公开(公告)号：US20160011345A1

公开(公告)日：2016-01-14

申请号：US14696331

申请日：2015-04-24

Applicant: Applied Materials, Inc.

Inventor： Ralf Hofmann ,  Cara Beasley ,  Vinayak Vishwanath Hassan ,  Majeed A. Foad

IPC: G02B5/08 ,  C23C16/455 ,  C23C16/24 ,  G03F7/20

CPC classification number: G02B5/0891 ,  C23C14/06 ,  C23C14/14 ,  C23C16/24 ,  C23C16/45525 ,  G02B5/0833 ,  G02B5/0875 ,  G03F7/7015 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067 ,  H05G2/008

Abstract: An extreme ultraviolet reflective element and method of manufacture includes a substrate; a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer formed from silicon and a second reflective layer having a preventative layer separating a lower amorphous layer and an upper amorphous layer; and a capping layer on and over the multilayer stack for protecting the multilayer stack by reducing oxidation and mechanical erosion.

Abstract translation: 极紫外线反射元件及其制造方法包括：基板; 所述多层叠层包括多个反射层对，所述多个反射层对具有由硅形成的第一反射层和具有分隔下部非晶层和上部非晶层的预防层的第二反射层; 以及多层堆叠上和上方的覆盖层，用于通过减少氧化和机械侵蚀来保护多层堆叠。

公开(公告)号：US09235137B2

公开(公告)日：2016-01-12

申请号：US13370829

申请日：2012-02-10

Applicant: Damian Fiolka ,  Ralf Stuetzle

Inventor： Damian Fiolka ,  Ralf Stuetzle

IPC: G03B27/72 ,  G03F7/20 ,  G02B27/09 ,  G21K1/06 ,  G21K1/16

CPC classification number: G03F7/70233 ,  G02B27/0905 ,  G02B27/0977 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70566 ,  G21K1/06 ,  G21K1/16 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067

Abstract: An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.

Abstract translation: 照明光学单元包括集光镜，其在照明光学单元的操作期间产生施加到第一刻面光学元件的偏振分布。 存在施加具有不同极化的辐射的至少两个第一小面元件。 第一刻面光学元件具有至少一个第一状态，其中第一面元件的反射表面的法向矢量被选择为使得在照明光学单元的操作期间在物场的位置处产生第一预定偏振分布 。

公开(公告)号：US20150340113A1

公开(公告)日：2015-11-26

申请号：US14673304

申请日：2015-03-30

Applicant: Yongjin Sung ,  Rajiv Gupta

Inventor： Yongjin Sung ,  Rajiv Gupta

IPC: G21K1/06 ,  G01N23/04

CPC classification number: G01N23/04 ,  G01N23/20075 ,  G01N2223/303 ,  G21K1/06 ,  G21K2201/067 ,  G21K2207/005

Abstract: Systems and methods for performing x-ray phase-contrast imaging using a conventional x-ray source and detector are provided. An array of x-ray focusing elements it provided and used to focus x-ray onto a pattern of multiple different focal spots. When an object is introduced into the beam path, the focal spots will be displaced based on the x-rays being refracted by the object. A refraction angle map is produced and used to generate a phase contrast image, such as an image that indicates the electron density distribution in the object. Multi-spectral imaging can be achieved by utilizing the chromatic aberration of the array of x-ray focusing elements and sweeping the detector through different focal planes associated with different x-ray energy levels or sweeping the peak voltage of the x-ray source for a fixed object-to-detector distance.

Abstract translation: 提供了使用常规x射线源和检测器执行X射线相位对比成像的系统和方法。 它提供并用于将x射线聚焦到多个不同焦点的图案上的x射线聚焦元件阵列。 当物体被引入光束路径时，焦斑将基于被物体折射的X射线而移位。 产生折射角度图并用于产生相位对比图像，例如指示物体中的电子密度分布的图像。 可以通过利用x射线聚焦元件阵列的色差并通过与不同X射线能级相关联的不同焦平面扫描检测器来实现多光谱成像，或扫描X射线源的峰值电压 固定的物体到检测器的距离。

公开(公告)号：US20150323478A1

公开(公告)日：2015-11-12

申请号：US14701812

申请日：2015-05-01

Applicant: The Johns Hopkins University

Inventor： Dan Stutman

IPC: G01N23/20 ,  G01N23/04 ,  A61B6/03 ,  A61B6/00

CPC classification number: G01N23/04 ,  A61B6/032 ,  A61B6/4035 ,  A61B6/4291 ,  A61B6/484 ,  A61B6/502 ,  A61B6/5205 ,  A61B6/5235 ,  G01N23/046 ,  G01N23/20075 ,  G01N2223/33 ,  G02B5/1871 ,  G21K2201/067

Abstract: A differential phase contrast X-ray imaging system includes an X-ray illumination system, a beam splitter arranged in a radiation path of the X-ray illumination system, and a detection system arranged in a radiation path to detect X-rays after passing through the beam splitter.

Abstract translation: 差分相位差X射线成像系统包括X射线照射系统，布置在X射线照射系统的辐射路径中的分束器和布置在辐射路径中的检测系统，以在穿过X射线照射系统之后检测X射线 分束器。

公开(公告)号：US20150296602A1

公开(公告)日：2015-10-15

申请号：US14440934

申请日：2013-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Andrey Nikipelov ,  Edgar Alberto Osorio Oliveros ,  Alexander Matthijs Struycken ,  Bert Pieter Van Drieënhuizen ,  Jan Bernard Plechelmus Van Schoot

IPC: H05G2/00

CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/7085 ,  G21K1/062 ,  G21K2201/067 ,  H01S3/073 ,  H01S3/08059 ,  H01S3/0815 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2383 ,  H05G2/008

Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.

Abstract translation: 一种为光刻设备产生辐射的方法。 该方法包括在等离子体形成位置（12）处提供连续更新的燃料靶（50）并且引导等离子体形成位置处的连续波激发束（6），使得连续更新的燃料靶内的燃料被连续的 波激发光束产生辐射产生等离子体。

公开(公告)号：US09063277B2

公开(公告)日：2015-06-23

申请号：US13332582

申请日：2011-12-21

Applicant: Fumitaro Masaki ,  Akira Miyake

Inventor： Fumitaro Masaki ,  Akira Miyake

IPC: B05D5/06 ,  F21V9/04 ,  G03B27/32 ,  G03B27/54 ,  G02B5/08 ,  G03F7/20 ,  G21K1/06 ,  B82Y10/00

CPC classification number: G02B5/0816 ,  B82Y10/00 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.

Abstract translation: 一种制造反射镜的方法包括：在基板上布置具有由热变化的层厚度的形状调整层的第一步骤，在形状调整层上布置包括第一层的反射层的第二步骤， 第二层和布置在第一层和第二层之间的阻挡层，并且防止第一层的材料和第二层的材料的扩散，以及使反射形状的第三步骤 通过在第二步骤之后改变形状调整层的层厚度轮廓，接近目标形状的层，第三步骤包括部分退火形状调节层的过程。

公开(公告)号：US09013678B2

公开(公告)日：2015-04-21

申请号：US13613390

申请日：2012-09-13

Applicant: Danny Chan ,  Hans-Juergen Mann ,  Sascha Migura

Inventor： Danny Chan ,  Hans-Juergen Mann ,  Sascha Migura

IPC: G03B27/54 ,  G03B27/72 ,  G03F7/20 ,  B82Y10/00 ,  G02B5/08 ,  G02B13/14 ,  G02B17/06 ,  G21K1/06

CPC classification number: G03F7/70308 ,  B82Y10/00 ,  G02B5/0891 ,  G02B13/143 ,  G02B17/0663 ,  G03F7/70233 ,  G21K1/062 ,  G21K2201/067

Abstract: An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength λ from an object field in an object surface to an image field in an image surface. The elements include mirror elements have a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about λ or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element.

Abstract translation: 公开了一种光学系统，其包括多个元件，其被布置成将从物体表面中的物场到波长λ的辐射成像到图像表面中的图像场。 元件包括镜元件具有由位于辐射路径上的反射涂层形成的反射表面。 至少一个镜元件具有在一个或多个位置处偏离最佳拟合旋转对称反射表面约λ或更大的旋转非对称反射表面。 这些元件包括有效地校正光学系统的出射光瞳相对于没有变迹校正元件的光学系统的空间强度分布的变迹校正元件。 变迹校正元件可以有效地增加出射光瞳相对于没有变迹校正元件的光学系统的空间强度分布的对称性。

公开(公告)号：US09008271B2

公开(公告)日：2015-04-14

申请号：US13817562

申请日：2011-08-18

Applicant: Zeev Burshtein ,  Aharon Bar-David ,  Zeev Harel

Inventor： Zeev Burshtein ,  Aharon Bar-David ,  Zeev Harel

IPC: G21K1/06 ,  A61N5/10 ,  G21K5/04

CPC classification number: G21K1/06 ,  A61N5/1042 ,  A61N5/1084 ,  A61N2005/1091 ,  A61N2005/1095 ,  G21K1/046 ,  G21K5/04 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: An X-ray system is arranged for providing X-ray exposure to a target volume. The aforesaid X-ray system comprises an X-ray source and at least one focusing lens. The provided exposure is distributed over a volume of the target in a substantially uniform manner.

Abstract translation: 布置X射线系统以提供对目标体积的X射线曝光。 上述X射线系统包括X射线源和至少一个聚焦透镜。 所提供的曝光以基本均匀的方式分布在目标体积上。

公开(公告)号：US09007559B2

公开(公告)日：2015-04-14

申请号：US13214470

申请日：2011-08-22

Applicant: Michael Layh ,  Udo Dinger

Inventor： Michael Layh ,  Udo Dinger

IPC: G03B27/52 ,  G03B27/54 ,  G21K1/06 ,  G03F7/20

CPC classification number: G21K1/06 ,  G03F7/70175 ,  G03F7/70891 ,  G21K2201/065 ,  G21K2201/067

Abstract: An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also includes a cooling device for cooling the at least one collector mirror. The cooling device has at least one cooling element, which has a course with respect to the collector mirror, in each case, such that the projection of the course into a plane perpendicular to the central axis has a main direction, which encloses an angle of at most 20° with respect to a predetermined preferred direction. The collector transmits improved quality radiation to illuminate an object field.

Abstract translation: 用于收集和发射来自EUV辐射源的辐射的EUV收集器包括至少一个收集器反射镜，用于反射相对于中心轴旋转对称的EUV辐射源的发射。 EUV收集器还包括用于冷却至少一个收集器反射镜的冷却装置。 冷却装置具有至少一个冷却元件，该冷却元件在每种情况下具有相对于收集器反射镜的过程，使得该过程的投影垂直于中心轴线的平面具有主方向，该主方向包围 相对于预定的优选方向为至多20°。 收集器传输改进的质量辐射以照亮物体场。

公开(公告)号：US20140376699A1

公开(公告)日：2014-12-25

申请号：US14344950

申请日：2012-09-05

Applicant: Atsushi Komoto ,  Hirokatsu Miyata ,  Kohei Okamoto ,  Wataru Kubo ,  Takashi Noma

Inventor： Atsushi Komoto ,  Hirokatsu Miyata ,  Kohei Okamoto ,  Wataru Kubo ,  Takashi Noma

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067

Abstract: An X-ray waveguide system capable of forming X-rays having spatial coherence of a large space region has an X-ray collecting optical element which collects incident X-rays; and an X-ray waveguide containing a core and claddings and wave-guiding a collected X-ray collected by the X-ray collecting optical element, in which the core of the X-ray waveguide is a periodic structure body in which a plurality of basic structures containing substances different in the refractive-index real part are periodically disposed, the total reflection critical angle of the collected X-ray at the interface of the core and the cladding is equal to or larger than the Bragg angle corresponding to the period of the core, and the collection angle of the collected X-ray entering the X-ray waveguide is as large as or larger than the double of the Bragg angle.

Abstract translation: 能够形成具有大空间区域的空间相干性的X射线的X射线波导系统具有收集入射X射线的X射线收集光学元件， 以及包含芯和包层的X射线波导，并且对由X射线收集光学元件收集的X射线收集的X射线进行波导，其中X射线波导的芯是周期性结构体，其中多个 周期性地设置包含折射率实部不同的物质的基本结构，在芯和包层的界面处收集的X射线的全反射临界角等于或大于对应于 核心和收集的入射到X射线波导的X射线的收集角度大于或大于布拉格角的两倍。