Method and device for growing large-volume oriented monocrystals
    1.
    发明授权
    Method and device for growing large-volume oriented monocrystals 失效
    用于生长大容量定向单晶的方法和装置

    公开(公告)号:US06969502B2

    公开(公告)日:2005-11-29

    申请号:US10220115

    申请日:2001-03-02

    CPC classification number: C30B11/003 C30B11/00 C30B29/12 Y10S117/90 Y10T117/10

    Abstract: In the method for growing large-volume monocrystals crystal raw material is heated in a melting vessel with heating elements to a temperature above its melting point until a melt is formed. A monocrystal is then formed on the bottom of the melting vessel by lowering the temperature at least to the crystallization point. A solid/liquid phase boundary is formed between the monocrystal and the melt. The monocrystal grows towards the melt surface in a direction that is perpendicular to the phase boundary. A vertical axial temperature gradient is produced and maintained between the bottom of the melting vessel and its upper opening and heat inflow and/or heat outflow through side walls of the melting vessel is prevented, so that the solid/liquid phase boundary has a curvature radius of at least one meter. A crystal-growing device for performing this process is also described.

    Abstract translation: 在生长大容量单晶的方法中,将晶体原料在具有加热元件的熔融容器中加热到高于其熔点的温度,直到形成熔体。 然后通过将温度至少降低至结晶点,在熔融容器的底部形成单晶。 在单晶和熔体之间形成固相/液相边界。 单晶在垂直于相边界的方向上朝着熔体表面生长。 在熔化槽的底部与其上部开口之间产生垂直的轴向温度梯度,并且防止了通过熔融容器的侧壁的热流入和/或热流出,使得固/液相边界具有曲率半径 至少一米。 还描述了用于执行该处理的晶体生长装置。

    Method of determining local structures in optical crystals
    2.
    发明授权
    Method of determining local structures in optical crystals 失效
    确定光学晶体中局部结构的方法

    公开(公告)号:US06989904B2

    公开(公告)日:2006-01-24

    申请号:US10464402

    申请日:2003-06-18

    Abstract: The method for determining local structures in optical materials, especially crystals, includes observing schlieren visually in a material to be tested with divergent white light in a first step; measuring birefringence of polarized laser light in the material to determine local defects and structure faults in the material with a spatial resolution of 0.5 mm or better in a second step if the material is judged to be suitable in the first step and then interferometrically measuring the material to determine the faults in the material by interferometry in a third step if the material is judged to be suitable in the first and second steps. This method can be part of a method for making optical components, especially for microlithography.

    Abstract translation: 用于确定光学材料,特别是晶体中的局部结构的方法包括在第一步骤中以发散的白光在待测材料中目视观察schlieren; 测量材料中的偏振激光的双折射,以确定在第二步中空间分辨率为0.5mm或更好的材料中的局部缺陷和结构断层,如果该材料被判断为适合于第一步骤然后干涉测量材料 如果在第一和第二步骤中判断材料是合适的,则通过第三步骤中的干涉测量来确定材料中的故障。 该方法可以是制造光学部件的方法的一部分,特别是用于微光刻。

    Method for determination of the radiation stability of crystals

    公开(公告)号:US06603547B2

    公开(公告)日:2003-08-05

    申请号:US09975173

    申请日:2001-10-11

    CPC classification number: G01N21/31

    Abstract: The method for determining radiation stability of a crystal to radiation of a working wavelength to be employed in a subsequent application includes taking a first absorption spectrum (A) of a cleaved piece of the crystal with a given thickness (D) over a predetermined wavelength range from a first wavelength (&lgr;1) to a second wavelength (&lgr;2) by means of a spectrophotometer. Then the cleaved piece of the crystal is irradiated with an energetic radiation source so as to form all theoretically possible color centers (saturation). After the irradiating a second absorption spectrum (B) of the cleaved piece of crystal is taken over the same predetermined wavelength range. Then a surface integral of a difference spectrum of the first absorption spectrum and the second absorption spectrum over the predetermined wavelength range is formed and divided by the thickness (D) to obtain a scaled surface integral value. The absorption coefficient &Dgr;k at the working wavelength for the subsequent application is then obtained preferably from the scaled surface integral value for the damage induced by the energetic radiation and a calibration curve relating the absorption coefficient at the working wavelength to the surface integral of the absorption coefficient induced by the energetic radiation.

    Optical system with compensated spatial dispersion
    5.
    发明授权
    Optical system with compensated spatial dispersion 有权
    具有补偿空间色散的光学系统

    公开(公告)号:US06816326B2

    公开(公告)日:2004-11-09

    申请号:US10194700

    申请日:2002-07-12

    CPC classification number: G03F7/70958 G02B1/02 G02B13/143

    Abstract: The optical system has a first optical element (11,17, 19, 26) and a second optical element (12, 18, 20, 27) having respective plane surfaces and cubic crystal structures, which are arranged next to each other along an optic axis (10) so that one of the crystal axes of each optical element is parallel to the optic axis and the plane surfaces are resting against each other. The first and second optical elements have first and second orientations in relation to the optic axis, which are preferably rotated by a rotation about the optic axis (10) with respect to each other according to the rotational symmetry of the material. At least one of the first optical element and second optical element is pre-stressed by applying a compressive stress (&sgr;,&sgr;,1,&sgr;2) thereto. The compressive stress is applied radially symmetrically in a plane perpendicular to the optic axis (10) and compensates for spatial dispersion.

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