公开(公告)号：US20100034998A1

公开(公告)日：2010-02-11

申请号：US12448998

申请日：2008-01-15

Applicant: Gerhard Schoetz ,  Karsten Braeuer ,  Jan Vydra

Inventor： Gerhard Schoetz ,  Karsten Braeuer ,  Jan Vydra

IPC: C03C13/04 ,  C03B37/018 ,  B28B23/08

CPC classification number: C03B37/01426 ,  C03B37/01211 ,  C03B37/01466 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2203/42 ,  C03C3/06

Abstract: To improve a known method for making a quartz glass tube as a semifinished product for the manufacture of optical fibers, the tube comprising an inner fluorine-doped quartz glass layer and an outer quartz glass layer, so as to achieve inexpensive manufacture and improved dimensional stability of the quartz glass tube, it is suggested according to the invention that the quartz glass of the inner layer should be produced in a first plasma deposition process with formation of an inner layer having a wall thickness of at least 1.5 mm, with a fluorine content of at least 1.5% by wt. being set in the quartz glass, and that the quartz glass of the outer layer should be produced in a second plasma deposition process and deposited directly or indirectly on the inner layer with formation of a composite tube, and that the composite tube should be elongated into the quartz glass tube.

Abstract translation: 为了改进用于制造石英玻璃管作为制造光纤的半成品的已知方法，该管包括内部掺氟石英玻璃层和外部石英玻璃层，以便实现便宜的制造和改善的尺寸稳定性 的石英玻璃管，根据本发明提出，内层的石英玻璃应该在第一等离子体沉积工艺中生产，形成壁厚至少为1.5mm的内层，氟含量 至少1.5重量％。 设置在石英玻璃中，并且外层的石英玻璃应该在第二等离子体沉积工艺中生产并直接或间接沉积在内层上，形成复合管，并且复合管应该被拉长成 石英玻璃管。

公开(公告)号：US20100003609A1

公开(公告)日：2010-01-07

申请号：US12496688

申请日：2009-07-02

Applicant: Shigeru Maida ,  Hisatoshi Otsuka

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: G03F1/00 ,  C03C14/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B23/0026 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  Y10T428/31616

Abstract: In a titania-doped quartz glass member having a surface where EUV light of up to 70 nm wavelength is reflected, a refractive index distribution in the surface has only one extreme point within a central 80% region of the member. The titania-doped quartz glass member has a surface with a high level of precision and thus can be formed into an EUV lithography photomask substrate which is improved in flatness and thermal expansion properties.

Abstract translation: 在具有反射高达70nm波长的EUV光的表面的二氧化钛掺杂石英玻璃构件中，表面中的折射率分布在构件的中心80％区域内仅具有一个极值点。 掺杂二氧化钛的石英玻璃构件具有高精度的表面，因此可以形成为平面度和热膨胀性能提高的EUV光刻光掩模基板。

公开(公告)号：US20080274869A1

公开(公告)日：2008-11-06

申请号：US11597087

申请日：2005-05-11

Applicant: Wolfgang Englisch ,  Ralf Takke ,  Bodo Kuehn ,  Bruno Uebbing ,  Rainer Koeppler

Inventor： Wolfgang Englisch ,  Ralf Takke ,  Bodo Kuehn ,  Bruno Uebbing ,  Rainer Koeppler

IPC: C03C3/06 ,  C03B29/00

CPC classification number: C03B19/1469 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42

Abstract: The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (

Abstract translation: 本发明涉及一种用于传输波长为15nm和更短的辐射的光学部件的石英玻璃坯料，该坯料由掺杂有钛和/或氟的高纯石英玻璃组成，其特征在于极高的均匀性 。 均匀性涉及以下特征：a）由TiO 2分布（<0.05％TIO 2 2）的局部方差引起的微不均匀性，其平均值在 （5umum）相对于TiO 2含量的平均值），b）主要功能方向上的热膨胀系数Deltaalpha的绝对最大不均匀性（ <5ppb / K），c）在石英玻璃坯料的可用表面上的热膨胀系数的径向变化不大于0.4ppb /（K.cm）; d）具有特定进展的2nm / cm 2的主要功能方向的633nm处的最大应力双折射（SDB） 和e）根据（b）在光学表面上平均的Deltaalpha的特定进展。 所述石英玻璃坯料只能通过将含有硅，钛和/或氟的化合物的火焰水解获得的掺杂石英玻璃作为大体积的棒状起始体形成为均匀的石英玻璃坯料，其中使用几个成形步骤 并均质化。

公开(公告)号：US07312170B2

公开(公告)日：2007-12-25

申请号：US10548237

申请日：2004-03-03

Applicant: Hiroyuki Nishimura ,  Akira Fujinoki

Inventor： Hiroyuki Nishimura ,  Akira Fujinoki

IPC: C03C3/06 ,  C03B37/07 ,  C03B37/075 ,  C03B37/018

CPC classification number: C03B32/00 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/42 ,  Y02P40/57

Abstract: The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017 to 10×1017 molecules/cm3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.

Abstract translation: 本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化 能量密度，例如 每个脉冲的能量密度为0.3mJ / cm 2以下。 本发明还提供一种制造该方法的方法。 为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10 10 17分子/ cm 3，当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为 0.25至25。

公开(公告)号：US07232778B2

公开(公告)日：2007-06-19

申请号：US10315984

申请日：2002-12-11

Applicant: Hisatoshi Otsuka ,  Kazuo Shirota

Inventor： Hisatoshi Otsuka ,  Kazuo Shirota

IPC: C03C3/06

CPC classification number: C03B19/1415 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03B2207/36 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/52

Abstract: In a synthetic quartz glass ingot which is produced by vapor phase hydrolyzing or oxidatively decomposing a silica-forming starting compound in an oxyhydrogen flame such that silica growth in a direction occurs at a silica particle deposition and melting face, striae visible when viewed from a direction perpendicular to the silica growth direction are distributed periodically over the silica growth direction. The ingot can be used in the production of optical-grade high-homogeneity synthetic quartz glass elements for excimer laser applications, particularly ArF excimer laser applications, in the production of laser damage-resistant optical elements used with light sources such as excimer lasers, and in the production of UV optical fiber.

Abstract translation: 在通过气相水解或氧化分解氧化氢火焰中的二氧化硅形成起始化合物而生成的合成石英玻璃锭中，使得二氧化硅生长沿方向发生在二氧化硅颗粒沉积和熔化面上，从方向观察可见的条纹 垂直于二氧化硅生长方向在二氧化硅生长方向周期性地分布。 该锭可用于生产用于准分子激光应用的光学级高均匀合成石英玻璃元件，特别是ArF准分子激光应用，用于生产与诸如准分子激光器的光源一起使用的激光损伤光学元件，以及 在生产UV光纤时。

公开(公告)号：US20060204193A1

公开(公告)日：2006-09-14

申请号：US11433576

申请日：2006-05-15

Applicant: Kenji Okada ,  Koichi Harada ,  Shunichirou Hirafune ,  Munehisa Fujimaki

Inventor： Kenji Okada ,  Koichi Harada ,  Shunichirou Hirafune ,  Munehisa Fujimaki

IPC: G02B6/02

CPC classification number: C03B37/0253 ,  C03B37/02718 ,  C03B37/029 ,  C03B2201/23 ,  C03B2205/40 ,  C03B2205/56 ,  C03B2205/72 ,  C03C13/045 ,  C03C2201/23 ,  Y02P40/57

Abstract: A drawing method for a bare optical fiber, comprises the steps of: melting an optical fiber preform using a heating device and drawing the bare optical fiber; and naturally cooling down the bare optical fiber or forcibly cooling down the bare optical fiber by a cooling device after the heating and melting step, wherein a temperature history during the drawing the optical fiber preform to obtain the bare optical fiber in the heating device satisfies a relational expression: T≦−0.01X+12 where a time period when the heated and molten portion of the optical fiber preform heated and molten by the heating device reaches 1800° C. or higher is T (min) and a OH group concentration in a cladding layer of the optical fiber preform is X (wtppm).

Abstract translation: 一种裸光纤的拉丝方法，包括以下步骤：使用加热装置熔化光纤预制棒并拉制裸光纤; 并且在加热熔融步骤之后自然地冷却裸光纤或强制地冷却裸光纤，其中在加热装置中获得裸光纤的拉伸期间的温度历史满足了 关系表达式：T <= -0.01X + 12其中加热装置加热熔化的光纤预制件的加热和熔融部分达到1800℃或更高的时间段为T（min），OH基浓度 在光纤预制件的包覆层中为X（wtppm）。

公开(公告)号：US20050187092A1

公开(公告)日：2005-08-25

申请号：US11064341

申请日：2005-02-22

Applicant: Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Lisa Moore ,  Susan Schiefelbein

Inventor： Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Lisa Moore ,  Susan Schiefelbein

IPC: C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C21/00 ,  C03C23/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm2. The synthetic silica glass optical material of the present invention comprises OH concentration levels of less than about 600 ppm, preferably less than 200 ppm, and H2 concentration levels less than about 5.0×1017 molecules/cm3,and preferably less than about 2.0×1017 molecules/cm3.

Abstract translation: 公开了一种合成石英玻璃光学材料，其特征在于波长小于约250nm，特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤， 特别是在经受100nm脉冲激光在约193nm下操作的激光诱导波前失真（在633nm处），介于约-1.0和1.0nm / cm之间，并且流量约为70μJ/ cm 2 。 本发明的合成石英玻璃光学材料包含小于约600ppm，优选小于200ppm的OH浓度水平和小于约5.0×10 17 H 2 O 2浓度水平， SUP>分子/ cm 3，优选小于约2.0×10 17分子/ cm 3。

公开(公告)号：US20050132749A1

公开(公告)日：2005-06-23

申请号：US11001142

申请日：2004-12-02

Applicant: Hisatoshi Otsuka ,  Kazuo Shirota

Inventor： Hisatoshi Otsuka ,  Kazuo Shirota

IPC: C03B19/14 ,  C03B37/014 ,  F23D14/22 ,  F23D14/32 ,  C03B19/01

CPC classification number: F23D14/22 ,  C03B19/1423 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/08 ,  C03B2207/12 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/36 ,  C03B2207/40 ,  F23D14/32 ,  F23L2900/07002

Abstract: A burner for use in the manufacture of synthetic quartz glass is provided, which comprises a main burner (7) comprising a multi-tube assembly (1) including a center tube (2) for feeding a silica-forming compound, a first enclosure tube (3) surrounding the center tube for feeding a combustion-supporting gas, and a second enclosure tube (4) surrounding the first enclosure tube for feeding a combustible gas; a tubular shell (5) surrounding the multi-tube assembly for feeding a combustible gas; and a plurality of nozzles (6) disposed within the tubular shell for feeding a combustion-supporting gas. A double-tube assembly (8) is disposed so as to surround the forward opening of the main burner (7) for feeding a combustion-supporting gas. Synthetic quartz glass ingots having high optical homogeneity are produced.

Abstract translation: 提供一种用于制造合成石英玻璃的燃烧器，其包括主燃烧器（7），其包括多管组件（1），所述多管组件（1）包括用于供给二氧化硅形成化合物的中心管（2），第一外壳管 （3）围绕用于供给燃烧载气的中心管，以及围绕所述第一外壳管的第二外壳管（4），用于供给可燃气体; 围绕多管组件的管状壳体（5），用于供给可燃气体; 以及设置在所述管状壳体内的多个喷嘴（6），用于供给燃烧气体。 双管组件（8）被设置为围绕主燃烧器（7）的向前开口以供给燃烧载气。 产生具有高光学均匀性的合成石英玻璃锭。

公开(公告)号：US06835683B2

公开(公告)日：2004-12-28

申请号：US10311233

申请日：2002-12-17

Applicant: Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

Inventor： Norio Komine ,  Akiko Yoshida ,  Hiroki Jinbo ,  Seishi Fujiwara

IPC: C03C306

CPC classification number: C03C4/0071 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/00 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  G02B1/02 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/70958

Abstract: A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1×1016 molecules/cm3 nor more than 5×1018 molecules/cm3, and wherein a difference A−B between an absorption coefficient A immediately before an end of irradiation with 1×104 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm2 and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm−1. When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.

Abstract translation: 本发明的石英玻璃构件是当其组成由SiO x表示时，x不小于1.85或不大于1.95，其中包含的氢分子的浓度不小于1×10 16分子/ cm <3>不超过5×10 18分子/ cm 3，并且其中在照射结束之前的吸收系数A与平均单脉冲中的1×10 4个ArF准分子激光脉冲之间的差AB 用ArF准分子激光照射停止600秒后的能量密度为2mJ / cm 2，第二吸收系数B为0.002cm -1以下。 当将该石英玻璃构件应用于投影曝光装置中的照明光学系统和/或投影光学系统时，可以实现均匀曝光，同时减小掩模版面和晶片上的曝光区域中的照度变化。

公开(公告)号：US06709997B2

公开(公告)日：2004-03-23

申请号：US09998328

申请日：2001-12-03

Applicant: Akira Urano ,  Toshio Danzuka ,  Tatsuhiko Saito ,  Yasuhiko Shishido ,  Masaharu Mogi ,  Michihisa Kyoto

Inventor： Akira Urano ,  Toshio Danzuka ,  Tatsuhiko Saito ,  Yasuhiko Shishido ,  Masaharu Mogi ,  Michihisa Kyoto

IPC: C03C1304

CPC classification number: G02B6/102 ,  C03B19/1453 ,  C03B32/00 ,  C03B37/01446 ,  C03B37/14 ,  C03B37/15 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0085 ,  C03C13/045 ,  C03C23/002 ,  C03C23/0025 ,  C03C23/003 ,  C03C23/0035 ,  C03C23/0095 ,  C03C25/6208 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/50 ,  G02B6/02 ,  Y02P40/57 ,  Y10S501/905

Abstract: A process of manufacturing a silica glass article comprising the steps of: (1) irradiating a silica glass article with electromagnetic waves to generate defects therein; and (2) immersing the thus irradiated silica glass article in an atmosphere comprising a hydrogen gas, thereby providing the resulting silica glass article with a characteristic that is effective for preventing it substantially from increasing its absorption within an ultraviolet region due to ultraviolet ray irradiation. Also disclosed are a silica glass article or a glass fiber produced according to the manufacturing process.

Abstract translation: 一种制造石英玻璃制品的方法，包括以下步骤：（1）用电磁波照射石英玻璃制品以在其中产生缺陷; 和（2）将这样照射的二氧化硅玻璃制品浸入包括氢气的气氛中，从而使得到的石英玻璃制品具有有效地防止紫外线辐射在紫外线区域内大幅吸收的特征。 还公开了根据制造方法制造的石英玻璃制品或玻璃纤维。