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    SELF-REFERENCING INTERFEROMETER AND DUAL SELF-REFERENCING INTERFEROMETER DEVICES
    33.
    发明申请
    SELF-REFERENCING INTERFEROMETER AND DUAL SELF-REFERENCING INTERFEROMETER DEVICES 有权

    公开(公告)号：US20220221802A1

    公开(公告)日：2022-07-14

    申请号：US17614159

    申请日：2020-05-19

    Applicant: ASML HOLDING N.V.

    Inventor： Douglas C. CAPPELLI

    IPC: G03F9/00 ,  G01B9/02097

    Abstract: A self-referencing interferometer (SRI) system for an alignment sensor apparatus includes a first prism and a second prism. The first prism has an input surface for an incident beam. The second prism is coupled to the first prism and has an output surface for a recombined beam. The recombined beam includes a first image and a second image rotated by 180 degrees with respect to the first image. The first and second prisms are identical in shape. A dual self-referencing interferometer (DSRI) system for an alignment sensor apparatus includes a first prism assembly having an input surface for a first incident beam and a second incident beam, and a second prism assembly coupled to the first prism assembly and having an output surface for a first recombined beam and a second recombined beam. The first and second prism assemblies are identical in shape.

    LITHOGRAPHIC APPARATUS, METROLOGY APPARATUS, OPTICAL SYSTEM AND METHOD
    35.
    发明申请
    LITHOGRAPHIC APPARATUS, METROLOGY APPARATUS, OPTICAL SYSTEM AND METHOD 有权

    公开(公告)号：US20220179330A1

    公开(公告)日：2022-06-09

    申请号：US17438328

    申请日：2020-02-28

    Applicant: ASML Holding N.V.

    Inventor： Stanislav SMIRNOV

    IPC: G03F9/00

    Abstract: A method to reduce sensitivity of a level sensor, arranged to measure a height of a substrate, to variations of a property of an optical component in the level sensor includes directing a beam of radiation toward a diffractive element and directing the beam, via an optical system, to a first reflective element at a first angle of incidence. The beam has a first polarization and a second polarization that is perpendicular to the first polarization. The first reflective element reflects the beam toward a second reflective element at a second angle of incidence causing the beam to impinge on the substrate. The first and second angles of incidence are selected to reduce variations of a ratio of intensities of the first polarization to the second polarization of the beam imparted by a property of a layer of at least one of the first and second reflective elements.

    ELECTROSTATIC CLAMP FOR A LITHOGRAPHIC APPARATUS
    37.
    发明申请
    ELECTROSTATIC CLAMP FOR A LITHOGRAPHIC APPARATUS 有权

    公开(公告)号：US20220146948A1

    公开(公告)日：2022-05-12

    申请号：US17438021

    申请日：2020-03-06

    Applicant: ASML Holding N.V.

    Inventor： Hari KRISHNAN ,  Joseph Harry LYONS ,  Eric Justin MONKMAN ,  Victor Antonio PEREZ-FALCON

    IPC: G03F7/20 ,  H01L21/683

    Abstract: An electrostatic clamp for supporting a substrate includes a substrate region, an electrode region at an edge of the substrate region, a support layer, an electrically conductive layer, a contact layer, and an electrode. The support layer has a body having first and second surfaces that are substantially parallel to each other and disposed on opposite sides of the body. A through-hole is disposed in the electrode region and provides access between the first and second surfaces. The electrically conductive layer is disposed on the second surface of the support layer. The contact layer disposed on the electrically conductive layer. The contact layer is uninterrupted in the electrode region and comprises burls in the substrate region. The burls contact the substrate when the electrostatic clamp is supporting the substrate. The electrode is disposed in the through-hole and is electrically coupled to the electrically conductive layer.

    High stability collimator assembly, lithographic apparatus, and method
    39.
    发明授权
    High stability collimator assembly, lithographic apparatus, and method 有权

    公开(公告)号：US11204559B2

    公开(公告)日：2021-12-21

    申请号：US17054313

    申请日：2019-05-02

    Applicant: ASML Holding N.V.

    Inventor： David Taub ,  Joseph Ashwin Franklin ,  Jeffrey John Kowalski

    IPC: G03F7/20 ,  G03F9/00 ,  G02B6/36 ,  G02B7/00

    Abstract: A lithography system comprises an illumination system configured to produce abeam of radiation, a support configured to support a patterning device configured to impart a pattern on the beam, a projection system configured to project the patterned beam onto a substrate, and an alignment system comprising an illuminator. The illuminator comprises an optical fiber, an optical fiber protector (714), an optical fiber support (700) comprising a first support arm assembly configured to support the optical fiber protector, an optical system, and an optical system support comprising a second support arm assembly configured to support the optical system.

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