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公开(公告)号：US09791780B2
公开(公告)日：2017-10-17
申请号：US14983962
申请日：2015-12-30
Applicant: Gigaphoton Inc.
Inventor： Takashi Onose , Kouji Kakizaki , Osamu Wakabayashi , Akiyoshi Suzuki
CPC classification number: G03F7/70058 , G03F7/7035 , G03F7/70408 , G03F7/70575
Abstract: An exposure apparatus may include a laser light source capable of varying a wavelength of a laser beam that is emitted from the laser light source, a mask on which a pattern is formed, the pattern being configured to generate diffracted light by being irradiated with the laser beam, and a controller configured to control, in accordance with a distance between the mask and a substrate, the wavelength of the laser beam that is emitted from the laser light source, wherein the mask is irradiated with the laser beam emitted from the laser light source to perform proximity exposure on a surface of the substrate.
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公开(公告)号：US09748727B2
公开(公告)日：2017-08-29
申请号：US14956709
申请日：2015-12-02
Applicant: Gigaphoton Inc.
Inventor： Kouji Kakizaki , Hiroaki Tsushima , Junichi Fujimoto , Natsushi Suzuki , Hisakazu Katsuumi
IPC: H01S3/0977 , H01S3/0971 , H01S3/038 , H01S3/08
CPC classification number: H01S3/09713 , H01S3/0384 , H01S3/08009 , H01S3/0977
Abstract: A preliminary ionization discharge device used in a laser chamber of a laser apparatus using preliminary ionization includes a dielectric pipe; a preliminary ionization inner electrode provided inside the dielectric pipe; and a preliminary ionization outer electrode provided outside the dielectric pipe. The preliminary ionization outer electrode includes: a contact plate part configured to contact the dielectric pipe; and an elastic part configured to exert a force in a direction in which the contact plate part pushes the dielectric pipe.
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公开(公告)号：US09350133B2
公开(公告)日：2016-05-24
申请号：US14579698
申请日：2014-12-22
Applicant: GIGAPHOTON INC.
Inventor： Osamu Wakabayashi , Hiroaki Tsushima , Kouji Kakizaki
CPC classification number: H01S3/0014 , H01S3/034 , H01S3/036 , H01S3/10069 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
Abstract: A method of controlling a laser apparatus may include: exchanging a gain medium in a chamber configured to output a laser beam by exciting the gain medium; first measuring, after the exchanging, pulse energy of a laser beam which is oscillated in the chamber under a specific gas pressure and a specific charge voltage; calculating an approximate expression indicating a relationship between the pulse energy of the laser beam and the gas pressure in the chamber and the charge voltage, or a table representing a correlationship between the pulse energy, the gas pressure and the charge voltage, based on the specific pressure, the specific charge voltage and the pulse energy in the first measuring; storing the approximate expression or the table; second measuring, after the first measuring, pulse energy Er of a laser beam oscillated in the chamber; calculating pulse energy Eec which is supposed to be obtained directly after the exchanging under the gas pressure and the charge voltage in the second measuring based on the approximate expression or the table; calculating a reduction amount ΔEd of pulse energy based on the pulse energy Eec and the pulse energy Er using ΔEd=Eec−Er; and calculating a partial gas exchange amount Q for partial gas exchange in the chamber based on the reduction amount ΔEd of pulse energy.
Abstract translation: 控制激光装置的方法可以包括：在配置成通过激励增益介质输出激光束的腔室中交换增益介质; 在交换之后，首先测量在特定气体压力和特定充电电压下在腔室中振荡的激光束的脉冲能量; 计算表示激光束的脉冲能量与腔室中的气体压力与充电电压之间的关系的近似表达式，或表示脉冲能量，气体压力和充电电压之间的相关性的表格， 压力，第一次测量中的具体充电电压和脉冲能量; 存储近似表达式或表格; 在第一次测量之后，第二次测量激光束的脉冲能量Er在腔室中振荡; 基于近似表达式或表格，计算在气体压力下的交换和第二测量中的充电电压之间直接获得的脉冲能量Eec; 使用＆Dgr; Ed = Eec-Er计算基于脉冲能量Eec和脉冲能量Er的脉冲能量的减少量＆Dgr; Ed; 并且基于脉冲能量的减少量＆Dgr; Ed计算腔室中部分气体交换的部分气体交换量Q。
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公开(公告)号：US09332625B2
公开(公告)日：2016-05-03
申请号：US14707990
申请日：2015-05-08
Applicant: GIGAPHOTON INC.
Inventor： Toshihiro Nishisaka , Yukio Watanabe , Osamu Wakabayashi , Kouji Kakizaki , Michio Shinozaki
CPC classification number: G03F7/70033 , G03F7/70975 , H05G2/00 , H05G2/003 , H05G2/008
Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
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25.发明授权公开(公告)号：US09093814B2
公开(公告)日：2015-07-28
申请号：US14220956
申请日：2014-03-20
Applicant: Gigaphoton Inc.
Inventor： Takahito Kumazaki , Kouji Kakizaki , Masanori Yashiro
CPC classification number: H01S3/038 , G02B5/208 , G03F7/20 , G03F7/70025 , H01S3/034 , H01S3/08004 , H01S3/08009 , H01S3/225
Abstract: An optical device includes a plate-like optical element made of a calcium fluoride crystal, a holding member to sandwich and hold the optical element, a seal member provided between the holding member and one surface of the optical element in close contact therewith, and a cushioning member provided between the holding member and the other surface of the optical element in contact therewith. The cushioning member is made of one of a 304 stainless steel, a 303 stainless steel, a 316 stainless steel, a Hastelloy™ alloy, a carbon steel for machine construction S45C, and Inconel™.
Abstract translation: 光学装置包括由氟化钙晶体制成的板状光学元件，夹持并保持光学元件的保持构件，设置在保持构件与光学元件的与其紧密接触的一个表面之间的密封构件， 缓冲构件设置在保持构件与光学元件的与其接触的另一表面之间。 缓冲构件由304不锈钢，303不锈钢，316不锈钢，Hastelloy™合金，用于机械结构S45C的碳素钢和Inconel™中的一种制成。
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Patent Agency Ranking
公开(公告)号：US08901524B2
公开(公告)日：2014-12-02
申请号：US14024198
申请日：2013-09-11
Applicant: Gigaphoton Inc
Inventor： Takeshi Asayama , Kouji Kakizaki , Akira Endo , Shinji Nagai
Abstract: An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.
Abstract translation: 一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动， 极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面 与离子收集器装置中的离子相撞。
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公开(公告)号：US11469568B2
公开(公告)日：2022-10-11
申请号：US16389860
申请日：2019-04-19
Applicant: Gigaphoton Inc.
Inventor： Kouji Kakizaki , Osamu Wakabayashi
IPC: H01S3/00 , H01S3/10 , H01S3/11 , H01S3/23 , H01S3/225 , H01S3/097 , H01S5/50 , H01S3/13 , H01S3/16 , H01S3/0971
Abstract: A laser apparatus includes: (A) a solid-state laser apparatus that outputs burst seed pulsed light containing a plurality of pulses; (B) an excimer amplifier that amplifies the burst seed pulsed light in a discharge space in a single occurrence of discharge and outputs the amplified light as amplified burst pulsed light; (C) an energy sensor that measures the energy of the amplified burst pulsed light; and (D) a laser controller that corrects the timing at which the solid-state laser apparatus is caused to output the burst seed pulsed light based on the relationship of the difference between the timing at which the solid-state laser apparatus outputs the burst seed pulsed light and the timing at which the discharge occurs in the discharge space with a measured value of the energy.
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公开(公告)号：US11350515B2
公开(公告)日：2022-05-31
申请号：US16919216
申请日：2020-07-02
Applicant: Gigaphoton Inc. , The University of Tokyo
Inventor： Hironori Igarashi , Kouji Kakizaki , Yohei Kobayashi , Shuntaro Tani
IPC: H05G2/00
Abstract: A laser system includes A. a laser apparatus configured to output pulsed laser light; B. a rare gas chamber; C. a light focusing optical system configured to focus the pulsed laser light in the rare gas chamber to excite the rare gas; D. a filter chamber configured to selectively transmit EUV light contained in harmonic light produced in the rare gas chamber; E. an exhauster connected to the filter chamber; F. at least one through hole disposed in the optical path between the rare gas chamber and the filter chamber; G. a rare gas supplier; H. a flow rate control valve configured to control the flow rate of the rare gas flowing from the rare gas supplier into the rare gas chamber; I. a first pressure sensor configured to detect the pressure of the rare gas in the rare gas chamber; J. a first controller configured to control the flow rate control valve in such a way that the pressure detected with the first pressure sensor falls within a reference range; and K. a second controller configured to control the pulse energy of the pulsed laser light outputted from the laser apparatus based at least on the pressure detected with the first pressure sensor.
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公开(公告)号：US10103509B2
公开(公告)日：2018-10-16
申请号：US15836878
申请日：2017-12-10
Applicant: Gigaphoton, Inc.
Inventor： Kouji Kakizaki , Akira Suwa , Osamu Wakabayashi , Hiroshi Umeda
Abstract: The excimer laser device receives data on a target value of pulse energy from an external device and outputs a pulse laser beam. The excimer laser device includes a master oscillator, at least one power amplifier including a chamber provided in an optical path of the pulse laser beam outputted from the master oscillator, a pair of electrodes provided in the chamber, and an electric power source configured to apply voltage to the pair of electrodes, and a controller configured to control the electric power source of one power amplifier of the at least one power amplifier to stop applying the voltage to the pair of electrodes based on the target value of the pulse energy.
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公开(公告)号：US10096966B2
公开(公告)日：2018-10-09
申请号：US15290518
申请日：2016-10-11
Applicant: Gigaphoton Inc.
Inventor： Akira Suwa , Kouji Kakizaki , Hiroaki Tsushima , Tomoyuki Ohkubo , Hiroshi Umeda , Hisakazu Katsuumi
IPC: H01S3/097 , H01G4/14 , H01G4/258 , H01G4/30 , H01S3/041 , H01S3/225 , H01S3/03 , H01S3/036 , H01S3/038
Abstract: A gas laser device may include: a laser chamber containing laser gas; a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; and a condenser including a polyimide dielectric and configured to supply power to between the first discharge electrode and the second discharge electrode.
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