公开(公告)号：US20130064978A1

公开(公告)日：2013-03-14

申请号：US13435626

申请日：2012-03-30

Applicant: Sang-Mi KIM ,  Gug Rae JO ,  Jae Hyuk CHANG ,  Seung-Jun LEE ,  Seung-Min LEE ,  Dae-Young LEE ,  Ki-Beom LEE

Inventor： Sang-Mi KIM ,  Gug Rae JO ,  Jae Hyuk CHANG ,  Seung-Jun LEE ,  Seung-Min LEE ,  Dae-Young LEE ,  Ki-Beom LEE

IPC: B05D3/12 ,  B65H18/08 ,  B65H35/02

CPC classification number: B65H18/103 ,  B01J3/02 ,  B01J3/03 ,  B05C11/115 ,  B65H2301/41487 ,  B65H2801/61 ,  C23C14/562 ,  C23C14/564 ,  C23C14/568 ,  C23C16/545 ,  D06B23/18

Abstract: A vacuum roll-to-roll device includes: a first chamber; a second chamber neighboring the first chamber; a shutter disposed between the first chamber and the second chamber; a sealing member attached to the shutter; and a roll-type substrate which moves from the first chamber to the second chamber through the sealing member. A thickness of a lateral side of the roll-type substrate decreases in a direction toward an edge thereof.

Abstract translation: 真空卷对卷装置包括：第一室; 邻近第一室的第二室; 设置在所述第一室和所述第二室之间的快门; 附接到所述活门的密封构件; 以及通过密封构件从第一室移动到第二室的辊型基板。 辊型基板的侧面的厚度在朝向其边缘的方向上减小。

公开(公告)号：US20130034923A1

公开(公告)日：2013-02-07

申请号：US13433013

申请日：2012-03-28

Applicant: In-Bae KIM ,  Jong-Hyun CHOUNG ,  Ji-Young PARK ,  Seon-Il KIM ,  Jae-Woo JEONG ,  Sang Gab KIM ,  Sang-Woo KIM ,  Ki-Beom LEE ,  Dae-Woo LEE ,  Sam-Young CHO

Inventor： In-Bae KIM ,  Jong-Hyun CHOUNG ,  Ji-Young PARK ,  Seon-Il KIM ,  Jae-Woo JEONG ,  Sang Gab KIM ,  Sang-Woo KIM ,  Ki-Beom LEE ,  Dae-Woo LEE ,  Sam-Young CHO

IPC: H01L33/08 ,  C09K13/08 ,  C23F1/02 ,  C09K13/00

CPC classification number: C23F1/18 ,  C09K13/08 ,  C23F1/26 ,  H01L21/32134 ,  H01L27/124

Abstract: An etching composition, a method of forming a metal pattern using the etching composition, and a method of manufacturing a display substrate are disclosed. The etching composition includes about 0.1% by weight to about 25% by weight of ammonium persulfate, about 0.1% by weight to about 25% by weight of an organic acid, about 0.01% by weight to about 5% by weight of a chelating agent, about 0.01% by weight to about 5% by weight of a fluoride compound, about 0.01% by weight to about 5% by weight of a chloride compound, about 0.01% by weight to about 2% by weight of an azole-based compound and a remainder of water. Thus, a copper layer may be stably etched to improve a reliability of manufacturing the metal pattern and the display substrate.

Abstract translation: 公开了一种蚀刻组合物，使用该蚀刻组合物形成金属图案的方法以及一种制造显示衬底的方法。 蚀刻组合物包含约0.1重量％至约25重量％的过硫酸铵，约0.1重量％至约25重量％的有机酸，约0.01重量％至约5重量％的螯合剂 ，约0.01重量％至约5重量％的氟化物，约0.01重量％至约5重量％的氯化物化合物，约0.01重量％至约2重量％的唑类化合物 和余下的水。 因此，可以稳定地蚀刻铜层以提高制造金属图案和显示基板的可靠性。

公开(公告)号：US20120295380A1

公开(公告)日：2012-11-22

申请号：US13566239

申请日：2012-08-03

Applicant: Bong-Kyun Kim ,  Jong-Hyun Choung ,  Byeong-Jin Lee ,  Sun-Young Hong ,  Hong-Sick Park ,  Shi-Yul Kim ,  Ki-Beom Lee ,  Sam-Young Cho ,  Sang-Woo Kim ,  Hyun-Cheol Shin ,  Won-Guk Seo

Inventor： Bong-Kyun Kim ,  Jong-Hyun Choung ,  Byeong-Jin Lee ,  Sun-Young Hong ,  Hong-Sick Park ,  Shi-Yul Kim ,  Ki-Beom Lee ,  Sam-Young Cho ,  Sang-Woo Kim ,  Hyun-Cheol Shin ,  Won-Guk Seo

IPC: H01L33/08

CPC classification number: C23F1/26 ,  C23F1/18 ,  H01L21/32134 ,  H01L27/124 ,  H01L29/458

Abstract: An etchant includes about 0.1 percent by weight to about 30 percent by weight of ammonium persulfate (NH4)2S2O8, about 0.1 percent by weight to about 10 percent by weight of an inorganic acid, about 0.1 percent by weight to about 10 percent by weight of an acetate salt, about 0.01 percent by weight to about 5 percent by weight of a fluorine-containing compound, about 0.01 percent by weight to about 5 percent by weight of a sulfonic acid compound, about 0.01 percent by weight to about 2 percent by weight of an azole compound, and a remainder of water. Accordingly, the etchant may have high stability to maintain etching ability. Thus, manufacturing margins may be improved so that manufacturing costs may be reduced.

Abstract translation: 蚀刻剂包括约0.1重量％至约30重量％的过硫酸铵（NH 4）2 S 2 O 8，约0.1重量％至约10重量％的无机酸，约0.1重量％至约10重量％的 约0.01重量％至约5重量％的含氟化合物的乙酸盐，约0.01重量％至约5重量％的磺酸化合物，约0.01重量％至约2重量％ 的唑类化合物，剩余的水。 因此，蚀刻剂可能具有高稳定性以保持蚀刻能力。 因此，可以提高制造裕度，从而可以降低制造成本。

公开(公告)号：US20120100649A1

公开(公告)日：2012-04-26

申请号：US13100149

申请日：2011-05-03

Applicant: Young-Min KIM ,  Seon-Pil JANG ,  Bo-Sung KIM ,  Yeon-Taek JEONG ,  Yong-Su LEE ,  Tae-Young CHOI ,  Ki-Beom LEE ,  Kang Moon JO

Inventor： Young-Min KIM ,  Seon-Pil JANG ,  Bo-Sung KIM ,  Yeon-Taek JEONG ,  Yong-Su LEE ,  Tae-Young CHOI ,  Ki-Beom LEE ,  Kang Moon JO

IPC: H01L33/08 ,  B05D3/06 ,  H01L21/336 ,  B05D5/00 ,  H01L21/26 ,  B05D3/02 ,  B05D5/06

CPC classification number: H01L29/7869 ,  H01L21/02667 ,  H01L21/324 ,  H01L29/41733 ,  H01L29/66765 ,  H01L29/66969 ,  H01L29/78633

Abstract: Provided is a method for manufacturing a film structure.The method for manufacturing the film structure n includes forming a layer of a precursor material on a substrate, preheating the precursor material, and irradiating the precursor material with microwave radiation to form the film structure.

Abstract translation: 提供一种膜结构的制造方法。 制造薄膜结构体n的方法包括在基材上形成前体材料层，预热前体材料，并用微波辐射照射前体材料，形成薄膜结构体。

公开(公告)号：US20100120181A1

公开(公告)日：2010-05-13

申请号：US12613961

申请日：2009-11-06

Applicant: Sung-Hee KIM ,  Soon-Sung Yoo ,  Jin-Wuk Kim ,  Byung-Geol Kim ,  Byung-Uk Kim ,  Ki-Beom Lee ,  Byong-Hoo Kim ,  Seung-Hyup Shin ,  Jun-Youg Song ,  Myoung-Soo Lee

Inventor： Sung-Hee KIM ,  Soon-Sung Yoo ,  Jin-Wuk Kim ,  Byung-Geol Kim ,  Byung-Uk Kim ,  Ki-Beom Lee ,  Byong-Hoo Kim ,  Seung-Hyup Shin ,  Jun-Youg Song ,  Myoung-Soo Lee

IPC: H01L21/50 ,  C09D11/10

CPC classification number: C09D11/02 ,  B82Y10/00 ,  B82Y40/00 ,  C09D11/033 ,  G03F7/0002

Abstract: Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.

Abstract translation: 公开了一种使用其制造液晶显示（LCD）装置的油墨组合物和方法，其中在使用压印光刻和辊印刷形成LCD装置的图案时，具有由聚合物组成的高耐热性的油墨组合物 即使在高温下也能耐久的树脂和添加剂被用于形成精细图案，并且不断地保持图案线宽和线间隔，油墨组合物由5-45重量％的聚合物树脂组成，5-45重量％的添加剂添加到 保持热稳定性和50-90重量％的有机溶剂，其中油墨组合物即使在90-250℃的高温下也是耐久的。

公开(公告)号：US08760596B2

公开(公告)日：2014-06-24

申请号：US13173457

申请日：2011-06-30

Applicant: Tae-Young Choi ,  Bo Sung Kim ,  Young Min Kim ,  Seon-Pil Jang ,  Kang Moon Jo ,  Yeon Taek Jeong ,  Ki Beom Lee

Inventor： Tae-Young Choi ,  Bo Sung Kim ,  Young Min Kim ,  Seon-Pil Jang ,  Kang Moon Jo ,  Yeon Taek Jeong ,  Ki Beom Lee

IPC: G02F1/136

CPC classification number: H01L27/1225 ,  G02F1/13439 ,  G02F2001/13685 ,  G02F2001/1676

Abstract: A thin film transistor array panel includes a source electrode and a drain electrode on an insulating substrate, an oxide semiconductor on the insulating substrate and overlapping the source electrode and the drain electrode, a passivation layer overlapping the oxide semiconductor and on the insulating substrate, a gate electrode on the passivation layer, and a pixel electrode connected to the drain electrode. The gate electrode and the pixel electrode include a same material. The oxide semiconductor is between the source electrode and the gate electrode, and between the drain electrode and the gate electrode in a cross-sectional view of the thin film transistor array panel.

Abstract translation: 薄膜晶体管阵列面板包括绝缘基板上的源极和漏电极，绝缘基板上的氧化物半导体，与源电极和漏电极重叠，钝化层与氧化物半导体和绝缘基板上重叠， 钝化层上的栅极电极和连接到漏电极的像素电极。 栅电极和像素电极包括相同的材料。 在薄膜晶体管阵列面板的截面图中，氧化物半导体位于源电极和栅电极之间，在漏电极和栅电极之间。

公开(公告)号：US20130115733A1

公开(公告)日：2013-05-09

申请号：US13547783

申请日：2012-07-12

Applicant: Bong-Kyun KIM ,  Hong Sick PARK ,  Wang Woo LEE ,  Young Woo PARK ,  Shin Il CHOI ,  Sang-Woo KIM ,  Ki-Beom LEE ,  Dae-Woo LEE ,  Sam-Young CHO ,  Jeong-Heon CHOI

Inventor： Bong-Kyun KIM ,  Hong Sick PARK ,  Wang Woo LEE ,  Young Woo PARK ,  Shin Il CHOI ,  Sang-Woo KIM ,  Ki-Beom LEE ,  Dae-Woo LEE ,  Sam-Young CHO ,  Jeong-Heon CHOI

IPC: H01L21/465 ,  C09K13/06 ,  C09K13/00

CPC classification number: H01L21/32134 ,  C09K13/06 ,  C09K13/08 ,  C09K13/10 ,  H01L21/465 ,  H01L29/7869

Abstract: Provided is an etchant composition. The etchant composition according to an exemplary embodiment of the present invention includes ammonium persulfate ((NH4)2)S2O8, an azole-based compound, a water-soluble amine compound, a sulfonic acid-containing compound, a nitrate-containing compound, and water.

Abstract translation: 提供了一种蚀刻剂组合物。 根据本发明的示例性实施方案的蚀刻剂组合物包括过硫酸铵（（NH 4）2）S2O8，唑类化合物，水溶性胺化合物，含磺酸化合物，含硝酸盐化合物和 水。

公开(公告)号：US08377325B2

公开(公告)日：2013-02-19

申请号：US13032563

申请日：2011-02-22

Applicant: Nam-Seok Suh ,  Sun-Young Hong ,  Jong-Hyun Choung ,  Bong-Kyun Kim ,  Hong-Sick Park ,  Jean-Ho Song ,  Wang-Woo Lee ,  Do-Won Kim ,  Sang-Woo Kim ,  Won-Guk Seo ,  Hyun-Cheol Shin ,  Ki-Beom Lee ,  Sam-Young Cho

Inventor： Nam-Seok Suh ,  Sun-Young Hong ,  Jong-Hyun Choung ,  Bong-Kyun Kim ,  Hong-Sick Park ,  Jean-Ho Song ,  Wang-Woo Lee ,  Do-Won Kim ,  Sang-Woo Kim ,  Won-Guk Seo ,  Hyun-Cheol Shin ,  Ki-Beom Lee ,  Sam-Young Cho

IPC: B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  C25F3/00

CPC classification number: C09K13/08 ,  C23F1/18 ,  C23F1/26 ,  C23F1/44 ,  H01L21/28088 ,  H01L21/32134 ,  H01L27/1214 ,  H01L27/124 ,  H05K3/067

Abstract: Exemplary embodiments of the present invention provide a metal wiring etchant. A metal wiring etchant according to an exemplary embodiment of the present invention includes ammonium persulfate, an organic acid, an ammonium salt, a fluorine-containing compound, a glycol-based compound, and an azole-based compound.

Abstract translation: 本发明的示例性实施方案提供金属线路蚀刻剂。 根据本发明的示例性实施方式的金属线蚀刻剂包括过硫酸铵，有机酸，铵盐，含氟化合物，二醇类化合物和唑类化合物。

公开(公告)号：US20120244667A1

公开(公告)日：2012-09-27

申请号：US13195444

申请日：2011-08-01

Applicant: Bo Sung KIM ,  Doo-Hyoung Lee ,  Yeon-Taek Jeong ,  Ki-Beom Lee ,  Young-Min Kim ,  Tae-Young Choi ,  Seon-Pil Jang ,  Kang-Moon Jo

Inventor： Bo Sung KIM ,  Doo-Hyoung Lee ,  Yeon-Taek Jeong ,  Ki-Beom Lee ,  Young-Min Kim ,  Tae-Young Choi ,  Seon-Pil Jang ,  Kang-Moon Jo

IPC: H01L21/335 ,  H01B1/12 ,  H01L21/20 ,  C07F17/00

CPC classification number: H01L21/02628 ,  H01L21/02554 ,  H01L21/02565

Abstract: Provided is a precursor composition for an oxide semiconductor. The precursor composition for the oxide semiconductor includes a metal complex compound formed by a metal ion and an organic ligand, wherein the precursor composition is represented by the following Formula 1. MAn   (Formula 1( Herein, M is a metal ion, A is an organic ligand which includes α-substituted carboxylate, and n is a natural number.

Abstract translation: 提供一种用于氧化物半导体的前体组合物。 用于氧化物半导体的前体组合物包括由金属离子和有机配体形成的金属络合物，其中前体组合物由下式1表示。MAn（式1（其中M是金属离子，A是 包括α-取代的羧酸酯的有机配体，n是自然数。

公开(公告)号：US07935552B2

公开(公告)日：2011-05-03

申请号：US12613961

申请日：2009-11-06

Applicant: Sung-Hee Kim ,  Soon-Sung Yoo ,  Jin-Wuk Kim ,  Byung-Geol Kim ,  Byung-Uk Kim ,  Ki-Beom Lee ,  Byong-Hoo Kim ,  Seung-Hyup Shin ,  Jun-Youg Song ,  Myoung-Soo Lee

Inventor： Sung-Hee Kim ,  Soon-Sung Yoo ,  Jin-Wuk Kim ,  Byung-Geol Kim ,  Byung-Uk Kim ,  Ki-Beom Lee ,  Byong-Hoo Kim ,  Seung-Hyup Shin ,  Jun-Youg Song ,  Myoung-Soo Lee

IPC: H01L21/00 ,  H01L21/78

CPC classification number: C09D11/02 ,  B82Y10/00 ,  B82Y40/00 ,  C09D11/033 ,  G03F7/0002

Abstract: Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.

Abstract translation: 公开了一种使用其制造液晶显示（LCD）装置的油墨组合物和方法，其中在使用压印光刻和辊印刷形成LCD装置的图案时，具有由聚合物组成的高耐热性的油墨组合物 即使在高温下也能耐久的树脂和添加剂被用于形成精细图案，并且不断地保持图案线宽和线间隔，油墨组合物由5-45重量％的聚合物树脂组成，5-45重量％的添加剂添加到 保持热稳定性和50-90重量％的有机溶剂，其中油墨组合物即使在90-250℃的高温下也是耐久的。