatment, or grain boundary diffusion are compared to evaluate a change in isotopic distribution over time.

公开(公告)号：US20180275079A1

公开(公告)日：2018-09-27

申请号：US15928807

申请日：2018-03-22

Applicant: Hitachi High-Tech Science Corporation

Inventor： Keiichi Tanaka ,  Kazuo Chinone

IPC: G01N23/2252 ,  H01J37/285 ,  H01J37/244

CPC classification number: G01N23/2252 ,  G01N2223/079 ,  H01J37/244 ,  H01J37/285 ,  H01J2237/063 ,  H01J2237/24507

Abstract: The radiation analyzing apparatus irradiates an object including a plurality of elements with a first radiation, detects a plurality of rays of a second radiation emitted from the object irradiated with the first radiation, derives an energy spectrum based on a signal of each of the plurality of rays of the second radiation, detects detection energy, which is energy absorbed in a reference element that is an element used as a reference or is energy emitted from the reference element, based on the energy spectrum, and corrects the energy spectrum based on reference energy information, which is previously stored in a storage unit and indicates reference energy that is energy absorbed in the reference element or is energy emitted from the reference element, and the detection energy.