Abstract:
An x-ray mirror material of high reflectance with a surface roughness which is very small and a high film density, the material being a Pt alloy film provided as a mirror surface for reflecting x-ray radiation. The composition of the mirror material is expressed by the general formula: Pt.sub.1-x M.sub.x. This material is deposited on a substrate surface which has been polished to a level form, where M is at least one substance selected from Mo, Ru, Rh, Pd, Ta, W, and Au, and x satisfies the formula: 0.005.ltoreq..times..ltoreq.0.10.
Abstract translation:具有非常小的表面粗糙度和高膜密度的高反射率的x射线镜材料,该材料是作为用于反射x射线辐射的镜面的Pt合金膜。 镜面材料的组成由通式Pt1-xMx表示。 该材料沉积在已经被抛光到水平形式的基底表面上,其中M是选自Mo,Ru,Rh,Pd,Ta,W和Au中的至少一种物质,并且x满足下式: = x = 0.10。
Abstract:
An apparatus for deriving X-ray absorbing and phase information comprises; a splitting element for splitting spatially an X-ray, a detector for detecting intensities of the X-rays transmitted through an object, the intensity of the X-rays changing according to X-ray phase and also position changes, and an calculating unit for calculating an X-ray transmittance image, and an X-ray differential phase contrast or phase sift contrast image as the phase information. The X-ray is split into two or more X-rays having different widths, and emitted onto the detector unit. And, the calculating unit calculates the X-ray absorbing and phase information based on a difference, between the two or more X-rays, in correlation between the changing of the phase of the X-ray and the changing the intensity of the X-ray in the detector unit.
Abstract:
A collimation device for an X-ray beam, an optical device for analyzing a specimen by the scattering of an X-ray beam, and a collimator for an X-ray beam. The collimation device includes an enclosure configured to be under a vacuum or a controlled atmosphere, the enclosure including an inlet and an outlet for the X-ray beam and at least one plate made of a material having a diffracting periodic structure, the plate including two main faces and at least one flared aperture between the faces.
Abstract:
Provided is an X-ray imaging apparatus having simple configuration and obtaining differential phase contrast images in two directions crossing each other without rotating the diffraction grating and the masking grating. The apparatus including: a diffraction grating diffracting X-rays; a masking grating masking portions rays and transmitting portions are two-dimensionally arranged to partially mask bright zones of the interference pattern; a moving device changing the relative position between the interference pattern and the masking grating; a detector detecting the intensity distribution of the X-rays transmitted through the masking grating; and a calculator calculating a differential phase contrast image or a phase contrast image of a subject, the calculator being configured to calculate the differential phase contrast image or the phase contrast image in each of two mutually crossing directions on the basis of results of detection performed a plurality of times by the detector.
Abstract:
The invention relates to an arrangement for transporting radicals. The arrangement includes a plasma generator and a guiding body. The plasma generator includes a chamber (2) in which a plasma may be formed. The chamber has an inlet (5) for receiving an input gas, and one or more outlets (6) for removal of at least one of the plasma and radicals created therein. The guiding body is hollow and is arranged for guiding radicals formed in the plasma towards an area or volume at which contaminant deposition is to be removed. The chamber inlet is coupled to a pressure device (40) for providing a pulsed pressure into the chamber so as to create a flow in the guiding body.
Abstract:
A collimation device for an X-ray beam, an optical device for analyzing a specimen by the scattering of an X-ray beam, and a collimator for an X-ray beam. The collimation device includes an enclosure configured to be under a vacuum or a controlled atmosphere, the enclosure including an inlet and an outlet for the X-ray beam and at least one plate made of a material having a diffracting periodic structure, the plate including two main faces and at least one flared aperture between the faces.
Abstract:
A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.
Abstract:
The present invention relates to X-rayimage acquisition technology in general. Employing phase-contrast imaging for X-rayimage acquisition may significantly enhance the visibility of structures in images acquired. However, phase-contrast information may only be obtainable in a small detector region with subsequent image acquisitions requiring individual phase stepping states to allow reconstruction of an X-ray image. Accordingly, a grating arrangement for phase-contrast imaging is provided which may allow on the fly phase stepping during a field of view scan. According to the present invention a grating arrangement (1) for phase-contrast imaging is provided, comprising a first grating element (8) and a second grating element (10). Each of the first grating element (8) and the second grating element (10) comprises a trench structure. The trench structure comprises at least one trench region (9) and at least one barrier region (3). The at least one trench region (9) and the at least one barrier region (3) are at least locally arranged in parallel. The first grating element (8) and the second grating element (10) are arranged such that the trench structure of the first grating element (8) and the trench structure of the second grating element (10) are non-parallel comprising an angle α.
Abstract:
An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.
Abstract:
A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.