-
公开(公告)号：US09008271B2
公开(公告)日：2015-04-14
申请号：US13817562
申请日：2011-08-18
Applicant: Zeev Burshtein , Aharon Bar-David , Zeev Harel
Inventor： Zeev Burshtein , Aharon Bar-David , Zeev Harel
CPC classification number: G21K1/06 , A61N5/1042 , A61N5/1084 , A61N2005/1091 , A61N2005/1095 , G21K1/046 , G21K5/04 , G21K2201/062 , G21K2201/064 , G21K2201/067
Abstract: An X-ray system is arranged for providing X-ray exposure to a target volume. The aforesaid X-ray system comprises an X-ray source and at least one focusing lens. The provided exposure is distributed over a volume of the target in a substantially uniform manner.
Abstract translation: 布置X射线系统以提供对目标体积的X射线曝光。 上述X射线系统包括X射线源和至少一个聚焦透镜。 所提供的曝光以基本均匀的方式分布在目标体积上。
-
公开(公告)号：US20150008345A1
公开(公告)日：2015-01-08
申请号：US14481620
申请日：2014-09-09
Applicant: GIGAPHOTON INC.
Inventor： Shinji NAGAI , Tamotsu ABE , Hitoshi NAGANO , Osamu WAKABAYASHI
CPC classification number: H05G2/008 , B23K10/00 , B23K26/12 , B23K26/36 , G03B27/32 , G03F7/70025 , G03F7/70033 , G21K1/067 , G21K5/00 , G21K5/02 , G21K2201/064 , H05G2/005
Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 设置在所述室上的蚀刻气体导入单元，所述蚀刻气体通过所述室; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。
-
公开(公告)号：US08872142B2
公开(公告)日：2014-10-28
申请号：US13474100
申请日：2012-05-17
Applicant: Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
Inventor： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
CPC classification number: H05G2/008 , B23K10/00 , B23K26/12 , B23K26/36 , G03B27/32 , G03F7/70025 , G03F7/70033 , G21K1/067 , G21K5/00 , G21K5/02 , G21K2201/064 , H05G2/005
Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。
-
24.发明授权Dual elliptical reflector with a co-located foci for curing optical fibers 有权双椭圆形反射器，具有用于固化光纤的共定位焦点公开(公告)号：US08872137B2
公开(公告)日：2014-10-28
申请号：US13619837
申请日：2012-09-14
Applicant: Doug Childers
Inventor： Doug Childers
CPC classification number: G21K5/00 , C03C25/12 , F26B3/28 , F26B13/00 , G21K1/067 , G21K2201/064 , G21K2201/065
Abstract: A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.
Abstract translation: 用于UV固化诸如光纤的工件上的涂层或印刷油墨的装置包括布置成具有共同定焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。
-
公开(公告)号：US08746903B2
公开(公告)日：2014-06-10
申请号：US13392453
申请日：2010-08-27
Applicant: Marcos Bavdaz
Inventor： Marcos Bavdaz
CPC classification number: G21K1/06 , G21K2201/064 , G21K2201/067 , Y10T156/1002
Abstract: The invention relates to a method for assembling two or more mirror plate stacks into a rigid unit in turn comprising a plurality of mirror plates and a base plate onto which the plurality of mirror plates are stacked. To improve assembly accuracy of the mirror plates, a base plate is provided with a first mirror plate mounted thereto, a handling tool is provided with a second mirror plate and a spacer is provided to a first surface of the second mirror plate and positioned to align the second mirror plate with the first mirror plate. This alignment is based on a measured position and shape of the first mirror plate to compensate for a deviation from a pre-defined position and shape. The plates are then attached to each other with the spacer; the handling tool is removed and the position and shape of the second mirror plate is measured.
Abstract translation: 本发明涉及一种用于将两个或更多个反射镜板组合成刚性单元的方法，该刚性单元依次包括多个反射镜板和多个反射镜板堆叠在其上的基板。 为了提高镜板的装配精度，底板设置有安装在其上的第一镜板，处理工具设置有第二镜板，并且间隔件设置在第二镜板的第一表面上并且被定位成对齐 第二个镜面板与第一个镜面板。 该对准基于第一镜板的测量位置和形状，以补偿与预定义位置和形状的偏差。 然后将板用间隔件彼此连接; 拆卸搬运工具，测定第二镜板的位置和形状。
-
Patent Agency Ranking
26.发明授权Grazing incidence collector optical systems for EUV and X-ray applications 有权用于EUV和X射线应用的掠入射收集器光学系统公开(公告)号：US08594277B2
公开(公告)日：2013-11-26
申请号：US12735525
申请日：2009-01-28
Applicant: Fabio Zocchi , Pietro Binda , Enrico Benedetti
Inventor： Fabio Zocchi , Pietro Binda , Enrico Benedetti
IPC: G21K1/06
CPC classification number: G03F7/70166 , G21K1/06 , G21K2201/064
Abstract: A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical axis. The mirrors have first and second reflective surfaces that provide successive grazing incidence reflections of radiation from a radiation source. The first and second reflective surfaces have a corrective shape that compensates for high spatial frequency variations in the far field intensity distribution of the radiation.
Abstract translation: 公开了一种用于EUV和X射线应用的收集器光学系统，其中所述系统包括以嵌套配置布置的关于光轴对称的多个反射镜。 反射镜具有第一和第二反射表面，其提供来自辐射源的辐射的连续掠入射反射。 第一和第二反射表面具有补偿辐射的远场强度分布中的高空间频率变化的校正形状。
-
27.发明授权公开(公告)号：US08592787B2
公开(公告)日：2013-11-26
申请号：US13437678
申请日：2012-04-02
Applicant: Masato Moriya , Osamu Wakabayashi , Georg Soumagne
Inventor： Masato Moriya , Osamu Wakabayashi , Georg Soumagne
IPC: G21K5/04
CPC classification number: G02B5/1838 , G02B5/0891 , G02B5/1857 , G03F7/70575 , G21K1/065 , G21K2201/064
Abstract: An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser.
Abstract translation: EUV光源被配置为产生用于曝光装置的EUV光。 所述EUV光源包括室，被配置为将靶供给到所述室中的目标供给装置，用于将来自驱动器激光器的激光引入所述室并且用所述激光照射所述靶的光学系统，以将所述靶转换成等离子体 哪个EUV光被发射，并且在室中的EUV收集器反射镜。 EUV收集器反射镜可以包括具有凹槽的多层反射表面并且将来自等离子体的EUV光收集到焦点。 凹槽可以以同心的方式布置，并且被配置为至少衍射与来自驱动器激光器的激光的波长相同的光。
-
28.发明申请Source-collector modules for EUV lithography employing a GIC mirror and a LPP source 有权用于采用GIC镜和LPP光源的EUV光刻的源极集电极模块公开(公告)号：US20130207004A1
公开(公告)日：2013-08-15
申请号：US13761189
申请日：2013-02-07
Applicant: Media Lario, S.R.L.
Inventor： Natale M. Ceglio , Daniel STEARNS , Jacques KOOLS , Giuseppe VALSECCHI , Fabio ZOCCHI , Riccardo BINDA
CPC classification number: H05G2/005 , G02B5/203 , G02B19/0095 , G02B27/425 , G03F7/70033 , G03F7/70166 , G03F7/70316 , G03F7/70575 , G03F7/70916 , G21K1/067 , H05G2/008 , G21K2201/06 , G21K2201/064
Abstract: Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.
Abstract translation: 公开了用于EUV光刻系统的源极集电极模块，其中源极 - 集电极模块采用激光产生的等离子体EUV辐射源和放电入射收集器。 通过首先形成低密度等离子体，然后用足够强度的红外辐射照射低密度等离子体来产生EUV辐射源，以产生最终的EUV发射等离子体。 掠入射收集器可以包括被配置为防止红外辐射到达中间焦点的光栅。 使用碎片减轻装置可以保持源 - 收集器模块的使用寿命。
-
29.发明申请公开(公告)号：US20130068969A1
公开(公告)日：2013-03-21
申请号：US13619837
申请日：2012-09-14
Applicant: Doug Childers
Inventor： Doug Childers
IPC: G21K5/00
CPC classification number: G21K5/00 , C03C25/12 , F26B3/28 , F26B13/00 , G21K1/067 , G21K2201/064 , G21K2201/065
Abstract: A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.
Abstract translation: 用于UV固化诸如光纤的工件上的涂层或印刷油墨的装置包括布置成具有共同定焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。
-
公开(公告)号：US08338809B2
公开(公告)日：2012-12-25
申请号：US13164745
申请日：2011-06-20
Applicant: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
Inventor： Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
CPC classification number: G21K1/062 , B82Y10/00 , G21K2201/064 , G21K2201/065 , G21K2201/067
Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second side reflectors have curved reflective surfaces with dichroic coatings and the longitudinal strip comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
Abstract translation: 用于紫外灯的反射器可用于基板处理装置。 反射器包括中心定位的纵向条和第一和第二侧反射器以形成抛物线型表面。 纵向条和第一和第二侧反射器具有带有二向色涂层的弯曲反射表面，并且纵向条带包括多个通孔以将冷却剂气体引向紫外线灯。 还描述了使用具有反射器的紫外线灯模块的室以及紫外线处理方法。
-
-
-
-
-
-
-
-
-
Search Results
392
records
(took 0.022 seconds)
