公开(公告)号：US09822035B2

公开(公告)日：2017-11-21

申请号：US15144563

申请日：2016-05-02

Applicant: Adam Hokansson ,  David J Kudelko ,  Yaowen Li ,  Joanna Y Ng ,  Debra A Simoff

Inventor： Adam Hokansson ,  David J Kudelko ,  Yaowen Li ,  Joanna Y Ng ,  Debra A Simoff

IPC: G02B6/02 ,  C03C25/10 ,  C03B37/027 ,  B23K26/364 ,  B23K26/00 ,  C03C25/62

CPC classification number: C03C25/1062 ,  B23K26/359 ,  B23K26/364 ,  B23K26/50 ,  C03B37/027 ,  C03B2201/21 ,  C03B2201/22 ,  C03B2201/31 ,  C03B2203/22 ,  C03B2205/20 ,  C03C25/106 ,  C03C25/6208 ,  C03C2218/152 ,  G02B6/02114 ,  G02B6/02138 ,  G02B6/02395 ,  G02B2006/02161

Abstract: A technique is described for fabricating one or more optical devices in a carbon-coated optical fiber. A photosensitive optical fiber is provided having a hermetic carbon coating. Further provided is a laser having a beam output that is configured to inscribe one or more refractive index modulations into the optical fiber through the hermetic carbon layer while leaving the hermetic carbon layer intact. The laser is used to inscribe one or more optical devices into the optical fiber through the hermetic carbon layer.

公开(公告)号：US09291770B2

公开(公告)日：2016-03-22

申请号：US14320861

申请日：2014-07-01

Applicant: Thierry Robin ,  Arnaud Laurent

Inventor： Thierry Robin ,  Arnaud Laurent

IPC: G11B33/02 ,  G11B33/14 ,  G02B6/02 ,  G02B6/032 ,  C03B37/027 ,  C03C25/10 ,  C03C13/04 ,  G02B6/255

CPC classification number: G02B6/032 ,  C03B37/02781 ,  C03B2201/21 ,  C03B2201/22 ,  C03C13/045 ,  C03C25/104 ,  C03C25/1062 ,  C03C25/1063 ,  G02B6/02295 ,  G02B6/02328 ,  G02B6/2551 ,  G02B2006/0325

Abstract: A method of manufacturing a radiation-resistant optical fiber and a thus-obtained radiation-resistant optical fiber, the method includes the following steps: a) manufacturing a silica optical fiber preform; b) forming, in the preform, a longitudinal cavity; c) drawing the preform so as to form an optical fiber (1) including a core (2), an optical cladding (6) and at least one longitudinal cavity (3) having at least one opening (13) at one end of the optical fiber (1); d) applying, during step c) of fiber drawing, a gas-tight coating (4); e) exposing the optical fiber (1) to a gaseous substance, including preferably gaseous hydrogen and/or gaseous deuterium, in such a way to incorporate the gaseous substance in silica via the opening (13); and f) closing any opening (13) at both ends of the optical fiber.

Abstract translation: 一种制造耐辐射光纤和由此获得的耐辐射光纤的方法，该方法包括以下步骤：a）制造二氧化硅光纤预制棒; b）在预成型件中形成纵向腔; c）拉伸所述预成型件以便形成包括芯（2），光学包层（6）和至少一个纵向腔（3）的光纤（1），所述至少一个纵向空腔（3）在所述第一端 光纤（1）; d）在纤维拉伸的步骤c）期间施加气密涂层（4）; e）将光纤（1）暴露于气态物质（包括优选气态氢气和/或气态氘），以便通过所述开口（13）将所述气态物质并入二氧化硅中; 以及f）关闭光纤两端的任何开口（13）。

公开(公告)号：US20140373571A1

公开(公告)日：2014-12-25

申请号：US14269409

申请日：2014-05-05

Applicant: Corning Incorporated

Inventor： Kenneth Edward Hrdina ,  Changyi Lai ,  Lisa Anne Moore ,  Ulrich Wilhelm Heinz Neukirch ,  William Rogers Rosch

IPC: C03C23/00

CPC classification number: C03C23/0095 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/22 ,  C03C3/06 ,  C03C4/0085 ,  C03C21/007 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2201/23 ,  C03C2203/54

Abstract: A fused silica glass article having greater resistance to damage induced by exposure to laser radiation such as laser induced wavefront distortion at deep ultraviolet (DUV) wavelengths, and behaviors such as fluence dependent transmission, which are related to intrinsic defects in the glass. The improved resistance to laser damage may be achieved in some embodiments by loading the glass article with molecular hydrogen (H2) at temperatures of about 400° C. or less, or 350° C. or less. The combined OH and deuteroxyl (OD) concentration may be less than 10 ppm by weight. In other embodiments, the improved resistance may be achieved by providing the glass with 10 to 60 ppm deuteroxyl (OD) species by weight. In still other embodiments, improved resistance to such laser damage may be achieved by both loading the glass article with molecular hydrogen at temperatures of about 350° C. or less and providing the glass with less than 10 ppm combined OH and OD, or 10 to 60 ppm OD by weight.

Abstract translation: 一种熔融石英玻璃制品，其具有较强的耐受暴露于激光辐射（例如在深紫外（DUV）波长处的激光诱导波前失真）以及与玻璃中的固有缺陷有关的诸如通量依赖透射的行为的损伤。 在一些实施方案中，可以通过在约400℃或更低或350℃或更低的温度下加载具有分子氢（H 2）的玻璃制品来实现对激光损伤的改进的抗性。 组合的OH和氘氧化（OD）浓度可以小于10ppm重量。 在其它实施方案中，可以通过为玻璃提供10至60ppm的重量的氘氧化（OD）种类来实现改进的电阻。 在另外的其它实施方案中，可以通过在大约350℃或更低的温度下将玻璃制品加载到分子氢中来提供对这种激光损伤的改进的抗性，并且使玻璃具有小于10ppm的组合的OH和OD，或10至 60ppm OD重量。

公开(公告)号：US08460769B2

公开(公告)日：2013-06-11

申请号：US13140982

申请日：2010-09-01

Applicant: Shigeru Yamagata ,  Tomomi Usui

Inventor： Shigeru Yamagata ,  Tomomi Usui

IPC: A47G19/22 ,  B28B21/00 ,  B28B21/72 ,  B28B23/08 ,  B29D22/00 ,  B29D23/00 ,  B32B1/08 ,  C03C17/32 ,  F16L9/10

CPC classification number: C03B19/095 ,  C01B33/12 ,  C01P2004/61 ,  C03B2201/21 ,  C03B2201/54 ,  C30B15/10 ,  C30B29/06 ,  Y02P40/57 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/2982

Abstract: A method is provided for producing a silica container arranged with a substrate, having a rotational symmetry, comprised of mainly a silica, and containing gaseous bubbles at least in its peripheral part, and an inner layer, formed on an inner surface of the substrate and comprised of a transparent silica glass; wherein a powdered silica, having particle diameter of 10 to 1000 μm, containing Ca, Sr, and Ba with the total concentration of 50 to 5000 ppm by weight, and releasing hydrogen molecules with the amount of 3×1016 to 3×1019 molecules/g upon heating at 1000° C. under vacuum, is prepared at least as a powdered raw material for forming the inner layer, and then the inner layer is formed from the powdered silica as the powdered raw material for forming the inner layer.

Abstract translation: 提供一种制造二氧化硅容器的方法，该二氧化硅容器具有旋转对称性，主要由二氧化硅构成的基板，至少在其周边部分含有气泡，内层形成在基板的内表面上， 由透明石英玻璃组成; 其中，粉末状二氧化硅的粒径为10〜1000μm，含有总量为50〜5000重量ppm的Ca，Sr，Ba，释放量为3×1016〜3×1019分子/ 至少作为形成内层的粉末状原料制备，然后内层由作为形成内层的粉末状原料的二氧化硅粉末形成。

公开(公告)号：US08176752B2

公开(公告)日：2012-05-15

申请号：US12507950

申请日：2009-07-23

Applicant: Susan Lee Schiefelbein ,  Charlene Marie Smith

Inventor： Susan Lee Schiefelbein ,  Charlene Marie Smith

IPC: C03B19/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B32/00 ,  C03B2201/21 ,  C03C4/0071 ,  C03C4/0085 ,  C03C23/0025 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54

Abstract: A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E′ centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C.

Abstract translation: 石英玻璃制品，例如步进/扫描仪系统中的透镜，在小于约250nm的波长处具有饱和诱导吸收。 通过首先通过在这种缺陷处形成硅氢化物（SiH）来除去二氧化硅玻璃中的Si-O缺陷，并将石英玻璃与氢气一起加载到石英玻璃制品中通过SiH光解产生的E'中心反应而实现饱和诱导吸收 。 氢化硅是通过在至少475℃的温度下加载二氧化硅玻璃与分子氢形成的。在形成SiH之后，二氧化硅玻璃在小于475℃的温度下装载另外的分子氢。

公开(公告)号：US08012894B2

公开(公告)日：2011-09-06

申请号：US12151172

申请日：2008-05-05

Applicant: Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Rostislav Radievich Khrapko

Inventor： Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Rostislav Radievich Khrapko

IPC: C03C3/06 ,  C03B19/06 ,  C03B19/00 ,  C03B37/00 ,  C03B37/018

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/31 ,  C03C2201/22 ,  C03C2201/23 ,  C03C2203/54

Abstract: A fused silica glass and a fused silica article having a combined concentration of at least one of OH and OD of up to about 50 ppm. The fused silica glass is formed by drying a fused silica soot blank or preform in an inert atmosphere containing a drying agent, followed by removal of residual drying agent from the dried soot blank by heating the dried soot blank in an atmosphere comprising an inert gas and of oxygen.

Abstract translation: 熔融石英玻璃和熔融二氧化硅制品，其具有高达约50ppm的OH和OD中的至少一种的组合浓度。 熔融二氧化硅玻璃通过在含有干燥剂的惰性气氛中干燥熔融二氧化硅烟灰坯料或预型体而形成，然后通过在包含惰性气体的气氛中加热干燥的烟灰坯料从干燥的烟灰坯中除去残留的干燥剂， 的氧气。

公开(公告)号：US08012653B2

公开(公告)日：2011-09-06

申请号：US12490833

申请日：2009-06-24

Applicant: Akio Koike ,  Ken Ebihara

Inventor： Akio Koike ,  Ken Ebihara

IPC: G03F1/00

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1492 ,  C03B2201/21 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/14 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  Y02P40/57

Abstract: A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided.A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12 mass % of TiO2, wherein the surface roughness (rms) in a surface quality area of the substrate is at most 2 nm, and the maximum variation (PV) of the stress in the surface quality area of the substrate is at most 0.2 MPa.

Abstract translation: 提供了适用于EUV掩模或EUV掩模坯料并且具有优异的平面度的基板。 由含有1〜12质量％的TiO 2的二氧化硅玻璃构成的EUV掩模坯的基板，其中，所述基板的表面质量区域的表面粗糙度（rms）为2nm以下，最大变化量 基板的表面质量区域的应力的最大值（PV）为0.2MPa以下。

公开(公告)号：US07954340B2

公开(公告)日：2011-06-07

申请号：US12417466

申请日：2009-04-02

Applicant: Hisatoshi Otsuka ,  Kazuo Shirota ,  Osamu Sekizawa

Inventor： Hisatoshi Otsuka ,  Kazuo Shirota ,  Osamu Sekizawa

IPC: C03C19/00

CPC classification number: C03B19/1469 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/22 ,  C03B2207/32 ,  C03B2207/34 ,  C03C3/06 ,  C03C4/0071 ,  C03C2201/21 ,  Y02P40/57

Abstract: When a synthetic quartz glass substrate is prepared from a synthetic quartz glass block, (I) the block has a hydrogen molecule concentration of 5×1017-1×1019 molecules/cm3, (II) the substrate has a hydrogen molecule concentration of 5×1015-5×1017 molecules/cm3, (III) the substrate has an in-plane variation of its internal transmittance at 193.4 nm which is up to 0.2%, and (IV) the substrate has an internal transmittance of at least 99.6% at 193.4 nm. The synthetic quartz glass substrate has a high transmittance and a uniform transmittance distribution, and is adapted for use with excimer lasers, particularly ArF excimer lasers.

Abstract translation: 当从合成石英玻璃块制备合成石英玻璃基板时，（I）该嵌段的氢分子浓度为5×1017-1×1019分子/ cm3，（II）基板的氢分子浓度为5× 1015-5×1017分子/ cm3，（III）基板的内部透射率在193.4nm处具有高达0.2％的面内变化，（IV）基板的内透射率至少为99.6％ 193.4nm。 合成石英玻璃基板具有高透射率和均匀的透射率分布，并且适用于准分子激光器，特别是ArF准分子激光器。

公开(公告)号：US07906446B2

公开(公告)日：2011-03-15

申请号：US12556848

申请日：2009-09-10

Applicant: Douglas Clippinger Allan ,  Dana Craig Bookbinder ,  Ulrich W H Neukirch ,  Charlene Marie Smith

Inventor： Douglas Clippinger Allan ,  Dana Craig Bookbinder ,  Ulrich W H Neukirch ,  Charlene Marie Smith

IPC: C03C3/06

CPC classification number: C03B19/1453 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/23 ,  C03C2203/54

Abstract: Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.

Abstract translation: 公开了具有低偏振诱发双折射的合成石英玻璃，用于制造玻璃的方法和包含由玻璃制成的光学元件的光刻系统。 当在大约193nm处的准分子激光脉冲具有约40μJ·cm-2·pulse-1的注量和脉冲长度时，石英玻璃具有在633nm处测量的偏振诱发双折射小于约0.1nm / cm 对于5×109脉冲，约25ns。

公开(公告)号：US20100180634A1

公开(公告)日：2010-07-22

申请号：US12688332

申请日：2010-01-15

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: C03B20/00 ,  C03B19/08

CPC classification number: C03B19/1453 ,  C03B19/1469 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2207/20 ,  Y02P40/57

Abstract: Disclosed is a method of producing a synthetic quartz glass for excimer laser by depositing on a target silica particulates obtained by subjecting a silica raw material to vapor-phase hydrolysis or oxidative decomposition in an oxyhydrogen flame in a vacuum sintering furnace to form a porous silica base material, vitrifying the porous silica base material, and subjecting the vitrified material to hot forming, an annealing treatment and a hydrogen doping treatment, wherein the vitrification of the porous silica base material includes: (a) a step of holding a vacuum pressure at or below 20.0 Pa in a temperature range from 400° C., inclusive, to 900° C., exclusive; (b) a step of holding a vacuum pressure at or below 10.0 Pa in a temperature range from 900° C., inclusive, to 1100° C., exclusive; and (c) a step of holding a vacuum pressure at or below 3.0 Pa in a temperature range from 1100° C. to a transparent-vitrification temperature.

Abstract translation: 公开了一种通过在真空烧结炉中在氧氢火焰中使二氧化硅原料进行气相水解或氧化分解而获得的目标二氧化硅微粒上沉积以制备准分子激光的合成石英玻璃的方法，以形成多孔二氧化硅基质 材料，玻璃化多孔二氧化硅基材，以及对玻璃化材料进行热成型，退火处理和氢掺杂处理，其中多孔二氧化硅基材的玻璃化包括：（a）将真空压力保持在或 低于20.0Pa，温度范围为400℃，至900℃，独占; （b）在900℃以上至1100℃的温度范围内保持真空压力为10.0Pa以下的工序。 和（c）在1100℃的温度范围内保持真空压力等于或低于3.0Pa的步骤至透明玻璃化温度。