公开(公告)号：US09331450B2

公开(公告)日：2016-05-03

申请号：US14663086

申请日：2015-03-19

Applicant: Gigaphoton Inc.

Inventor： Takeshi Asayama ,  Hakaru Mizoguchi ,  Kouji Kakizaki ,  Hiroaki Tsushima ,  Osamu Wakabayashi ,  Kazuya Takezawa

IPC: H01S3/097 ,  H01S3/038 ,  H01S3/225 ,  H01S3/034 ,  H01S3/08 ,  H01S3/104 ,  H01S3/036

CPC classification number: H01S3/038 ,  H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/0388 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/104 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256

Abstract: A laser apparatus according to embodiments may include a laser chamber including a laser gain medium; a power source; a first electrode to which a voltage is applied from the power source and a second electrode that is grounded, the first and second electrodes being disposed in the laser chamber; and a connector connected to the power source, and supporting the first electrode in a way that allows the first electrode to move toward a side where the second electrode is disposed.

Abstract translation: 根据实施例的激光装置可以包括包括激光增益介质的激光室; 电源; 从电源施加电压的第一电极和接地的第二电极，第一和第二电极设置在激光室中; 以及连接到所述电源的连接器，并且以允许所述第一电极向所述第二电极设置的一侧移动的方式支撑所述第一电极。

公开(公告)号：US09233782B2

公开(公告)日：2016-01-12

申请号：US13715897

申请日：2012-12-14

Applicant: GIGAPHOTON INC

Inventor： Takanobu Ishihara ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Osamu Wakabayashi

IPC: B67D5/54 ,  B67D5/40 ,  B65D47/06 ,  H05G2/00

CPC classification number: B65D47/06 ,  H05G2/005 ,  H05G2/006

Abstract: A target supply device may include a tank formed cylindrically with a first material, a cylindrical portion for covering the tank, the cylindrical portion being formed of a second material having higher tensile strength than the first material, a first lid formed of the second material and having a through-hole, the first lid being provided at one end in an axial direction of the cylindrical portion, a second lid formed of the second material and provided at another end opposite the one end in the axial direction of the cylindrical portion, and a nozzle provided to be in fluid communication with the interior of the tank and to pass through the through-hole, the nozzle being formed of the first material.

Abstract translation: 目标供给装置可以包括：具有第一材料的圆柱形的罐，用于覆盖罐的圆柱形部分，圆柱形部分由具有比第一材料更高的拉伸强度的第二材料形成，第一盖由第二材料形成， 具有通孔，所述第一盖设置在所述圆筒部的轴向的一端，所述第二盖由所述第二材料形成，并且设置在所述圆筒部的轴向的一端的相反侧的另一端，以及 喷嘴，其设置成与所述罐的内部流体连通并且穿过所述通孔，所述喷嘴由所述第一材料形成。

公开(公告)号：US09198272B2

公开(公告)日：2015-11-24

申请号：US14215527

申请日：2014-03-17

Applicant: GIGAPHOTON INC.

Inventor： Masaki Nakano ,  Osamu Wakabayashi

IPC: H05G2/00 ,  B05B12/02 ,  B05B17/06 ,  B05B9/00

CPC classification number: H05G2/006 ,  B05B9/002 ,  B05B12/02 ,  B05B17/0607 ,  B05B17/0615 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/7085 ,  H01L21/268 ,  H01L22/10 ,  H05G2/003 ,  H05G2/008

Abstract: A target supply device may include a reservoir configured to hold a target material in its interior in liquid form, a vibrating element configured to apply vibrations to the reservoir, a target sensor configured to detect droplets of the target material outputted from the reservoir, a control unit configured to set parameters based on a result of the detection performed by the target sensor, a function generator configured to generate an electrical signal having a waveform based on the parameters, and a power source configured to apply a driving voltage to the vibrating element in accordance with the electrical signal.

Abstract translation: 目标供应装置可以包括被配置为在其内部保持液体形式的目标材料的储存器，被配置为向储存器施加振动的振动元件，配置成检测从储存器输出的目标材料的液滴的目标传感器， 被配置为基于由所述目标传感器执行的检测结果来设置参数的单元，被配置为生成基于所述参数的具有波形的电信号的功能发生器，以及被配置为向所述振动元件施加驱动电压的电源 符合电信号。

公开(公告)号：US09184555B2

公开(公告)日：2015-11-10

申请号：US14298563

申请日：2014-06-06

Applicant: Gigaphoton Inc.

Inventor： Masaya Yoshino ,  Takashi Onose ,  Osamu Wakabayashi

IPC: H01S3/23 ,  H01S3/00 ,  H01S3/13 ,  H01S3/134 ,  H01S3/10 ,  H01S3/11 ,  H01S3/225 ,  H01S3/16

CPC classification number: H01S3/2308 ,  H01S3/0057 ,  H01S3/0092 ,  H01S3/10023 ,  H01S3/11 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/1636 ,  H01S3/2251 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2333 ,  H01S3/2366

Abstract: A laser system may include: a master oscillator configured to output pulsed laser light; an amplification device for amplifying the pulsed laser light from the master oscillator; a first timing detector configured to detect a first timing at which the master oscillator outputs the pulsed laser light; a second timing detector configured to detect a second timing at which the amplification device discharges; and a controller configured to, based on results of detection by the first timing detector and the second timing detector, control at least one of the first timing and the second timing so that the amplification device discharges when the pulsed laser light passes through a discharge space of the amplification device.

Abstract translation: 激光系统可以包括：主振荡器，被配置为输出脉冲激光; 用于放大来自主振荡器的脉冲激光的放大装置; 第一定时检测器，被配置为检测主振荡器输出脉冲激光的第一定时; 第二定时检测器，被配置为检测放大装置放电的第二定时; 以及控制器，被配置为基于所述第一定时检测器和所述第二定时检测器的检测结果，控制所述第一定时和所述第二定时中的至少一个，使得当所述脉冲激光通过放电空间时所述放大装置放电 的放大装置。

公开(公告)号：US09179534B2

公开(公告)日：2015-11-03

申请号：US14158710

申请日：2014-01-17

Applicant: GIGAPHOTON INC.

Inventor： Yukio Watanabe ,  Osamu Wakabayashi ,  Miwa Igarashi

IPC: H05G2/00 ,  G03F7/20 ,  G21K1/04

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/04 ,  H05G2/003 ,  H05G2/005

Abstract: An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.

Abstract translation: 一种用于向处理单元提供极紫外光的极紫外光源装置，用于通过使用极紫外光进行处理。 所述极紫外光源装置具有：向所述处理单元供给所述极紫外光的室， 收集器反射镜，用于收集在室中产生的极紫外光，以将极紫外光输出到处理单元; 以及光路连接模块，其用于限定所述室与所述处理单元之间的所述极紫外光的路线，并将所述极紫外光的路径与外部隔离。

公开(公告)号：US09130345B2

公开(公告)日：2015-09-08

申请号：US14152813

申请日：2014-01-10

Applicant: GIGAPHOTON, INC.

Inventor： Tatsuya Yanagida ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01S3/10

CPC classification number: H01S3/10061 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/2308 ,  H01S3/2383 ,  H01S2301/20 ,  H05G2/003 ,  H05G2/008

Abstract: An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

Abstract translation: 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。

公开(公告)号：US08698114B2

公开(公告)日：2014-04-15

申请号：US13759970

申请日：2013-02-05

Applicant: Gigaphoton Inc.

Inventor： Masato Moriya ,  Hideo Hoshino ,  Hakaru Mizoguchi ,  Osamu Wakabayashi

IPC: G21K5/00

CPC classification number: H01S3/10 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/034 ,  H01S3/1061 ,  H01S3/1307 ,  H01S3/136 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.

Abstract translation: EUV光源装置适当地补偿由热量改变的激光束的波前。 在放大激光束的放大系统中提供波前补偿器和传感器。 传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。 波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。 波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。

公开(公告)号：US20130107899A1

公开(公告)日：2013-05-02

申请号：US13657964

申请日：2012-10-23

Applicant: Gigaphoton Inc.

Inventor： Takashi MATSUNAGA ,  Masaya Yoshino ,  Osamu Wakabayashi

IPC: H01S3/10

CPC classification number: H01S3/0818 ,  H01S3/0014 ,  H01S3/005 ,  H01S3/076 ,  H01S3/08009 ,  H01S3/225

Abstract: A laser apparatus may include a laser oscillator capable of tuning a spectral bandwidth of a laser beam to be outputted therefrom, a spectrum detecting unit that detects a spectrum of the laser beam outputted from the laser oscillator and an attenuation unit capable of regulating light intensity of the laser beam that enters the spectrum detecting unit. The attenuation unit may include a variable attenuator whose transmittance varies depending on an incident position of the laser beam and a movement mechanism that moves the variable attenuator so that the incident position of the laser beam is changed.

Abstract translation: 激光装置可以包括能够调谐要从其输出的激光束的光谱带宽的激光振荡器，检测从激光振荡器输出的激光束的光谱的光谱检测单元和能够调节激光振荡器的光强度的衰减单元 进入频谱检测单元的激光束。 衰减单元可以包括可变衰减器，其可变衰减器根据激光束的入射位置而变化，移动机构使可变衰减器移动，从而改变激光束的入射位置。

公开(公告)号：US12197132B2

公开(公告)日：2025-01-14

申请号：US17817190

申请日：2022-08-03

Applicant: Gigaphoton Inc.

Inventor： Koichi Fujii ,  Osamu Wakabayashi

IPC: G03F7/00 ,  H01S3/225 ,  H01S5/12

Abstract: An exposure system according to an aspect of the present disclosure includes a laser apparatus that outputs pulsed laser light, an illuminating optical system that guides the pulsed laser light to a reticle, a reticle stage, and a processor that controls the output of the pulsed laser light from the laser apparatus and the movement of the reticle performed by the reticle stage. The reticle has a first region where a first pattern is disposed and a second region where a second pattern is disposed, and the first and second regions are each a region continuous in a scan width direction perpendicular to a scan direction of the pulsed laser light, with the first and second regions arranged side by side in the scan direction. The processor controls the laser apparatus to output the pulsed laser light according to each of the first and second regions by changing the values of control parameters of the pulsed laser light in accordance with each of the first and second regions.

公开(公告)号：US12105425B2

公开(公告)日：2024-10-01

申请号：US17818174

申请日：2022-08-08

Applicant: Gigaphoton Inc.

Inventor： Koichi Fujii ,  Osamu Wakabayashi ,  Toshihiro Oga

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70025 ,  G03F7/70041 ,  G03F7/70866

Abstract: An exposure method includes reading data representing a relationship between a first parameter relating to an energy ratio between energy of first pulsed laser light having a first wavelength and energy of second pulsed laser light having a second wavelength longer than the first wavelength and a second parameter relating to a sidewall angle of a resist film that is the angle of a sidewall produced when the resist film is exposed to the first pulsed laser light and the second pulsed laser light, and determining a target value of the first parameter based on the data and a target value of the second parameter; and exposing the resist film to the first pulsed laser light and the second pulsed laser light by controlling a narrowed-line gas laser apparatus to output the first pulsed laser light and the second pulsed laser light based on the target value of the first parameter.