公开(公告)号：US20170025141A1

公开(公告)日：2017-01-26

申请号：US15289884

申请日：2016-10-10

Applicant: Seagate Technology LLC

Inventor： XiaoMin Yang ,  Shuaigang Xiao ,  Kim Y. Lee ,  Koichi Wago ,  Philip Steiner

IPC: G11B5/74 ,  G03F7/00 ,  G11B5/855

CPC classification number: G11B5/746 ,  G03F7/0002 ,  G11B5/855

Abstract: The embodiments disclose a method including patterning a template substrate to have different densities using hierarchical block copolymer density patterns in different zones including a first pattern and a second pattern, using a first directed self-assembly to pattern a first zone in the substrate using a first block copolymer material, and using a second directed self-assembly to pattern a second zone in the substrate using a second block copolymer material.

Abstract translation: 实施方案公开了一种方法，其包括使用第一定向自组装使用第一和第二图案在第一图案和第二图案中分层嵌段共聚物密度图案在不同区域中图案化模板基底以具有不同的密度，以使用第一 嵌段共聚物材料，并且使用第二定向自组装来使用第二嵌段共聚物材料在基材中图案化第二区域。

公开(公告)号：US20150356989A1

公开(公告)日：2015-12-10

申请号：US14830534

申请日：2015-08-19

Applicant: Seagate Technology LLC

Inventor： Yuan Xu ,  Kim Y. Lee ,  David S. Kuo ,  Koichi Wago ,  Wei Hu

IPC: G11B5/84

CPC classification number: G11B5/84 ,  G11B5/746 ,  G11B5/855 ,  Y10T428/24479 ,  Y10T428/24802

Abstract: A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A block copolymer (“BCP”) material is deposited on the imprinted resist, wherein a molecular dimension L0 of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains.

Abstract translation: 纳米图案的方法包括在抗蚀剂中用压印模具压印特征以在印刷抗蚀剂上形成一个或多个形貌表面图案。 在印刷抗蚀剂上沉积嵌段共聚物（“BCP”）材料，其中BCP材料的分子尺寸L0与印迹抗蚀剂上的一个或多个形貌表面图案的间隔尺寸相关联。 将沉积的BCP退火，并且去除退火的BCP的至少一部分，形成具有离散区域的模板。

公开(公告)号：US20150167155A1

公开(公告)日：2015-06-18

申请号：US14635847

申请日：2015-03-02

Applicant: Seagate Technology LLC

Inventor： Michael Feldbaum ,  Koichi Wago ,  David Kuo

IPC: C23C14/48 ,  C23C14/08 ,  G11B5/84 ,  C23C14/06

CPC classification number: C23C14/48 ,  C23C14/0605 ,  C23C14/08 ,  G11B5/84 ,  G11B5/8408 ,  G11B5/855 ,  Y10T428/24612

Abstract: Provided herein is a method including conformally depositing a first layer over a patterned resist; depositing a second, thicker layer over the first layer; etching the second layer to expose the first layer; and patterning a magnetic layer by ion implantation in accordance with the patterned resist to form a patterned magnet layer.

Abstract translation: 本文提供了一种方法，包括在图案化的抗蚀剂上共形沉积第一层; 在第一层上沉积第二较厚的层; 蚀刻第二层以暴露第一层; 以及通过根据图案化的抗蚀剂的离子注入构图磁性层以形成图案化磁体层。

公开(公告)号：US20140308439A1

公开(公告)日：2014-10-16

申请号：US14315307

申请日：2014-06-25

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Zhaohui Fan ,  Yuan Xu ,  Justin Jia-Jen Hwu ,  Koichi Wago ,  David Shiao-Min Kuo

IPC: G11B5/84 ,  C23C16/513 ,  C23C16/455

CPC classification number: G11B5/8408 ,  C23C16/45525 ,  C23C16/513 ,  G11B5/855 ,  H01F41/32 ,  Y10T428/24802

Abstract: The embodiments disclose a method of protecting patterned magnetic materials of a stack, including depositing a thin continuous film of an inert material that is inert to the magnetic materials of a patterned stack upon which the thin continuous film is being deposited and forming a thin interim interface layer from the thin continuous film to protect top and sidewall areas of non-etched higher relief magnetic islands and magnetic film etched surfaces of the patterned stack from air exposure damage and damage from contact with backfilled materials.

Abstract translation: 这些实施方案公开了一种保护叠层的图案化磁性材料的方法，包括沉积惰性材料的薄连续薄膜，惰性材料对图案化叠层的磁性材料是惰性的，薄膜连续薄膜将沉积在其上并形成薄的临时界面 层，以保护未蚀刻的更高的浮雕磁岛的顶部和侧壁区域以及图案化叠层的磁性膜蚀刻表面从空气暴露损坏和与回填材料接触的损坏。

公开(公告)号：US20140193538A1

公开(公告)日：2014-07-10

申请号：US14160220

申请日：2014-01-21

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Kim Y. Lee ,  Bing K. Yen ,  David S. Kuo ,  Koichi Wago ,  Shih-fu Lee ,  Dieter K. Weller

IPC: B29C59/02

CPC classification number: B29C59/022 ,  G03F7/0002

Abstract: Provided herein is an apparatus, including an imprint template including a dual-imprint pattern, wherein the dual-imprint pattern is characteristic of imprinting a first pattern on the template with a first template and a second pattern on the template with a second template, and wherein the first pattern and the second pattern at least partially overlap to form the dual-imprint pattern.

Abstract translation: 本文提供了一种装置，其包括压印模板，其包括双重印记图案，其中所述双印记图案的特征在于，在所述模板上用第一模板和第二模板在第二模板上印刷模板上的第一图案，以及 其中所述第一图案和所述第二图案至少部分地重叠以形成所述双印刷图案。

公开(公告)号：US08719616B2

公开(公告)日：2014-05-06

申请号：US13775098

申请日：2013-02-22

Applicant: Seagate Technology, LLC

Inventor： Koichi Wago ,  Sundeep Chauhan ,  David M. Tung

IPC: G06F1/00 ,  H04L7/00

CPC classification number: H03L7/06 ,  H01J37/3174 ,  H03B21/00 ,  H03L7/08

Abstract: A method for encoder frequency-shift compensation includes determining frequency values of an input encoder signal, determining repeatable frequency-shifts of the frequency values and generating a frequency-shift compensated clock using the repeatable frequency-shifts. A frequency-shift compensated clock includes a synthesizer configured to generate a frequency-shift compensated clock signal using repeatable frequency shifts and encoder clock signals.

Abstract translation: 一种用于编码器频移补偿的方法包括：确定输入编码器信号的频率值，确定频率值的可重复频移，并使用可重复的频移产生频移补偿时钟。 频移补偿时钟包括合成器，其被配置为使用可重复的频移和编码器时钟信号来产生频移补偿的时钟信号。

公开(公告)号：US11732295B2

公开(公告)日：2023-08-22

申请号：US17137837

申请日：2020-12-30

Applicant: Seagate Technology LLC

Inventor： Xiaomin Yang ,  ShuaiGang Xiao ,  David S. Kuo ,  Koichi Wago ,  Thomas Young Chang

IPC: G03F7/40 ,  G03F7/004 ,  C12Q1/6869 ,  C12M1/34 ,  B82Y15/00

CPC classification number: C12Q1/6869 ,  C12M1/34 ,  B82Y15/00 ,  C12Q2563/159 ,  C12Q1/6869 ,  C12Q2565/607 ,  C12Q2565/629

Abstract: Apparatus and methods relating to DNA sequencing are provided. In one embodiment, a DNA sequencing device includes a nanochannel having a width that is approximately 0.3 nm to approximately 20 nm. A pair of electrodes having portions exposed to the nanochannel may form a tunneling current electrode (TCE) with an electrode gap of approximately 0.1 nm to approximately 2 nm, and more particularly about 0.3 nm to about 1 nm. In one embodiment, at least one of the pair of electrodes is formed as a suspended electrode. An actuator may be associated with the suspended electrode to displace it relative to the other electrode. In various embodiments, the nanochannel and/or the electrodes may be formed using thermal reflow processes to reduce the size of such features.

公开(公告)号：US11542552B2

公开(公告)日：2023-01-03

申请号：US16909827

申请日：2020-06-23

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Kim Yang Lee ,  Thomas Young Chang ,  David S. Kuo ,  ShuaiGang Xiao ,  Xiaomin Yang ,  Koichi Wago

IPC: B81C1/00 ,  B01L3/00 ,  G01N27/327 ,  C12Q1/6869 ,  G01N27/447

Abstract: A DNA sequencing device and related methods, wherein the device includes a substrate, a nanochannel formed in the substrate, a first electrode positioned on a first side of the nanochannel, and a second electrode. The second electrode is positioned on a second side of the nanochannel opposite the first electrode and is spaced apart from the first electrode to form an electrode gap that is exposed in the nanochannel. At least a portion of first electrode is movable relative to the second electrode to decrease a size of the electrode gap.

公开(公告)号：US11320397B2

公开(公告)日：2022-05-03

申请号：US16940486

申请日：2020-07-28

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Thomas Young Chang ,  David S. Kuo ,  Kim Yang Lee ,  Koichi Wago

IPC: G01N27/447 ,  B01L3/00 ,  G01N33/487 ,  C12Q1/6869 ,  B82Y15/00 ,  B82Y30/00

Abstract: A DNA sequencing device, and related method, which include an electrode and a plurality of spaced apart alignment structures. The electrode defines an electrode gap, the electrode being operable to detect a change in tunneling current as a DNA strand passes through the electrode gap. The plurality of spaced apart alignment structures are arranged to position nucleotides of the DNA strand in a predetermined orientation as the DNA strand passes through the electrode gap.

公开(公告)号：US10889857B2

公开(公告)日：2021-01-12

申请号：US15886533

申请日：2018-02-01

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Xiaomin Yang ,  ShuaiGang Xiao ,  David S. Kuo ,  Koichi Wago ,  Thomas Young Chang

IPC: C12Q1/6869 ,  B82Y15/00 ,  C12M1/34

Abstract: Apparatus and methods relating to DNA sequencing are provided. In one embodiment, a DNA sequencing device includes a nanochannel having a width that is approximately 0.3 nm to approximately 20 nm. A pair of electrodes having portions exposed to the nanochannel may form a tunneling current electrode (TCE) with an electrode gap of approximately 0.1 nm to approximately 2 nm, and more particularly about 0.3 nm to about 1 nm. In one embodiment, at least one of the pair of electrodes is formed as a suspended electrode. An actuator may be associated with the suspended electrode to displace it relative to the other electrode. In various embodiments, the nanochannel and/or the electrodes may be formed using thermal reflow processes to reduce the size of such features.