Portable laser plasma spectroscopy apparatus and method for in situ identification of deposits
    21.
    发明授权
    Portable laser plasma spectroscopy apparatus and method for in situ identification of deposits 有权
    便携式激光等离子体光谱仪及其原位鉴定方法

    公开(公告)号:US06762836B2

    公开(公告)日:2004-07-13

    申请号:US10152349

    申请日:2002-05-22

    CPC classification number: G01N21/718

    Abstract: A portable Laser Plasma Spectroscopy (LPS) system and process is provided for performing in situ, near-real time, remote elemental analysis and identification of deposits or other foreign material found on surfaces of machine parts, such as turbine compressor blades or the like, wherein identification of the elemental constituents of a particular deposit is obtained without incurring significant ablative damage to the machine part substrate material underlying the deposit.

    Abstract translation: 提供了一种便携式激光等离子体光谱(LPS)系统和方法,用于在机器部件(例如涡轮压缩机叶片等)的表面上发现的沉积物或其他异物进行原位,近实时,远程元素分析和鉴定, 其中获得特定沉积物的元素成分的鉴定,而不会对沉积物下面的机器部件基底材料产生显着的烧蚀损伤。

    Asynchronous fluorescence scan
    22.
    发明授权
    Asynchronous fluorescence scan 失效
    异步荧光扫描

    公开(公告)号:US06639668B1

    公开(公告)日:2003-10-28

    申请号:US09704829

    申请日:2000-11-03

    Abstract: The present invention is directed to asynchronous scanning devices and methods of using asynchronous scanning to acquire fluorescence data from a sample, such as biological tissue, to facilitate diagnosis of the presence or absence of disease or other abnormality in the sample. The present invention is useful for biomedical diagnostics, chemical analysis or other evaluation of the target sample.

    Abstract translation: 本发明涉及异步扫描装置和使用异步扫描从诸如生物组织的样品获取荧光数据的方法,以便于诊断样品中存在或不存在疾病或其它异常。 本发明可用于目标样品的生物医学诊断,化学分析或其他评估。

    Method of and apparatus for qualitative analysis
    23.
    发明授权
    Method of and apparatus for qualitative analysis 失效
    定性分析的方法和装置

    公开(公告)号:US06614524B1

    公开(公告)日:2003-09-02

    申请号:US08854620

    申请日:1997-05-12

    Applicant: Shoji Kuwabara

    Inventor: Shoji Kuwabara

    CPC classification number: G01N23/223 G01N21/274 G01N2223/076

    Abstract: A qualitative analysis is carried out by first storing reference spectral line data of various elements in different compound forms, exciting a sample and spectroscopically analyzing signal light emitted from the sample to obtain measured spectral line data, determining whether these measured spectral line data include spectral lines of specified compound-forming elements, and comparing the reference spectral line data with the measured spectral line data, if the measured spectral line data are found to include spectral lines of any of the compound-forming elements, to thereby identify elements in the sample.

    Abstract translation: 通过首先以不同的化合物形式存储各种元素的参考光谱线数据,激发样品并对从样品发射的信号光进行光谱分析以获得测得的谱线数据,确定这些测得的谱线数据是否包括谱线,进行定性分析 并且如果发现所测量的谱线数据包括任何化合物形成元素的谱线,则将参考光谱线数据与测量的光谱线数据进行比较,从而识别样品中的元素。

    Method for determination of the radiation stability of crystals

    公开(公告)号:US06603547B2

    公开(公告)日:2003-08-05

    申请号:US09975173

    申请日:2001-10-11

    CPC classification number: G01N21/31

    Abstract: The method for determining radiation stability of a crystal to radiation of a working wavelength to be employed in a subsequent application includes taking a first absorption spectrum (A) of a cleaved piece of the crystal with a given thickness (D) over a predetermined wavelength range from a first wavelength (&lgr;1) to a second wavelength (&lgr;2) by means of a spectrophotometer. Then the cleaved piece of the crystal is irradiated with an energetic radiation source so as to form all theoretically possible color centers (saturation). After the irradiating a second absorption spectrum (B) of the cleaved piece of crystal is taken over the same predetermined wavelength range. Then a surface integral of a difference spectrum of the first absorption spectrum and the second absorption spectrum over the predetermined wavelength range is formed and divided by the thickness (D) to obtain a scaled surface integral value. The absorption coefficient &Dgr;k at the working wavelength for the subsequent application is then obtained preferably from the scaled surface integral value for the damage induced by the energetic radiation and a calibration curve relating the absorption coefficient at the working wavelength to the surface integral of the absorption coefficient induced by the energetic radiation.

    Scanning system and method for scanning a plurality of samples
    25.
    发明授权
    Scanning system and method for scanning a plurality of samples 有权
    用于扫描多个样本的扫描系统和方法

    公开(公告)号:US06563581B1

    公开(公告)日:2003-05-13

    申请号:US09617549

    申请日:2000-07-14

    Abstract: A system for detecting fluorescence emitted from a plurality of samples in a sample tray is provided. The system generally includes a plurality of lenses positioned in a linear arrangement, a linear actuator configured to translate the plurality of lenses, an excitation light source for generating an excitation light, an excitation light direction mechanism for directing the excitation light to a single lens of the plurality of lenses at a time so that a single sample holder aligned with the lens is illuminated at a time, and an optical detection system for analyzing light from the sample holders. In certain embodiments, the optical detection system includes a light dispersing element configured to spectrally disperse the light from the sample holder being illuminated, and a lens element configured to receive light from the light dispersing element and direct the light onto a light detection device. A method of scanning a sample tray having a plurality of samples positioned in sample holders to detect fluorescence is also provided.

    Abstract translation: 提供了一种用于检测从样品盘中的多个样品发出的荧光的系统。 该系统通常包括以线性布置定位的多个透镜,被配置为平移多个透镜的线性致动器,用于产生激发光的激发光源,用于将激发光引导到单个透镜的激发光方向机构 一次使多个透镜一次照射与镜片对准的单个样品保持器,以及用于分析来自样品保持器的光的光学检测系统。 在某些实施例中,光学检测系统包括光分散元件,其被配置为光谱地分散来自被照亮的样品保持器的光;以及透镜元件,被配置为接收来自光分散元件的光并将光引导到光检测装置。 还提供了扫描具有位于样品架中的多个样品以检测荧光的样品盘的方法。

    Method and device utilizing real-time gas sampling

    公开(公告)号:US06538734B2

    公开(公告)日:2003-03-25

    申请号:US09726195

    申请日:2000-11-29

    Applicant: Gary Powell

    Inventor: Gary Powell

    CPC classification number: G01N1/2226 G01N21/68

    Abstract: Aspects of the present invention provide novel methods and devices for sampling gas, exciting the sampled gas to emit radiation and detecting in real time from the emitted radiation a plurality of wave bands of an emission spectrum. Energy used to excite the sampled gas may be adjusted based on the detected wave bands. A process may be controlled in real time based on the detected wave bands. Novel interfaces may be used to display portions of the detected wave bands. A known flow of a reference gas may be included in the flow of sampled gases and an unknown flow of an unknown flow gas determined.

    Method and apparatus for monitoring plasma processing operations

    公开(公告)号:US06261470B1

    公开(公告)日:2001-07-17

    申请号:US09065307

    申请日:1998-04-23

    CPC classification number: G01J3/443 G01J3/28 G01J2003/2866

    Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

    Method and apparatus for monitoring plasma processing operations

    公开(公告)号:US06246473B1

    公开(公告)日:2001-06-12

    申请号:US09064991

    申请日:1998-04-23

    CPC classification number: G01J3/443 G01J3/28 G01J2003/2866

    Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

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