公开(公告)号：US20180254166A1

公开(公告)日：2018-09-06

申请号：US15912139

申请日：2018-03-05

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Hiroshi Kawaguchi

IPC: H01J37/08 ,  H01J27/26 ,  H01J27/08

CPC classification number: H01J37/08 ,  H01J27/08 ,  H01J27/205 ,  H01J27/26 ,  H01J37/3171 ,  H01J2237/061 ,  H01J2237/082 ,  H01J2237/31701

Abstract: An ion generator includes an arc chamber which has a plasma generating region therein, a cathode configured to emit a thermoelectron toward the plasma generating region, a repeller which faces the cathode in an axial direction in a state where the plasma generating region is interposed between the cathode and the repeller, and a cage which is disposed to partially surround the plasma generating region at a position between an inner surface of the arc chamber and the plasma generating region.

公开(公告)号：US20160336138A1

公开(公告)日：2016-11-17

申请号：US14713573

申请日：2015-05-15

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Shengwu Chang ,  Jeff Burgess ,  William Leavitt ,  Michael St Peter ,  Matt Mosher ,  Joe Olson ,  Frank Sinclair

IPC: H01J27/08 ,  H01J9/18 ,  H01J9/385 ,  H01J27/02

CPC classification number: H01J27/08 ,  H01J3/04 ,  H01J5/02 ,  H01J9/18 ,  H01J9/385 ,  H01J27/024 ,  H01J37/08

Abstract: Provided herein are approaches for improving ion beam extraction stability and ion beam current for an ion extraction system. In one approach, a source housing assembly may include a source housing surrounding an ion source including an arc chamber, the source housing having an extraction aperture plate mounted at a proximal end thereof. The source housing assembly further includes a vacuum liner disposed within an interior of the source housing to form a barrier around a set of vacuum pumping apertures. As configured, openings in the source housing assembly, other than an opening in the extraction aperture plate, are enclosed by the extraction aperture plate and the vacuum liner, thus ensuring appendix arcs or extraneous ions produced outside the arc chamber remain within the source housing. Just those ions produced within the arc chamber exit the source housing through the opening of the extraction aperture plate.

Abstract translation: 本文提供了用于改进离子提取系统的离子束提取稳定性和离子束电流的方法。 在一种方法中，源壳体组件可以包括围绕包括电弧室的离子源的源壳体，源壳体具有安装在其近端处的抽吸孔板。 源壳体组件还包括设置在源壳体的内部中以在一组真空泵浦孔周围形成屏障的真空衬套。 根据构造，源壳体组件中除了抽吸孔板中的开口之外的开口被提取孔板和真空衬套包围，从而确保在电弧室外产生的附加电弧或外来离子保留在源壳体内。 恰好在电弧室内产生的那些离子通过提取孔板的开口离开源壳体。

公开(公告)号：US09305733B2

公开(公告)日：2016-04-05

申请号：US14263970

申请日：2014-04-28

Applicant: COLORADO STATE UNIVERSITY RESEARCH FOUNDATION

Inventor： Lauren P. Rand ,  John D. Williams ,  Rafael A. Martinez

IPC: H01J1/14 ,  H01J27/14 ,  H01J1/02 ,  H01J27/08

CPC classification number: H01J1/025 ,  F03H1/0068 ,  H01J1/14 ,  H01J27/08 ,  H01J27/146 ,  H01J2237/08

Abstract: The use of the electride form of 12CaO-7Al2O3, or C12A7, as a low work function electron emitter in a hollow cathode discharge apparatus is described. No heater is required to initiate operation of the present cathode, as is necessary for traditional hollow cathode devices. Because C12A7 has a fully oxidized lattice structure, exposure to oxygen does not degrade the electride. The electride was surrounded by a graphite liner since it was found that the C12A7 electride converts to it's eutectic (CA+C3A) form when heated (through natural hollow cathode operation) in a metal tube.

Abstract translation: 描述了在空心阴极放电装置中使用12CaO-7Al2O3或C12A7的电子形式作为低功函电子发射体。 根据传统的空心阴极器件的需要，不需要加热器来启动本阴极的操作。 因为C12A7具有完全氧化的晶格结构，所以暴露于氧气不会降低电极。 电极被石墨衬垫包围，因为发现当在金属管中加热（通过天然空心阴极操作）时，C12A7电致转变成它的共晶（CA + C3A）形式。

公开(公告)号：US09155180B1

公开(公告)日：2015-10-06

申请号：US13647826

申请日：2012-10-09

Applicant: KLA-Tencor Corporation

Inventor： Karl R. Umstadter

IPC: H05H1/00 ,  H01J27/08 ,  G03F7/20 ,  H01J17/30

CPC classification number: H05H1/00 ,  G03F7/70916 ,  H01J17/30 ,  H01J27/08 ,  H05G2/003

Abstract: The disclosure is directed to a system and method of fueling and mitigating debris for an illumination source. An illumination system may include a plasma-based illumination source. The illumination system may provide illumination along an illumination path emanating from an illumination origin of the illumination source. A gas jet nozzle may be disposed at a selected distance from the illumination origin or proximate to the illumination origin. The gas jet nozzle may be configured to provide fuel gas to fuel the plasma-based illumination source. The gas jet nozzle may be further configured to provide fuel gas in a selected direction substantially opposite to a direction of illumination emanating from the illumination origin to remove at least a portion of debris from the illumination path.

Abstract translation: 本公开涉及一种用于加注和减轻照明源的碎屑的系统和方法。 照明系统可以包括基于等离子体的照明源。 照明系统可以沿着从照明源的照明原点发出的照明路径提供照明。 气体喷嘴可以设置在距照明原点或接近照明原点的选定距离处。 气体喷嘴可以被配置为提供燃料气体来燃料基于等离子体的照明源。 气体喷嘴可以进一步构造成在与从照明原点发出的照明方向基本相反的选定方向上提供燃料气体，以从照明路径去除至少一部分碎片。

公开(公告)号：US09134074B2

公开(公告)日：2015-09-15

申请号：US13645006

申请日：2012-10-04

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Neil J. Bassom

IPC: H01J27/08 ,  F28D15/04 ,  F28D15/02 ,  H01J37/02 ,  H01J37/317

CPC classification number: F28D15/0266 ,  F28D15/0275 ,  F28D15/0283 ,  F28D15/04 ,  H01J27/08 ,  H01J37/02 ,  H01J37/3171 ,  H01J2237/002

Abstract: A method and apparatus are disclosed for controlling a semiconductor process temperature. In one embodiment a thermal control device includes a heat source and a housing comprising a vapor chamber coupled to the heat source. The vapor chamber includes an evaporator section and a condenser section. The evaporator section has a first wall associated with the heat source, the first wall having a wick for drawing a working fluid from a lower portion of the vapor chamber to the evaporator section. The condenser section coupled to a cooling element. The vapor chamber is configured to transfer heat from the heat source to the cooling element via continuous evaporation of the working fluid at the evaporator section and condensation of the working fluid at the condenser section. Other embodiments are disclosed and claimed.

Abstract translation: 公开了一种用于控制半导体工艺温度的方法和装置。 在一个实施例中，热控制装置包括热源和包括耦合到热源的蒸气室的壳体。 蒸气室包括蒸发器部分和冷凝器部分。 蒸发器部分具有与热源相关联的第一壁，第一壁具有用于将工作流体从蒸气室的下部抽吸到蒸发器部分的芯。 冷凝器部分联接到冷却元件。 蒸气室被配置成通过蒸发器部分处的工作流体的连续蒸发以及在冷凝器部分处的工作流体的冷凝将热量从热源传递到冷却元件。 公开和要求保护其他实施例。

公开(公告)号：US08658986B1

公开(公告)日：2014-02-25

申请号：US13649652

申请日：2012-10-11

Applicant: Manuel A. Jerez ,  Carlos F. M. Borges

Inventor： Manuel A. Jerez ,  Carlos F. M. Borges

IPC: H01J27/00

CPC classification number: H01J27/00 ,  H01J27/08 ,  H01J37/08 ,  H01J2237/31701

Abstract: The second repeller assembly includes a flat plate and two sleeves through which the legs of a filament pass in electrically insulated manner. The clamp assembly for the filament includes a pair of strap assemblies with three straps each for electrically connecting the clamps and filament to an electrical feed. The straps are in contact with opposite flat sides of a terminal pin.

Abstract translation: 第二推斥器组件包括平板和两个套筒，细丝的腿通过该套筒以电绝缘的方式穿过。 用于灯丝的夹具组件包括一对带组件，其具有三个带子，用于将夹具和灯丝电连接到电源。 带子与端子销的相对的平坦侧面接触。

公开(公告)号：US08416552B2

公开(公告)日：2013-04-09

申请号：US12925360

申请日：2010-10-20

Applicant: Peter Gefter ,  Leslie Wayne Partridge ,  Lyle Dwight Nelsen

Inventor： Peter Gefter ,  Leslie Wayne Partridge ,  Lyle Dwight Nelsen

IPC: H05F3/06 ,  H01T23/00

CPC classification number: H01T23/00 ,  H01J27/022 ,  H01J27/08 ,  H01T19/04 ,  H05F3/06

Abstract: Self-balancing, corona discharge for the stable production of electrically balanced and ultra-clean ionized gas streams is disclosed. This result is achieved by promoting the electronic conversion of free electrons into negative ions without adding oxygen or another electronegative gas to the gas stream. The invention may be used with electronegative and/or electropositive or noble gas streams and may include the use of a closed loop corona discharge control system.

Abstract translation: 公开了用于稳定生产电平衡和超清洁电离气流的自平衡电晕放电。 该结果是通过促进自由电子向负离子的电子转换而不向气流中添加氧气或另外的负电性气体来实现的。 本发明可以与电负性和/或正电性或惰性气体流一起使用，并且可以包括使用闭环电晕放电控制系统。

公开(公告)号：US08378576B2

公开(公告)日：2013-02-19

申请号：US12897400

申请日：2010-10-04

Applicant: Einstein Noel Abarra ,  Yasushi Miura ,  Eiji Fujiyama ,  Naoyuki Suzuki ,  Yasuyuki Taneda ,  Yasushi Kamiya

Inventor： Einstein Noel Abarra ,  Yasushi Miura ,  Eiji Fujiyama ,  Naoyuki Suzuki ,  Yasuyuki Taneda ,  Yasushi Kamiya

IPC: H05B31/26

CPC classification number: H01J27/08

Abstract: [Objection of the invention]An ion beam generator, a thermal distortion in a grid assembly is reduced. [Structure to solve the objection]Thermal expansion coefficients αP, αM and αG, for a sidewall (1A) of a discharge chamber, mounting platform (40) and extraction grid electrode assembly (20) are selected to have a relation: αP>αM≧αG. For example, the material of discharge chamber sidewall is stainless steel o aluminum, the material of grids is Mo, W or C and the material of platform is Ti or Mo.

Abstract translation: 本发明的目的在于减少电网组件中的热变形的离子束发生器。 [解决异议的结构]选择放电室，安装台（40）和提取栅极电极组件（20）的侧壁（1A）的热膨胀系数αP，αM和αG具有以下关系：αP>αM ≧αG。 例如，放电室侧壁的材料为不锈钢铝，栅格材料为Mo，W或C，平台材料为Ti或Mo。

公开(公告)号：US08281738B2

公开(公告)日：2012-10-09

申请号：US11886526

申请日：2006-03-22

Applicant: Andrew Stephen Devaney ,  Richard David Goldberg ,  Christopher Burgess ,  David George Armour ,  David Kirkwood

Inventor： Andrew Stephen Devaney ,  Richard David Goldberg ,  Christopher Burgess ,  David George Armour ,  David Kirkwood

IPC: H01J27/02

CPC classification number: H01J37/3171 ,  H01J27/08 ,  H01J37/08 ,  H01J2237/082

Abstract: The present invention relates to ion sources (14) comprising a cathode (20) and a counter-cathode (44) that are suitable for ion implanters (10). Typically, the ion source is held under vacuum and produces ions using a plasma generated within an arc chamber (16). Plasma ions are extracted from the arc chamber and subsequently implanted in a semiconductor wafer (12). The ion source according to the present invention further comprises a cathode (40) arranged to emit electrons into the arc chamber; an electrode (44) positioned in the arc chamber such that electrons emitted by the cathode are incident thereon; one or more voltage potential sources (76) arranged to bias the electrode; and a voltage potential adjuster (82) operable to switch between the voltage potential source biasing the electrode positively thereby to act as an anode and the voltage potential source biasing the electrode negatively thereby to act as a counter-cathode.

Abstract translation: 本发明涉及包括适于离子注入机（10）的阴极（20）和反向阴极（44）的离子源（14）。 通常，离子源保持在真空下并使用在电弧室（16）内产生的等离子体产生离子。 从电弧室中提取等离子体离子，随后将其注入到半导体晶片（12）中。 根据本发明的离子源还包括布置成将电子发射到电弧室中的阴极（40） 位于电弧室中的电极（44），使得由阴极发射的电子入射到其上; 布置成偏置电极的一个或多个电压电位源（76） 以及电压电位调节器（82），其可操作以在电极之间切换偏置电极的电压电位，从而充当阳极，并且电压电位源负极偏置电极，用作反向阴极。

公开(公告)号：US20110139998A1

公开(公告)日：2011-06-16

申请号：US12897400

申请日：2010-10-04

Applicant: Einstein Noel ABARRA ,  Yasushi MIURA ,  Eiji FUJIYAMA ,  Naoyuki SUZUKI ,  Yasuyuki TANEDA ,  Yasushi KAMIYA

Inventor： Einstein Noel ABARRA ,  Yasushi MIURA ,  Eiji FUJIYAMA ,  Naoyuki SUZUKI ,  Yasuyuki TANEDA ,  Yasushi KAMIYA

IPC: H01J27/00

CPC classification number: H01J27/08

Abstract: [Objective of the Invention] An ion beam generator, a thermal distortion in a grid assembly is reduced.[Structure to Solve the Objective] Thermal expansion coefficients αP, αM and αG, for a sidewall (1A) of a discharge chamber, mounting platform (40) and extraction grid electrode assembly (20) are selected to have a relation: αP>αM≧αG. For example, the material of discharge chamber sidewall is stainless steel o aluminum, the material of grids is Mo, W or C and the material of platform is Ti or Mo.

Abstract translation: 本发明的目的在于减少栅组件中的热变形的离子束发生器。 [解决目的的结构]选择排出室，安装台（40）和提取栅极电极组件（20）的侧壁（1A）的热膨胀系数αP，αM和αG具有以下关系：αP>αM ≧αG。 例如，放电室侧壁的材料为不锈钢铝，栅格材料为Mo，W或C，平台材料为Ti或Mo。