公开(公告)号：US20130045439A1

公开(公告)日：2013-02-21

申请号：US13569429

申请日：2012-08-08

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: G03F1/24 ,  C03C21/00

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/81 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/42 ,  Y02P40/57

Abstract: Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.

Abstract translation: 通过混合提供硅的反应物气体和提供钛的反应物气体，在200-400℃下预热反应气体混合物，并对混合物进行氧化或火焰水解，制造掺杂二氧化钛的石英玻璃。 在EUV光反射表面的有效区域中，玻璃的基底不具有体积至少为30,000nm 3的凹陷缺陷，适用于EUV光刻。

公开(公告)号：US08178450B2

公开(公告)日：2012-05-15

申请号：US12868900

申请日：2010-08-26

Applicant: Akio Koike ,  Kenta Saito ,  Long Shao ,  Yasutomi Iwahashi ,  Shinya Kikugawa

Inventor： Akio Koike ,  Kenta Saito ,  Long Shao ,  Yasutomi Iwahashi ,  Shinya Kikugawa

IPC: C03C3/06 ,  C03C3/04 ,  C03B37/018

CPC classification number: C03B19/1453 ,  C03B19/1415 ,  C03B2201/075 ,  C03B2201/23 ,  C03B2201/42 ,  C03B2207/70 ,  C03B2207/81 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.

Abstract translation: 本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件并且具有非常高的表面光滑度时，在EUV光的照射时间范围内的线性热膨胀系数基本上为零。 本发明涉及TiO 2含量为7.5〜12质量％，线膨胀系数为0ppb /℃的温度，在40〜 110℃，在至少一个平面内在30mm×30mm的区域内的条纹应力水平为0.03MPa以下的标准偏差（＆sgr）。

公开(公告)号：US08137574B2

公开(公告)日：2012-03-20

申请号：US12233884

申请日：2008-09-19

Applicant: Koji Otsuka ,  Hiroshi Kojima ,  Masabumi Ito

Inventor： Koji Otsuka ,  Hiroshi Kojima ,  Masabumi Ito

IPC: B44C1/22 ,  C03C15/00

CPC classification number: C03C15/02 ,  B24B7/242 ,  B24B37/08 ,  C03C3/06 ,  C03C19/00 ,  C03C23/005 ,  C03C23/006 ,  C03C2201/42 ,  C03C2204/08 ,  Y10T428/24355

Abstract: The present invention is to provide a processing method for manufacturing a highly flat and highly smooth glass substrate with good productivity. A highly flat and highly smooth glass substrate is obtained with good productivity by processing of a glass substrate, which comprises a step of measuring the surface shape of the glass substrate prior to processing, a step of processing the surface of the substrate by changing a processing condition for each site (first processing step), and a step of finish-polishing the surface of the glass substrate that has been subjected to the first processing step (second processing step). At that time, the processing condition for each site within the surface of the substrate in the first processing step is determined from a processing amount that is determined from the concave-convex shape of the surface of the glass substrate prior to processing and the in-plane distribution of a processing amount by the second processing step separately measured by using a similar substrate.

Abstract translation: 本发明提供一种以高生产率制造高度平坦且高度光滑的玻璃基板的加工方法。 通过处理玻璃基板，通过加工玻璃基板，以高生产率获得高度平坦且高度平滑的玻璃基板，其包括在处理之前测量玻璃基板的表面形状的步骤，通过改变处理来处理基板的表面的步骤 （第一处理步骤），以及对经过第一处理步骤（第二处理步骤）的玻璃基板的表面进行精抛光的步骤。 此时，根据从处理前的玻璃基板的表面的凹凸形状确定的处理量来确定第一处理工序中的基板的表面内的每个部位的处理条件， 通过使用相似的基板分别测量的第二处理步骤的处理量的平面分布。

公开(公告)号：US20110287219A1

公开(公告)日：2011-11-24

申请号：US13113152

申请日：2011-05-23

Applicant: Harunobu Matsui ,  Daijitsu Harada ,  Masaki Takeuchi

Inventor： Harunobu Matsui ,  Daijitsu Harada ,  Masaki Takeuchi

IPC: B32B3/00 ,  B24B49/00

CPC classification number: C03C3/06 ,  B82Y10/00 ,  B82Y40/00 ,  C03C19/00 ,  C03C2201/42 ,  C03C2204/08 ,  G03F1/24 ,  G03F1/60 ,  G03F7/0002 ,  Y10T428/24355

Abstract: A synthetic quartz glass substrate has a surface of 6 inch squares including a central surface area of 132 mm squares. The central surface area of 132 mm squares has a flatness of up to 50 nm. A frame region obtained by subtracting the central surface area of 132 mm squares from the central surface area of 148 mm squares has a flatness of up to 150 nm.

Abstract translation: 合成石英玻璃基板具有6英寸正方形的表面，包括132mm正方形的中心表面积。 132mm正方形的中心表面积具有高达50nm的平坦度。 通过从148mm正方形的中心表面区域减去132mm正方形的中心表面积获得的框架区域具有高达150nm的平坦度。

公开(公告)号：US08047023B2

公开(公告)日：2011-11-01

申请号：US09844947

申请日：2001-04-27

Applicant: Bradford Giles Ackerman ,  Kenneth Edward Hrdina ,  Lisa Anne Moore ,  Nikki Jo Russo ,  C. Charles Yu

Inventor： Bradford Giles Ackerman ,  Kenneth Edward Hrdina ,  Lisa Anne Moore ,  Nikki Jo Russo ,  C. Charles Yu

IPC: C03B37/014

CPC classification number: C03C4/0085 ,  C03B19/1415 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/12 ,  C03B2201/42 ,  C03B2207/32 ,  C03B2207/62 ,  C03B2207/70 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/12 ,  C03C2201/42 ,  C03C2203/40 ,  Y02P40/57

Abstract: A method for producing a fused silica glass containing titania includes synthesizing particles of silica and titania by delivering a mixture of a silica precursor and a titania precursor to a burner, growing a porous preform by successively depositing the particles on a deposition surface while rotating and translating the deposition surface relative to the burner, and consolidating the porous preform into a dense glass.

Abstract translation: 一种制备含有二氧化钛的熔融石英玻璃的方法包括通过将二氧化硅前体和二氧化钛前体的混合物输送到燃烧器来合成二氧化硅和二氧化钛的颗粒，通过将颗粒依次沉积在沉积表面上同时旋转和平移来生长多孔预型体 沉积表面相对于燃烧器，并将多孔预成型件固结成致密的玻璃。

公开(公告)号：US08012653B2

公开(公告)日：2011-09-06

申请号：US12490833

申请日：2009-06-24

Applicant: Akio Koike ,  Ken Ebihara

Inventor： Akio Koike ,  Ken Ebihara

IPC: G03F1/00

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1492 ,  C03B2201/21 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/14 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  Y02P40/57

Abstract: A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided.A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12 mass % of TiO2, wherein the surface roughness (rms) in a surface quality area of the substrate is at most 2 nm, and the maximum variation (PV) of the stress in the surface quality area of the substrate is at most 0.2 MPa.

Abstract translation: 提供了适用于EUV掩模或EUV掩模坯料并且具有优异的平面度的基板。 由含有1〜12质量％的TiO 2的二氧化硅玻璃构成的EUV掩模坯的基板，其中，所述基板的表面质量区域的表面粗糙度（rms）为2nm以下，最大变化量 基板的表面质量区域的应力的最大值（PV）为0.2MPa以下。

公开(公告)号：US20110117480A1

公开(公告)日：2011-05-19

申请号：US12940405

申请日：2010-11-05

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: G03F1/00 ,  C03C3/04 ,  C03B19/01 ,  C03B19/14

CPC classification number: G03F1/22 ,  C03B19/1423 ,  C03B2201/20 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/20 ,  C03C2201/42 ,  Y02P40/57

Abstract: A titania and sulfur co-doped quartz glass member is provided. Due to co-doping of titania and sulfur, the quartz glass member undergoes zero expansion at a certain temperature and low thermal expansion over a wide temperature range, and is thus suited for use in a commercial EUV lithography tool. A manufacturing method and an optical member for EUV lithography are also provided.

Abstract translation: 提供二氧化钛和硫共掺杂石英玻璃构件。 由于二氧化钛和硫的共掺杂，石英玻璃构件在宽温度范围内在一定温度下经历零膨胀和低热膨胀，因此适用于商业的EUV光刻工具。 还提供了用于EUV光刻的制造方法和光学构件。

公开(公告)号：US20100323871A1

公开(公告)日：2010-12-23

申请号：US12868900

申请日：2010-08-26

Applicant: Akio Koike ,  Kenta Saito ,  Long Shao ,  Yasutomi Iwahashi ,  Shinya Kikugawa

Inventor： Akio Koike ,  Kenta Saito ,  Long Shao ,  Yasutomi Iwahashi ,  Shinya Kikugawa

IPC: C03C3/04

CPC classification number: C03B19/1453 ,  C03B19/1415 ,  C03B2201/075 ,  C03B2201/23 ,  C03B2201/42 ,  C03B2207/70 ,  C03B2207/81 ,  C03C3/06 ,  C03C3/076 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57

Abstract: The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (σ) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.

Abstract translation: 本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件并且具有非常高的表面光滑度时，在EUV光的照射时间范围内的线性热膨胀系数基本上为零。 本发明涉及TiO 2含量为7.5〜12质量％，线膨胀系数为0ppb /℃的温度，在40〜 110℃，在至少一个平面内在30mm×30mm的区域内的条纹应力水平为0.03MPa以下的标准偏差（＆sgr）。

公开(公告)号：US20100003609A1

公开(公告)日：2010-01-07

申请号：US12496688

申请日：2009-07-02

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: G03F1/00 ,  C03C14/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/0026 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  Y10T428/31616

Abstract: In a titania-doped quartz glass member having a surface where EUV light of up to 70 nm wavelength is reflected, a refractive index distribution in the surface has only one extreme point within a central 80% region of the member. The titania-doped quartz glass member has a surface with a high level of precision and thus can be formed into an EUV lithography photomask substrate which is improved in flatness and thermal expansion properties.

Abstract translation: 在具有反射高达70nm波长的EUV光的表面的二氧化钛掺杂石英玻璃构件中，表面中的折射率分布在构件的中心80％区域内仅具有一个极值点。 掺杂二氧化钛的石英玻璃构件具有高精度的表面，因此可以形成为平面度和热膨胀性能提高的EUV光刻光掩模基板。

公开(公告)号：US20090288448A1

公开(公告)日：2009-11-26

申请号：US12512436

申请日：2009-07-30

Applicant: Shigeru MAIDA ,  Motoyuki YAMADA

Inventor： Shigeru MAIDA ,  Motoyuki YAMADA

IPC: C03C17/23

CPC classification number: C03B19/1407 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1446 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  G03F1/24 ,  G03F1/60 ,  G21K2201/067

Abstract: A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates.

Abstract translation: 在二氧化钛浓度梯度小于或等于0.01重量％/重量的情况下，含有3-12重量％的二氧化钛的二氧化钛掺杂的石英玻璃，并且对于440nm波长具有至多30％的表观透射率，厚度为6.35mm 具有这样的同质性，其提供了EUV光刻元件（通常为EUV光刻光掩模基板）所需的高表面精度。