Embedded microelectromechanical systems (MEMS) semiconductor substrate and related method of forming
    282.
    再颁专利
    Embedded microelectromechanical systems (MEMS) semiconductor substrate and related method of forming 有权
    嵌入式微机电系统(MEMS)半导体衬底及相关成型方法

    公开(公告)号:USRE45286E1

    公开(公告)日:2014-12-09

    申请号:US13890668

    申请日:2013-05-09

    CPC classification number: B81C1/00246 B81B2201/0271 H01L27/0617

    Abstract: An embedded MEMS semiconductor substrate is set forth and can be a starting material for subsequent semiconductor device processing. A MEMS device is formed in a semiconductor substrate, including at least one MEMS electrode and a buried silicon dioxide sacrificial layer has been applied for releasing the MEMS. A planarizing layer is applied over the substrate, MEMS device and MEMS electrode. A polysilicon protection layer is applied over the planarizing layer. A silicon nitride capping layer is applied over the polysilicon protection layer. A polsilicon seed layer is applied over the polysilicon nitride capping layer. The MEMS device is released by removing at least a portion of the buried silicon dioxide sacrificial layer and an epitaxial layer is grown over the polysilicon seed layer to be used for subsequent semiconductor wafer processing.

    Abstract translation: 介绍了一种嵌入式MEMS半导体衬底,可以作为后续半导体器件处理的起始材料。 在包括至少一个MEMS电极的半导体衬底中形成MEMS器件,并且已经应用​​了掩埋的二氧化硅牺牲层来释放MEMS。 在衬底,MEMS器件和MEMS电极上施加平坦化层。 在平坦化层上施加多晶硅保护层。 在多晶硅保护层上施加氮化硅覆盖层。 将多晶硅种子层施加在多晶硅氮化物覆盖层上。 通过去除掩埋的二氧化硅牺牲层的至少一部分来释放MEMS器件,并且在多晶硅种子层上生长外延层以用于随后的半导体晶片处理。

    CAPACITIVE MEMS SENSOR DEVICES
    283.
    发明申请
    CAPACITIVE MEMS SENSOR DEVICES 有权
    电容式MEMS传感器器件

    公开(公告)号:US20140239979A1

    公开(公告)日:2014-08-28

    申请号:US13779160

    申请日:2013-02-27

    Abstract: A packaged capacitive MEMS sensor device includes at least one capacitive MEMS sensor element with at least one capacitive MEMS sensor cell including a first substrate having a thick and a thin dielectric region. A second substrate with a membrane layer is bonded to the thick dielectric region and over the thin dielectric region to provide a MEMS cavity. The membrane layer provides a fixed electrode and a released MEMS electrode over the MEMS cavity. A first through-substrate via (TSV) extends through a top side of the MEMS electrode and a second TSV through a top side of the fixed electrode. A metal cap is on top of the first TSV and second TSV. A third substrate including an inner cavity and outer protruding portions framing the inner cavity is bonded to the thick dielectric regions. The third substrate together with the first substrate seals the MEMS electrode.

    Abstract translation: 封装的电容MEMS传感器装置包括至少一个电容式MEMS传感器元件,其具有至少一个电容式MEMS传感器单元,该电容式MEMS传感器单元包括具有厚和薄电介质区域的第一基板 具有膜层的第二衬底被结合到厚电介质区域和薄介电区域上以提供MEMS空腔。 膜层在MEMS腔体上提供固定电极和释放的MEMS电极。 第一穿通基板通孔(TSV)延伸穿过MEMS电极的顶侧,通过固定电极的顶侧延伸穿过第二TSV。 金属帽位于第一TSV和第二TSV的顶部。 包括内腔和构成内腔的外突出部分的第三基板被接合到厚电介质区域。 第三衬底与第一衬底一起密封MEMS电极。

    VIBRATION ELEMENT AND ELECTRONIC DEVICE
    285.
    发明申请
    VIBRATION ELEMENT AND ELECTRONIC DEVICE 审中-公开
    振动元件和电子设备

    公开(公告)号:US20140145553A1

    公开(公告)日:2014-05-29

    申请号:US14083984

    申请日:2013-11-19

    Abstract: A MEMS vibration element 100 includes a substrate 1, fixing parts 23 provided on a principal surface of the substrate 1, supporting parts (supporting beams 22 and connection beams 21) extending from the fixing parts 23, and an upper electrode (a vibration body) supported by the supporting parts, isolated from the substrate 1. The upper electrode 20 includes cut sections 30 each extending from the peripheral portion of the upper electrode 20 toward the central portion of the upper electrode 20, the cut sections 30 exposing side surfaces 31 of the upper electrode 20. The upper electrode 20 includes joining parts provided at the side surfaces 31 oriented in a direction from the peripheral portion toward the central portion of the upper electrode 20, and the joining parts are connected to the supporting parts 22.

    Abstract translation: MEMS振动元件100包括基板1,设置在基板1的主表面上的固定部23,从固定部23延伸的支撑部(支撑梁22和连接梁21)以及上部电极(振动体) 由与基板1隔离的支撑部支撑。上电极20包括从上电极20的周边部朝向上电极20的中心部分延伸的切断部30,切断部30将侧面31 上部电极20.上部电极20具有设置在从上部电极20的周边部朝向中央部的方向取向的侧面31的接合部,接合部与支撑部22连接。

    VARIABLE CAPACITOR AND SWITCH STRUCTURES IN SINGLE CRYSTAL PIEZOELECTRIC MEMS DEVICES USING BIMORPHS
    286.
    发明申请
    VARIABLE CAPACITOR AND SWITCH STRUCTURES IN SINGLE CRYSTAL PIEZOELECTRIC MEMS DEVICES USING BIMORPHS 有权
    单晶压电MEMS器件中的可变电容和开关结构

    公开(公告)号:US20140125201A1

    公开(公告)日:2014-05-08

    申请号:US14071025

    申请日:2013-11-04

    Abstract: A micro-electrical-mechanical systems (MEMS) device includes a substrate, one or more anchors formed on a first surface of the substrate, and a piezoelectric layer suspended over the first surface of the substrate by the one or more anchors. A first electrode may be provided on a first surface of the piezoelectric layer facing the first surface of the substrate, such that the first electrode is in contact with a first bimorph layer of the piezoelectric layer. A second electrode may be provided on a second surface of the piezoelectric layer opposite the first surface, such that the second electrode is in contact with a second bimorph layer of the piezoelectric layer.

    Abstract translation: 微电气机械系统(MEMS)装置包括衬底,形成在衬底的第一表面上的一个或多个锚固体和通过一个或多个锚固件悬挂在衬底的第一表面上的压电层。 第一电极可以设置在面向基板的第一表面的压电层的第一表面上,使得第一电极与压电层的第一双压电晶片层接触。 第二电极可以设置在与第一表面相对的压电层的第二表面上,使得第二电极与压电层的第二双晶片层接触。

    METHOD OF MANUFACTURING A WIRING SUBSTRATE
    288.
    发明申请
    METHOD OF MANUFACTURING A WIRING SUBSTRATE 审中-公开
    制造配线基板的方法

    公开(公告)号:US20140082936A1

    公开(公告)日:2014-03-27

    申请号:US14095182

    申请日:2013-12-03

    Inventor: Tsuyoshi YODA

    Abstract: A wiring substrate includes: a substrate having a first surface and a second surface; a first insulating layer stacked on the first surface; a pad electrode stacked on the first insulating layer; a through electrode connected to the pad electrode; and a second insulating layer disposed between the substrate and the through electrode and between the first insulating layer and the through electrode, wherein a diameter of the through electrode in a connection section between the pad electrode and the through electrode is smaller than a diameter of the through electrode on the second surface side, the first insulating layer, the second insulating layer and the through electrode overlap with each other in a peripheral area of the connection section, when seen from a plan view, and the thickness of the first insulating layer in the area is thinner than the thickness of the first insulating layer in other areas.

    Abstract translation: 布线基板包括:具有第一表面和第二表面的基板; 堆叠在第一表面上的第一绝缘层; 堆叠在所述第一绝缘层上的焊盘电极; 连接到焊盘电极的贯通电极; 以及设置在所述基板和所述贯通电极之间并且位于所述第一绝缘层与所述贯通电极之间的第二绝缘层,其中,所述焊盘电极和贯通电极之间的连接部中的贯通电极的直径小于 在第二表面侧的贯通电极,第一绝缘层,第二绝缘层和贯通电极在连接部的周边区域彼此重叠,从平面图看,第一绝缘层的厚度 该区域比其它区域的第一绝缘层的厚度薄。

    METHOD OF MANUFACTURING CAPACITIVE ELECTROMECHANICAL TRANSDUCER
    290.
    发明申请
    METHOD OF MANUFACTURING CAPACITIVE ELECTROMECHANICAL TRANSDUCER 审中-公开
    制造电容式电磁传感器的方法

    公开(公告)号:US20130302934A1

    公开(公告)日:2013-11-14

    申请号:US13981504

    申请日:2012-01-24

    Abstract: Provided is a method of manufacturing a capacitive electromechanical transducer using fusion bonding, which is capable of reducing fluctuations in initial deformation among diaphragms caused at positions having different boundary conditions such as the bonding area, thereby enhancing the uniformity of the transducer and stabilizing the sensitivity and the like. The method of manufacturing a capacitive electromechanical transducer includes: forming an insulating layer on a first silicon substrate and forming at least one recess; fusion bonding a second silicon substrate onto the insulating layer; and thinning the second silicon substrate and forming a silicon film. The method further includes, before the bonding of the second silicon substrate onto the insulating layer, forming a groove in the insulating layer at the periphery of the at least one recess.

    Abstract translation: 提供一种使用熔接的制造电容式机电换能器的方法,其能够减少在具有不同边界条件(例如接合面积)的位置处引起的膜片之间的初始变形的波动,从而增强换能器的均匀性并稳定灵敏度, 类似。 制造电容式机电换能器的方法包括:在第一硅衬底上形成绝缘层并形成至少一个凹槽; 将第二硅衬底熔合到所述绝缘层上; 并使第二硅衬底变薄并形成硅膜。 该方法还包括在将第二硅衬底接合到绝缘层之前,在至少一个凹部的周边处在绝缘层中形成凹槽。

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