Abstract:
Techniques are disclosed for systems and methods to provide shock impact mitigation for MEMS structures. A MEMS structure may include one or more actuators. An actuator may include a first frame having a spine, where the spine includes a body and a tip. The actuator may include a second frame connected to the first frame and including a shock stop, where the shock stop includes a surface in proximity to the spine tip. An actuator may include a shock cushion spring fixed relative to the spine tip and situated substantially between the spine tip and the shock stop surface, where the shock cushion spring is adapted to protect the spine tip from contact with the shock stop surface.
Abstract:
A microelectromechanical sensor that in one embodiment includes a supporting structure, having a substrate and electrode structures anchored to the substrate; and a sensing mass, movable with respect to the supporting structure so that a distance between the sensing mass and the substrate is variable. The sensing mass is provided with movable electrodes capacitively coupled to the electrode structures. Each electrode structure comprises a first fixed electrode and a second fixed electrode mutually insulated by a dielectric region and arranged in succession in a direction substantially perpendicular to a face of the substrate.
Abstract:
A device with a mobile element extending along a given plane comprising at least one first, one second and one third layers extending in planes parallel to the given plane, with the first layer forming a support, the second layer comprising all or a portion of the mobile element and means for suspending the mobile element with respect to the support and the third layer comprising all or a portion of the capacitive means of which the capacitance varies according to the relative position of the mobile element with respect to the support, said capacitive means comprising at least one mobile electrode integral with one of the faces of the mobile element parallel to the given plane, and at least one fixed electrode with respect to the support, with the fixed and mobile electrodes being arranged at least partially in the same plane parallel to the given plane and at least partially above and/or below the mobile element.
Abstract:
The invention relates to a capacitive micromechanical sensor structure comprising a stator structure rigidly anchored to a substrate and a rotor structure movably anchored by means of spring structures to the substrate. The stator structure has a plurality of stator finger support beams and the rotor structure has a plurality of rotor finger support beams. Stator fingers along the stator finger support beam of the stator structure extend into rotor gaps along the rotor finger support beam of the rotor structure, and rotor fingers along the rotor finger support beam of the rotor structure extend into stator gaps along the stator finger support beam of the stator structure.
Abstract:
The MEMS device has a suspended mass supported via a pair of articulation arms by a supporting region. An electrostatic driving system, coupled to the articulation arms, has mobile electrodes and fixed electrodes that are coupled to each other. The electrostatic driving system is formed by two pairs of actuation assemblies, arranged on opposite sides of a respective articulation arm and connected to the articulation arm through connection elements. Each actuation assembly extends laterally to the suspended mass and has an auxiliary arm carrying a respective plurality of mobile electrodes. Each auxiliary arm is parallel to the articulation arms. The connection elements may be rigid or formed by linkages.
Abstract:
Methods and systems for micro transmissions for a micro machine may comprise an input shaft assembly coupled to a micro actuator, an output shaft assembly coupled to a micro shaft, and one or more power conversion elements operable to convert a first type of movement from the micro actuator into a second, disparate type of movement for the micro shaft.
Abstract:
A MEMS system comprises a first rotational actuator having a first drive mechanism configured to drive rotation of a first rotator about a first axis, a second rotational actuator having a second drive mechanism configured to drive rotation of a second rotator about a second axis, first and second flexible linkages, a first drive beam coupled to the first rotator and to the first flexible linkage, a second drive beam coupled to the second rotator and to the second flexible linkage, and one or more device mounts coupled to the first and second flexible linkages. The one or more device mounts are configured to provide distributed points of attachment of a device. The rotation of the first and second rotators causes the device mount to rotate or piston.
Abstract:
A method for manufacturing a micro-electro-mechanical device, which has supporting parts and operative parts, includes providing a first semiconductor wafer, having a first layer of semiconductor material and a second layer of semiconductor material arranged on top of the first layer, forming first supporting parts and first operative parts of the device in the second layer, forming temporary anchors in the first layer, and bonding the first wafer to a second wafer, with the second layer facing the second wafer. After bonding the first wafer and the second wafer together, second supporting parts and second operative parts of said device are formed in the first layer. The temporary anchors are removed from the first layer to free the operative parts formed therein.
Abstract:
This disclosure provides systems, methods and apparatus for glass electromechanical systems (EMS) electrostatic devices. In one aspect, a glass EMS electrostatic device includes sidewall electrodes. Structural components of a glass EMS electrostatic device such as stationary support structures, movable masses, coupling flexures, and sidewall electrode supports, can be formed from a single glass body. The glass body can be a photochemically etched. In some implementations, pairs of sidewall electrodes can be arranged in interdigitated comb or parallel plate configurations and can include plated metal layers and narrow capacitive gap spacing.
Abstract:
To provide a semiconductor device prevented from giving a limitation on the sensitivity of HEMS devices due to isolation regions thereof and a method of fabricating the same. The semiconductor device includes: a semiconductor substrate with a recess portion formed in an upper surface; a supporting body provided around the recess portion on the semiconductor substrate; a beam-type movable portion which includes a movable electrode provided above the recess portion and is fixed to the supporting body at a position away from the movable electrode; a beam-type fixed electrode provided above the recess portion to be opposed to the movable electrode and fixed to the supporting body; and isolation regions each including a separation column made of a semiconductor and a separation insulating film provided on a side surface of the separation column, the isolation regions being provided between the movable electrode and the supporting body and between the fixed electrode and the supporting body to electrically separate the movable and fixed electrodes from the supporting body.