公开(公告)号：US20210333720A1

公开(公告)日：2021-10-28

申请号：US17231446

申请日：2021-04-15

Applicant: ASML Holding N.V.

Inventor： Ryan Richard Westover ,  Ryan Walter Roder ,  Peter Ferenz ,  David Taub

IPC: G03F7/20

Abstract: A compensator for manipulating a radiation beam traveling along an optical path. The compensator includes a fixed support holding a first optical wedge and an adjustable support holding a second optical wedge. The adjustable support includes a base, a stage holding the second optical wedge, first and second flexures, and a drive block. The stage defines a cavity and is movable relative to the base and the fixed support. The first and second flexures couple the stage to the base such that the stage translates along a stage path. The drive block is disposed in the cavity of the stage and is configured to translate along a drive block path perpendicular to the optical path and perpendicular to the stage path. The drive block includes first and second drive bearing surfaces configured to translate the stage in first and second stage directions, respectively, along the stage path.

公开(公告)号：US11249402B2

公开(公告)日：2022-02-15

申请号：US17231446

申请日：2021-04-15

Applicant: ASML Holding N.V.

Inventor： Ryan Richard Westover ,  Ryan Walter Roder ,  Peter Ferenz ,  David Taub

IPC: G03F7/20

Abstract: A compensator for manipulating a radiation beam traveling along an optical path. The compensator includes a fixed support holding a first optical wedge and an adjustable support holding a second optical wedge. The adjustable support includes a base, a stage holding the second optical wedge, first and second flexures, and a drive block. The stage defines a cavity and is movable relative to the base and the fixed support. The first and second flexures couple the stage to the base such that the stage translates along a stage path. The drive block is disposed in the cavity of the stage and is configured to translate along a drive block path perpendicular to the optical path and perpendicular to the stage path. The drive block includes first and second drive bearing surfaces configured to translate the stage in first and second stage directions, respectively, along the stage path.

公开(公告)号：US11204559B2

公开(公告)日：2021-12-21

申请号：US17054313

申请日：2019-05-02

Applicant: ASML Holding N.V.

Inventor： David Taub ,  Joseph Ashwin Franklin ,  Jeffrey John Kowalski

IPC: G03F7/20 ,  G03F9/00 ,  G02B6/36 ,  G02B7/00

Abstract: A lithography system comprises an illumination system configured to produce abeam of radiation, a support configured to support a patterning device configured to impart a pattern on the beam, a projection system configured to project the patterned beam onto a substrate, and an alignment system comprising an illuminator. The illuminator comprises an optical fiber, an optical fiber protector (714), an optical fiber support (700) comprising a first support arm assembly configured to support the optical fiber protector, an optical system, and an optical system support comprising a second support arm assembly configured to support the optical system.