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    Electron beam generating apparatus
    5.
    发明授权
    Electron beam generating apparatus 有权
    电子束发生装置

    公开(公告)号：US08736169B2

    公开(公告)日：2014-05-27

    申请号：US13122109

    申请日：2010-08-10

    Applicant: Yong Woon Park ,  Sung Ju Park ,  In Soo Ko ,  Chang Bum Kim ,  Ju Ho Hong ,  Sung Ik Moon

    Inventor： Yong Woon Park ,  Sung Ju Park ,  In Soo Ko ,  Chang Bum Kim ,  Ju Ho Hong ,  Sung Ik Moon

    IPC: H01J29/80

    CPC classification number: H01J3/02

    Abstract: An apparatus for generating an electron beam is disclosed to reduce emittance of an electron beam. The apparatus includes: a housing including a rear portion where an electron beam is generated, a front portion having an electron beam discharge hole for discharging the electron beam to the exterior, and a side portion connecting the rear portion and the front portion, the side portion having a first hole and an opposite side portion, facing the first hole, having a second hole in order to reduce asymmetry of an electric field caused by the first hole; and a waveguide installed on the side portion to supply an electromagnetic wave to the interior of the housing through the first hole, wherein the electron beam is generated by laser incident to the interior of the housing and accelerated by the electromagnetic wave supplied to the interior of the housing.

    Abstract translation: 公开了一种用于产生电子束的装置，以减少电子束的发射。 该装置包括：壳体，其包括产生电子束的后部，具有用于将电子束排出到外部的电子束排出孔的前部和连接后部和前部的侧部， 具有第一孔和与第一孔相对的相对侧部的部分具有第二孔，以减少由第一孔引起的电场的不对称性; 以及安装在所述侧部上的波导，以通过所述第一孔向所述壳体的内部提供电磁波，其中所述电子束通过入射到所述壳体的内部的激光产生并且被提供给所述壳体内部的电磁波加速 住房。

    SYSTEMS AND METHODS FOR GENERATING COHERENT MATTERWAVE BEAMS
    7.
    发明申请
    SYSTEMS AND METHODS FOR GENERATING COHERENT MATTERWAVE BEAMS 有权
    用于产生相干物流的系统和方法

    公开(公告)号：US20130169157A1

    公开(公告)日：2013-07-04

    申请号：US13338925

    申请日：2011-12-28

    Applicant: Moe J. ARMAN ,  Charles Chase

    Inventor： Moe J. ARMAN ,  Charles Chase

    IPC: H01J21/18

    CPC classification number: H01J3/02 ,  G21K1/08

    Abstract: Systems and methods for generating a coherent matterwave beam are provided. In some aspects, a system includes a plurality of beam generating units. Each of the plurality of beam generating units is configured to generate a stream of charged particles. The system also includes a magnetic field generator configured to expose the plurality of streams to a magnetic field such that (i) the charged particles of the plurality of streams undergo phase synchronization with one another in response to a vector potential associated with the magnetic field and (ii) the plurality of streams is directed along one or more channels to combine with one another and produce a coherent matterwave beam.

    Abstract translation: 提供了用于产生一致的物质波束的系统和方法。 在一些方面，系统包括多个光束产生单元。 多个光束产生单元中的每一个被配置为产生带电粒子流。 该系统还包括磁场发生器，其被配置为将多个流暴露于磁场，使得（i）响应于与磁场相关联的向量电位，多个流中的带电粒子彼此相位同步，以及 （ii）多个流沿着一个或多个通道引导以彼此结合并产生一个相干物质波束。

    Electron beam directed energy device and methods of using same
    8.
    发明授权
    Electron beam directed energy device and methods of using same 失效
    电子束定向能量装置及其使用方法

    公开(公告)号：US07282727B2

    公开(公告)日：2007-10-16

    申请号：US11187519

    申请日：2005-07-22

    Applicant: Michael W. Retsky

    Inventor： Michael W. Retsky

    IPC: H01J3/14

    CPC classification number: H01J3/02 ,  F41H11/02 ,  F41H11/12 ,  F41H11/136 ,  F41H13/00 ,  F41H13/0043 ,  F42B33/065 ,  H01J3/026 ,  H01J3/14

    Abstract: A method and apparatus is disclosed for an electron beam directed energy device. The device consists of an electron gun with one or more electron beams. The device includes one or more accelerating plates with holes aligned for beam passage. The plates may be flat or preferably shaped to direct each electron beam to exit the electron gun at a predetermined orientation. In one preferred application, the device is located in outer space with individual beams that are directed to focus at a distant target to be used to impact and destroy missiles. The aimings of the separate beams are designed to overcome Coulomb repulsion. A method is also presented for directing the beams to a target considering the variable terrestrial magnetic field. In another preferred application, the electron beam is directed into the ground to produce a subsurface x-ray source to locate and/or destroy buried or otherwise hidden objects including explosive devices.

    Abstract translation: 公开了一种用于电子束定向能量装置的方法和装置。 该装置由具有一个或多个电子束的电子枪组成。 该装置包括一个或多个加速板，其具有用于梁通道对准的孔。 板可以是平坦的或优选地成形以引导每个电子束以预定取向离开电子枪。 在一个优选的应用中，设备位于外部空间中，其中各个射束被引导以聚焦在远距离目标处以用于撞击和摧毁导弹。 单独梁的目的是克服库仑排斥。 还提出了一种考虑到可变地面磁场将光束引导到目标的方法。 在另一个优选的应用中，电子束被引导到地面中以产生地下x射线源来定位和/或破坏包括爆炸装置在内的隐藏的物体。

    Electron emission device
    9.
    发明申请
    Electron emission device 审中-公开
    电子发射装置

    公开(公告)号：US20050140268A1

    公开(公告)日：2005-06-30

    申请号：US10927177

    申请日：2004-08-25

    Applicant: Byong-Gon Lee ,  Sang-Ho Jeon

    Inventor： Byong-Gon Lee ,  Sang-Ho Jeon

    IPC: H01J29/04 ,  H01J1/30 ,  H01J1/62 ,  H01J3/02 ,  H01J29/46 ,  H01J31/12 ,  H01J63/04

    CPC classification number: H01J3/02

    Abstract: An electron emission device includes first and second substrates facing each other with a distance, and first and second electrodes formed on the first substrate. Electron emission regions contact the second electrodes, and are located corresponding to pixel regions established on the first substrate. A grid electrode is disposed between the first and the second substrates, and has electron beam passage holes corresponding to the respective electron emission regions. With the electron emission device, the positional relation of the electron emission region to the beam passage hole of the grid electrode is optimally made to thereby enhance the screen brightness and the color representation.

    Abstract translation: 电子发射装置包括彼此面对距离的第一和第二基板，以及形成在第一基板上的第一和第二电极。 电子发射区域与第二电极接触，并且对应于在第一衬底上建立的像素区域。 栅格电极设置在第一和第二基板之间，并且具有与各个电子发射区域对应的电子束通过孔。 利用电子发射器件，电子发射区域与栅格电极的光束通过孔的位置关系是最佳的，从而提高了屏幕亮度和色彩表现。

    Electron beam exposure system
    10.
    发明授权
    Electron beam exposure system 有权
    电子束曝光系统

    公开(公告)号：US06897458B2

    公开(公告)日：2005-05-24

    申请号：US10699246

    申请日：2003-10-30

    Applicant: Marco Jan-Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Vincent van Veen ,  Pieter Kruit

    Inventor： Marco Jan-Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Vincent van Veen ,  Pieter Kruit

    IPC: A61N5/00 ,  G01Q30/02 ,  G01Q30/08 ,  G03B1/00 ,  H01J37/08 ,  H01J37/30 ,  H01J37/304 ,  H01J37/317

    CPC classification number: H01J3/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/3045

    Abstract: The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optimal system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

    Abstract translation: 本发明涉及一种用于将图案转印到目标表面上的电子束曝光装置，包括：用于产生多个电子束的小波发生器; 用于接收所述多个电子子束的调制阵列，包括用于调制电子束的强度的多个调制器; 连接到用于单独控制调制器的调制阵列的控制器，可操作地连接到每个调制器的调节器，用于单独调整每个调制器的控制信号; 聚焦电子最优系统，其包括静电透镜阵列，其中每个透镜将由所述调制阵列传输的相应单独的子束聚焦到小于300nm的横截面，以及用于将其曝光表面保持在其上的目标保持器 其图案将在聚焦电子光学系统的第一焦平面中转印。

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