中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

643 records (took 0.024 seconds)

    METHOD FOR MICROSTRUCTURE CONTROL OF CERAMIC THERMAL SPRAY COATING
    23.
    发明申请
    METHOD FOR MICROSTRUCTURE CONTROL OF CERAMIC THERMAL SPRAY COATING 有权
    陶瓷热喷涂的微结构控制方法

    公开(公告)号：US20120189763A1

    公开(公告)日：2012-07-26

    申请号：US12650650

    申请日：2009-12-31

    Applicant: Christopher W. Strock ,  Charles G. Davis

    Inventor： Christopher W. Strock ,  Charles G. Davis

    IPC: B05D1/08 ,  B05D1/36

    CPC classification number: C23C4/02 ,  C23C4/06 ,  C23C4/12 ,  C23C4/134 ,  C23C28/3215 ,  C23C28/345 ,  F01D5/288 ,  F01D11/122 ,  F05D2230/90 ,  F05D2240/11 ,  F05D2300/21 ,  Y02T50/672

    Abstract: An apparatus for applying segmented ceramic coatings includes means for supporting and moving one or more substrates; one or more heat sources disposed proximate to one or more substrates, wherein at least one of the heat sources is positioned to apply a heat stream to pre-heat a thermal gradient zone on a surface of a substrate; a material deposition device disposed proximate to one or more heat sources, wherein the material deposition device is positioned to deposit a material on a deposition area located behind the thermal gradient zone on the surface; and means for monitoring a surface temperature of one or more substrates.

    Abstract translation: 用于施加分段陶瓷涂层的装置包括用于支撑和移动一个或多个基板的装置; 设置在一个或多个基底附近的一个或多个热源，其中至少一个热源被定位成施加热流以预热衬底表面上的热梯度区; 设置在一个或多个热源附近的材料沉积装置，其中所述材料沉积装置定位成将材料沉积在位于所述表面上的所述热梯度区后面的沉积区域上; 以及用于监测一个或多个基板的表面温度的装置。

    COMPONENT AND METHODS OF FABRICATING AND COATING A COMPONENT
    25.
    发明申请
    COMPONENT AND METHODS OF FABRICATING AND COATING A COMPONENT 有权
    组分和方法制备和涂覆组分

    公开(公告)号：US20120114912A1

    公开(公告)日：2012-05-10

    申请号：US12943646

    申请日：2010-11-10

    Applicant: Ronald Scott Bunker ,  Dennis Michael Gray ,  Don Mark Lipkin

    Inventor： Ronald Scott Bunker ,  Dennis Michael Gray ,  Don Mark Lipkin

    IPC: B32B3/10 ,  B05D1/08 ,  B05D3/06 ,  B05D3/00 ,  B05D7/22

    CPC classification number: F01D25/12 ,  C23C4/02 ,  C23C4/18 ,  C23C24/04 ,  F01D5/187 ,  F01D5/288 ,  F05B2280/6011 ,  F05D2260/204 ,  Y02T50/67 ,  Y02T50/672 ,  Y02T50/676 ,  Y10T428/13 ,  Y10T428/2462

    Abstract: A component is disclosed. The component comprises a substrate comprising an outer surface and an inner surface, where the inner surface defines at least one hollow, interior space, where the outer surface defines one or more grooves, and where each of the one or more grooves extends at least partially along the surface of the substrate and has a base. One or more access holes extend through the base of a respective groove to place the groove in fluid communication with respective ones of the at least one hollow interior space. The component further comprises a coating disposed over at least a portion of the substrate surface, where the coating comprises one or more layers. At least one of the layers defines one or more permeable slots, such that the respective layer does not completely bridge each of the one or more grooves. The grooves and the coating together define one or more channels for cooling the component. Methods for fabricating and coating a component are also provided.

    Abstract translation: 公开了一个组件。 该组件包括一个包括一个外表面和一个内表面的基底，其中内表面限定了至少一个中空的内部空间，其中外表面限定了一个或多个凹槽，并且其中每个凹槽至少部分地延伸 沿着基板的表面并具有基部。 一个或多个进入孔延伸穿过相应凹槽的基部，以使凹槽与至少一个中空内部空间中的相应凹槽流体连通。 该组件还包括设置在衬底表面的至少一部分上的涂层，其中涂层包括一层或多层。 层中的至少一个限定一个或多个可渗透狭缝，使得相应的层不完全桥接一个或多个凹槽中的每一个。 凹槽和涂层一起限定一个或多个通道用于冷却部件。 还提供了制造和涂覆组分的方法。

    Process and apparatus for the manufacture of a sputtering target
    30.
    发明授权
    Process and apparatus for the manufacture of a sputtering target 有权
    用于制造溅射靶的方法和装置

    公开(公告)号：US07964247B2

    公开(公告)日：2011-06-21

    申请号：US10546639

    申请日：2004-02-23

    Applicant: Maher I. Boulos ,  Jerzy W. Jurewicz

    Inventor： Maher I. Boulos ,  Jerzy W. Jurewicz

    IPC: B05D1/08

    CPC classification number: C23C4/12 ,  C23C4/134 ,  C23C4/185 ,  C23C14/3414 ,  H01J37/3491

    Abstract: A process for the manufacture of sputtering target comprises the steps of i) providing a substrate; ii) plasma melting of a material selected to form the sputtering target, yielding droplets of molten material; and iii) deposition of the droplets onto the substrate, yielding a sputtering target comprised of the coated layer of the material on the substrate. In some application, it might be preferable that the substrate be a temporary substrate and iv) to join the coated temporary target via its coated layer to a permanent target backing material; and v) to remove the temporary substrate, yielding a sputtering target comprised of the coated layer of the material on the permanent target backing material. The plasma deposition step is carried out at atmospheric pressure or under soft vacuum conditions using, for example, d.c. plasma spraying, d.c. transferred arc deposition or induction plasma spraying. The process is simple and does not require subsequent operation on the resulting target.

    Abstract translation: 制造溅射靶的方法包括以下步骤：i）提供衬底; ii）选择用于形成溅射靶的材料的等离子体熔融，产生熔融材料的液滴; 以及iii）将液滴沉积到基底上，产生由在基底上的材料的涂层组成的溅射靶。 在一些应用中，可能优选的是基材是临时基材，和iv）通过其涂层将涂覆的临时靶材连接到永久性靶材背衬材料; 以及v）去除所述临时衬底，在所述永久性靶材背衬材料上产生由所述材料的涂层组成的溅射靶。 等离子体沉积步骤在大气压或软的真空条件下进行，例如使用直流 等离子喷涂，直流 转移电弧沉积或感应等离子体喷涂。 该过程很简单，不需要对结果目标进行后续操作。

Patent Agency Ranking