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21.发明授权Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件公开(公告)号：US08637834B2
公开(公告)日：2014-01-28
申请号：US13342017
申请日：2011-12-31
Applicant: Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximillian Haider , Antonio Casares , Steven Rogers
Inventor： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximillian Haider , Antonio Casares , Steven Rogers
CPC classification number: H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。
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22.发明申请Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements 有权这种系统和布置的粒子 - 光学系统和布置和粒子 - 光学部件公开(公告)号：US20120104252A1
公开(公告)日：2012-05-03
申请号：US13342017
申请日：2011-12-31
Applicant: Rainer KNIPPELMEYER , Oliver KIENZLE , Thomas KEMEN , Heiko MUELLER , Stephan UHLEMANN , Maximilian HAIDER , Antonio CASARES , Steven ROGERS
Inventor： Rainer KNIPPELMEYER , Oliver KIENZLE , Thomas KEMEN , Heiko MUELLER , Stephan UHLEMANN , Maximilian HAIDER , Antonio CASARES , Steven ROGERS
CPC classification number: H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。
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Patent Agency Ranking
公开(公告)号：US08159157B1
公开(公告)日：2012-04-17
申请号：US12326271
申请日：2008-12-02
Applicant: Timothy J. Imholt
Inventor： Timothy J. Imholt
IPC: H01J23/00
CPC classification number: H01J3/02 , H01J2237/04735 , H01J2237/06 , H05H15/00
Abstract: According to certain embodiments, a linear accelerator comprises a nanotube, a particle, and an energy source. The nanotube has a cylindrical shape, and the particle is disposed within the nanotube. The energy source is configured to apply energy to the nanotube to cause the particle to accelerate.
Abstract translation: 根据某些实施方案，线性加速剂包括纳米管，颗粒和能量源。 纳米管具有圆柱形状，并且该颗粒设置在纳米管内。 能量源被配置为向纳米管施加能量以使颗粒加速。
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24.发明授权Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件公开(公告)号：US08097847B2
公开(公告)日：2012-01-17
申请号：US12459078
申请日：2009-06-25
Applicant: Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares
Inventor： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares
CPC classification number: H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。
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公开(公告)号：US20100258262A1
公开(公告)日：2010-10-14
申请号：US12821480
申请日：2010-06-23
Applicant: Robin M. Forbes Jones
Inventor： Robin M. Forbes Jones
CPC classification number: C22B9/04 , B22F9/14 , B22F2009/0836 , B22F2009/0848 , B22F2009/0888 , B22F2009/0896 , B22F2998/10 , B32B15/01 , C22B9/226 , C22B9/228 , C22C1/0433 , C22C19/055 , C22C19/056 , C23C4/06 , C23C4/123 , C23C4/137 , H01J37/305 , H01J2237/06 , H01J2237/063 , H01J2237/15 , H01J2237/16
Abstract: Methods and apparatus for producing large diameter superalloy ingots are disclosed. A material comprising at least one of a metal and a metallic alloy is introduced into a pressure-regulated chamber in a melting assembly. The material is subjected to a wide-area electron field within the pressure-regulated chamber to heat the material to a temperature above the melting temperature of the material to form a molten alloy. At least one stream of molten alloy from the pressure-regulated chamber is provided from the melting assembly and is fed into an atomizing assembly, where particles of the molten alloy are generated by impinging electrons on the molten alloy to atomize the molten alloy. At least one of an electrostatic field and an electromagnetic field are produced to influence the particles of the molten alloy. The particles of the molten alloy are deposited onto a collector in a spray forming operation to form an alloy ingot.
Abstract translation: 公开了用于生产大直径超合金锭的方法和装置。 将包括金属和金属合金中的至少一种的材料引入熔融组件中的压力调节室中。 该材料在压力调节室内经受广泛的电场，以将材料加热到高于材料的熔融温度的温度以形成熔融合金。 从熔融组件提供至少一个来自压力调节室的熔融合金流，并被送入雾化组件，其中熔融合金的颗粒通过在熔融合金上撞击电子而雾化熔融合金而产生。 产生静电场和电磁场中的至少一个以影响熔融合金的颗粒。 熔融合金的颗粒在喷射成型操作中沉积到集热器上以形成合金锭。
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公开(公告)号：US07737414B2
公开(公告)日：2010-06-15
申请号：US11924692
申请日：2007-10-26
Applicant: Hong-Shi Kuo , Ing-Shouh Hwang , Tien T. Tsong , Tsu-Yi Fu
Inventor： Hong-Shi Kuo , Ing-Shouh Hwang , Tien T. Tsong , Tsu-Yi Fu
CPC classification number: G01Q60/16 , C21D9/26 , C21D2201/04 , C22F1/14 , H01J1/3044 , H01J9/025 , H01J37/28 , H01J37/285 , H01J37/3056 , H01J2201/30411 , H01J2201/30449 , H01J2209/0226 , H01J2237/06 , H01J2237/08 , H01J2237/0807 , H01J2237/3114 , Y10S977/848 , Y10S977/90 , Y10S977/949 , Y10S977/95 , Y10T428/12389
Abstract: A method for preparing an iridium tip with atomic sharpness. The method includes tapering an iridium wire to a needle shape and heating the iridium needle in an oxygen atmosphere. Also disclosed is an iridium needle having a pyramidal structure which terminates with a small number of atoms prepared by the methods.
Abstract translation: 一种制备原子锐度的铱尖的方法。 所述方法包括将铱丝丝逐渐变细为针状，并在氧气氛中加热铱针。 还公开了具有锥形结构的铱针，其以通过该方法制备的少量原子终止。
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27.发明申请公开(公告)号：US20060289804A1
公开(公告)日：2006-12-28
申请号：US11366533
申请日：2006-03-03
Applicant: Rainer Knippelmeyer , Oliver Kienzle
Inventor： Rainer Knippelmeyer , Oliver Kienzle
IPC: G21K5/10
CPC classification number: H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
Abstract: An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.
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