公开(公告)号：US20240128042A1

公开(公告)日：2024-04-18

申请号：US18547556

申请日：2022-02-22

Applicant: TWI Limited

Inventor： Colin RIBTON

IPC: H01J37/065 ,  H01J1/18 ,  H01J1/88 ,  H01J3/02

CPC classification number: H01J37/065 ,  H01J1/18 ,  H01J1/88 ,  H01J3/024 ,  H01J2201/19 ,  H01J2203/02

Abstract: The present invention relates to an electron gun cathode mount adapted at one end to secure a thermionic cathode and at the other end to be connected to an attachment member, wherein the electron gun cathode mount is structured so as to be capable of, when in use, reducing heat transfer from the thermionic cathode to the attachment member, and the material forming the electron gun cathode mount has a thermal conductivity of less than 10 Wm−1K−1 at the operating temperature of the thermionic cathode in a direction from the thermionic cathode to the attachment member. The present invention also relates to an electron gun assembly having the electron gun cathode mount installed therein.

公开(公告)号：US20240029989A1

公开(公告)日：2024-01-25

申请号：US18258461

申请日：2021-12-20

Applicant: Denka Company Limited

Inventor： Hiromitsu CHATANI

IPC: H01J1/146 ,  H01J1/16 ,  H01J37/065

CPC classification number: H01J1/146 ,  H01J1/16 ,  H01J37/065 ,  H01J2237/06308

Abstract: A method for manufacturing an electron source includes steps of sandwiching a welding object in which a tip of an electron emission material and a tungsten filament overlap in direct contact between a pair of welding electrodes, and welding the tip and the tungsten filament by causing a current to flow while pressing forces are applied to the welding object by the pair of welding electrodes. A thickness of the welding object is within a range of 50 to 500 μm.

公开(公告)号：US20230352262A1

公开(公告)日：2023-11-02

申请号：US17928401

申请日：2020-06-29

Applicant: Hitachi High-Tech Corporation

Inventor： Keigo KASUYA ,  Shuhei ISHIKAWA ,  Kenji TANIMOTO ,  Takashi DOI ,  Soichiro MATSUNAGA ,  Hiroshi MORITA ,  Daigo KOMESU ,  Kenji MIYATA

IPC: H01J37/065 ,  H01J37/073 ,  H01J37/28

CPC classification number: H01J37/065 ,  H01J37/073 ,  H01J37/28

Abstract: In an electron source including a suppressor electrode having an opening at one end portion thereof in a direction along a central axis and an electron emission material having a distal end protruding from the opening, the suppressor electrode further includes a receding portion receding to a position farther from the distal end of the electron emission material than the opening in the direction along the central axis at a position in an outer peripheral direction than the opening, and at least a part of the receding portion is disposed within a diameter of 2810 μm from a center of the opening. Accordingly, an electron source, an electron gun, and a charged particle beam device such as an electron microscope using the same, in which a machine difference in a device performance due to an axial shift between the electron emission material and the suppressor electrode is reduced, are implemented.

公开(公告)号：US11688579B2

公开(公告)日：2023-06-27

申请号：US17549854

申请日：2021-12-13

Applicant: ASML Netherlands B.V.

Inventor： Juying Dou ,  Zheng Fan ,  Tzu-Yi Kuo ,  Zhong-wei Chen

IPC: H01J37/073 ,  H01J37/065 ,  H01J1/304 ,  H01J1/14 ,  H01J9/02 ,  H01J9/04 ,  H01J37/26

CPC classification number: H01J37/073 ,  H01J1/14 ,  H01J1/304 ,  H01J9/025 ,  H01J9/042 ,  H01J37/065 ,  H01J37/26 ,  H01J2201/196 ,  H01J2201/30403 ,  H01J2201/30426 ,  H01J2201/30449 ,  H01J2201/30484 ,  H01J2201/30492 ,  H01J2209/0223 ,  H01J2237/06308 ,  H01J2237/06316 ,  H01J2237/06341

Abstract: Electron emitters and methods of fabricating the electron emitters are disclosed. According to certain embodiments, an electron emitter includes a tip with a planar region having a diameter in a range of approximately (0.05-10) micrometers. The electron emitter tip is configured to release field emission electrons. The electron emitter further includes a work-function-lowering material coated on the tip.

公开(公告)号：US20180323036A1

公开(公告)日：2018-11-08

申请号：US15586194

申请日：2017-05-03

Applicant: FEI Company

Inventor： Ali Mohammadi-Gheidari ,  Alexander Henstra ,  Peter Christiaan Tiemeijer ,  Kun Liu ,  Pleun Dona ,  Gregory A. Schwind ,  Gerbert Jeroen van de Water ,  Maarten Bischoff

IPC: H01J37/29 ,  H01J37/244 ,  G02B21/06

CPC classification number: H01J37/29 ,  G02B21/06 ,  H01J37/065 ,  H01J37/067 ,  H01J37/145 ,  H01J37/244 ,  H01J2237/06316 ,  H01J2237/06341 ,  H01J2237/0656 ,  H01J2237/08 ,  H01J2237/1415 ,  H01J2237/28

Abstract: A charged particle microscope and a method of operating a charged particle microscope are disclosed. The microscope employs a source for producing charged particles, and a source lens below the source to form a charged particle beam which is directed onto a specimen by a condenser system. A detector collects radiation emanating from the specimen in response to irradiation of the specimen by the beam. The source lens is a compound lens, focusing the beam within a vacuum enclosure using both a magnetic lens having permanent magnets outside the enclosure to produce a magnetic field at the beam, and a variable electrostatic lens within the enclosure.

公开(公告)号：US20180277334A1

公开(公告)日：2018-09-27

申请号：US15985763

申请日：2018-05-22

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Alexander Hendrik Vincent VAN VEEN ,  Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND

IPC: H01J37/153 ,  H01J37/12 ,  H01J37/09

CPC classification number: H01J37/153 ,  H01J37/023 ,  H01J37/065 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/0264 ,  H01J2237/0453 ,  H01J2237/1207 ,  H01J2237/1534 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/31774 ,  H01J2237/31793

Abstract: A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.

公开(公告)号：US09934933B1

公开(公告)日：2018-04-03

申请号：US15593900

申请日：2017-05-12

Applicant: KLA-Tencor Corporation

Inventor： Laurence S. Hordon ,  Nikolai Chubun ,  Luca Grella ,  Xinrong Jiang ,  Daniel Bui ,  Kevin Cummings ,  Christopher Sears ,  Oscar G. Florendo

IPC: H01J37/28 ,  H01J37/00 ,  H01J37/073 ,  H01J37/065 ,  H01J37/14

CPC classification number: H01J37/065 ,  H01J37/073 ,  H01J37/14 ,  H01J37/28 ,  H01J2237/06316 ,  H01J2237/06341 ,  H01J2237/06375 ,  H01J2237/14

Abstract: Extractors and extractor systems minimize the generation of secondary electrons which interact with and degrade the primary electron beam. This can improve the performance of an electron beam system, such as a scanning electron microscope. The extractor may include a frustoconical aperture that widens as distance from the source of the electron beam increases. The entrance into the frustoconical aperture also can include a curved edge.

公开(公告)号：US09916959B2

公开(公告)日：2018-03-13

申请号：US14397557

申请日：2013-05-21

Applicant: KONINKLIJKE PHILIPS N.V.

Inventor： Marcus Walter Foellmer ,  Zoryana Terletska ,  Stefan Hauttmann

IPC: H01J35/06 ,  H01J35/16 ,  H01J37/06 ,  H01J9/04 ,  H01J1/18 ,  H01J37/065 ,  H01J1/92 ,  H01J35/14

CPC classification number: H01J35/06 ,  H01J1/18 ,  H01J1/92 ,  H01J9/042 ,  H01J35/14 ,  H01J35/165 ,  H01J37/065 ,  H01J2229/4824 ,  H01J2229/4831 ,  H01J2235/06 ,  H01J2237/032 ,  H01J2237/036 ,  H01J2237/038 ,  H01J2893/0006

Abstract: A cathode for an X-ray tube, an X-ray tube, a system for X-ray imaging, and a method for an assembly of a cathode for an X-ray tube include a filament, a support structure, a body structure, and a filament frame structure. The filament is provided to emit electrons towards an anode in an electron emitting direction, and the filament at least partially includes a helical structure. Further, the filament is held by the support structure which is fixedly connected to the body structure. The filament frame structure is provided for electron-optical focusing of the emitted electrons, and the filament frame structure is provided adjacent to the outer boundaries of the filament. The filament frame structure includes frame surface portions arranged transverse to the emitting direction, and the filament frame structure is held by the support structure.

公开(公告)号：US20180033579A1

公开(公告)日：2018-02-01

申请号：US15717364

申请日：2017-09-27

Applicant: NIKON METROLOGY NV

Inventor： Roger HADLAND

IPC: H01J35/02 ,  H01J29/48 ,  F16C35/04 ,  F16C33/76 ,  F16J15/16 ,  H05G1/12 ,  H02M7/10 ,  H01J35/10 ,  H01J35/04 ,  H01J35/16 ,  H02M1/32

CPC classification number: H01J35/025 ,  F16C33/768 ,  F16C35/042 ,  F16J15/16 ,  H01J29/48 ,  H01J35/04 ,  H01J35/06 ,  H01J35/101 ,  H01J35/106 ,  H01J35/108 ,  H01J35/16 ,  H01J37/065 ,  H01J2235/0236 ,  H01J2235/083 ,  H01J2235/086 ,  H01J2235/087 ,  H01J2235/1046 ,  H01J2235/1204 ,  H01J2235/1262 ,  H01J2235/20 ,  H01J2237/2482 ,  H02M1/32 ,  H02M7/106 ,  H05G1/12

Abstract: Disclosed herein are a high-voltage generator for an x-ray source, an x-ray gun, an electron beam apparatus, a rotary vacuum seal, a target assembly for an x-ray source, a rotary x-ray emission target, and an x-ray source. These various aspects may separately and/or together enable the construction of an x-ray source which can operate at energies of up to 500 kV and beyond, which is suitable for use in commercial and research x-ray applications such as computerised tomography. In particular, the high-voltage generator includes a shield electrode electrically connected intermediate of a first voltage multiplier and a second voltage multiplier. The electron beam apparatus includes control photodetectors and photo emitters having a transparent conductive shield arranged therebetween. The rotary vacuum seal includes a pumpable chamber at a position intermediate between high-pressure and low-pressure ends of a bore for a rotating shaft. The rotary target assembly is configured such that when a torque between a bearing housing and a vacuum housing exceeds a predetermined torque, the bearing housing rotates relative to the vacuum housing. The rotary x-ray emission target has a plurality of target plates supported on a hub, the plates being arranged on the hub to provide an annular target region about an axis rotation of the hub. The x-ray gun is provided with a shield electrode maintained at a potential difference relative to the x-ray target different to the electron beam emission cathode.

公开(公告)号：US09859097B2

公开(公告)日：2018-01-02

申请号：US15224167

申请日：2016-07-29

Applicant: The Board of Trustees of the Leland Stanford Junior University

Inventor： R. Fabian W. Pease ,  Manu Prakash ,  James Stanley Cybulski ,  Alireza Nojeh

IPC: H01J37/26 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/065 ,  H01J37/073 ,  H01J37/075 ,  H01J37/141 ,  H01J37/20 ,  H01J37/26 ,  H01J2237/061 ,  H01J2237/06308 ,  H01J2237/06333 ,  H01J2237/1035 ,  H01J2237/14 ,  H01J2237/164 ,  H01J2237/18 ,  H01J2237/20228 ,  H01J2237/2608 ,  H01J2237/262 ,  H01J2237/28 ,  H01J2237/2803

Abstract: A permanently sealed vacuum tube is used to provide the electrons for an electron microscope. This advantageously allows use of low vacuum at the sample, which greatly simplifies the overall design of the system. There are two main variations. In the first variation, imaging is provided by mechanically scanning the sample. In the second variation, imaging is provided by point projection. In both cases, the electron beam is fixed and does not need to be scanned during operation of the microscope. This also greatly simplifies the overall system.