公开(公告)号：US11728131B2

公开(公告)日：2023-08-15

申请号：US17553357

申请日：2021-12-16

Applicant: ASML Netherlands B.V.

Inventor： Ning Ye ,  Jun Jiang ,  Jian Zhang ,  Yixiang Wang

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/0047 ,  H01J2237/2817

Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.

公开(公告)号：US11726411B2

公开(公告)日：2023-08-15

申请号：US17625467

申请日：2020-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs Kramer ,  Ringo Petrus Cornelis Van Dorst

IPC: G03F7/20 ,  H01L21/67 ,  G03F7/00

CPC classification number: G03F7/7085 ,  H01L21/67288

Abstract: A substrate shape measuring device, including: a substrate support to support a substrate having a main surface, the main surface of the substrate when supported by the substrate support substantially extending in a first plane; one or more sensor assemblies, each including a light emitter to emit light along a light axis substantially parallel to the first plane and a light sensor arranged to receive the light; and a processing device arranged to determine a shape of the substrate, wherein the substrate shape measuring device is constructed to measure with the one or more sensor assemblies in at least a first measurement direction with respect to the substrate substantially parallel to the first plane and a second measurement direction with respect to the substrate substantially parallel to the first plane.

公开(公告)号：US20230252347A1

公开(公告)日：2023-08-10

申请号：US18015162

申请日：2021-07-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Eleftherios KOULIERAKIS ,  Carlo LANCIA ,  Juan Manuel GONZALEZ HUESCA ,  Alexander YPMA

IPC: G06N20/00 ,  G03F7/00 ,  G03F7/20

CPC classification number: G06N20/00 ,  G03F7/706841 ,  G03F7/70516 ,  G03F7/705

Abstract: Method and apparatus for adapting a distribution model of a machine learning fabric. The distribution model is for mitigating the effect of concept drift, and is configured to provide an output as input to a functional model of the machine learning fabric. The functional model is for performing a machine learning task. The method may include obtaining a first data point, and providing the first data point as input to one or more distribution monitoring components of the distribution model. The one or more distribution monitoring components have been trained on a plurality of further data points. A metric representing a correspondence between the first data point and the plurality of further data points is determined, by at least one of the one or more distribution monitoring components. Based on the error metric, the output of the distribution model is adapted.

公开(公告)号：US20230251583A1

公开(公告)日：2023-08-10

申请号：US18015155

申请日：2021-05-31

Applicant: ASML Netherlands B.V.

Inventor： Oleg Viacheslavovich VOZNYI ,  Bearrach MOEST

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/7085 ,  G03F7/70716 ,  G03F7/70558

Abstract: The present invention relates to a stage system (130), which comprises a pre-exposure element (134), and to a method employing the pre-exposure element for conditioning an optical system (100). The pre-exposure element comprises a radiation receiving area at a surface of the stage system, wherein the radiation receiving area comprises at least one pre-exposure plate configured to receive radiation. The stage system comprises further a controller (140), wherein the controller is capable to control an optical parameter of the pre-exposure element, herewith controlling a portion of received radiation reflected by the pre-exposure element.

公开(公告)号：US20230245849A1

公开(公告)日：2023-08-03

申请号：US18123210

申请日：2023-03-17

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/12 ,  G01N23/2251 ,  H01J37/09 ,  H01J37/147

CPC classification number: H01J37/12 ,  G01N23/2251 ,  H01J37/09 ,  H01J37/1474 ,  G01N2223/3301 ,  H01J2237/0453 ,  H01J2237/04924 ,  H01J2237/12

Abstract: Arrangements involving objective lens array assemblies for charged-particle assessment tools are disclosed. In one arrangement, the assembly comprises an objective lens array and a control lens array. Each objective lens projects a respective sub-beam of a multi-beam onto a sample. The control lens array is associated with the objective lens array and positioned up-beam of the objective lens array. The control lenses pre-focus the sub-beams.

公开(公告)号：US20230244153A1

公开(公告)日：2023-08-03

申请号：US18000299

申请日：2021-04-19

Applicant: ASML Netherlands B.V.

Inventor： Andrey Valerievich ROGACHEVSKIY ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Doru Cristian TORUMBA ,  Arjan GIJSBERTSEN ,  Cristina CARESIO ,  Raymund CENTENO ,  Tabitha Wangari KINYANJUI ,  Jan Arie DEN BOER

IPC: G03F9/00 ,  G06T7/246 ,  G01C5/00

CPC classification number: G03F9/7034 ,  G06T7/246 ,  G01C5/00 ,  G03F9/7046 ,  G03F9/7092 ,  G03F9/7026 ,  G03F9/7019

Abstract: The present invention provides a method for calculating a corrected substrate height map of a first substrate using a height level sensor. The method comprises: sampling the first substrate by means of the height level sensor with the first substrate moving with a first velocity, wherein the first velocity is a first at least partially non-constant velocity of the first substrate with respect to the height level sensor, to generate a first height level data, generating a first height map based on the first height level data, and calculating a corrected substrate height map by subtracting a correction map from the first height map, wherein the correction map is calculated from the difference between a first velocity height map and a second velocity height map.

公开(公告)号：US11715619B2

公开(公告)日：2023-08-01

申请号：US17713189

申请日：2022-04-04

Applicant: ASML Netherlands B.V.

Inventor： Yongxin Wang ,  Weiming Ren ,  Zhonghua Dong ,  Zhongwei Chen

IPC: H01J37/244 ,  H01J37/28 ,  G01N23/2251

CPC classification number: H01J37/244 ,  G01N23/2251 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/24495 ,  H01J2237/24507 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: Systems and methods are provided for charged particle detection. The detection system can comprise a signal processing circuit configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements. The detection system can further comprise a beam spot processing module configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.

公开(公告)号：US20230236518A1

公开(公告)日：2023-07-27

申请号：US18008283

申请日：2021-06-09

Applicant: ASML Netherlands B.V. ,  ASML HOLDING N.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Koos VAN BERKEL ,  Marcus Adrianus VAN DE KERKHOF ,  Roger Franciscus Mattheus Maria HAMELINCK ,  Shahab SHERVIN ,  Marinus Augustinus Christiaan VERSCHUREN ,  Johannes Bernardus Charles ENGELEN ,  Matthias KRUIZINGA ,  Tammo UITTERDIJK ,  Oleksiy Sergiyovich GALAKTIONOV ,  Kjeld Gertrudus Hendrikus JANSSEN ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Peter VAN DELFT

IPC: G03F7/00

CPC classification number: G03F7/70825 ,  G03F7/70708

Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.

公开(公告)号：US11710668B2

公开(公告)日：2023-07-25

申请号：US17072391

申请日：2020-10-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Adriaan Johan Van Leest ,  Anagnostis Tsiatmas ,  Paul Christiaan Hinnen ,  Elliott Gerard McNamara ,  Alok Verma ,  Thomas Theeuwes ,  Hugo Augustinus Joseph Cramer ,  Maria Isabel De La Fuente Valentin ,  Koen Van Witteveen ,  Martijn Maria Zaal ,  Shu-jin Wang

IPC: H01L21/66 ,  G03F7/20 ,  G03F9/00 ,  G01N21/95 ,  G03F7/00

CPC classification number: H01L22/12 ,  G01N21/9501 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7003

Abstract: A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.

公开(公告)号：US11703772B2

公开(公告)日：2023-07-18

申请号：US17124758

申请日：2020-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Arie Jeffrey Den Boef ,  Timothy Dugan Davis ,  Peter David Engblom ,  Kaustuve Bhattacharyya

IPC: G03F9/00 ,  G03F7/00 ,  G01B11/27

CPC classification number: G03F9/7069 ,  G01B11/272 ,  G03F7/70633

Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.