公开(公告)号：US20090194692A1

公开(公告)日：2009-08-06

申请号：US12362000

申请日：2009-01-29

Applicant: Atsushi KOBARU

Inventor： Atsushi KOBARU

IPC: G01N23/00 ,  G21F3/00 ,  H01J3/14

CPC classification number: H01J37/09 ,  H01J2237/0264 ,  H01J2237/26 ,  H01J2237/28 ,  H01J2237/31749

Abstract: A magnetic shield with which a high magnetic field suppression effect is realized in a restricted space and a charged particle radiation apparatus using the magnetic shield are described below. To achieve the above-described object, a scanning electron microscope wherein a shield for shielding against an external magnetic field is formed of a plurality of plate portions made of a magnetic material, the plate portions being disposed on the circumference of a circle whose center corresponds to a center of the space so that each plate portion has a surface direction set different from a line tangent to the circle, is proposed (see FIG. 1).

Abstract translation: 下面描述在限制空间中实现高磁场抑制效果的磁屏蔽和使用磁屏蔽的带电粒子辐射装置。 为了实现上述目的，一种扫描电子显微镜，其中用于屏蔽外部磁场的屏蔽件由多个由磁性材料制成的板部分形成，所述板部分设置在其中心对应于圆周的圆周上 提供到该空间的中心，使得每个板部具有与圆相切的线不同的表面方向（参见图1）。

公开(公告)号：US07411192B2

公开(公告)日：2008-08-12

申请号：US11189901

申请日：2005-07-27

Applicant: Koichiro Takeuchi ,  Tohru Ishitani ,  Yoichi Ose

Inventor： Koichiro Takeuchi ,  Tohru Ishitani ,  Yoichi Ose

IPC: H01J1/50 ,  H01J37/08 ,  G21K7/00 ,  G21K1/093

CPC classification number: H01J37/09 ,  H01J37/3056 ,  H01J2237/0264 ,  H01J2237/31749

Abstract: A focused ion beam apparatus and a focused ion beam irradiation method are disclosed. Even in the case where a magnetic field exists on the optical axis of an ion beam and the particular magnetic field undergoes a change, the ion beam is focused without separating the isotopes on the sample at the same ion beam spot position as if the magnetic field is not existent. A canceling magnetic field is generated on the optical axis of the ion beam from a canceling magnetic field generator thereby to offset the deflection of the ion beam due to the external magnetic field.

Abstract translation: 公开了一种聚焦离子束装置和聚焦离子束照射方法。 即使在离子束的光轴上存在磁场并且特定的磁场发生变化的情况下，也可以将离子束聚焦，而不会在相同的离子束点位置分离样品上的同位素，就像磁场 不存在 在来自消除磁场发生器的离子束的光轴上产生消除磁场，从而抵消由于外部磁场引起的离子束的偏转。

公开(公告)号：US20060022150A1

公开(公告)日：2006-02-02

申请号：US11189901

申请日：2005-07-27

Applicant: Koichiro Takeuchi ,  Tohru Ishitani ,  Yoichi Ose

Inventor： Koichiro Takeuchi ,  Tohru Ishitani ,  Yoichi Ose

IPC: H01J1/50

CPC classification number: H01J37/09 ,  H01J37/3056 ,  H01J2237/0264 ,  H01J2237/31749

Abstract: A focused ion beam apparatus and a focused ion beam irradiation method are disclosed. Even in the case where a magnetic field exists on the optical axis of an ion beam and the particular magnetic field undergoes a change, the ion beam is focused without separating the isotopes on the sample at the same ion beam spot position as if the magnetic field is not existent. A canceling magnetic field is generated on the optical axis of the ion beam from a canceling magnetic field generator thereby to offset the deflection of the ion beam due to the external magnetic field.

Abstract translation: 公开了一种聚焦离子束装置和聚焦离子束照射方法。 即使在离子束的光轴上存在磁场并且特定的磁场发生变化的情况下，也可以将离子束聚焦，而不会在相同的离子束点位置分离样品上的同位素，就像磁场 不存在 在来自消除磁场发生器的离子束的光轴上产生消除磁场，从而抵消由于外部磁场引起的离子束的偏转。

公开(公告)号：US06831281B2

公开(公告)日：2004-12-14

申请号：US09996527

申请日：2001-11-28

Applicant: Mamoru Nakasuji

Inventor： Mamoru Nakasuji

IPC: H01J3702

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/0264

Abstract: CPB microlithography systems are disclosed that effectively cancel the effects of floating external magnetic fields and that exhibit a high magnetic shielding ratio using small components. An exemplary system includes a search coil situated and configured to detect external magnetic field, and a compensation coil situated and configured to produce a magnetic field that, based on the detected magnetic field, cancels the external magnetic field. These coils desirably are situated downstream of an illumination lens. The external magnetic field detected by the search coil is converted to a corresponding electrical signal by an external-magnetic-field-detection circuit and routed to an external-magnetic-field-compensation circuit to which the compensation coil is connected. The external-magnetic-field-compensation circuit cancels the external magnetic field by providing an electrical current, corresponding to the detected external magnetic field, to the compensation coil. A search coil and compensation coil also can be provided in a similar manner downstream of a second projection lens, and provided with a respective external-magnetic-field-detection circuit and external-magnetic-field-compensation circuit.

Abstract translation: 公开了CPB微光刻系统，其有效地消除了浮动的外部磁场的影响，并且使用小的部件表现出高的磁屏蔽比。 示例性系统包括位于并被配置为检测外部磁场的搜索线圈，以及位于并被配置为产生基于所检测的磁场抵消外部磁场的磁场的补偿线圈。 这些线圈期望地位于照明透镜的下游。 由搜索线圈检测的外部磁场由外部磁场检测电路转换成相应的电信号，并被路由到与补偿线圈连接的外部磁场补偿电路。 外部磁场补偿电路通过向补偿线圈提供与检测到的外部磁场相对应的电流来抵消外部磁场。 搜索线圈和补偿线圈也可以以类似的方式在第二投影透镜的下游提供，并且设置有相应的外部磁场检测电路和外部磁场补偿电路。

公开(公告)号：US06794657B2

公开(公告)日：2004-09-21

申请号：US10000305

申请日：2001-11-30

Applicant: Michael R. Sogard

Inventor： Michael R. Sogard

IPC: G21K510

CPC classification number: H01J37/09 ,  H01J37/20 ,  H01J2237/0264 ,  H01J2237/31793

Abstract: A magnetic shunt assembly (12) for an exposure apparatus (10) includes a magnetic shunt assembly (12). The apparatus (10) includes an optical assembly (24)(26), a stage (44), a first mover assembly (16) that moves the stage (44) in a first gap (37). The first mover assembly (16) is surrounded by a magnetic field. The magnetic shunt assembly (12) is positioned near the optical assembly (24)(26) approximately between the optical assembly (24)(26) and the mover assembly (16). The magnetic shunt assembly (12) is made of a material having a relatively high magnetic permeability. The magnetic shunt assembly (12) can provide a low magnetic reluctance path that redirects at least a portion of the magnetic field from the first mover assembly (16) away from the gap (37).

Abstract translation: 用于曝光设备（10）的磁分路组件（12）包括磁分路组件（12）。 装置（10）包括光学组件（24），阶段（44），第一移动器组件（16），其在第一间隙（37）中移动平台（44）。 第一移动器组件（16）被磁场包围。 磁分路组件（12）位于光学组件（24）（26）附近，大致在光学组件（24）（26）和移动器组件（16）之间。 磁分路组件（12）由具有相对较高磁导率的材料制成。 磁分路组件（12）可以提供低磁阻磁路，其将来自第一移动器组件（16）的磁场的至少一部分重定向远离间隙（37）。

公开(公告)号：US20020096640A1

公开(公告)日：2002-07-25

申请号：US10021603

申请日：2001-12-11

Applicant: Nikon Corporation

Inventor： Keiichi Tanaka

IPC: G01K001/08 ,  G21K005/10 ,  H01J003/14

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G21K1/093 ,  H01J37/09 ,  H01J2237/0264 ,  H01J2237/3175

Abstract: Charged-particle-beam microlithographic exposure apparatus are disclosed that effectively block adverse effects of magnetic fields on the trajectory of the charged particle beam. An exemplary apparatus includes an illumination-optical system and a projection-optical system each contained in a respective vacuum chamber. The apparatus includes at least one magnetic shield structure comprising a superconducting material. A multilayer magnetic shield (including a ferromagnetic body and an electrically conductive body) can be situated outside the magnetic shield structure, with a defined gap therebetween. Such a shield structure can be located, e.g., adjacent a beam-trajectory region in an illumination-optical system between a beam deflector and the reticle, in association with a vacuum chamber of the apparatus, and/or in association with an electromagnetic actuator (e.g., linear motor used to actuate a stage device).

Abstract translation: 公开了带电粒子束微光刻曝光装置，其有效地阻止磁场对带电粒子束的轨迹的不利影响。 示例性装置包括各自包含在相应的真空室中的照明光学系统和投影光学系统。 该装置包括至少一个包含超导材料的磁屏蔽结构。 多层磁屏蔽（包括铁磁体和导电体）可以位于磁屏蔽结构外部，其间具有限定的间隙。 这样的屏蔽结构可以被定位成例如在与设备的真空室相关联的光束偏转器和光罩之间的照明光学系统中的光束轨迹区域和/或与电磁致动器相关联 例如，用于致动平台装置的线性电动机）。

公开(公告)号：US5463268A

公开(公告)日：1995-10-31

申请号：US247261

申请日：1994-05-23

Applicant: James B. Schroeder

Inventor： James B. Schroeder

IPC: H01J37/09 ,  H05H5/02 ,  H02N1/00

CPC classification number: H01J37/09 ,  H05H5/02 ,  H01J2237/0264

Abstract: The high voltage electrostatic accelerator of this invention has spark arrester rings which form magnetic shield elements around an acceleration tube and which together with mu-metal rings between accelerator segments shield the electrons being accelerated from stray static and dynamic magnetic fields. The spark arresters surround the accelerating electrodes. The rings between accelerator segments are formed of mu-metal, an alloy of nickel designed for its magnetic shielding properties and consisting of 77 percent nickel, 4.8 percent copper, 1.5 percent chrome and 14.9 percent iron. The mu-metal spark arresters together with the rings between accelerators segments provide an effective magnetic shield in a cost-effective manner. Because mu-metal has a high permeability, magnetic field lines tend to travel about the Mu-metal rings rather than pass through the acceleration tube, where they would influence electrons being accelerated. The discontinuous nature of the shield allows it to be super-positioned as an integral part of the spark arresters positioned about the accelerating electrodes.

Abstract translation: 本发明的高电压静电促进器具有放电避雷器环，其在加速管周围形成磁屏蔽元件，并且与加速器段之间的多个金属环一起屏蔽电子被从杂散静态和动态磁场加速。 火花塞围绕加速电极。 加速器段之间的环由mu金属形成，镍合金为其磁屏蔽性能设计，由77％的镍，4.8％的铜，1.5％的铬和14.9％的铁构成。 多金属火花放电器与加速器段之间的环与提供有效的磁屏蔽以成本有效的方式。 因为多金属具有高磁导率，所以磁场线往往会绕着金属金属环行进，而不是通过加速管，在那里它们会影响被加速的电子。 屏蔽件的不连续性质允许其被超定位为围绕加速电极定位的火花放电器的组成部分。

公开(公告)号：US5446722A

公开(公告)日：1995-08-29

申请号：US132958

申请日：1993-10-07

Applicant: Yoshiaki Kojima ,  Yasumitsu Wada ,  Masahiro Katsumura

Inventor： Yoshiaki Kojima ,  Yasumitsu Wada ,  Masahiro Katsumura

IPC: G11B7/00 ,  G11B7/004 ,  G11B7/26 ,  G11B9/10 ,  G11B19/20 ,  G11B23/00 ,  H01J37/20

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G11B19/2009 ,  G11B23/0057 ,  G11B7/26 ,  H01J37/20 ,  H01J2237/0264 ,  H01J2237/20278

Abstract: An information recording apparatus including a device for driving an optical-disk's master disk, an electron lens barrel for having an electron beam irradiate a recording surface of a disk, a translational device for producing, between the disk and the electron lens barrel, a relative movement in a direction parallel to the recording surface and a container for enclosing the elements of the apparatus adapted to support a vacuum atmosphere. The driving device includes a turn table 4, a spindle 14a for supporting the turn table, a motor 14 for driving the spindle, and a magnetic shield for preventing magnetic fields of the motor from leaking outward. The motor is enclosed in the shield to prevent its magnetic fields from affecting the electron beam, which makes it possible to record information with high accuracy. The use of the motor as a drive source realizes easier and more responsive control of the turn table than that in the prior art.

Abstract translation: 一种信息记录装置，包括用于驱动光盘的主盘的装置，具有照射盘的记录表面的电子束的电子透镜镜筒，用于在光盘和电子镜头镜筒之间产生的平移装置， 在与记录表面平行的方向上的运动和用于封闭适于支撑真空气氛的装置的元件的容器。 驱动装置包括转台4，用于支撑转台的主轴14a，用于驱动主轴的电动机14和用于防止电动机的磁场向外泄漏的磁屏蔽。 电机被封闭在屏蔽中，以防止其磁场影响电子束，这样可以高精度地记录信息。 使用电动机作为驱动源实现了与现有技术相比，转台更容易和更灵敏的控制。

公开(公告)号：US20240266152A1

公开(公告)日：2024-08-08

申请号：US18107487

申请日：2023-02-08

Applicant: Applied Materials, Inc.

Inventor： Michael Andrew STEARNS ,  Alok RANJAN ,  Kartik RAMASWAMY ,  Peng TIAN ,  Timothy Joseph FRANKLIN ,  Chris BLANK ,  Carlaton WONG

IPC: H01J37/32 ,  H01F27/28 ,  H01L21/3065

CPC classification number: H01J37/3266 ,  H01F27/28 ,  H01J37/3211 ,  H01L21/3065 ,  H01J2237/0264 ,  H01J2237/3341 ,  H01J2237/3343

Abstract: Embodiments of the present disclosure include an apparatus and methods for the plasma processing of a substrate. Some embodiments are directed to a plasma processing chamber. The plasma processing chamber generally includes a planar coil region comprising a concentric coil region comprising a first concentric coil and a second concentric coil, and a power supply circuit coupled to the first concentric coil and the second concentric coil. The first concentric coil may include a first coil with a diameter measured in a direction parallel to a first plane that is smaller than the diameter of a second coil included in the second concentric coil. The power supply circuit may be configured to bias the first concentric coil and the second concentric coil to adjust a generated magnetic field in a region of control of a plasma in the plasma processing chamber to control a plasma density of the plasma.

公开(公告)号：US20180277334A1

公开(公告)日：2018-09-27

申请号：US15985763

申请日：2018-05-22

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Alexander Hendrik Vincent VAN VEEN ,  Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND

IPC: H01J37/153 ,  H01J37/12 ,  H01J37/09

CPC classification number: H01J37/153 ,  H01J37/023 ,  H01J37/065 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/0264 ,  H01J2237/0453 ,  H01J2237/1207 ,  H01J2237/1534 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/31774 ,  H01J2237/31793

Abstract: A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.