公开(公告)号：US09840772B2

公开(公告)日：2017-12-12

申请号：US15592823

申请日：2017-05-11

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Bon-Woong Koo ,  Christopher J. Leavitt ,  John A. Frontiero ,  Timothy J. Miller ,  Svetlana B. Radovanov

IPC: C23C14/48 ,  C23C14/56 ,  C23C14/14 ,  H01J37/317

CPC classification number: C23C14/564 ,  C23C14/14 ,  C23C14/48 ,  H01J27/00 ,  H01J37/3171 ,  H01J37/3178 ,  H01J37/32412

Abstract: A method of processing a workpiece is disclosed, where the plasma chamber is first coated using a conditioning gas and optionally, a co-gas. The conditioning gas, which is disposed within a conditioning gas container may comprise a hydride of the desired dopant species and a filler gas, where the filler gas is a hydride of a Group 4 or Group 5 element. The remainder of the conditioning gas container may comprise hydrogen gas. Following this conditioning process, a feedgas, which comprises fluorine and the desired dopant species, is introduced to the plasma chamber and ionized. Ions are then extracted from the plasma chamber and accelerated toward the workpiece, where they are implanted without being first mass analyzed. In some embodiments, the desired dopant species may be boron.

公开(公告)号：US20150354056A1

公开(公告)日：2015-12-10

申请号：US14298251

申请日：2014-06-06

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Bon-Woong Koo ,  Christopher J. Leavitt ,  John A. Frontiero ,  Timothy J. Miller ,  Svetlana B. Radovanov

IPC: C23C14/48

CPC classification number: C23C14/564 ,  C23C14/14 ,  C23C14/48 ,  H01J27/00 ,  H01J37/3171 ,  H01J37/3178 ,  H01J37/32412

Abstract: A method of processing a workpiece is disclosed, where the plasma chamber is first coated using a conditioning gas and optionally, a co-gas. The conditioning gas, which is disposed within a conditioning gas container may comprise a hydride of the desired dopant species and a filler gas, where the filler gas is a hydride of a Group 4 or Group 5 element. The remainder of the conditioning gas container may comprise hydrogen gas. Following this conditioning process, a feedgas, which comprises fluorine and the desired dopant species, is introduced to the plasma chamber and ionized. Ions are then extracted from the plasma chamber and accelerated toward the workpiece, where they are implanted without being first mass analyzed. In some embodiments, the desired dopant species may be boron.

Abstract translation: 公开了一种处理工件的方法，其中首先使用调节气体和任选的辅助气体涂覆等离子体室。 设置在调节气体容器内的调节气体可以包含所需掺杂物种类的氢化物和填充气体，其中填充气体是第4族或第5族元素的氢化物。 调理气体容器的其余部分可以包括氢气。 在这种调理过程之后，将包含氟和所需掺杂物种的进料气引入等离子体室并离子化。 然后将离子从等离子体室中提取出来并加速朝向工件，在这些离子室中它们被植入而不被首先进行质量分析。 在一些实施方案中，所需的掺杂物种类可以是硼。

公开(公告)号：US08653475B1

公开(公告)日：2014-02-18

申请号：US13649564

申请日：2012-10-11

Applicant: Manuel A. Jerez ,  Carlos F. Borges

Inventor： Manuel A. Jerez ,  Carlos F. Borges

IPC: H01J27/00

CPC classification number: H01J27/00 ,  H01J27/022 ,  H01J27/08 ,  H01J37/04 ,  H01J37/08 ,  H01J2237/006 ,  H01J2237/082

Abstract: An arc chamber assembly for an ion source comprising a housing having a base and at least one pair of side walls extending upwardly from opposite sides of the base to define an arc chamber, the base having a plurality of channels extending to each sidewall; an inlet port connected to the base for delivering a flow of gas into the channels; a bottom liner having at least one pair of notches in each of two opposite side edges thereof and disposed in the housing in spaced parallel relation to the base and opposite the channels for conducting a flow of gas from the inlet port towards the sidewalls, each notch being in communication with a respective channel of the plurality of channels to pass gas upwardly into the arc chamber; and a pair of side liners, each side liner being disposed in the housing in spaced parallel relation to a respective one of the side walls for conducting a flow of gas between the base and the bottom liner, each side liner having at least one pair of slots to horizontally pass gas into the arc chamber.

Abstract translation: 1.一种用于离子源的电弧室组件，包括壳体，所述壳体具有基部和从所述基部的相对侧向上延伸的至少一对侧壁，以限定电弧室，所述基部具有延伸到每个侧壁的多个通道; 连接到基座的入口端口，用于将气流输送到通道中; 底部衬套在其两个相对的侧边缘中的每一个中具有至少一对凹口，并且以与腔体平行的方式设置在壳体中并与通道相对，用于将气体从入口端口朝向侧壁传导， 与多个通道的相应通道连通以将气体向上流入电弧室; 以及一对侧衬，每个侧衬与所述侧壁中的相应的一个侧壁间隔开设置在所述壳体中，用于在所述底座和所述底衬套之间进行气体流动，每个侧衬里具有至少一对 水槽将气体水平地通入电弧室。

公开(公告)号：US08561486B2

公开(公告)日：2013-10-22

申请号：US13078999

申请日：2011-04-03

Applicant: Igor V Novosselov ,  Peter C Ariessohn ,  Evan D Dengler ,  Michelle Hickner

Inventor： Igor V Novosselov ,  Peter C Ariessohn ,  Evan D Dengler ,  Michelle Hickner

IPC: G01N1/12

CPC classification number: B01D15/08 ,  G01J1/58 ,  G01J3/00 ,  G01N1/28 ,  G01N27/447 ,  G01N27/62 ,  G01N30/00 ,  G01N33/00 ,  H01J27/00 ,  H01J49/26 ,  Y02A50/25

Abstract: Devices, apparatus and methods are disclosed for non-contact pneumatic sampling and sampling of surfaces, persons, articles of clothing, buildings, furnishings, vehicles, baggage, packages, mail, and the like, for contaminating aerosols indicative of a hazard or a benefit, where the contaminating aerosols are chemical, radiological, biological, toxic, or infectious in character. In a first device, a central orifice for pulling a suction gas stream is surrounded by a peripheral array of convergingly-directed gas jets, forming a virtual sampling chamber. The gas jets are configured to deliver millisecond pneumatic pulses that erode particles from solid surfaces at a distance. In another aspect of the invention, a suction gas stream is split using an air-to-air concentrator so that a particle-enriched gas flow is directed to a particle trap and any particles immobilized in the particle trap (including any adsorbed vapors associated with the particles) are selectively analyzed to detect trace residues associated with explosives.

Abstract translation: 公开了用于表面，人员，衣物，建筑物，家具，车辆，行李，包装，邮件等的非接触式气体采样和采样的装置，装置和方法，用于污染指示危险或益处的气溶胶 污染气溶胶在化学，放射学，生物学，毒性或传染性方面。 在第一装置中，用于拉动吸入气流的中心孔被收敛的气体射流的外围阵列包围，形成虚拟取样室。 气体喷射器被配置为传送毫秒的气动脉冲，其从一定距离的实体表面侵蚀颗粒。 在本发明的另一方面，使用空气 - 空气浓缩器分离吸入气体流，使得富含颗粒的气体流被引导到颗粒捕获器，并且固定在颗粒捕获器中的任何颗粒（包括与 颗粒）被选择性分析以检测与爆炸物相关的痕量残留物。

公开(公告)号：US20110315867A1

公开(公告)日：2011-12-29

申请号：US13075138

申请日：2011-03-29

Applicant: GLENN LANE

Inventor： GLENN LANE

IPC: H01J49/30

CPC classification number: H01J27/00 ,  H05H1/54

Abstract: A closed plasma channel (“CPC”) superconductor which, in a first embodiment, is comprised of an elongated, close-ended vacuum conduit comprising a cylindrical wall having a longitudinal axis and defining a transmission space for containing an ionized gas of vapor plasma (hereinafter “plasma components”), the plasma components being substantially separated into regionalized channels parallel to the longitudinal axis in response to a static magnetic field produced within the transmission space. Each channel is established along the entire length of the transmission space. At least one channel is established comprised primarily of free-electrons which provide a path of least resistance for the transmission of energy therethrough. Ionization is established and maintained by the photoelectric effect of a light source of suitable wavelength to produce the most conductive electrical transmission medium. Various embodiments of the subject method and apparatus are described including a hybrid system for the transmission of alternating current or, alternatively, multi-pole EM fields through the cylindrical wall and direct current or charged particles through the stratified channels.

Abstract translation: 一种封闭的等离子体通道（“CPC”）超导体，其在第一实施例中由细长的近端真空导管组成，其包括具有纵向轴线并且限定用于容纳蒸汽等离子体的电离气体的透射空间的圆柱形壁 以下称为“等离子体部件”），响应于在传输空间内产生的静态磁场，等离子体部件基本上分离成与纵向轴线平行的区域化通道。 每个通道沿传输空间的整个长度建立。 至少建立了一个通道，主要由自由电子组成，其提供通过其传输能量的最小电阻的路径。 通过适当波长的光源的光电效应建立和维持电离以产生最导电的电传输介质。 描述了本发明方法和装置的各种实施例，其包括用于传输交流电的混合系统，或者通过圆柱形壁的多极EM场，以及通过分层通道的直流或带电粒子。

公开(公告)号：US07247863B2

公开(公告)日：2007-07-24

申请号：US10032664

申请日：2001-10-19

Applicant: Donald W. Berrian

Inventor： Donald W. Berrian

IPC: H01J37/08

CPC classification number: H01J27/00 ,  H01J27/022 ,  H01J37/08 ,  H01J2237/31701

Abstract: An apparatus and a method are disclosed for rapidly controlling the rate of ion generation in an ion source. The ion source includes an ion chamber, filament-cathode, a mirror electrode, and a grid. The ion source is operable to generate an ion beam from the ionization of ion precursor gas present in the ion chamber by electrons emitted from the filament. The rate of ion generation is controlled by modifying the potential of the grid relative to the filament to control the number of electrons available for ionization between the grid and the mirror electrode. An alternative embodiment for rapidly controlling the rate of ion generation in an ion source is also disclosed. In the alternative embodiment, the ion source comprises an ion chamber having mutually opposed sides and configured to receive ion precursor gas; a filament-cathode located on one side of said ion chamber and operable to emit electrons for the ionization of the precursor gas for the generation of the ion beam; and a mirror electrode having a potential associated therewith and located on the other side of said ion chamber. The mirror electrode is connected to a circuit to vary its potential relative to said filament so as to vary the number of the electrons available in the ion chamber for ionization.

Abstract translation: 公开了用于快速控制离子源中的离子产生速率的装置和方法。 离子源包括离子室，灯丝阴极，反射镜电极和栅极。 离子源可操作以通过从灯丝发射的电子从离子室中存在的离子前体气体的离子化产生离子束。 通过改变网格相对于灯丝的电位来控制离子产生的速率，以控制可用于电网和镜电极之间电离的电子数。 还公开了用于快速控制离子源中的离子产生速率的替代实施方案。 在替代实施例中，离子源包括具有彼此相对的侧面并被配置为接收离子前体气体的离子室; 位于所述离子室一侧的灯丝阴极，可操作地发射用于离子束离子化的前体气体的电子; 以及具有与之相关联并位于所述离子室的另一侧上的电位的镜电极。 镜电极连接到电路以改变其相对于所述灯丝的电位，以便改变用于电离的离子室中可用的电子数。